JP2013206962A - 保守システム及び基板処理装置 - Google Patents

保守システム及び基板処理装置 Download PDF

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Publication number
JP2013206962A
JP2013206962A JP2012071743A JP2012071743A JP2013206962A JP 2013206962 A JP2013206962 A JP 2013206962A JP 2012071743 A JP2012071743 A JP 2012071743A JP 2012071743 A JP2012071743 A JP 2012071743A JP 2013206962 A JP2013206962 A JP 2013206962A
Authority
JP
Japan
Prior art keywords
substrate processing
processing apparatus
living body
monitoring target
target device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2012071743A
Other languages
English (en)
Japanese (ja)
Other versions
JP2013206962A5 (https=
Inventor
Tsutomu Hiroki
勤 廣木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Priority to JP2012071743A priority Critical patent/JP2013206962A/ja
Priority to KR20147026644A priority patent/KR20140138768A/ko
Priority to PCT/JP2013/058375 priority patent/WO2013146611A1/ja
Priority to TW102110589A priority patent/TW201401334A/zh
Publication of JP2013206962A publication Critical patent/JP2013206962A/ja
Priority to US14/495,353 priority patent/US20150012124A1/en
Publication of JP2013206962A5 publication Critical patent/JP2013206962A5/ja
Withdrawn legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B9/00—Safety arrangements
    • G05B9/02—Safety arrangements electric
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
    • B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
    • B25J19/00—Accessories fitted to manipulators, e.g. for monitoring, for viewing; Safety devices combined with or specially adapted for use in connection with manipulators
    • B25J19/0066—Means or methods for maintaining or repairing manipulators
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B19/00—Program-control systems
    • G05B19/02—Program-control systems electric
    • G05B19/418—Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS] or computer integrated manufacturing [CIM]
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0451—Apparatus for manufacturing or treating in a plurality of work-stations
    • H10P72/0464—Apparatus for manufacturing or treating in a plurality of work-stations characterised by the construction of the transfer chamber
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/06—Apparatus for monitoring, sorting, marking, testing or measuring
    • H10P72/0606—Position monitoring, e.g. misposition detection or presence detection
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2219/00—Program-control systems
    • G05B2219/10—Plc systems
    • G05B2219/14—Plc safety
    • G05B2219/14007—Plc as standalone for safety control of machine

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  • Engineering & Computer Science (AREA)
  • Automation & Control Theory (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Robotics (AREA)
  • Quality & Reliability (AREA)
  • Manufacturing & Machinery (AREA)
  • General Engineering & Computer Science (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Testing And Monitoring For Control Systems (AREA)
  • Safety Devices In Control Systems (AREA)
  • Emergency Alarm Devices (AREA)
JP2012071743A 2012-03-27 2012-03-27 保守システム及び基板処理装置 Withdrawn JP2013206962A (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2012071743A JP2013206962A (ja) 2012-03-27 2012-03-27 保守システム及び基板処理装置
KR20147026644A KR20140138768A (ko) 2012-03-27 2013-03-22 보수 시스템 및 기판 처리 장치
PCT/JP2013/058375 WO2013146611A1 (ja) 2012-03-27 2013-03-22 保守システム及び基板処理装置
TW102110589A TW201401334A (zh) 2012-03-27 2013-03-26 維修系統與基板處理裝置
US14/495,353 US20150012124A1 (en) 2012-03-27 2014-09-24 Maintenance System, and Substrate Processing Device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012071743A JP2013206962A (ja) 2012-03-27 2012-03-27 保守システム及び基板処理装置

Publications (2)

Publication Number Publication Date
JP2013206962A true JP2013206962A (ja) 2013-10-07
JP2013206962A5 JP2013206962A5 (https=) 2015-04-30

Family

ID=49259864

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012071743A Withdrawn JP2013206962A (ja) 2012-03-27 2012-03-27 保守システム及び基板処理装置

Country Status (5)

Country Link
US (1) US20150012124A1 (https=)
JP (1) JP2013206962A (https=)
KR (1) KR20140138768A (https=)
TW (1) TW201401334A (https=)
WO (1) WO2013146611A1 (https=)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20150013722A1 (en) * 2013-07-09 2015-01-15 Tokyo Electron Limited Substrate processing system, method for controlling substrate processing system, and storage medium
JP2018160584A (ja) * 2017-03-23 2018-10-11 東京エレクトロン株式会社 基板処理装置及び基板処理方法
JP2021089970A (ja) * 2019-12-04 2021-06-10 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9918180B2 (en) * 2014-04-28 2018-03-13 Johnson Controls Technology Company Systems and methods for detecting and using occupant location in a building management system
JP6625597B2 (ja) * 2017-11-13 2019-12-25 平田機工株式会社 搬送チャンバ
CN111372735A (zh) * 2017-11-17 2020-07-03 三菱电机株式会社 3维空间监视装置、3维空间监视方法及3维空间监视程序
KR102045826B1 (ko) * 2018-04-27 2019-11-18 주식회사 선익시스템 진공챔버용 비상 스위치 장치와 이를 포함하는 증착장치
KR102150450B1 (ko) * 2018-05-11 2020-09-01 주식회사 선익시스템 비상 탈출이 가능한 진공챔버 및 이를 포함하는 증착장치
KR102259282B1 (ko) * 2019-07-18 2021-06-01 세메스 주식회사 물류 저장 시스템 및 그 제어 방법
CN114162450B (zh) 2020-09-11 2023-05-23 长鑫存储技术有限公司 曝光机台的门板密闭监测系统、方法、装置、介质和设备
KR102378366B1 (ko) * 2020-10-13 2022-03-25 주식회사 새한산업 안전펜스설비
CN118241174B (zh) * 2024-05-27 2024-08-06 上海米蜂激光科技有限公司 一种真空镀膜机安全控制方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4101166B2 (ja) * 2003-12-11 2008-06-18 大日本スクリーン製造株式会社 基板処理装置
JP5415832B2 (ja) * 2009-05-29 2014-02-12 株式会社竹中工務店 入退管理システム
JP5531003B2 (ja) * 2009-10-05 2014-06-25 株式会社日立国際電気 基板処理装置、基板処理装置のメンテナンス方法および半導体装置の製造方法

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20150013722A1 (en) * 2013-07-09 2015-01-15 Tokyo Electron Limited Substrate processing system, method for controlling substrate processing system, and storage medium
US9782807B2 (en) * 2013-07-09 2017-10-10 Tokyo Electron Limited Substrate processing system, method for controlling substrate processing system, and storage medium
JP2018160584A (ja) * 2017-03-23 2018-10-11 東京エレクトロン株式会社 基板処理装置及び基板処理方法
JP2021089970A (ja) * 2019-12-04 2021-06-10 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置
JP7388896B2 (ja) 2019-12-04 2023-11-29 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置

Also Published As

Publication number Publication date
US20150012124A1 (en) 2015-01-08
KR20140138768A (ko) 2014-12-04
WO2013146611A1 (ja) 2013-10-03
TW201401334A (zh) 2014-01-01

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