JP2013254723A5 - - Google Patents

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Publication number
JP2013254723A5
JP2013254723A5 JP2012209582A JP2012209582A JP2013254723A5 JP 2013254723 A5 JP2013254723 A5 JP 2013254723A5 JP 2012209582 A JP2012209582 A JP 2012209582A JP 2012209582 A JP2012209582 A JP 2012209582A JP 2013254723 A5 JP2013254723 A5 JP 2013254723A5
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JP
Japan
Prior art keywords
processing apparatus
plasma processing
gas supply
recess
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2012209582A
Other languages
English (en)
Japanese (ja)
Other versions
JP2013254723A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2012209582A priority Critical patent/JP2013254723A/ja
Priority claimed from JP2012209582A external-priority patent/JP2013254723A/ja
Priority to US13/743,748 priority patent/US20130299091A1/en
Priority to KR1020130005786A priority patent/KR20130126458A/ko
Publication of JP2013254723A publication Critical patent/JP2013254723A/ja
Publication of JP2013254723A5 publication Critical patent/JP2013254723A5/ja
Withdrawn legal-status Critical Current

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JP2012209582A 2012-05-11 2012-09-24 プラズマ処理装置 Withdrawn JP2013254723A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2012209582A JP2013254723A (ja) 2012-05-11 2012-09-24 プラズマ処理装置
US13/743,748 US20130299091A1 (en) 2012-05-11 2013-01-17 Plasma processing apparatus
KR1020130005786A KR20130126458A (ko) 2012-05-11 2013-01-18 플라즈마 처리 장치

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2012109063 2012-05-11
JP2012109063 2012-05-11
JP2012209582A JP2013254723A (ja) 2012-05-11 2012-09-24 プラズマ処理装置

Publications (2)

Publication Number Publication Date
JP2013254723A JP2013254723A (ja) 2013-12-19
JP2013254723A5 true JP2013254723A5 (enExample) 2015-03-12

Family

ID=49547716

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012209582A Withdrawn JP2013254723A (ja) 2012-05-11 2012-09-24 プラズマ処理装置

Country Status (3)

Country Link
US (1) US20130299091A1 (enExample)
JP (1) JP2013254723A (enExample)
KR (1) KR20130126458A (enExample)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5617817B2 (ja) * 2011-10-27 2014-11-05 パナソニック株式会社 誘導結合型プラズマ処理装置及び誘導結合型プラズマ処理方法
JP2015138602A (ja) * 2014-01-21 2015-07-30 株式会社アルバック プラズマ処理用整合器、プラズマ処理装置、および、プラズマ処理用整合器の駆動方法
US20160118284A1 (en) * 2014-10-22 2016-04-28 Panasonic Intellectual Property Management Co., Ltd. Plasma processing apparatus
JP2017045916A (ja) * 2015-08-28 2017-03-02 パナソニックＩｐマネジメント株式会社 プラズマ処理装置およびプラズマ処理方法
GB201603581D0 (en) * 2016-03-01 2016-04-13 Spts Technologies Ltd Plasma processing apparatus
CN105931940B (zh) * 2016-06-01 2018-09-21 京东方科技集团股份有限公司 一种电感耦合等离子体装置
TWI733021B (zh) 2017-05-15 2021-07-11 美商應用材料股份有限公司 電漿源組件、處理腔室與處理基板的方法
JP7069319B2 (ja) * 2017-12-15 2022-05-17 アプライド マテリアルズ インコーポレイテッド 垂直プラズマ源からの改良されたプラズマ暴露のために成形された電極
CN108121004B (zh) * 2018-01-05 2019-05-24 北京航空航天大学 法拉第探针
CN110660635B (zh) * 2018-06-29 2022-08-16 北京北方华创微电子装备有限公司 工艺腔室和半导体处理设备
CN110416053B (zh) * 2019-07-30 2021-03-16 江苏鲁汶仪器有限公司 一种电感耦合等离子体处理系统
US12519108B2 (en) * 2021-06-17 2026-01-06 Resonac Corporation Negative electrode material for lithium ion secondary battery, negative electrode for lithium ion secondary battery, and lithium ion secondary battery
JP7760389B2 (ja) 2022-01-24 2025-10-27 東京エレクトロン株式会社 プラズマ処理装置

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