JP2013147743A - 成膜装置および成膜方法 - Google Patents

成膜装置および成膜方法 Download PDF

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Publication number
JP2013147743A
JP2013147743A JP2012278030A JP2012278030A JP2013147743A JP 2013147743 A JP2013147743 A JP 2013147743A JP 2012278030 A JP2012278030 A JP 2012278030A JP 2012278030 A JP2012278030 A JP 2012278030A JP 2013147743 A JP2013147743 A JP 2013147743A
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deposition
vapor deposition
source
layer
target
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Japanese (ja)
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JP2013147743A5 (enExample
Inventor
Shunpei Yamazaki
舜平 山崎
Shingo Eguchi
晋吾 江口
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Semiconductor Energy Laboratory Co Ltd
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Semiconductor Energy Laboratory Co Ltd
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    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00Electroluminescent light sources
    • H05B33/10Apparatus or processes specially adapted to the manufacture of electroluminescent light sources

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Electroluminescent Light Sources (AREA)
  • Physical Vapour Deposition (AREA)
JP2012278030A 2011-12-22 2012-12-20 成膜装置および成膜方法 Withdrawn JP2013147743A (ja)

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JP2012278030A JP2013147743A (ja) 2011-12-22 2012-12-20 成膜装置および成膜方法

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JP2011280793 2011-12-22
JP2011280793 2011-12-22
JP2012278030A JP2013147743A (ja) 2011-12-22 2012-12-20 成膜装置および成膜方法

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JP2017011107A Division JP6339250B2 (ja) 2011-12-22 2017-01-25 成膜方法

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JP2013147743A5 JP2013147743A5 (enExample) 2015-11-12

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2018204106A (ja) * 2017-06-02 2018-12-27 キヤノントッキ株式会社 真空蒸着装置及びそれを用いたデバイス製造方法
JP2021022423A (ja) * 2019-07-24 2021-02-18 スタンレー電気株式会社 発光装置の製造方法、及び、発光装置
WO2022097286A1 (ja) * 2020-11-06 2022-05-12 貴嗣 飯塚 成膜装置、成膜ユニット及び成膜方法
JP2023102548A (ja) * 2022-01-12 2023-07-25 株式会社ジャパンディスプレイ 蒸着装置及び蒸着方法

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102013109140B4 (de) * 2013-08-23 2017-04-27 Osram Oled Gmbh Verfahren zum Herstellen von organischen Leuchtdioden und organische Leuchtdiode
DE102013111591A1 (de) * 2013-10-21 2015-04-23 Osram Oled Gmbh Verfahren und Vorrichtung zum Ausbilden einer organischen funktionellen Schichtenstruktur und optoelektronisches Bauelement
KR102315659B1 (ko) 2013-11-27 2021-10-20 가부시키가이샤 한도오따이 에네루기 켄큐쇼 표시 장치
CN103938161A (zh) * 2014-04-29 2014-07-23 京东方科技集团股份有限公司 基板蒸镀装置和蒸镀方法
KR20210149266A (ko) * 2020-06-01 2021-12-09 삼성디스플레이 주식회사 기판 고정 장치, 이를 포함하는 성막 처리 설비 및 이를 이용한 성막 처리 방법

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0253581A (ja) * 1988-08-11 1990-02-22 Fanuc Ltd 水平腕を備えた産業用ロボット
JPH11335847A (ja) * 1998-05-27 1999-12-07 Nippon Steel Corp 光起電力装置の製造方法及び製造装置、並びに光起電力装置を有する移動体
JP2004035964A (ja) * 2002-07-04 2004-02-05 Tokki Corp 蒸着装置
JP2007044838A (ja) * 2005-08-11 2007-02-22 Toshiba Mach Co Ltd 産業用ロボット
JP2007088110A (ja) * 2005-09-21 2007-04-05 Daihen Corp 基板搬送ロボットの基準位置教示方法

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05339712A (ja) * 1992-06-09 1993-12-21 Mitsubishi Electric Corp 成膜装置
TW490714B (en) 1999-12-27 2002-06-11 Semiconductor Energy Lab Film formation apparatus and method for forming a film
US6739931B2 (en) 2000-09-18 2004-05-25 Semiconductor Energy Laboratory Co., Ltd. Display device and method of fabricating the display device
SG113448A1 (en) 2002-02-25 2005-08-29 Semiconductor Energy Lab Fabrication system and a fabrication method of a light emitting device
US7309269B2 (en) 2002-04-15 2007-12-18 Semiconductor Energy Laboratory Co., Ltd. Method of fabricating light-emitting device and apparatus for manufacturing light-emitting device
TWI336905B (en) 2002-05-17 2011-02-01 Semiconductor Energy Lab Evaporation method, evaporation device and method of fabricating light emitting device
JP4634698B2 (ja) 2002-05-17 2011-02-16 株式会社半導体エネルギー研究所 蒸着装置
US20030221620A1 (en) 2002-06-03 2003-12-04 Semiconductor Energy Laboratory Co., Ltd. Vapor deposition device
US6692094B1 (en) * 2002-07-23 2004-02-17 Eastman Kodak Company Apparatus and method of material deposition using compressed fluids
WO2004028214A1 (en) 2002-09-20 2004-04-01 Semiconductor Energy Laboratory Co., Ltd. Fabrication system and manufacturing method of light emitting device
US20040135160A1 (en) * 2003-01-10 2004-07-15 Eastman Kodak Company OLED device
US7211461B2 (en) 2003-02-14 2007-05-01 Semiconductor Energy Laboratory Co., Ltd. Manufacturing apparatus
JP4493926B2 (ja) 2003-04-25 2010-06-30 株式会社半導体エネルギー研究所 製造装置
US7948171B2 (en) 2005-02-18 2011-05-24 Semiconductor Energy Laboratory Co., Ltd. Light emitting device
US7368307B2 (en) 2005-06-07 2008-05-06 Eastman Kodak Company Method of manufacturing an OLED device with a curved light emitting surface
JP2008031501A (ja) * 2006-07-26 2008-02-14 Canon Inc 成膜装置および蒸着薄膜の製造方法
JP2008108611A (ja) * 2006-10-26 2008-05-08 Fuji Electric Holdings Co Ltd 蒸着層の製造方法および製造装置

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0253581A (ja) * 1988-08-11 1990-02-22 Fanuc Ltd 水平腕を備えた産業用ロボット
JPH11335847A (ja) * 1998-05-27 1999-12-07 Nippon Steel Corp 光起電力装置の製造方法及び製造装置、並びに光起電力装置を有する移動体
JP2004035964A (ja) * 2002-07-04 2004-02-05 Tokki Corp 蒸着装置
JP2007044838A (ja) * 2005-08-11 2007-02-22 Toshiba Mach Co Ltd 産業用ロボット
JP2007088110A (ja) * 2005-09-21 2007-04-05 Daihen Corp 基板搬送ロボットの基準位置教示方法

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2018204106A (ja) * 2017-06-02 2018-12-27 キヤノントッキ株式会社 真空蒸着装置及びそれを用いたデバイス製造方法
JP2021022423A (ja) * 2019-07-24 2021-02-18 スタンレー電気株式会社 発光装置の製造方法、及び、発光装置
JP7323251B2 (ja) 2019-07-24 2023-08-08 スタンレー電気株式会社 発光装置の製造方法、及び、発光装置
WO2022097286A1 (ja) * 2020-11-06 2022-05-12 貴嗣 飯塚 成膜装置、成膜ユニット及び成膜方法
JPWO2022097286A1 (enExample) * 2020-11-06 2022-05-12
JP7239724B2 (ja) 2020-11-06 2023-03-14 貴嗣 飯塚 成膜装置、成膜ユニット及び成膜方法
CN116438326A (zh) * 2020-11-06 2023-07-14 饭塚贵嗣 成膜装置、成膜单元和成膜方法
CN116438326B (zh) * 2020-11-06 2024-04-12 饭塚贵嗣 成膜装置、成膜单元和成膜方法
US12270099B2 (en) 2020-11-06 2025-04-08 Takashi Iizuka Film-forming device, film-forming unit, and film-forming method
JP2023102548A (ja) * 2022-01-12 2023-07-25 株式会社ジャパンディスプレイ 蒸着装置及び蒸着方法

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US20130164437A1 (en) 2013-06-27
US9055654B2 (en) 2015-06-09
JP2017082341A (ja) 2017-05-18
JP6339250B2 (ja) 2018-06-06

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