JP2013131533A - 半導体装置 - Google Patents

半導体装置 Download PDF

Info

Publication number
JP2013131533A
JP2013131533A JP2011278311A JP2011278311A JP2013131533A JP 2013131533 A JP2013131533 A JP 2013131533A JP 2011278311 A JP2011278311 A JP 2011278311A JP 2011278311 A JP2011278311 A JP 2011278311A JP 2013131533 A JP2013131533 A JP 2013131533A
Authority
JP
Japan
Prior art keywords
test
chip
input
output
data input
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2011278311A
Other languages
English (en)
Japanese (ja)
Other versions
JP2013131533A5 (OSRAM
Inventor
Tetsuji Takahashi
哲治 高橋
Toru Ishikawa
透 石川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Micron Memory Japan Ltd
Original Assignee
Elpida Memory Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Elpida Memory Inc filed Critical Elpida Memory Inc
Priority to JP2011278311A priority Critical patent/JP2013131533A/ja
Priority to US13/720,863 priority patent/US8957695B2/en
Publication of JP2013131533A publication Critical patent/JP2013131533A/ja
Publication of JP2013131533A5 publication Critical patent/JP2013131533A5/ja
Withdrawn legal-status Critical Current

Links

Images

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P74/00—Testing or measuring during manufacture or treatment of wafers, substrates or devices
    • H10P74/27—Structural arrangements therefor
    • H10P74/273—Interconnections for measuring or testing, e.g. probe pads
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P74/00—Testing or measuring during manufacture or treatment of wafers, substrates or devices
    • H10P74/27—Structural arrangements therefor
    • H10P74/277—Circuits for electrically characterising or monitoring manufacturing processes, e.g. circuits in tested chips or circuits in testing wafers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00—Package configurations
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/20—Bump connectors, e.g. solder bumps or copper pillars; Dummy bumps; Thermal bumps
    • H10W72/221—Structures or relative sizes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/20—Bump connectors, e.g. solder bumps or copper pillars; Dummy bumps; Thermal bumps
    • H10W72/221—Structures or relative sizes
    • H10W72/222—Multilayered bumps, e.g. a coating on top and side surfaces of a bump core
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/20—Bump connectors, e.g. solder bumps or copper pillars; Dummy bumps; Thermal bumps
    • H10W72/241—Dispositions, e.g. layouts
    • H10W72/242—Dispositions, e.g. layouts relative to the surface, e.g. recessed, protruding
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/20—Bump connectors, e.g. solder bumps or copper pillars; Dummy bumps; Thermal bumps
    • H10W72/241—Dispositions, e.g. layouts
    • H10W72/247—Dispositions of multiple bumps
    • H10W72/248—Top-view layouts, e.g. mirror arrays
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/20—Bump connectors, e.g. solder bumps or copper pillars; Dummy bumps; Thermal bumps
    • H10W72/29—Bond pads specially adapted therefor
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/851—Dispositions of multiple connectors or interconnections
    • H10W72/874—On different surfaces
    • H10W72/884—Die-attach connectors and bond wires
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/90—Bond pads, in general
    • H10W72/921—Structures or relative sizes of bond pads
    • H10W72/923—Bond pads having multiple stacked layers
    • H10W72/9232—Bond pads having multiple stacked layers with additional elements interposed between layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/90—Bond pads, in general
    • H10W72/941—Dispositions of bond pads
    • H10W72/9415—Dispositions of bond pads relative to the surface, e.g. recessed, protruding
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W74/00—Encapsulations, e.g. protective coatings
    • H10W74/10—Encapsulations, e.g. protective coatings characterised by their shape or disposition
    • H10W74/111—Encapsulations, e.g. protective coatings characterised by their shape or disposition the semiconductor body being completely enclosed
    • H10W74/114—Encapsulations, e.g. protective coatings characterised by their shape or disposition the semiconductor body being completely enclosed by a substrate and the encapsulations
    • H10W74/117—Encapsulations, e.g. protective coatings characterised by their shape or disposition the semiconductor body being completely enclosed by a substrate and the encapsulations the substrate having spherical bumps for external connection
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00—Package configurations
    • H10W90/20—Configurations of stacked chips
    • H10W90/284—Configurations of stacked chips characterised by structural arrangements for measuring or testing
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00—Package configurations
    • H10W90/20—Configurations of stacked chips
    • H10W90/297—Configurations of stacked chips characterised by the through-semiconductor vias [TSVs] in the stacked chips
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00—Package configurations
    • H10W90/701—Package configurations characterised by the relative positions of pads or connectors relative to package parts
    • H10W90/721—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bump connectors
    • H10W90/722—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bump connectors between stacked chips
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00—Package configurations
    • H10W90/701—Package configurations characterised by the relative positions of pads or connectors relative to package parts
    • H10W90/721—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bump connectors
    • H10W90/724—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bump connectors between a chip and a stacked insulating package substrate, interposer or RDL
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00—Package configurations
    • H10W90/701—Package configurations characterised by the relative positions of pads or connectors relative to package parts
    • H10W90/731—Package configurations characterised by the relative positions of pads or connectors relative to package parts of die-attach connectors
    • H10W90/732—Package configurations characterised by the relative positions of pads or connectors relative to package parts of die-attach connectors between stacked chips
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00—Package configurations
    • H10W90/701—Package configurations characterised by the relative positions of pads or connectors relative to package parts
    • H10W90/731—Package configurations characterised by the relative positions of pads or connectors relative to package parts of die-attach connectors
    • H10W90/734—Package configurations characterised by the relative positions of pads or connectors relative to package parts of die-attach connectors between a chip and a stacked insulating package substrate, interposer or RDL
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00—Package configurations
    • H10W90/701—Package configurations characterised by the relative positions of pads or connectors relative to package parts
    • H10W90/751—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires
    • H10W90/752—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires between stacked chips
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00—Package configurations
    • H10W90/701—Package configurations characterised by the relative positions of pads or connectors relative to package parts
    • H10W90/751—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires
    • H10W90/754—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires between a chip and a stacked insulating package substrate, interposer or RDL

Landscapes

  • Tests Of Electronic Circuits (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • For Increasing The Reliability Of Semiconductor Memories (AREA)
  • Dram (AREA)
  • Engineering & Computer Science (AREA)
  • Automation & Control Theory (AREA)
  • Manufacturing & Machinery (AREA)
JP2011278311A 2011-12-20 2011-12-20 半導体装置 Withdrawn JP2013131533A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2011278311A JP2013131533A (ja) 2011-12-20 2011-12-20 半導体装置
US13/720,863 US8957695B2 (en) 2011-12-20 2012-12-19 Semiconductor device having plural semiconductor chip stacked with one another

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011278311A JP2013131533A (ja) 2011-12-20 2011-12-20 半導体装置

Publications (2)

Publication Number Publication Date
JP2013131533A true JP2013131533A (ja) 2013-07-04
JP2013131533A5 JP2013131533A5 (OSRAM) 2014-12-25

Family

ID=48609213

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011278311A Withdrawn JP2013131533A (ja) 2011-12-20 2011-12-20 半導体装置

Country Status (2)

Country Link
US (1) US8957695B2 (OSRAM)
JP (1) JP2013131533A (OSRAM)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2022060614A (ja) * 2020-10-05 2022-04-15 三菱電機エンジニアリング株式会社 半導体装置
WO2022238798A1 (ja) * 2021-05-10 2022-11-17 株式会社半導体エネルギー研究所 半導体装置
JP2023501251A (ja) * 2019-11-01 2023-01-18 ザイリンクス インコーポレイテッド マルチチップ積層デバイス

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2608207A1 (en) * 2010-06-17 2013-06-26 Mosaid Technologies Incorporated Semiconductor device with through-silicon vias
US9859199B2 (en) * 2013-12-18 2018-01-02 Taiwan Semiconductor Manufacturing Co., Ltd. Method for forming semiconductor package using carbon nano material in molding compound
KR20160025957A (ko) * 2014-08-28 2016-03-09 에스케이하이닉스 주식회사 집적회로
CN107305861B (zh) * 2016-04-25 2019-09-03 晟碟信息科技(上海)有限公司 半导体装置及其制造方法
US10079049B2 (en) 2016-06-08 2018-09-18 Micron Technology, Inc. Stack access control for memory device
US10008287B2 (en) * 2016-07-22 2018-06-26 Micron Technology, Inc. Shared error detection and correction memory
US9792964B1 (en) * 2016-09-20 2017-10-17 Micron Technology, Inc. Apparatus of offset voltage adjustment in input buffer
US10282264B1 (en) 2017-11-09 2019-05-07 Micron Technology, Inc. Apparatus and methods for repairing memory devices including a plurality of memory die and an interface
KR102504332B1 (ko) * 2018-02-21 2023-02-28 삼성전자주식회사 서로 이격되어 배치되는 범프 어레이들을 포함하는 메모리 장치 및 이를 포함하는 전자 장치
US10664432B2 (en) 2018-05-23 2020-05-26 Micron Technology, Inc. Semiconductor layered device with data bus inversion
CN109244058A (zh) * 2018-09-19 2019-01-18 深圳铨力半导体有限公司 半导体封装结构及其制备方法
US10964702B2 (en) 2018-10-17 2021-03-30 Micron Technology, Inc. Semiconductor device with first-in-first-out circuit
KR102674029B1 (ko) 2018-10-26 2024-06-13 삼성전자주식회사 테스트 패드를 포함하는 반도체 패키지
KR20240061935A (ko) * 2022-11-01 2024-05-08 삼성전자주식회사 테스트 패드를 갖는 반도체 패키지
KR20250051844A (ko) * 2023-10-10 2025-04-18 삼성전자주식회사 반도체 패키지

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008140530A (ja) * 2006-12-05 2008-06-19 Toshiba Corp 半導体装置およびそのテスト方法
KR100909969B1 (ko) * 2007-06-28 2009-07-29 삼성전자주식회사 반도체 소자 및 그 제조 방법, 및 반도체 소자를 포함하는스택 모듈, 카드 및 시스템

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2023501251A (ja) * 2019-11-01 2023-01-18 ザイリンクス インコーポレイテッド マルチチップ積層デバイス
JP7664240B2 (ja) 2019-11-01 2025-04-17 ザイリンクス インコーポレイテッド マルチチップ積層デバイス
JP2022060614A (ja) * 2020-10-05 2022-04-15 三菱電機エンジニアリング株式会社 半導体装置
JP7561563B2 (ja) 2020-10-05 2024-10-04 三菱電機エンジニアリング株式会社 半導体装置
WO2022238798A1 (ja) * 2021-05-10 2022-11-17 株式会社半導体エネルギー研究所 半導体装置
JPWO2022238798A1 (OSRAM) * 2021-05-10 2022-11-17
JP7811940B2 (ja) 2021-05-10 2026-02-06 株式会社半導体エネルギー研究所 半導体装置

Also Published As

Publication number Publication date
US8957695B2 (en) 2015-02-17
US20130153898A1 (en) 2013-06-20

Similar Documents

Publication Publication Date Title
US8957695B2 (en) Semiconductor device having plural semiconductor chip stacked with one another
JP5654855B2 (ja) 半導体装置
US8981808B2 (en) Semiconductor device and test method thereof
US8952498B2 (en) Semiconductor device having plural stacked chips
US8384432B2 (en) Semiconductor device and information processing system including the same
JP5623088B2 (ja) 半導体装置及びそのテスト方法並びにシステム
US8400781B2 (en) Using interrupted through-silicon-vias in integrated circuits adapted for stacking
US20120262196A1 (en) Semiconductor device including plural core chips and interface chip that controls the core chips and control method thereof
JP5647014B2 (ja) 半導体装置
JP2012255704A (ja) 半導体装置
US20150270250A1 (en) Semiconductor device
JP2013131264A (ja) 半導体装置及びその試験方法
US20130258788A1 (en) Semiconductor device having plural chip connected to each other
US20130121092A1 (en) Semiconductor device including plural semiconductor chips stacked to one another
CN112562770A (zh) 具有测试电路的半导体装置
US9171588B2 (en) Semiconductor device capable of performing a read leveling and a write leveling based on an ambient temperature
KR102295895B1 (ko) 반도체 장치 및 시스템
JP2016091576A (ja) 半導体装置
TW201510996A (zh) 半導體裝置
US20150226784A1 (en) Semiconductor device having plural memory units and test method therefor
JP2013131282A (ja) 半導体装置
KR20260006169A (ko) 메모리 장치 및 그의 검사 방법
JP2013131283A (ja) 半導体装置
JP2015170370A (ja) 半導体装置
JP2016012646A (ja) 半導体装置

Legal Events

Date Code Title Description
A711 Notification of change in applicant

Free format text: JAPANESE INTERMEDIATE CODE: A711

Effective date: 20130731

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A821

Effective date: 20130801

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20130905

RD03 Notification of appointment of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7423

Effective date: 20131030

RD04 Notification of resignation of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7424

Effective date: 20131213

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20141107

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20141107

A761 Written withdrawal of application

Free format text: JAPANESE INTERMEDIATE CODE: A761

Effective date: 20141219