JP2013510429A - 非ハロゲン化硬化剤を有する誘電体材料 - Google Patents
非ハロゲン化硬化剤を有する誘電体材料 Download PDFInfo
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- titanate
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- 239000003989 dielectric material Substances 0.000 title abstract description 4
- MQJKPEGWNLWLTK-UHFFFAOYSA-N Dapsone Chemical class C1=CC(N)=CC=C1S(=O)(=O)C1=CC=C(N)C=C1 MQJKPEGWNLWLTK-UHFFFAOYSA-N 0.000 claims abstract description 18
- 229920000647 polyepoxide Polymers 0.000 claims description 48
- 239000000758 substrate Substances 0.000 claims description 43
- 239000003822 epoxy resin Substances 0.000 claims description 41
- 239000000203 mixture Substances 0.000 claims description 39
- 239000002245 particle Substances 0.000 claims description 17
- 239000003795 chemical substances by application Substances 0.000 claims description 16
- 239000003990 capacitor Substances 0.000 claims description 12
- 229910002113 barium titanate Inorganic materials 0.000 claims description 11
- JRPBQTZRNDNNOP-UHFFFAOYSA-N barium titanate Chemical compound [Ba+2].[Ba+2].[O-][Ti]([O-])([O-])[O-] JRPBQTZRNDNNOP-UHFFFAOYSA-N 0.000 claims description 11
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 10
- 239000004593 Epoxy Substances 0.000 claims description 8
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 5
- 229910052802 copper Inorganic materials 0.000 claims description 5
- 239000010949 copper Substances 0.000 claims description 5
- 238000000354 decomposition reaction Methods 0.000 claims description 5
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical class C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 claims description 5
- 230000009477 glass transition Effects 0.000 claims description 5
- 150000002989 phenols Chemical class 0.000 claims description 4
- 229920003986 novolac Polymers 0.000 claims description 3
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 2
- 229910052454 barium strontium titanate Inorganic materials 0.000 claims description 2
- HAUBPZADNMBYMB-UHFFFAOYSA-N calcium copper Chemical compound [Ca].[Cu] HAUBPZADNMBYMB-UHFFFAOYSA-N 0.000 claims description 2
- 239000007795 chemical reaction product Substances 0.000 claims description 2
- 239000000945 filler Substances 0.000 claims description 2
- 229910052746 lanthanum Inorganic materials 0.000 claims description 2
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 claims description 2
- HFGPZNIAWCZYJU-UHFFFAOYSA-N lead zirconate titanate Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ti+4].[Zr+4].[Pb+2] HFGPZNIAWCZYJU-UHFFFAOYSA-N 0.000 claims description 2
- 229910052749 magnesium Inorganic materials 0.000 claims description 2
- 239000011777 magnesium Substances 0.000 claims description 2
- 239000000377 silicon dioxide Substances 0.000 claims description 2
- 235000012239 silicon dioxide Nutrition 0.000 claims description 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 2
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 45
- 239000010410 layer Substances 0.000 description 27
- 239000000523 sample Substances 0.000 description 21
- 239000000463 material Substances 0.000 description 19
- 238000000034 method Methods 0.000 description 19
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 15
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 15
- 239000000243 solution Substances 0.000 description 14
- 230000001965 increasing effect Effects 0.000 description 9
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- 125000003118 aryl group Chemical group 0.000 description 8
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- 239000007787 solid Substances 0.000 description 8
- 239000002904 solvent Substances 0.000 description 8
- 239000000126 substance Substances 0.000 description 8
- 238000000576 coating method Methods 0.000 description 7
- 229920000642 polymer Polymers 0.000 description 7
- 238000012360 testing method Methods 0.000 description 7
- 239000004594 Masterbatch (MB) Substances 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 6
- 239000006185 dispersion Substances 0.000 description 6
- 238000006073 displacement reaction Methods 0.000 description 6
- 238000002474 experimental method Methods 0.000 description 6
- 239000011889 copper foil Substances 0.000 description 5
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 4
- 150000001412 amines Chemical class 0.000 description 4
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 239000002131 composite material Substances 0.000 description 4
- 238000009472 formulation Methods 0.000 description 4
- 239000012456 homogeneous solution Substances 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- LJGHYPLBDBRCRZ-UHFFFAOYSA-N 3-(3-aminophenyl)sulfonylaniline Chemical compound NC1=CC=CC(S(=O)(=O)C=2C=C(N)C=CC=2)=C1 LJGHYPLBDBRCRZ-UHFFFAOYSA-N 0.000 description 3
- 239000004642 Polyimide Substances 0.000 description 3
- 239000003054 catalyst Substances 0.000 description 3
- 230000008859 change Effects 0.000 description 3
- 229910003460 diamond Inorganic materials 0.000 description 3
- 239000010432 diamond Substances 0.000 description 3
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 3
- 238000011068 loading method Methods 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 239000004033 plastic Substances 0.000 description 3
- 229920003023 plastic Polymers 0.000 description 3
- 229920000728 polyester Polymers 0.000 description 3
- 239000004848 polyfunctional curative Substances 0.000 description 3
- 229920001721 polyimide Polymers 0.000 description 3
- 229920001451 polypropylene glycol Polymers 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 230000004044 response Effects 0.000 description 3
- 230000035945 sensitivity Effects 0.000 description 3
- 229910000679 solder Inorganic materials 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 101100365384 Mus musculus Eefsec gene Proteins 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- DKPFZGUDAPQIHT-UHFFFAOYSA-N butyl acetate Chemical compound CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000013016 damping Methods 0.000 description 2
- 238000013500 data storage Methods 0.000 description 2
- 230000005284 excitation Effects 0.000 description 2
- 238000000227 grinding Methods 0.000 description 2
- 239000004843 novolac epoxy resin Substances 0.000 description 2
- 238000000059 patterning Methods 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 230000001105 regulatory effect Effects 0.000 description 2
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical compound C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 1
- XQUPVDVFXZDTLT-UHFFFAOYSA-N 1-[4-[[4-(2,5-dioxopyrrol-1-yl)phenyl]methyl]phenyl]pyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C(C=C1)=CC=C1CC1=CC=C(N2C(C=CC2=O)=O)C=C1 XQUPVDVFXZDTLT-UHFFFAOYSA-N 0.000 description 1
- AHDSRXYHVZECER-UHFFFAOYSA-N 2,4,6-tris[(dimethylamino)methyl]phenol Chemical compound CN(C)CC1=CC(CN(C)C)=C(O)C(CN(C)C)=C1 AHDSRXYHVZECER-UHFFFAOYSA-N 0.000 description 1
- XRAKCYJTJGTSMM-UHFFFAOYSA-N 2-chloro-4-fluoroaniline Chemical compound NC1=CC=C(F)C=C1Cl XRAKCYJTJGTSMM-UHFFFAOYSA-N 0.000 description 1
- FZZMTSNZRBFGGU-UHFFFAOYSA-N 2-chloro-7-fluoroquinazolin-4-amine Chemical compound FC1=CC=C2C(N)=NC(Cl)=NC2=C1 FZZMTSNZRBFGGU-UHFFFAOYSA-N 0.000 description 1
- XSFHICWNEBCMNN-UHFFFAOYSA-N 2h-benzotriazol-5-amine Chemical compound NC1=CC=C2NN=NC2=C1 XSFHICWNEBCMNN-UHFFFAOYSA-N 0.000 description 1
- KMHLGVTVACLEJE-UHFFFAOYSA-N 4-fluoro-2-methylaniline Chemical compound CC1=CC(F)=CC=C1N KMHLGVTVACLEJE-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- 229920005372 Plexiglas® Polymers 0.000 description 1
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 229920002873 Polyethylenimine Polymers 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- UMIVXZPTRXBADB-UHFFFAOYSA-N benzocyclobutene Chemical compound C1=CC=C2CCC2=C1 UMIVXZPTRXBADB-UHFFFAOYSA-N 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 239000004643 cyanate ester Substances 0.000 description 1
- 150000001913 cyanates Chemical class 0.000 description 1
- 238000000113 differential scanning calorimetry Methods 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 150000002118 epoxides Chemical group 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 239000005350 fused silica glass Substances 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 238000007542 hardness measurement Methods 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 238000007373 indentation Methods 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 239000002648 laminated material Substances 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000005065 mining Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000001565 modulated differential scanning calorimetry Methods 0.000 description 1
- FEKSQPIVDJSVJJ-UHFFFAOYSA-N n-chloro-2-fluoroaniline Chemical compound FC1=CC=CC=C1NCl FEKSQPIVDJSVJJ-UHFFFAOYSA-N 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 229920003192 poly(bis maleimide) Polymers 0.000 description 1
- 229920003223 poly(pyromellitimide-1,4-diphenyl ether) Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920000768 polyamine Polymers 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920001955 polyphenylene ether Polymers 0.000 description 1
- 229920006380 polyphenylene oxide Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- -1 polytetrafluoroethylenes Polymers 0.000 description 1
- 239000013557 residual solvent Substances 0.000 description 1
- 239000011342 resin composition Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000010972 statistical evaluation Methods 0.000 description 1
- 230000035882 stress Effects 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/16—Printed circuits incorporating printed electric components, e.g. printed resistor, capacitor, inductor
- H05K1/162—Printed circuits incorporating printed electric components, e.g. printed resistor, capacitor, inductor incorporating printed capacitors
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/10—Metal compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
- C08K3/20—Oxides; Hydroxides
- C08K3/22—Oxides; Hydroxides of metals
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/34—Silicon-containing compounds
- C08K3/36—Silica
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
- C08K3/20—Oxides; Hydroxides
- C08K3/22—Oxides; Hydroxides of metals
- C08K2003/2206—Oxides; Hydroxides of metals of calcium, strontium or barium
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
- C08K3/20—Oxides; Hydroxides
- C08K3/22—Oxides; Hydroxides of metals
- C08K2003/2237—Oxides; Hydroxides of metals of titanium
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/02—Fillers; Particles; Fibers; Reinforcement materials
- H05K2201/0203—Fillers and particles
- H05K2201/0206—Materials
- H05K2201/0209—Inorganic, non-metallic particles
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- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Epoxy Resins (AREA)
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Abstract
【選択図】なし
Description
DDS−1は、4,4’−ジアミノジフェニルスルホン(CAS−80−08−1)である。
DDS−2は、3,3’−ジアミノジフェニルスルホン(CAS−599−61−1)である。
OTBAFは、9,9’−ビス(3−メチル−4−アミノフェニル)フッ素(CAS−15499−84−0)である。
CAFは、9,9’−ビス(3−クロロ−4−アミノフェニル)フッ素(CAS−107934−68−9)である。
EPON 1001Fは、Hexion Specialty Chemical(Columbus,OH)製のビスフェノールAベースのエポキシ樹脂製品(CAS−25036−25−3)の商標名である。
EPON HPT−1050は、Hexion Specialty Chemical(Columbus,OH)製のノボラックエポキシ樹脂製品(CAS−28064−14−4)の商標名である。
Nippon Chemical Industrial Co.(Tokyo,Japan)製のチタン酸バリウム(BaTiO3)
Aldrich Chemical(Milwaukee,WI,U.S.A.)製のメチルイソブチルケトン(MIBK)溶媒。
Aldrich Chemical(Milwaukee,WI,U.S.A.)製のメチルエチルケトン(MEK)溶媒。
EPON 1001F及びEPON HPT−1050をメチルイソブチルケトン(MIBK)溶媒及びメチルエチルケトン(MEK)溶媒に溶解することにより、バッチ量の50重量%エポキシ溶液を作製した。EPON 1001FとEPON HPT−1050との比は、4:1であった。MIBKとMEKとの比は、1.5:1であった。エポキシ樹脂を溶媒に加え、炉内でおよそ70℃に加熱し、混合して実質的に均質の溶液とした。
EPON 1001F及びEPON HPT−1050をメチルイソブチルケトン(MIBK)溶媒及びメチルエチルケトン(MEK)溶媒に溶解することにより、バッチ量の50重量%エポキシ溶液を作製した。EPON 1001FとEPON HPT−1050との比は、4:1であった。MIBKとMEKとの比は、1.5:1であった。エポキシ樹脂を溶媒に加え、炉内でおよそ70℃に加熱し、混合して実質的に均質の溶液とした。
実施例2〜4及び比較例C2〜C7の組成物を、下記の表5に示す。実施例は、表5に示す成分をポリスチレンサンプルバイアル(長さ2インチ×直径0.5インチ(長さ5cm×直径1.8cm)、Sigma Aldrich(St.Louis,MO)製の製品# Z11153−8)に加えることにより調製した。キャップを適用し、サンプルをおよそ30秒間手で振盪し混転して、成分層(stratificaiton)を砕いた。手で混合した後、PLEXIGLAS球形乳棒(直径3/8インチ(直径0.9cm)、Sigma Aldrich(St.Louis,MO)製の製品# Z111503)をバイアル内に配置し、サンプルをCrescent WIG−L−BUG(RINN(Elgin,IL)製の製品C32010B)を使用した60秒間の機械的混合に付した。次いで乳棒をバイアルから除去して、材料の更なる動きを可能にした。混合物を手で30秒間更に混合し、乳棒を交換し、機械的混合を60秒間繰り返した。手による混合及び機械的混合のプロセスを、合計で3回繰り返した。
使用したMDSCは、TA Instruments(New Castle,DE)製のQ200 1517であった。
1:外部事象:On
2:データ記憶:Off
3:25.00℃で平衡化
4:60秒毎に変調+/−0.80℃
5:15.00分間の等温
6:データ記憶:On
7:300.00℃への勾配5.00℃/分
8:2.00分間の等温
9:25.00℃で平衡化
10:15.00分間の等温
11:300.00℃への勾配5.00℃/分
12:方法の終了
この測定プロセスは、サンプル表面内への深さの連続関数としての弾性係数(E)及び硬度(H)を測定する。弾性率及び硬度データは、硬度及び弾性率のバルク評価のために、2000nmの空間的ウィンドウに関して平均した。結果を表7に示す。
S−連続剛性方法(CSM)を介して決定された接触剛性であり、周期的強制関数
A−接触面積[m^2]、圧入が、圧入中の圧子の形状を複製すると想定して、圧子形状を解析幾何学によってモデル化し、それにより、射影面積A=h^2+高次項(式中、h−変位深さ)、高次項は、実験的に測定される。
F−複合材料弾性率[Gpa]
β=1.04、ベルコビッチ形状
1/F=(1−u^2)/K+(1−v^2)/E
式中、
u−ダイヤモンド圧子のポアソン比=0.07
K−ダイヤモンド圧子の弾性係数=1141Gpa
v−サンプルのポアソン比(ここで想定を行う必要がある−これらのサンプルの場合、〜0.35)
H=P/A
式中、
H−硬度[Gpa]
P−塑性流動に必要な荷重
A−塑性接触面積
Claims (21)
- 物品であって、
未硬化高分子誘電体組成物を有する電気物品を備え、前記高分子誘電体組成物が、約10〜約60重量%のエポキシ樹脂、約20〜約90重量%の誘電体フィラー、及び約0.1〜約10重量%のジアミノジフェニルスルホン硬化剤を含む、物品。 - 前記誘電体組成物が、少なくとも50の誘電率を有する誘電体粒子を更に含む、請求項1に記載の物品。
- 前記誘電体粒子が、チタン酸バリウム、チタン酸バリウムストロンチウム、酸化チタン、チタン酸鉛ジルコニウム、チタン酸カルシウム銅、チタン酸鉛マグネシウム、チタン酸ジルコン酸鉛ランタン、二酸化ケイ素及びそれらの混合物である、請求項2に記載の物品。
- 前記誘電体粒子が、10μm以下の平均粒径を有するチタン酸バリウムである、請求項3に記載の物品。
- 硬化後、1kHzで約10を超える誘電率と、少なくとも約0.0009の損失正接とを有する、請求項1に記載の物品。
- 硬化後、少なくとも120℃のガラス転移温度と、約325℃以上の分解温度とを有する、請求項1に記載の物品。
- 硬化後、約120〜160℃で指数関数的に増大する相対容量を有する、請求項1に記載の物品。
- 硬化後、約115〜145℃で指数関数的に増大する誘電正接を有する、請求項1に記載の物品。
- 前記エポキシ樹脂が、多価フェノール類のジグリシジルエーテル類、エポキシノボラック樹脂、及びそれらの組み合わせからなる群から選択される、請求項1に記載の物品。
- 物品であって、
誘電体層に隣接する導電性基材を有する電気物品を備え、前記誘電体層が硬化エポキシ樹脂組成物を含み、前記硬化組成物が、エポキシ樹脂とジアミノジフェニルスルホン硬化剤との反応生成物を含む、物品。 - 前記誘電体層が、誘電体粒子を更に含む、請求項10に記載の物品。
- 前記誘電体粒子が、10μm以下の平均粒径を有するチタン酸バリウムである、請求項11に記載の物品。
- 硬化後、1kHzで約10を超える誘電率と、少なくとも約0.0009の損失正接とを有する、請求項10に記載の物品。
- 硬化後、少なくとも100℃のガラス転移温度と、少なくとも約325℃の分解温度とを有する、請求項10に記載の物品。
- 約120〜160℃で指数関数的に増大する相対容量を有する、請求項10に記載の物品。
- 約115〜145℃で指数関数的に増大する誘電正接を有する、請求項10に記載の物品。
- 前記エポキシ樹脂が、多価フェノール類のジグリシジルエーテル類、エポキシノボラック樹脂、及びそれらの組み合わせからなる群から選択される、請求項10に記載の物品。
- 前記導電性基材が銅を含む、請求項10に記載の物品。
- 前記電気物品が、コンデンサ、抵抗、インダクタ、又はそれらの組み合わせからなる群から選択される、請求項10に記載の物品。
- 前記電気物品が、プリント回路基板及び集積回路パッケージ内で使用するのに好適な埋め込みコンデンサである、請求項10に記載の物品。
- 前記埋め込みコンデンサが、電源デカップリングコンデンサ、ローパスフィルタ、バンドパスフィルタ、及びバンドストップフィルタのうちの1つ以上として機能する、請求項20に記載の物品。
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WO2011056455A3 (en) | 2011-11-24 |
CN102598895B (zh) | 2016-06-08 |
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KR20120103608A (ko) | 2012-09-19 |
EP2497347A2 (en) | 2012-09-12 |
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US9247645B2 (en) | 2016-01-26 |
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