JP2013139637A - Continuous thin film vapor deposition apparatus - Google Patents

Continuous thin film vapor deposition apparatus Download PDF

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JP2013139637A
JP2013139637A JP2012286188A JP2012286188A JP2013139637A JP 2013139637 A JP2013139637 A JP 2013139637A JP 2012286188 A JP2012286188 A JP 2012286188A JP 2012286188 A JP2012286188 A JP 2012286188A JP 2013139637 A JP2013139637 A JP 2013139637A
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crucible
unit
organic material
thin film
preheating
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JP5569756B2 (en
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Hyoung Bae Lee
リ,ヒョンベ
Ki Taek Jung
ジュン,キテク
Whang Sin Cho
チョ,ワンシン
Sung Hoon Yoon
ユン,スンフン
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SNU Precision Co Ltd
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12Organic material
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/243Crucibles for source material
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10Deposition of organic active material
    • H10K71/16Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Physical Vapour Deposition (AREA)
  • Electroluminescent Light Sources (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a continuous thin film vapor deposition apparatus capable of vapor deposition in a thin-film form on a substrate by evaporating an organic material for a long time.SOLUTION: The continuous thin film vapor deposition apparatus includes a material storage part, a material preheat part, a material transport part, a material evaporation part, and a crucible transport part. In the material storage part, an organic material is stored. In the material preheat part, a crucible, in which the organic material is contained, is preheated to a temperature less than the vaporization point of the organic material. In the material transport part, a fixed quantity of the organic material is delivered from the material storage part, and the organic material is conveyed to the crucible arranged in the material preheat part. In the material evaporation part, the organic material contained in the crucible is evaporated by supplying the transported crucible with heat. In the crucible transport part, the crucible preheated in the material preheat part is carried in the material evaporation part or the crucible whose organic material is consumed is carried out of the material evaporation part.

Description

本発明は、連続薄膜蒸着装置に関し、より詳しくは、長時間有機材料を蒸発させて基板上に薄膜形態で蒸着させることができる連続薄膜蒸着装置に関する。   The present invention relates to a continuous thin film deposition apparatus, and more particularly to a continuous thin film deposition apparatus that can evaporate an organic material for a long time and deposit it in a thin film form on a substrate.

有機発光表示素子は、代表的な平板ディスプレイ素子であって、基板に形成される透明陽電極層と金属陰電極層との間に有機発光層を含む有機薄膜が介される構造からなる。したがって、このような有機発光表示素子を有する基板の製造において、有機発光層を含む有機薄膜を形成するために有機物蒸着工程が行われる。   The organic light emitting display element is a typical flat display element, and has a structure in which an organic thin film including an organic light emitting layer is interposed between a transparent positive electrode layer and a metal negative electrode layer formed on a substrate. Accordingly, in the manufacture of a substrate having such an organic light emitting display element, an organic material vapor deposition process is performed to form an organic thin film including an organic light emitting layer.

このような有機薄膜を基板に蒸着させるためには、一般的に真空熱蒸着法が用いられている。真空熱蒸着法は、薄膜蒸着装置の真空チャンバ内に備えられた有機材料にヒータなどを利用して熱を加え、内部に収容された有機材料を基板に向かって蒸発させることにより、基板に一定の厚さの有機薄膜を形成させる方法である。   In order to deposit such an organic thin film on a substrate, a vacuum thermal evaporation method is generally used. In the vacuum thermal evaporation method, heat is applied to the organic material provided in the vacuum chamber of the thin film deposition apparatus using a heater and the like, and the organic material contained therein is evaporated toward the substrate. It is the method of forming the organic thin film of thickness.

図1は、従来の薄膜蒸着装置の一例を示す図である。   FIG. 1 is a diagram showing an example of a conventional thin film deposition apparatus.

図1を参照すると、従来の薄膜蒸着装置は、基板に蒸着される有機材料を収容しているるつぼ10と、るつぼ10の原料物質を加熱するためのヒータ20と、ヒータ20の内側でるつぼ10を昇降させる移送ユニット30と、気化した有機材料を噴射するノズル40とを含む。   Referring to FIG. 1, a conventional thin film deposition apparatus includes a crucible 10 containing an organic material to be deposited on a substrate, a heater 20 for heating a raw material of the crucible 10, and a crucible 10 inside the heater 20. The transfer unit 30 which raises / lowers and the nozzle 40 which injects the vaporized organic material are included.

しかしながら、従来の薄膜蒸着装置は、るつぼ10内に収容可能な有機材料の量が限定されるため、有機材料を頻繁に再充填しなければならなく、そのために充填過程では毎回薄膜蒸着装置の稼動を停止しなければならないという問題がある。なお、るつぼ10の容量を増大させる方案もあるが、るつぼ10の容量を無制限に増大させることもできず、るつぼ10の容量を増大させると、それに対応して装置に関連した構成品も全体的に向上した性能を発揮できるものを採用する必要がある。これにより、装置の全体サイズが増加し、製造コストが上昇するという問題がある。   However, since the amount of organic material that can be accommodated in the crucible 10 is limited in the conventional thin film deposition apparatus, the organic material has to be refilled frequently. For this reason, the thin film deposition apparatus is operated every time during the filling process. There is a problem that you have to stop. Although there is a method of increasing the capacity of the crucible 10, the capacity of the crucible 10 cannot be increased without limit. When the capacity of the crucible 10 is increased, the components related to the apparatus are correspondingly increased. It is necessary to adopt one that can exhibit improved performance. This increases the overall size of the apparatus and raises the manufacturing cost.

一方、るつぼ10の容量を増大させると、るつぼ10内に大量の有機材料を収容することが可能である。しかし、この時、るつぼ10内の有機材料が長時間ヒータ20によって加熱されるため、有機材料自体の変性危険性がかなり大きいという問題がある。   On the other hand, when the capacity of the crucible 10 is increased, a large amount of organic material can be accommodated in the crucible 10. However, at this time, since the organic material in the crucible 10 is heated by the heater 20 for a long time, there is a problem that there is a considerable risk of denaturation of the organic material itself.

これにより、本発明の目的は、このような従来の問題点を解決するためのものであって、有機材料を収容するるつぼを大容量に製作せず、一定の容量のるつぼ自体を入れ替えて有機材料を連続的に供給するように構成することにより、蒸着装置の稼働時間を延長させることができ、るつぼの容量を適宜維持及び供給してるつぼ内の有機材料が熱によって変性されることを防止できる連続薄膜蒸着装置を提供することにある。   Accordingly, an object of the present invention is to solve such a conventional problem, and does not produce a crucible containing an organic material in a large capacity, but replaces the crucible having a certain capacity with an organic material. By configuring the material to be continuously supplied, the operation time of the vapor deposition apparatus can be extended, and the capacity of the crucible is appropriately maintained and supplied to prevent the organic material in the crucible from being modified by heat. An object of the present invention is to provide a continuous thin film deposition apparatus that can be used.

前記のような目的を達成するために、本発明の連続薄膜蒸着装置は、有機材料が保存された材料保存部と、有機材料が収容されたるつぼを有機材料の気化点未満の温度に予熱する材料予熱部と、前記材料保存部から一定量の有機材料が供給され、前記材料予熱部に配置されたるつぼに有機材料を移送する材料移送部と、搬入されたるつぼに熱を供給して前記るつぼに収容された有機材料を蒸発させる材料蒸発部と、前記材料予熱部で予熱されたるつぼを前記材料蒸発部に搬入したり、又は前記材料蒸発部から有機材料が消耗したるつぼを搬出するるつぼ移送部と、を含むことを特徴とする。   In order to achieve the above-described object, the continuous thin film deposition apparatus of the present invention preheats the material storage unit storing the organic material and the crucible containing the organic material to a temperature below the vaporization point of the organic material. A certain amount of organic material is supplied from the material preheating unit, the material storage unit, a material transfer unit that transfers the organic material to the crucible disposed in the material preheating unit, and heat is supplied to the crucible carried in A material evaporation unit that evaporates the organic material contained in the crucible, and a crucible that carries the crucible preheated by the material preheating unit into the material evaporation unit or carries out the crucible depleted of the organic material from the material evaporation unit And a transfer unit.

本発明に係る連続薄膜蒸着装置において、望ましくは、前記材料保存部は、有機材料が保存されたホッパーと、前記ホッパーに一定振幅の振動を供給するホッパー振動部を含む。   In the continuous thin film deposition apparatus according to the present invention, preferably, the material storage unit includes a hopper in which an organic material is stored, and a hopper vibration unit that supplies vibration with a constant amplitude to the hopper.

本発明に係る連続薄膜蒸着装置において、望ましくは、前記材料予熱部は、ヒータが装着され前記るつぼをそれぞれ収容する第1収容部及び第2収容部と、前記第1収容部又は前記第2収容部を前記材料移送部と前記材料蒸発部との間の任意の位置に選択的に位置させる位置設定ユニットと、を含む。   In the continuous thin film deposition apparatus according to the present invention, preferably, the material preheating unit includes a first storage unit and a second storage unit that are each equipped with a heater and store the crucible, and the first storage unit or the second storage unit. A position setting unit that selectively positions the unit at an arbitrary position between the material transfer unit and the material evaporation unit.

本発明に係る連続薄膜蒸着装置において、望ましくは、前記位置設定ユニットは、前記第1収容部又は前記第2収容部を、前記材料移送部から有機材料が伝達される伝達位置、前記材料蒸発部の下側で前記材料蒸発部への搬入又は搬出を待機する待機位置、前記伝達位置と前記待機位置との間に備えられ、前記るつぼを予熱する予熱位置の間で回転させる。   In the continuous thin film deposition apparatus according to the present invention, preferably, the position setting unit is configured to transmit the organic material from the material transfer unit to the first storage unit or the second storage unit, the material evaporation unit. A standby position for waiting for loading or unloading to the material evaporation section on the lower side, a position between the transmission position and the standby position, and rotating between the preheating positions for preheating the crucible.

本発明に係る連続薄膜蒸着装置において、望ましくは、前記材料予熱部は、前記第1収容部又は前記第2収容部で予熱されるるつぼ内の有機材料の温度を感知する予熱用センサをさらに含む。   In the continuous thin film deposition apparatus according to the present invention, preferably, the material preheating unit further includes a preheating sensor that senses the temperature of the organic material in the crucible preheated by the first storage unit or the second storage unit. .

本発明に係る連続薄膜蒸着装置において、望ましくは、前記材料移送部は、前記材料保存部から供給される有機材料を一時的に収容するバケットと、前記材料保存部の下側における前記材料保存部から有機材料が供給される充填位置と前記材料予熱部の上側における前記材料予熱部に有機材料を伝達する伝達位置との間で、前記バケットを往復移送させる移送ユニットと、を含む。   In the continuous thin film deposition apparatus according to the present invention, preferably, the material transfer unit includes a bucket that temporarily stores an organic material supplied from the material storage unit, and the material storage unit below the material storage unit. And a transfer unit for reciprocating the bucket between a filling position where the organic material is supplied from and a transmission position where the organic material is transmitted to the material preheating part above the material preheating part.

本発明に係る連続薄膜蒸着装置において、望ましくは、前記バケットは、前記バケットの下部に設けられ、前記充填位置では閉鎖されて有機材料を収容し、前記伝達位置では開放されて有機材料を放出するドア部を備える。   In the continuous thin film deposition apparatus according to the present invention, preferably, the bucket is provided at a lower portion of the bucket, is closed at the filling position to receive the organic material, and is opened at the transmission position to release the organic material. A door part is provided.

本発明に係る連続薄膜蒸着装置において、望ましくは、前記材料蒸発部は、前記るつぼを収容する胴体部と、前記胴体部の側部を囲んで備えられるヒータと、前記胴体部の上部に形成され、前記ヒータから熱が供給される間、蒸発した有機材料が噴射されるノズルと、を含む。   In the continuous thin film deposition apparatus according to the present invention, preferably, the material evaporation part is formed on a body part that accommodates the crucible, a heater that surrounds a side part of the body part, and an upper part of the body part. A nozzle through which the evaporated organic material is jetted while heat is supplied from the heater.

本発明に係る連続薄膜蒸着装置において、望ましくは、前記材料蒸発部は、前記るつぼから蒸発される有機材料の蒸発速度を測定するセンサをさらに含む。   In the continuous thin film deposition apparatus according to the present invention, preferably, the material evaporation unit further includes a sensor for measuring an evaporation rate of the organic material evaporated from the crucible.

本発明に係る連続薄膜蒸着装置において、望ましくは、前記材料蒸発部の上側に設けられ、蒸発される有機材料により前記材料保存部と、前記材料移送部と、前記材料予熱部と、前記材料蒸発部の汚染を防止するための汚染防止部と、をさらに含む。   In the continuous thin film deposition apparatus according to the present invention, preferably, the material storage unit, the material transfer unit, the material preheating unit, and the material evaporation are provided by an organic material provided above the material evaporation unit. And a contamination prevention unit for preventing contamination of the unit.

本発明の連続薄膜蒸着装置によると、装置の稼働時間を長時間延長させることができる。   According to the continuous thin film deposition apparatus of the present invention, the operation time of the apparatus can be extended for a long time.

なお、本発明の連続薄膜蒸着装置によると、るつぼ内の有機材料が長時間熱に露出されることを回避して熱により変性されることを防止することができる。   According to the continuous thin film deposition apparatus of the present invention, it is possible to prevent the organic material in the crucible from being exposed to heat for a long time and to be prevented from being modified by heat.

なお、本発明の連続薄膜蒸着装置によると、全体的に蒸着工程にかかる時間を減らすことができる。   In addition, according to the continuous thin film vapor deposition apparatus of this invention, the time concerning a vapor deposition process can be reduced entirely.

なお、本発明の連続薄膜蒸着装置によると、有機材料の蒸発量を正確に制御することができる。   In addition, according to the continuous thin film vapor deposition apparatus of the present invention, the evaporation amount of the organic material can be accurately controlled.

従来の薄膜蒸着装置の一例を示す図である。It is a figure which shows an example of the conventional thin film vapor deposition apparatus. 本発明の一実施例による連続薄膜蒸着装置を示す図である。It is a figure which shows the continuous thin film vapor deposition apparatus by one Example of this invention. 図2における連続薄膜蒸着装置の材料予熱部を示す図である。It is a figure which shows the material preheating part of the continuous thin film vapor deposition apparatus in FIG. 図2における連続薄膜蒸着装置の材料予熱部の動作原理を説明する図である。It is a figure explaining the principle of operation of the material preheating part of the continuous thin film vapor deposition apparatus in FIG. 図2における連続薄膜蒸着装置の材料移送部の動作原理を説明する図である。It is a figure explaining the operation | movement principle of the material transfer part of the continuous thin film vapor deposition apparatus in FIG. 図2における連続薄膜蒸着装置の材料蒸発部を示す図である。It is a figure which shows the material evaporation part of the continuous thin film vapor deposition apparatus in FIG.

以下、本発明に係る連続薄膜蒸着装置の実施例を添付の図面を参照して詳しく説明する。ただし、本発明はこれらの実施例により限定されるものではない。   Hereinafter, embodiments of a continuous thin film deposition apparatus according to the present invention will be described in detail with reference to the accompanying drawings. However, the present invention is not limited to these examples.

図2は、本発明の一実施例による連続薄膜蒸着装置を示す図であり、図3は、図2における連続薄膜蒸着装置の材料予熱部を示す図であり、図4は、図2における連続薄膜蒸着装置の材料予熱部の動作原理を説明する図であり、図5は、図2における連続薄膜蒸着装置の材料移送部の動作原理を説明する図であり、図6は、図2における連続薄膜蒸着装置の材料蒸発部を示す図である。   2 is a view showing a continuous thin film deposition apparatus according to an embodiment of the present invention, FIG. 3 is a view showing a material preheating part of the continuous thin film deposition apparatus in FIG. 2, and FIG. 4 is a continuous view in FIG. FIG. 5 is a diagram for explaining the operation principle of the material preheating unit of the thin film deposition apparatus, FIG. 5 is a diagram for explaining the operation principle of the material transfer unit of the continuous thin film deposition apparatus in FIG. 2, and FIG. It is a figure which shows the material evaporation part of a thin film vapor deposition apparatus.

図2〜図6を参照すると、本実施例の連続薄膜蒸着装置100は、るつぼを連続的に供給しながら、るつぼ内の有機材料を蒸発させて基板に薄膜形態で蒸着させるためのものであり、材料保存部110と、材料予熱部120と、材料移送部130と、材料蒸発部140と、るつぼ移送部150と、汚染防止部160と、を含む。   Referring to FIGS. 2 to 6, the continuous thin film deposition apparatus 100 of the present embodiment is for evaporating the organic material in the crucible and depositing it on the substrate in a thin film form while continuously supplying the crucible. , A material storage unit 110, a material preheating unit 120, a material transfer unit 130, a material evaporation unit 140, a crucible transfer unit 150, and a contamination prevention unit 160.

前記材料保存部110は、基板に蒸着される有機材料が固体又は液体状態で保存されており、ホッパー111と、ホッパー振動部112とを含む。   The material storage unit 110 stores an organic material deposited on a substrate in a solid or liquid state, and includes a hopper 111 and a hopper vibration unit 112.

ホッパー111は、約30日以上使用可能な量の有機材料を常温状態で保存し、後述するバケット131に一定量(例えば、約80cc)の有機材料を伝達できる開口部が下側に備えられている。   The hopper 111 stores an amount of organic material that can be used for about 30 days or more at room temperature, and an opening that can transmit a certain amount (for example, about 80 cc) of organic material to a bucket 131 described below is provided on the lower side. Yes.

ホッパー振動部112は、ホッパー111に一定の振幅の振動を供給するものであり、本実施例では、ホッパー111を左右方向に振る振動を供給する。何ら振動もなくバケット131に有機材料が伝達されると、バケット131に充填される有機材料の上部表面が山状又は谷状に形成されて表面積が均一にならない。有機材料の蒸発量は、外部との境界となる表面の表面積に比例するので、外部との境界となる有機材料の表面積が変更されると、後述する材料蒸発部140で有機材料の蒸発量を適切に制御できなくなり、基板に蒸着される有機薄膜の厚さなど有機薄膜の品質に問題が生じることになる。   The hopper vibration unit 112 supplies vibration with a constant amplitude to the hopper 111, and in this embodiment, supplies vibration that shakes the hopper 111 in the left-right direction. When the organic material is transmitted to the bucket 131 without any vibration, the upper surface of the organic material filled in the bucket 131 is formed in a mountain shape or a valley shape, and the surface area is not uniform. Since the evaporation amount of the organic material is proportional to the surface area of the surface that becomes the boundary with the outside, when the surface area of the organic material that becomes the boundary with the outside is changed, the evaporation amount of the organic material is changed by the material evaporation unit 140 described later. It becomes impossible to control appropriately, and problems arise in the quality of the organic thin film such as the thickness of the organic thin film deposited on the substrate.

なお、ホッパー振動部112の振動によってバケット131に移送される有機材料を一定量に捕集することができ、一定量の有機材料をバケット131に充填することができる。有機材料の移送量が一定でないと、材料蒸発部140で有機物の残量による蒸発量を適切に制御することができず、基板に蒸着される有機薄膜の厚さなど有機薄膜の品質に問題が生じることになる。   In addition, the organic material transferred to the bucket 131 by the vibration of the hopper vibration unit 112 can be collected in a certain amount, and the certain amount of organic material can be filled in the bucket 131. If the transfer amount of the organic material is not constant, the material evaporation unit 140 cannot appropriately control the evaporation amount due to the remaining amount of organic matter, and there is a problem in the quality of the organic thin film such as the thickness of the organic thin film deposited on the substrate. Will occur.

したがって、ホッパー振動部112によりホッパー111を左右方向に振ることで、バケット131に充填される有機材料の上部表面を平坦にして、常に均一な表面積を確保することができ、一定の有機材料の量を材料蒸発部140に供給して蒸発される有機材料の蒸発量を正確に制御することができる。   Therefore, the upper surface of the organic material filled in the bucket 131 can be flattened by shaking the hopper 111 in the left-right direction by the hopper vibration unit 112, and a uniform surface area can be ensured at all times. Can be supplied to the material evaporation unit 140 to accurately control the evaporation amount of the evaporated organic material.

ホッパー111を左右方向に直線往復させるホッパー振動部112は一般的な直線駆動ユニットで構成でき、直線駆動ユニットは直線往復運動か可能なものであれば制限がない。空気圧シリンダ、リニアモータ又は回転モータとボールねじを組み合わせた構成など、通常の技術者によく知られている構成を採用できるので、構成についての詳細な説明は省略する。   The hopper vibration part 112 that linearly reciprocates the hopper 111 in the left-right direction can be configured by a general linear drive unit, and the linear drive unit is not limited as long as it can perform linear reciprocating motion. Since a configuration well known to a normal engineer such as a configuration in which a pneumatic cylinder, a linear motor or a rotary motor and a ball screw are combined can be adopted, detailed description of the configuration is omitted.

前記材料予熱部120は、るつぼ10が材料蒸発部140に搬入される前、有機材料が収容されているるつぼ10を有機材料の気化点未満の温度に予熱する。   The material preheating unit 120 preheats the crucible 10 containing the organic material to a temperature below the vaporization point of the organic material before the crucible 10 is carried into the material evaporation unit 140.

材料保存部110から移送された有機材料は常温状態に置かれている。このような低い温度にあった有機材料をすぐに材料蒸発部140に搬入すると、有機材料を蒸発させるためにかなりの時間がかかる。したがって、るつぼ10が材料蒸発部140に搬入される前に材料予熱部120により有機材料を所定の温度に予熱させると、材料蒸発部140内での有機材料の蒸発時間を短縮することができ、全体的に蒸着工程時間を減らすことができる。   The organic material transferred from the material storage unit 110 is placed in a normal temperature state. When the organic material at such a low temperature is immediately carried into the material evaporation unit 140, it takes a considerable time to evaporate the organic material. Therefore, if the organic material is preheated to a predetermined temperature by the material preheating unit 120 before the crucible 10 is carried into the material evaporation unit 140, the evaporation time of the organic material in the material evaporation unit 140 can be shortened. Overall, the deposition process time can be reduced.

材料予熱部120は、るつぼ10をそれぞれ収容できる第1収容部121と第2収容部122に分けられる。第1収容部121と第2収容部122にはるつぼ10を予熱できるヒータ124が装着されている。   The material preheating part 120 is divided into a first accommodating part 121 and a second accommodating part 122 that can accommodate the crucible 10. A heater 124 that can preheat the crucible 10 is attached to the first housing part 121 and the second housing part 122.

材料予熱部120は、第1収容部又は第2収容部を材料移送部と材料蒸発部との間の任意の位置に選択的に位置させる位置設定ユニット123を含み、本実施例での位置設定ユニット123は第1収容部121と第2収容部122を回転させることができるように構成される。   The material preheating unit 120 includes a position setting unit 123 that selectively positions the first storage unit or the second storage unit at an arbitrary position between the material transfer unit and the material evaporation unit. The unit 123 is configured to be able to rotate the first housing part 121 and the second housing part 122.

図4を参照すると、位置設定ユニット123は、第1収容部121及び第2収容部122のうちいずれか(例えば、第1収容部121)を材料移送部130から有機材料が伝達される伝達位置(P1)に位置させる(図4の(a))。その後、位置設定ユニット123により第1収容部121を約90度回転させてるつぼ10を予熱する予熱位置(P3)に位置させる(図4の(b))。この時、予熱位置(P3)の上側には、第1収容部121で予熱されるるつぼ10内の有機材料の温度を感知する予熱用センサ125が備えられており、予め決められた適正温度に有機材料が予熱されるかを感知する。   Referring to FIG. 4, the position setting unit 123 is configured to transmit the organic material from the material transfer unit 130 through one of the first storage unit 121 and the second storage unit 122 (for example, the first storage unit 121). It is located at (P1) ((a) of FIG. 4). After that, the position setting unit 123 is used to position the crucible 10 rotating the first housing 121 about 90 degrees at the preheating position (P3) for preheating ((b) of FIG. 4). At this time, a preheating sensor 125 for sensing the temperature of the organic material in the crucible 10 preheated in the first housing part 121 is provided above the preheating position (P3), and the temperature is set to a predetermined appropriate temperature. Senses whether organic materials are preheated.

その後、位置設定ユニット123により第1収容部121を予熱位置(P3)から約90度回転させ、第2収容部122が材料蒸発部140の下側に位置するようにして材料蒸発部140から搬出されるるつぼ10を待機する待機位置(P2)に位置させる(図4の(c))。この時、有機材料が消耗したるつぼ10がるつぼ移送部150により第2収容部122に移送される。その後、位置設定ユニット123により第1収容部121を待機位置(P2)から約180度回転させ、第1収容部121が材料蒸発部140の下側に位置するようにして材料蒸発部140に搬入されるるつぼ10を材料蒸発部140の下側で待機する待機位置(P2)に位置させる(図4の(d))。   After that, the position setting unit 123 rotates the first container 121 from the preheating position (P3) by about 90 degrees, and the second container 122 is carried out of the material evaporator 140 so that the second container 122 is located below the material evaporator 140. The crucible 10 to be placed is placed at the standby position (P2) for standby ((c) of FIG. 4). At this time, the crucible 10 in which the organic material has been consumed is transferred to the second housing part 122 by the crucible transfer part 150. Thereafter, the first accommodation unit 121 is rotated about 180 degrees from the standby position (P2) by the position setting unit 123, and is loaded into the material evaporation unit 140 so that the first accommodation unit 121 is located below the material evaporation unit 140. The crucible 10 to be used is positioned at a standby position (P2) where the crucible 10 stands by below the material evaporation section 140 ((d) in FIG. 4).

るつぼ10を予熱する予熱位置(P3)は伝達位置(P1)と待機位置(P2)との間に備えられ、位置設定ユニット123は第1収容部121又は第2収容部122が伝達位置(P1)、待機位置(P2)、予熱位置(P3)のいずれかに位置するように第1収容部121又は第2収容部122を回転させる。   The preheating position (P3) for preheating the crucible 10 is provided between the transmission position (P1) and the standby position (P2), and the position setting unit 123 includes the first accommodation portion 121 or the second accommodation portion 122 in the transmission position (P1). ), The first housing part 121 or the second housing part 122 is rotated so as to be located at either the standby position (P2) or the preheating position (P3).

本実施例の位置設定ユニット123は、回転運動が可能なものであれば制限がなく、空気圧シリンダ、回転モータとベルトを組み合わせた構成など通常の技術者によく知られている構成を採用できるので、これ以上の詳細な説明は省略する。   The position setting unit 123 of this embodiment is not limited as long as it can rotate, and can employ a configuration well known to ordinary engineers such as a combination of a pneumatic cylinder, a rotary motor, and a belt. Further detailed description will be omitted.

前記材料移送部130は、材料保管部110から一定量の有機材料が供給され、材料予熱部120に配置されたるつぼ10に有機材料を伝達し、バケット131と移送ユニット132とを含む。   The material transfer unit 130 is supplied with a certain amount of organic material from the material storage unit 110, transmits the organic material to the crucible 10 disposed in the material preheating unit 120, and includes a bucket 131 and a transfer unit 132.

前記バケット131は、材料保管部110から供給される有機材料を一時的に収容し、下部にドア部133を備える。   The bucket 131 temporarily stores an organic material supplied from the material storage unit 110 and includes a door portion 133 at a lower portion.

前記移送ユニット132は、バケット131を直線往復移送させる。図5を参照すると、バケット131は、材料保管部110の下側で材料保存部110から有機材料が供給される充填位置(P4)に位置する(図5の(a))。その後、移送ユニット132によりバケット131は材料予熱部120の上側に直線移送され、材料予熱部120に収容されたるつぼ10に有機材料を伝達する伝達位置(P1)に位置する(図5の(b))。このように、移送ユニット132は充填位置(P4)と伝達位置(P1)との間でバケット131を直線往復移送させる。   The transfer unit 132 linearly reciprocates the bucket 131. Referring to FIG. 5, the bucket 131 is located at the filling position (P4) where the organic material is supplied from the material storage unit 110 below the material storage unit 110 ((a) of FIG. 5). Thereafter, the bucket 131 is linearly transferred to the upper side of the material preheating unit 120 by the transfer unit 132, and is located at the transmission position (P1) for transmitting the organic material to the crucible 10 accommodated in the material preheating unit 120 ((b of FIG. 5). )). Thus, the transfer unit 132 linearly reciprocates the bucket 131 between the filling position (P4) and the transmission position (P1).

バケット131の下部には、ドア部133が備えられている。充填位置(P4)では、材料保存部110から供給される有機材料を収容するために閉鎖されており、伝達位置(P1)では、材料予熱部120のるつぼ10に有機材料を伝達するために開放されて有機材料を放出する。   A door portion 133 is provided at the lower portion of the bucket 131. The filling position (P4) is closed to accommodate the organic material supplied from the material storage unit 110, and the transmission position (P1) is opened to transmit the organic material to the crucible 10 of the material preheating unit 120. To release organic material.

移送ユニット132も、直線往復運動が可能な様々な形態の直線駆動ユニットであれば良いので、構成に関する詳細な説明は省略する。   Since the transfer unit 132 may also be a linear drive unit of various forms capable of linear reciprocation, detailed description of the configuration is omitted.

前記材料蒸発部140は、搬入されたるつぼ10に熱を供給してるつぼ10に収容された有機材料を蒸発させ、胴体部141と、ヒータ142と、ノズル143と、を含む。   The material evaporation part 140 includes a body part 141, a heater 142, and a nozzle 143 to supply heat to the crucible 10 that has been carried in and evaporate the organic material contained in the crucible 10.

前記胴体部141は、るつぼ移送部150によって搬入されたるつぼ10を収容する。   The body part 141 accommodates the crucible 10 carried in by the crucible transfer part 150.

前記ヒータ142は、胴体部141の側部を囲んで備えられ有機材料を蒸発させることができる熱エネルギーを供給する。ヒータ142は、有機材料を蒸発させることができる熱エネルギーを供給できるものであれば制限がなく、例えば、コアヒータ又はランプヒータなどを用いることができる。本実施例では、コアヒータを用いるが、胴体部141の外側から抵抗熱線が巻かれて形成される。この時使用される抵抗熱線はTa、W、Mo金属又はこれらの合金線からなるものである。   The heater 142 is provided so as to surround a side portion of the body portion 141 and supplies heat energy capable of evaporating the organic material. The heater 142 is not limited as long as it can supply heat energy capable of evaporating the organic material. For example, a core heater or a lamp heater can be used. In this embodiment, a core heater is used, but a resistance heating wire is wound from the outside of the body portion 141. The resistance heating wire used at this time is made of Ta, W, Mo metal or an alloy wire thereof.

前記ノズル143は、胴体部141の上部に形成され、ヒータ142から熱が供給される間、蒸発した有機材料が噴射される。ノズル143は、例えば、一定の長さを有する直線形状の貫通ホールで形成され、一定の直径を有する円形状の貫通ホールで形成される。   The nozzle 143 is formed in the upper portion of the body portion 141, and the evaporated organic material is injected while heat is supplied from the heater 142. The nozzle 143 is formed of, for example, a linear through hole having a certain length and a circular through hole having a certain diameter.

なお、材料蒸発部140は、るつぼ10から蒸発される有機材料の蒸発量を測定するセンサ144をさらに含む。測定された蒸発量により蒸発速度を制御することにより、所望の厚さの有機薄膜を蒸着させることができる。   The material evaporating unit 140 further includes a sensor 144 that measures the evaporation amount of the organic material evaporated from the crucible 10. By controlling the evaporation rate according to the measured evaporation amount, an organic thin film having a desired thickness can be deposited.

前記るつぼ移送部150は、材料予熱部120で予熱されたるつぼ10を材料蒸発部140に搬入するか、又は材料蒸発部140から有機材料が消耗したるつぼ10を搬出する。予熱が完了したるつぼ10を上昇させて材料蒸発部140内に搬入し、有機材料が消耗したるつぼ10を下降させて材料蒸発部140から搬出する。   The crucible transfer unit 150 carries the crucible 10 preheated by the material preheating unit 120 into the material evaporation unit 140 or carries out the crucible 10 with the organic material consumed from the material evaporation unit 140. The crucible 10 that has been preheated is raised and carried into the material evaporation unit 140, and the crucible 10 with the organic material consumed is lowered and carried out of the material evaporation unit 140.

なお、るつぼ移送部150は、材料蒸発部140内で有機材料をヒータ142に近づく方向に、又はヒータ142から遠ざかる方向にるつぼ10を往復させながら昇降させる。るつぼ移送部150を用いてるつぼ10内の有機材料とヒータ142との間の距離を調節することにより、蒸発される有機材料の量を制御することができる。   The crucible transfer unit 150 moves the organic material up and down while reciprocating the crucible 10 in a direction approaching the heater 142 or away from the heater 142 in the material evaporation unit 140. By adjusting the distance between the organic material in the crucible 10 using the crucible transfer unit 150 and the heater 142, the amount of the organic material to be evaporated can be controlled.

即ち、蒸発される有機材料の量が予め設定された基準量よりも少ないと、るつぼ10をヒータ142に近づく方向に移送させてヒータ142により有機材料に十分な熱が供給されるようにして、有機材料の蒸発量を増加させることができ、蒸発される有機材料の量が予め設定された基準量よりも多いと、るつぼ10をヒータ142から遠ざかる方向に移送させてヒータ142により有機材料に供給される熱を減らすことにより、有機材料の蒸発量を減少させることができる。   That is, when the amount of the organic material to be evaporated is less than a preset reference amount, the crucible 10 is moved in a direction approaching the heater 142 so that sufficient heat is supplied to the organic material by the heater 142. The evaporation amount of the organic material can be increased. When the amount of the evaporated organic material is larger than a preset reference amount, the crucible 10 is moved away from the heater 142 and supplied to the organic material by the heater 142. By reducing the generated heat, the evaporation amount of the organic material can be reduced.

るつぼ移送部150は、直線往復運動が可能なものであれば制限がなく、空気圧シリンダ、リニアモータ、回転モータとボールねじを組み合わせた構成など通常の技術者によく知られている構成を採用できるので、これ以上の詳細な説明は省略する。   The crucible transfer unit 150 is not limited as long as it can perform a linear reciprocating motion, and a configuration well known to ordinary engineers such as a configuration combining a pneumatic cylinder, a linear motor, a rotary motor and a ball screw can be adopted. Therefore, further detailed description is omitted.

前記汚染防止部160は、材料蒸発部140の上側に設けられ、蒸発される有機材料によって材料保存部110、材料移送部130、材料予熱部120及び材料蒸発部140が汚染されることを防止する。ヒータ142によりるつぼ10に熱が供給される間、るつぼ10に収容された有機材料や不純物がチャンバ内に付着することを防止する。   The contamination prevention unit 160 is provided above the material evaporation unit 140 and prevents the material storage unit 110, the material transfer unit 130, the material preheating unit 120, and the material evaporation unit 140 from being contaminated by the evaporated organic material. . While heat is supplied to the crucible 10 by the heater 142, organic materials and impurities contained in the crucible 10 are prevented from adhering to the chamber.

チャンバ内部にくっ付く有機材料や不純物は、基板が蒸着されるチャンバ内部を汚染させる。長時間蒸着装置を稼働すると、チャンバ内部にくっ付く有機材料や不純物は汚染源の役割をし、これにより製品の不良率が高くなる。したがって、一時的に蒸着装置の稼動を停止しチャンバ内部を掃除した後工程を再開しなければならないが、このような場合、装置の歩留まりが低下するという問題が発生することになる。   Organic materials and impurities adhering to the inside of the chamber contaminate the inside of the chamber where the substrate is deposited. When the vapor deposition apparatus is operated for a long time, the organic material and impurities adhering to the inside of the chamber act as a contamination source, thereby increasing the defect rate of the product. Therefore, it is necessary to temporarily stop the operation of the vapor deposition apparatus and clean the inside of the chamber, and then restart the process. In such a case, there arises a problem that the yield of the apparatus decreases.

このように、汚染防止部160は、チャンバ内部に有機材料が付着することを遮断し、汚染発生時、汚染防止部160自体を入れ替えることが可能であるので、チャンバ内部の汚染を防止し、長時間連続的な生産を可能にして装置の歩留まりを向上させることができる。   In this way, the contamination prevention unit 160 can prevent the organic material from adhering to the inside of the chamber and can replace the contamination prevention unit 160 itself when contamination occurs. It is possible to improve production yield by enabling continuous production in time.

上述のように構成された本実施例に係る連続薄膜蒸着装置は、有機材料を収容するるつぼを入れ替えながら、材料蒸発部で有機材料が連続的に蒸発するように構成することで、装置の稼働時間を長時間延長させることができる効果が得られる。   The continuous thin film deposition apparatus according to the present embodiment configured as described above is configured so that the organic material continuously evaporates in the material evaporation unit while replacing the crucible containing the organic material. The effect which can extend time for a long time is acquired.

なお、上述のように構成された本実施例に係る連続薄膜蒸着装置は、装置を長時間使用するために、るつぼの容量を無制限的に増大させることなく、一定の容量の有機材料を収容するるつぼ自体を入れ替えることにより、るつぼ内の有機材料が長時間熱に露出されることを回避して熱により変性されることを防止できる効果が得られる。   In addition, the continuous thin film deposition apparatus according to the present embodiment configured as described above accommodates an organic material having a certain capacity without increasing the capacity of the crucible without limitation in order to use the apparatus for a long time. By replacing the crucible itself, an effect can be obtained in which the organic material in the crucible is avoided from being exposed to heat for a long time to be denatured by heat.

なお、上述のように構成された本実施例に係る連続薄膜蒸着装置は、有機材料が材料蒸発部に搬入される前に材料予熱部により有機材料を所定の温度に予熱させることにより、全体的に蒸着工程にかかる時間を減らすことができる効果が得られる。   In addition, the continuous thin film deposition apparatus according to the present embodiment configured as described above is configured so that the organic material is preheated to a predetermined temperature by the material preheating unit before the organic material is carried into the material evaporation unit. In addition, it is possible to reduce the time required for the vapor deposition process.

なお、上述のように構成された本実施例に係る連続薄膜蒸着装置は、ホッパー振動部によりホッパーを左右方向に振りながら有機材料を供給して、るつぼに収容される有機材料の上部表面積を均一に維持することにより、有機材料の蒸発量を正確に制御できる効果が得られる。   In addition, the continuous thin film deposition apparatus according to the present embodiment configured as described above supplies the organic material while swinging the hopper in the left-right direction by the hopper vibration unit, and uniforms the upper surface area of the organic material accommodated in the crucible. By maintaining the above, an effect of accurately controlling the evaporation amount of the organic material can be obtained.

図2に示された実施例において、ホッパー振動部は、ホッパーに左右方向に一定の振幅の振動を供給するもので説明したが、ホッパー振動部は上下方向、又は円弧方向に一定の振幅の振動を供給するように構成することもできる。   In the embodiment shown in FIG. 2, the hopper vibration unit supplies vibration with a constant amplitude in the left-right direction to the hopper. However, the hopper vibration unit vibrates with a constant amplitude in the vertical direction or the arc direction. Can also be configured to supply.

図2に示された実施例において、材料予熱部は、第1収容部と第2収容部を回転させるもので説明したが、材料予熱部は、第1収容部と第2収容部を直線往復移動しながら位置変更されるように構成することもできる。   In the embodiment shown in FIG. 2, the material preheating unit is described as rotating the first storage unit and the second storage unit, but the material preheating unit linearly reciprocates between the first storage unit and the second storage unit. The position can be changed while moving.

本発明の権利範囲は、上述した実施例及び変形例に限定されるものではなく、添付の特許請求の範囲内で様々な形態の実施例で実現することができる。   The scope of rights of the present invention is not limited to the above-described embodiments and modifications, and can be realized in various forms of embodiments within the scope of the appended claims.

100:連続薄膜蒸着装置
110:材料保存部
120:材料予熱部
130:材料移送部
140:材料蒸発部
150:るつぼ移送部
DESCRIPTION OF SYMBOLS 100: Continuous thin film vapor deposition apparatus 110: Material preservation | save part 120: Material preheating part 130: Material transfer part 140: Material evaporation part 150: Crucible transfer part

Claims (10)

有機材料が保存された材料保存部と、
有機材料が収容されたるつぼを有機材料の気化点未満の温度に予熱する材料予熱部と、
前記材料保存部から一定量の有機材料が供給され、前記材料予熱部に配置されたるつぼに有機材料を伝達する材料移送部と、
搬入されたるつぼに熱を供給して前記るつぼに収容された有機材料を蒸発させる材料蒸発部と、
前記材料予熱部で予熱されたるつぼを前記材料蒸発部に搬入したり、又は前記材料蒸発部から有機材料が消耗されたるつぼを搬出するるつぼ移送部と、を含むことを特徴とする連続薄膜蒸着装置。
A material storage section in which organic materials are stored;
A material preheating part for preheating the crucible containing the organic material to a temperature below the vaporization point of the organic material;
A material transfer unit that is supplied with a certain amount of organic material from the material storage unit and transmits the organic material to the crucible disposed in the material preheating unit,
A material evaporation section for supplying heat to the crucible carried in and evaporating the organic material accommodated in the crucible;
A continuous thin film deposition comprising: a crucible preheated by the material preheating unit; or a crucible transport unit for carrying out a crucible depleted of organic material from the material evaporation unit. apparatus.
前記材料保存部は、
有機材料が保存されたホッパーと、
前記ホッパーに一定の振幅の振動を供給するホッパー振動部と、を含むことを特徴とする請求項1に記載の連続薄膜蒸着装置。
The material storage unit is
A hopper in which organic materials are stored;
The continuous thin film deposition apparatus according to claim 1, further comprising: a hopper vibration unit that supplies vibration with a constant amplitude to the hopper.
前記材料予熱部は、
ヒータが装着され前記るつぼをそれぞれ収容する第1収容部及び第2収容部と、
前記第1収容部又は前記第2収容部を前記材料移送部と前記材料蒸発部との間の任意の位置に選択的に位置させる位置設定ユニットと、を含むことを特徴とする請求項1に記載の連続薄膜蒸着装置。
The material preheating part is
A first housing part and a second housing part, each of which is fitted with a heater and houses the crucible;
2. A position setting unit that selectively positions the first storage unit or the second storage unit at an arbitrary position between the material transfer unit and the material evaporation unit. The continuous thin film deposition apparatus as described.
前記位置設定ユニットは、前記第1収容部又は前記第2収容部を、
前記材料移送部から有機材料が伝達される伝達位置、前記材料蒸発部の下側で前記材料蒸発部への搬入又は搬出を待機する待機位置、前記伝達位置と前記待機位置との間に備えられ、前記るつぼを予熱する予熱位置の間で回転させることを特徴とする請求項3に記載の連続薄膜蒸着装置。
The position setting unit includes the first storage unit or the second storage unit.
A transmission position where the organic material is transmitted from the material transfer section; The continuous thin film deposition apparatus according to claim 3, wherein the crucible is rotated between preheating positions for preheating.
前記材料予熱部は、
前記第1収容部又は前記第2収容部で予熱されるるつぼ内の有機材料の温度を感知する予熱用センサをさらに含むことを特徴とする請求項3に記載の連続薄膜蒸着装置。
The material preheating part is
The continuous thin film deposition apparatus according to claim 3, further comprising a preheating sensor that senses a temperature of an organic material in a crucible preheated in the first housing part or the second housing part.
前記材料移送部は、
前記材料保存部から供給される有機材料を一時的に収容するバケットと、
前記材料保存部の下側における前記材料保存部から有機材料が供給される充填位置と前記材料予熱部の上側における前記材料予熱部に有機材料を伝達する伝達位置との間で、前記バケットを往復移送させる移送ユニットと、を含むことを特徴とする請求項1に記載の連続薄膜蒸着装置。
The material transfer unit is
A bucket for temporarily storing the organic material supplied from the material storage unit;
The bucket is reciprocated between a filling position where the organic material is supplied from the material storage section below the material storage section and a transmission position where the organic material is transmitted to the material preheating section above the material preheating section. The continuous thin film deposition apparatus according to claim 1, further comprising a transfer unit that transfers the film.
前記バケットは、
前記バケットの下部に設けられ、前記充填位置では閉鎖されて有機材料を収容し、前記伝達位置では開放されて有機材料を放出するドア部を備えることを特徴とする請求項6に記載の連続薄膜蒸着装置。
The bucket is
The continuous thin film according to claim 6, further comprising a door portion provided at a lower portion of the bucket, closed at the filling position to receive an organic material, and opened at the transmission position to discharge the organic material. Vapor deposition equipment.
前記材料蒸発部は、
前記るつぼを収容する胴体部と、前記胴体部の側部を囲んで備えられるヒータと、前記胴体部の上部に形成され、前記ヒータから熱が供給される間、蒸発した有機材料が噴射されるノズルと、を含むことを特徴とする請求項1に記載の連続薄膜蒸着装置。
The material evaporation section is
A body part that accommodates the crucible, a heater that is provided to surround a side part of the body part, and an upper portion of the body part that is formed, and while the heat is supplied from the heater, the evaporated organic material is injected. A continuous thin film deposition apparatus according to claim 1, comprising a nozzle.
前記材料蒸発部は、
前記るつぼから蒸発される有機材料の蒸発速度を測定するセンサをさらに含むことを特徴とする請求項1に記載の連続薄膜蒸着装置。
The material evaporation section is
The continuous thin film deposition apparatus according to claim 1, further comprising a sensor that measures an evaporation rate of the organic material evaporated from the crucible.
前記材料蒸発部の上側に設けられ、蒸発される有機材料により前記材料保存部、前記材料移送部、前記材料予熱部、及び前記材料蒸発部が汚染されることを防止するための汚染防止部をさらに含むことを特徴とする請求項1に記載の連続薄膜蒸着装置。 A contamination prevention unit provided above the material evaporation unit and configured to prevent contamination of the material storage unit, the material transfer unit, the material preheating unit, and the material evaporation unit by an organic material to be evaporated; The continuous thin film deposition apparatus according to claim 1, further comprising:
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