JP2013179284A5 - - Google Patents

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Publication number
JP2013179284A5
JP2013179284A5 JP2013016496A JP2013016496A JP2013179284A5 JP 2013179284 A5 JP2013179284 A5 JP 2013179284A5 JP 2013016496 A JP2013016496 A JP 2013016496A JP 2013016496 A JP2013016496 A JP 2013016496A JP 2013179284 A5 JP2013179284 A5 JP 2013179284A5
Authority
JP
Japan
Prior art keywords
region
oxide semiconductor
semiconductor film
film
oxide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2013016496A
Other languages
English (en)
Japanese (ja)
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JP6148024B2 (ja
JP2013179284A (ja
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Publication date
Application filed filed Critical
Priority to JP2013016496A priority Critical patent/JP6148024B2/ja
Priority claimed from JP2013016496A external-priority patent/JP6148024B2/ja
Publication of JP2013179284A publication Critical patent/JP2013179284A/ja
Publication of JP2013179284A5 publication Critical patent/JP2013179284A5/ja
Application granted granted Critical
Publication of JP6148024B2 publication Critical patent/JP6148024B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2013016496A 2012-02-09 2013-01-31 半導体装置 Expired - Fee Related JP6148024B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2013016496A JP6148024B2 (ja) 2012-02-09 2013-01-31 半導体装置

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2012026733 2012-02-09
JP2012026733 2012-02-09
JP2013016496A JP6148024B2 (ja) 2012-02-09 2013-01-31 半導体装置

Publications (3)

Publication Number Publication Date
JP2013179284A JP2013179284A (ja) 2013-09-09
JP2013179284A5 true JP2013179284A5 (enExample) 2016-03-17
JP6148024B2 JP6148024B2 (ja) 2017-06-14

Family

ID=49270624

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013016496A Expired - Fee Related JP6148024B2 (ja) 2012-02-09 2013-01-31 半導体装置

Country Status (1)

Country Link
JP (1) JP6148024B2 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6506545B2 (ja) 2013-12-27 2019-04-24 株式会社半導体エネルギー研究所 半導体装置
JP2015188062A (ja) * 2014-02-07 2015-10-29 株式会社半導体エネルギー研究所 半導体装置
WO2017081579A1 (en) 2015-11-13 2017-05-18 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and method for manufacturing the same
US10714633B2 (en) * 2015-12-15 2020-07-14 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and display device

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5128733A (en) * 1991-05-17 1992-07-07 United Technologies Corporation Silicon mesa transistor structure
JP5111867B2 (ja) * 2007-01-16 2013-01-09 株式会社ジャパンディスプレイイースト 表示装置
WO2011132591A1 (en) * 2010-04-23 2011-10-27 Semiconductor Energy Laboratory Co., Ltd. Method for manufacturing semiconductor device
DE112011101395B4 (de) * 2010-04-23 2014-10-16 Semiconductor Energy Laboratory Co., Ltd. Verfahren zum Herstellen einer Halbleitervorrichtung
DE112011101969B4 (de) * 2010-06-11 2018-05-09 Semiconductor Energy Laboratory Co., Ltd. Halbleitervorrichtung und Verfahren zum Herstellen derselben

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