JP2013504671A5 - - Google Patents

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Publication number
JP2013504671A5
JP2013504671A5 JP2012529201A JP2012529201A JP2013504671A5 JP 2013504671 A5 JP2013504671 A5 JP 2013504671A5 JP 2012529201 A JP2012529201 A JP 2012529201A JP 2012529201 A JP2012529201 A JP 2012529201A JP 2013504671 A5 JP2013504671 A5 JP 2013504671A5
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JP
Japan
Prior art keywords
branched
alkyl
hydrogen
substituted
phenyl
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JP2012529201A
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English (en)
Japanese (ja)
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JP5894919B2 (ja
JP2013504671A (ja
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Priority claimed from PCT/EP2010/062779 external-priority patent/WO2011032837A1/en
Publication of JP2013504671A publication Critical patent/JP2013504671A/ja
Publication of JP2013504671A5 publication Critical patent/JP2013504671A5/ja
Application granted granted Critical
Publication of JP5894919B2 publication Critical patent/JP5894919B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2012529201A 2009-09-15 2010-09-01 光潜在性チタンキレート触媒 Expired - Fee Related JP5894919B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP09170294 2009-09-15
EP09170294.4 2009-09-15
PCT/EP2010/062779 WO2011032837A1 (en) 2009-09-15 2010-09-01 Photo-latent titanium-chelate catalysts

Publications (3)

Publication Number Publication Date
JP2013504671A JP2013504671A (ja) 2013-02-07
JP2013504671A5 true JP2013504671A5 (https=) 2013-10-17
JP5894919B2 JP5894919B2 (ja) 2016-03-30

Family

ID=41664722

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012529201A Expired - Fee Related JP5894919B2 (ja) 2009-09-15 2010-09-01 光潜在性チタンキレート触媒

Country Status (9)

Country Link
US (1) US8933138B2 (https=)
EP (1) EP2477738B1 (https=)
JP (1) JP5894919B2 (https=)
KR (1) KR101752517B1 (https=)
CN (1) CN102497930B (https=)
BR (1) BR112012005909A2 (https=)
ES (1) ES2720595T3 (https=)
RU (1) RU2548004C2 (https=)
WO (1) WO2011032837A1 (https=)

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US9822263B2 (en) * 2014-04-28 2017-11-21 Nitto Kasei Co., Ltd. Electrodeposition coating material composition and catalyst for electrodeposition coating material
US9499698B2 (en) 2015-02-11 2016-11-22 Az Electronic Materials (Luxembourg)S.A.R.L. Metal hardmask composition and processes for forming fine patterns on semiconductor substrates
US10053596B2 (en) * 2016-08-30 2018-08-21 Prc-Desoto International, Inc. Curable film-forming compositions demonstrating increased wet-edge time
CN111051570B (zh) 2017-09-06 2022-05-10 默克专利股份有限公司 具有改善的热稳定性可用作硬掩膜的含旋涂式无机氧化物的组合物和填充材料
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