JP2013115126A - Czts系薄膜太陽電池及びその製造方法 - Google Patents
Czts系薄膜太陽電池及びその製造方法 Download PDFInfo
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- 239000010409 thin film Substances 0.000 title claims abstract description 55
- 238000000034 method Methods 0.000 title claims description 25
- 238000004519 manufacturing process Methods 0.000 title claims description 22
- 229910052751 metal Inorganic materials 0.000 claims abstract description 116
- 239000002184 metal Substances 0.000 claims abstract description 116
- 239000010408 film Substances 0.000 claims abstract description 96
- 239000002245 particle Substances 0.000 claims abstract description 58
- 239000000758 substrate Substances 0.000 claims abstract description 47
- 239000006185 dispersion Substances 0.000 claims abstract description 35
- 230000031700 light absorption Effects 0.000 claims description 59
- 239000002243 precursor Substances 0.000 claims description 53
- 239000003513 alkali Substances 0.000 claims description 39
- 239000011521 glass Substances 0.000 claims description 36
- 230000004888 barrier function Effects 0.000 claims description 27
- 239000000203 mixture Substances 0.000 claims description 27
- 229910052725 zinc Inorganic materials 0.000 claims description 18
- 229910052802 copper Inorganic materials 0.000 claims description 17
- 238000005987 sulfurization reaction Methods 0.000 claims description 9
- SBIBMFFZSBJNJF-UHFFFAOYSA-N selenium;zinc Chemical compound [Se]=[Zn] SBIBMFFZSBJNJF-UHFFFAOYSA-N 0.000 claims description 7
- 229910052718 tin Inorganic materials 0.000 claims description 7
- 238000000151 deposition Methods 0.000 claims description 6
- 230000015572 biosynthetic process Effects 0.000 claims description 3
- 238000006243 chemical reaction Methods 0.000 abstract description 47
- 239000011701 zinc Substances 0.000 description 49
- 238000002474 experimental method Methods 0.000 description 36
- 238000005486 sulfidation Methods 0.000 description 29
- 239000010949 copper Substances 0.000 description 25
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 16
- 150000001875 compounds Chemical class 0.000 description 11
- 230000000694 effects Effects 0.000 description 10
- 239000000463 material Substances 0.000 description 10
- 230000006798 recombination Effects 0.000 description 8
- 238000005215 recombination Methods 0.000 description 8
- 239000004065 semiconductor Substances 0.000 description 8
- 239000011787 zinc oxide Substances 0.000 description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- 238000009792 diffusion process Methods 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 238000009826 distribution Methods 0.000 description 5
- 229910052717 sulfur Inorganic materials 0.000 description 5
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical compound S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 4
- 239000011651 chromium Substances 0.000 description 4
- 238000000635 electron micrograph Methods 0.000 description 4
- 229910000037 hydrogen sulfide Inorganic materials 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 4
- 239000010936 titanium Substances 0.000 description 4
- 238000004458 analytical method Methods 0.000 description 3
- 238000000231 atomic layer deposition Methods 0.000 description 3
- 239000002585 base Substances 0.000 description 3
- 229910021476 group 6 element Inorganic materials 0.000 description 3
- 238000002488 metal-organic chemical vapour deposition Methods 0.000 description 3
- 238000002161 passivation Methods 0.000 description 3
- 238000001552 radio frequency sputter deposition Methods 0.000 description 3
- SPVXKVOXSXTJOY-UHFFFAOYSA-N selane Chemical compound [SeH2] SPVXKVOXSXTJOY-UHFFFAOYSA-N 0.000 description 3
- 229910000058 selane Inorganic materials 0.000 description 3
- 229910052711 selenium Inorganic materials 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 229910052796 boron Inorganic materials 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 239000002019 doping agent Substances 0.000 description 2
- 238000000921 elemental analysis Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 229910052733 gallium Inorganic materials 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 229910052750 molybdenum Inorganic materials 0.000 description 2
- 239000011733 molybdenum Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 238000010248 power generation Methods 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 229910016347 CuSn Inorganic materials 0.000 description 1
- 229910002535 CuZn Inorganic materials 0.000 description 1
- 229910016423 CuZnS Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 229910007610 Zn—Sn Inorganic materials 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 150000004770 chalcogenides Chemical class 0.000 description 1
- 239000013626 chemical specie Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 229910021419 crystalline silicon Inorganic materials 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000005566 electron beam evaporation Methods 0.000 description 1
- 239000012776 electronic material Substances 0.000 description 1
- 239000005357 flat glass Substances 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0224—Electrodes
- H01L31/022408—Electrodes for devices characterised by at least one potential jump barrier or surface barrier
- H01L31/022425—Electrodes for devices characterised by at least one potential jump barrier or surface barrier for solar cells
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- H01L31/0256—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by the material
- H01L31/0264—Inorganic materials
- H01L31/032—Inorganic materials including, apart from doping materials or other impurities, only compounds not provided for in groups H01L31/0272 - H01L31/0312
- H01L31/0326—Inorganic materials including, apart from doping materials or other impurities, only compounds not provided for in groups H01L31/0272 - H01L31/0312 comprising AIBIICIVDVI kesterite compounds, e.g. Cu2ZnSnSe4, Cu2ZnSnS4
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- H01L31/0216—Coatings
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- H01L31/0256—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by the material
- H01L31/0264—Inorganic materials
- H01L31/032—Inorganic materials including, apart from doping materials or other impurities, only compounds not provided for in groups H01L31/0272 - H01L31/0312
- H01L31/0324—Inorganic materials including, apart from doping materials or other impurities, only compounds not provided for in groups H01L31/0272 - H01L31/0312 comprising only AIVBVI or AIIBIVCVI chalcogenide compounds, e.g. Pb Sn Te
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Abstract
【解決手段】CZTS系薄膜太陽電池は、基板1と、基板1上に形成した金属裏面電極層2と、金属裏面電極層2上に形成したp型CZTS系光吸収層3と、p型CZTS系光吸収層3上に形成したn型透明導電膜5と、を備え、p型CZTS系光吸収層3と金属裏面電極層2との界面に、ZnS系小粒子の分散層30を有する。
【選択図】図1
Description
本発明者等は、上記のp型CZTS系光吸収層3を形成するに当たって、製造条件を種々変更して実験を行った結果、金属プリカーサー膜の積層順序と硫化/セレン化の温度および時間の調整によって、ZnS系小粒子の分散層30を形成するための特別な工程を設けることなく、この層30を形成し、光電変換効率の優れたCZTS系薄膜太陽電池を得ることができることを見出した。特に、金属プリカーサー膜の最下層(金属裏面電極層2と接触する層)としてZn、ZnとCuの混合物、ZnとVI族元素の混合物、またはZnとCuとVI族元素の混合物(以下、Znを含む混合物)を製膜し、さらに、金属プリカーサー膜の硫化/セレン化時間を短くすることによって、光電変換効率が大きく改善される。
2 金属裏面電極層
3 p型CZTS系光吸収層
4 n型高抵抗バッファ層
5 n型透明導電膜
6 アルカリバリア層
10 ホール
12 金属プリカーサー膜の第1層
13 金属プリカーサー膜の第2層
14 金属プリカーサー膜の第3層
15 金属プリカーサー膜
20 電子
30 ZnS系小粒子の分散層
Claims (12)
- 基板と、
前記基板上に形成した金属裏面電極層と、
前記金属裏面電極層上に形成したp型CZTS系光吸収層と、
前記p型CZTS系光吸収層上に形成したn型透明導電膜と、を備え、
前記p型CZTS系光吸収層と前記金属裏面電極層との界面にZnS系小粒子の分散層を有する、CZTS系薄膜太陽電池。 - 請求項1に記載のCZTS系薄膜太陽電池において、前記ZnS系小粒子の分散層は、前記金属裏面電極層表面を完全に被覆していない、CZTS系薄膜太陽電池。
- 請求項1又は2に記載のCZTS系薄膜太陽電池において、前記ZnS系小粒子は、10nm〜200nmφの大きさを有する、CZTS系薄膜太陽電池。
- 請求項1乃至3の何れか1項に記載のCZTS系薄膜太陽電池において、前記基板は、Naを含むアルカリガラスである、CZTS系薄膜太陽電池。
- 請求項4に記載のCZTS系薄膜太陽電池において、前記基板と前記金属裏面電極層間にアルカリバリア層をさらに備える、CZTS系薄膜太陽電池。
- 請求項1乃至5の何れか1項に記載のCZTS系薄膜太陽電池において、前記ZnS系小粒子はZnS,ZnSe,ZnSSeの何れかを含む、CZTS系薄膜太陽電池。
- 請求項1乃至6の何れか1項に記載のCZTS系薄膜太陽電池において、前記p型CZTS系光吸収層と前記n型透明導電膜間にn型高抵抗バッファ層をさらに備える、CZTS系薄膜太陽電池。
- 基板上に金属裏面電極層を形成し、
前記金属裏面電極層上にCu,Sn,Znを含む金属プリカーサー膜を形成し、
前記金属プリカーサー膜を硫化および/またはセレン化してp型CZTS系光吸収層を形成し、
前記p型CZTS系光吸収層上にn型透明導電膜を形成する、各ステップを備え、
前記金属プリカーサー膜は前記金属裏面電極層側の最下層をZnを含む層で形成し、前記硫化および/またはセレン化を雰囲気温度540℃〜600℃で、5分〜25分間に亘って行うことを特徴とする、CZTS系薄膜太陽電池の製造方法。 - 請求項8に記載の方法において、前記基板をNa含有アルカリガラスで形成することを特徴とする、CZTS系薄膜太陽電池の製造方法。
- 請求項9に記載の方法において、前記基板と前記金属裏面電極層との間にアルカリバリア層を形成するステップをさらに備える、CZTS系薄膜太陽電池の製造方法。
- 請求項8乃至10の何れか1項に記載の方法において、前記金属プリカーサー膜は、金属裏面電極層上にZnを含む混合物としてZnS層を堆積した後、Sn、Cuまたはこれらを含む混合物を堆積して形成することを特徴とする、CZTS系薄膜太陽電池の製造方法。
- 請求項8乃至11の何れか1項に記載の方法において、前記p型CZTS系光吸収層の形成後であって前記n型透明導電膜の形成前に、n型高抵抗バッファ層を形成するステップをさらに備える、CZTS系薄膜太陽電池の製造方法。
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JP2011257893A JP5178904B1 (ja) | 2011-11-25 | 2011-11-25 | Czts系薄膜太陽電池及びその製造方法 |
PCT/JP2012/080347 WO2013077417A1 (ja) | 2011-11-25 | 2012-11-22 | Czts系薄膜太陽電池及びその製造方法 |
EP12851803.2A EP2784828A4 (en) | 2011-11-25 | 2012-11-22 | CZTS THIN FILM SOLAR CELL AND METHOD OF MANUFACTURING THEREOF |
US14/360,270 US20150059845A1 (en) | 2011-11-25 | 2012-11-22 | Czts-based thin film solar cell and method of production of same |
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Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2017055059A (ja) * | 2015-09-11 | 2017-03-16 | 国立研究開発法人産業技術総合研究所 | 太陽電池の製造方法 |
KR20180005730A (ko) * | 2015-09-24 | 2018-01-16 | 재단법인대구경북과학기술원 | 황화아연 버퍼층을 적용한 czts계 박막 태양전지 제조방법 |
KR20220049380A (ko) * | 2020-10-14 | 2022-04-21 | 재단법인대구경북과학기술원 | 박막 태양전지 광흡수층의 제조 방법 |
KR20220138675A (ko) * | 2021-04-06 | 2022-10-13 | 재단법인대구경북과학기술원 | 박막 태양전지 광흡수층의 제조 방법 |
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CN105047753B (zh) * | 2015-06-24 | 2017-03-22 | 中国科学技术大学 | 制备铜锡硫或铜锡硫硒薄膜的方法 |
KR102420408B1 (ko) * | 2020-07-31 | 2022-07-13 | 전남대학교산학협력단 | 무기박막태양전지용 p형 화합물 반도체층 제조방법 및 상기 방법으로 제조된 p형 화합물 반도체층을 포함하는 무기박막태양전지 |
CN114171637B (zh) * | 2021-11-24 | 2024-03-26 | 湖北工业大学 | 一种具有修饰层的czts薄膜太阳能电池背电极的制备方法 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001274176A (ja) * | 2000-03-24 | 2001-10-05 | Central Glass Co Ltd | 化合物半導体膜の製造方法 |
JP2009537997A (ja) * | 2006-05-24 | 2009-10-29 | アトーテヒ ドイッチュラント ゲゼルシャフト ミット ベシュレンクテル ハフツング | 薄膜太陽電池を製造するのに適した銅−亜鉛−錫析出のための金属メッキ組成及び方法 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4808462A (en) * | 1987-05-22 | 1989-02-28 | Glasstech Solar, Inc. | Solar cell substrate |
US6689950B2 (en) * | 2001-04-27 | 2004-02-10 | The Boeing Company | Paint solar cell and its fabrication |
JP5309285B2 (ja) | 2007-11-30 | 2013-10-09 | 株式会社豊田中央研究所 | 光電素子及びその製造方法 |
US20100139753A1 (en) * | 2008-12-05 | 2010-06-10 | Applied Materials, Inc. | Semiconductor device and method of producing a semiconductor device |
JP5003698B2 (ja) * | 2009-02-18 | 2012-08-15 | Tdk株式会社 | 太陽電池、及び太陽電池の製造方法 |
US9105796B2 (en) * | 2009-11-25 | 2015-08-11 | E I Du Pont De Nemours And Company | CZTS/Se precursor inks and methods for preparing CZTS/Se thin films and CZTS/Se-based photovoltaic cells |
CN102290454A (zh) * | 2010-06-21 | 2011-12-21 | 杜邦太阳能有限公司 | 多电极光伏面板 |
US8426241B2 (en) * | 2010-09-09 | 2013-04-23 | International Business Machines Corporation | Structure and method of fabricating a CZTS photovoltaic device by electrodeposition |
US8771555B2 (en) * | 2011-05-06 | 2014-07-08 | Neo Solar Power Corp. | Ink composition |
US20130074911A1 (en) * | 2011-09-23 | 2013-03-28 | Yueh-Chun Liao | Photovoltaic Device Including a CZTS Absorber Layer and Method of Manufacturing the Same |
-
2011
- 2011-11-25 JP JP2011257893A patent/JP5178904B1/ja not_active Expired - Fee Related
-
2012
- 2012-11-22 WO PCT/JP2012/080347 patent/WO2013077417A1/ja active Application Filing
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Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001274176A (ja) * | 2000-03-24 | 2001-10-05 | Central Glass Co Ltd | 化合物半導体膜の製造方法 |
JP2009537997A (ja) * | 2006-05-24 | 2009-10-29 | アトーテヒ ドイッチュラント ゲゼルシャフト ミット ベシュレンクテル ハフツング | 薄膜太陽電池を製造するのに適した銅−亜鉛−錫析出のための金属メッキ組成及び方法 |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2017055059A (ja) * | 2015-09-11 | 2017-03-16 | 国立研究開発法人産業技術総合研究所 | 太陽電池の製造方法 |
KR20180005730A (ko) * | 2015-09-24 | 2018-01-16 | 재단법인대구경북과학기술원 | 황화아연 버퍼층을 적용한 czts계 박막 태양전지 제조방법 |
KR101893411B1 (ko) * | 2015-09-24 | 2018-08-30 | 재단법인대구경북과학기술원 | 황화아연 버퍼층을 적용한 czts계 박막 태양전지 제조방법 |
KR20220049380A (ko) * | 2020-10-14 | 2022-04-21 | 재단법인대구경북과학기술원 | 박막 태양전지 광흡수층의 제조 방법 |
KR102517540B1 (ko) * | 2020-10-14 | 2023-04-03 | 재단법인대구경북과학기술원 | 박막 태양전지 광흡수층의 제조 방법 |
KR20220138675A (ko) * | 2021-04-06 | 2022-10-13 | 재단법인대구경북과학기술원 | 박막 태양전지 광흡수층의 제조 방법 |
KR102573517B1 (ko) | 2021-04-06 | 2023-08-31 | 재단법인대구경북과학기술원 | 박막 태양전지 광흡수층의 제조 방법 |
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EP2784828A4 (en) | 2015-08-19 |
WO2013077417A1 (ja) | 2013-05-30 |
JP5178904B1 (ja) | 2013-04-10 |
US20150059845A1 (en) | 2015-03-05 |
EP2784828A1 (en) | 2014-10-01 |
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