JP2013511823A5 - - Google Patents
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- Publication number
- JP2013511823A5 JP2013511823A5 JP2012539080A JP2012539080A JP2013511823A5 JP 2013511823 A5 JP2013511823 A5 JP 2013511823A5 JP 2012539080 A JP2012539080 A JP 2012539080A JP 2012539080 A JP2012539080 A JP 2012539080A JP 2013511823 A5 JP2013511823 A5 JP 2013511823A5
- Authority
- JP
- Japan
- Prior art keywords
- workpiece
- plasma
- focusing plate
- aperture
- scanning
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 150000002500 ions Chemical class 0.000 claims description 33
- 238000000034 method Methods 0.000 claims description 23
- 238000002347 injection Methods 0.000 claims description 18
- 239000007924 injection Substances 0.000 claims description 18
- 238000002513 implantation Methods 0.000 claims description 13
- 239000002019 doping agent Substances 0.000 claims description 10
- 239000007943 implant Substances 0.000 claims description 2
- 238000005468 ion implantation Methods 0.000 claims description 2
- 210000002381 plasma Anatomy 0.000 claims 34
- 230000001360 synchronised effect Effects 0.000 claims 2
- 238000000605 extraction Methods 0.000 claims 1
- 238000004886 process control Methods 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 2
- 230000000737 periodic effect Effects 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 230000007723 transport mechanism Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US26198309P | 2009-11-17 | 2009-11-17 | |
| US61/261,983 | 2009-11-17 | ||
| US12/947,078 | 2010-11-16 | ||
| US12/947,078 US8461030B2 (en) | 2009-11-17 | 2010-11-16 | Apparatus and method for controllably implanting workpieces |
| PCT/US2010/056952 WO2011062945A1 (en) | 2009-11-17 | 2010-11-17 | Apparatus and method for controllably implanting workpieces |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2013511823A JP2013511823A (ja) | 2013-04-04 |
| JP2013511823A5 true JP2013511823A5 (enExample) | 2013-11-21 |
Family
ID=43601664
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012539080A Pending JP2013511823A (ja) | 2009-11-17 | 2010-11-17 | ワークピースの注入処理を制御可能に実行する装置および方法 |
Country Status (7)
| Country | Link |
|---|---|
| US (2) | US8461030B2 (enExample) |
| EP (1) | EP2502254A1 (enExample) |
| JP (1) | JP2013511823A (enExample) |
| KR (1) | KR20120105469A (enExample) |
| CN (1) | CN102971825A (enExample) |
| TW (1) | TWI485743B (enExample) |
| WO (1) | WO2011062945A1 (enExample) |
Families Citing this family (28)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20110027463A1 (en) * | 2009-06-16 | 2011-02-03 | Varian Semiconductor Equipment Associates, Inc. | Workpiece handling system |
| US8749053B2 (en) | 2009-06-23 | 2014-06-10 | Intevac, Inc. | Plasma grid implant system for use in solar cell fabrications |
| US8164068B2 (en) * | 2009-07-30 | 2012-04-24 | Varian Semiconductor Equipment Associates, Inc. | Mask health monitor using a faraday probe |
| US8592230B2 (en) | 2010-04-22 | 2013-11-26 | Varian Semiconductor Equipment Associates, Inc. | Method for patterning a substrate using ion assisted selective depostion |
| US8435727B2 (en) | 2010-10-01 | 2013-05-07 | Varian Semiconductor Equipment Associates, Inc. | Method and system for modifying photoresist using electromagnetic radiation and ion implantation |
| KR101915753B1 (ko) * | 2010-10-21 | 2018-11-07 | 삼성디스플레이 주식회사 | 이온 주입 시스템 및 이를 이용한 이온 주입 방법 |
| DE102010060910A1 (de) * | 2010-11-30 | 2012-05-31 | Roth & Rau Ag | Verfahren und Vorrichtung zur Ionenimplantation |
| US8907307B2 (en) * | 2011-03-11 | 2014-12-09 | Varian Semiconductor Equipment Associates, Inc. | Apparatus and method for maskless patterned implantation |
| US8716682B2 (en) | 2011-04-04 | 2014-05-06 | Varian Semiconductor Equipment Associates, Inc. | Apparatus and method for multiple slot ion implantation |
| US8288741B1 (en) * | 2011-08-16 | 2012-10-16 | Varian Semiconductor Equipment Associates, Inc. | Apparatus and method for three dimensional ion processing |
| US9437392B2 (en) | 2011-11-02 | 2016-09-06 | Varian Semiconductor Equipment Associates, Inc. | High-throughput ion implanter |
| WO2013070978A2 (en) | 2011-11-08 | 2013-05-16 | Intevac, Inc. | Substrate processing system and method |
| US9297063B2 (en) | 2012-04-26 | 2016-03-29 | Varian Semiconductor Equipment Associates, Inc. | Plasma potential modulated ion implantation system |
| JP2014045036A (ja) * | 2012-08-24 | 2014-03-13 | Amaya Corp | 半導体装置の製造方法 |
| TWI570745B (zh) * | 2012-12-19 | 2017-02-11 | 因特瓦克公司 | 用於電漿離子植入之柵極 |
| US9232628B2 (en) | 2013-02-20 | 2016-01-05 | Varian Semiconductor Equipment Associates, Inc. | Method and system for plasma-assisted ion beam processing |
| US9236257B2 (en) * | 2013-03-13 | 2016-01-12 | Varian Semiconductor Equipment Associates, Inc. | Techniques to mitigate straggle damage to sensitive structures |
| US20140360670A1 (en) * | 2013-06-05 | 2014-12-11 | Tokyo Electron Limited | Processing system for non-ambipolar electron plasma (nep) treatment of a substrate with sheath potential |
| JP6150632B2 (ja) * | 2013-06-26 | 2017-06-21 | 住友重機械イオンテクノロジー株式会社 | イオンビーム測定装置及びイオンビーム測定方法 |
| US9711316B2 (en) | 2013-10-10 | 2017-07-18 | Varian Semiconductor Equipment Associates, Inc. | Method of cleaning an extraction electrode assembly using pulsed biasing |
| US9520267B2 (en) * | 2014-06-20 | 2016-12-13 | Applied Mateirals, Inc. | Bias voltage frequency controlled angular ion distribution in plasma processing |
| US9514912B2 (en) * | 2014-09-10 | 2016-12-06 | Varian Semiconductor Equipment Associates, Inc. | Control of ion angular distribution of ion beams with hidden deflection electrode |
| US9287148B1 (en) * | 2014-12-18 | 2016-03-15 | Varian Semiconductor Equipment Associates, Inc. | Dynamic heating method and system for wafer processing |
| US10730082B2 (en) * | 2016-10-26 | 2020-08-04 | Varian Semiconductor Equipment Associates, Inc. | Apparatus and method for differential in situ cleaning |
| EP3404693B1 (en) * | 2017-05-19 | 2019-11-13 | Total SA | Apparatus and method for patterned processing |
| US10276340B1 (en) * | 2017-12-20 | 2019-04-30 | Varian Semiconductor Equipment Associates, Inc. | Low particle capacitively coupled components for workpiece processing |
| US10468226B1 (en) | 2018-09-21 | 2019-11-05 | Varian Semiconductor Equipment Associates, Inc. | Extraction apparatus and system for high throughput ion beam processing |
| US11193198B2 (en) * | 2018-12-17 | 2021-12-07 | Applied Materials, Inc. | Methods of forming devices on a substrate |
Family Cites Families (28)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4979457A (enExample) * | 1972-12-04 | 1974-07-31 | ||
| US4074139A (en) | 1976-12-27 | 1978-02-14 | Rca Corporation | Apparatus and method for maskless ion implantation |
| DE2835136A1 (de) | 1978-08-10 | 1980-02-14 | Fraunhofer Ges Forschung | Solarelement sowie verfahren und vorrichtung zur herstellung desselben mittels ionenimplantation |
| JPS58180227A (ja) * | 1982-04-17 | 1983-10-21 | Samuko Internatl Kenkyusho:Kk | 複数の反応室を備えた能率的プラズマ処理装置 |
| JP2780419B2 (ja) * | 1990-03-05 | 1998-07-30 | 松下電器産業株式会社 | 不純物の導入装置及びその導入方法 |
| JPH08213339A (ja) * | 1995-02-02 | 1996-08-20 | Hitachi Ltd | イオン注入方法およびその装置 |
| JP4204662B2 (ja) | 1998-04-02 | 2009-01-07 | 株式会社アルバック | イオン注入装置およびイオン注入方法 |
| US6203862B1 (en) | 1998-05-13 | 2001-03-20 | Intevac, Inc. | Processing systems with dual ion sources |
| JP2920188B1 (ja) * | 1998-06-26 | 1999-07-19 | 日新電機株式会社 | パルスバイアス水素負イオン注入方法及び注入装置 |
| JP2001189483A (ja) | 1999-10-18 | 2001-07-10 | Sharp Corp | バイパス機能付太陽電池セルおよびバイパス機能付き多接合積層型太陽電池セルおよびそれらの製造方法 |
| US6534775B1 (en) | 2000-09-01 | 2003-03-18 | Axcelis Technologies, Inc. | Electrostatic trap for particles entrained in an ion beam |
| US7470329B2 (en) | 2003-08-12 | 2008-12-30 | University Of Maryland | Method and system for nanoscale plasma processing of objects |
| DE102004063691B4 (de) * | 2004-05-10 | 2019-01-17 | Hynix Semiconductor Inc. | Verfahren zum Implantieren von Ionen in einem Halbleiterbauelement |
| JP4969781B2 (ja) | 2005-01-14 | 2012-07-04 | 株式会社アルバック | プラズマドーピング装置 |
| JP2006278006A (ja) | 2005-03-28 | 2006-10-12 | Japan Atomic Energy Agency | イオン源引き出し領域におけるプラズマ境界面制御方法及びそのイオン源 |
| US7524743B2 (en) | 2005-10-13 | 2009-04-28 | Varian Semiconductor Equipment Associates, Inc. | Conformal doping apparatus and method |
| US7820460B2 (en) * | 2007-09-07 | 2010-10-26 | Varian Semiconductor Equipment Associates, Inc. | Patterned assembly for manufacturing a solar cell and a method thereof |
| US20090142875A1 (en) | 2007-11-30 | 2009-06-04 | Applied Materials, Inc. | Method of making an improved selective emitter for silicon solar cells |
| US7727866B2 (en) | 2008-03-05 | 2010-06-01 | Varian Semiconductor Equipment Associates, Inc. | Use of chained implants in solar cells |
| US20090317937A1 (en) | 2008-06-20 | 2009-12-24 | Atul Gupta | Maskless Doping Technique for Solar Cells |
| CN102099870A (zh) | 2008-06-11 | 2011-06-15 | 因特瓦克公司 | 用于在太阳能电池制作中使用的专用注入系统和方法 |
| US8356550B2 (en) | 2008-07-25 | 2013-01-22 | Federal-Mogul Corporation | Piston skirt with friction reducing oil recess and oil reservoir |
| US8101510B2 (en) * | 2009-04-03 | 2012-01-24 | Varian Semiconductor Equipment Associates, Inc. | Plasma processing apparatus |
| US8623171B2 (en) | 2009-04-03 | 2014-01-07 | Varian Semiconductor Equipment Associates, Inc. | Plasma processing apparatus |
| US7767977B1 (en) | 2009-04-03 | 2010-08-03 | Varian Semiconductor Equipment Associates, Inc. | Ion source |
| US8749053B2 (en) | 2009-06-23 | 2014-06-10 | Intevac, Inc. | Plasma grid implant system for use in solar cell fabrications |
| US8008176B2 (en) | 2009-08-11 | 2011-08-30 | Varian Semiconductor Equipment Associates, Inc. | Masked ion implant with fast-slow scan |
| US8173527B2 (en) | 2009-10-19 | 2012-05-08 | Varian Semiconductor Equipment Associates, Inc. | Stepped masking for patterned implantation |
-
2010
- 2010-11-16 US US12/947,078 patent/US8461030B2/en active Active
- 2010-11-17 JP JP2012539080A patent/JP2013511823A/ja active Pending
- 2010-11-17 WO PCT/US2010/056952 patent/WO2011062945A1/en not_active Ceased
- 2010-11-17 KR KR1020127015077A patent/KR20120105469A/ko not_active Withdrawn
- 2010-11-17 EP EP10788436A patent/EP2502254A1/en not_active Withdrawn
- 2010-11-17 TW TW099139576A patent/TWI485743B/zh not_active IP Right Cessation
- 2010-11-17 CN CN2010800515328A patent/CN102971825A/zh active Pending
-
2013
- 2013-04-19 US US13/866,315 patent/US8937004B2/en not_active Expired - Fee Related
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