JP2013110176A5 - - Google Patents
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- Publication number
- JP2013110176A5 JP2013110176A5 JP2011252177A JP2011252177A JP2013110176A5 JP 2013110176 A5 JP2013110176 A5 JP 2013110176A5 JP 2011252177 A JP2011252177 A JP 2011252177A JP 2011252177 A JP2011252177 A JP 2011252177A JP 2013110176 A5 JP2013110176 A5 JP 2013110176A5
- Authority
- JP
- Japan
- Prior art keywords
- film
- metal
- oxide
- forming
- metal element
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000002184 metal Substances 0.000 claims 24
- 239000004065 semiconductor Substances 0.000 claims 8
- 229910044991 metal oxide Inorganic materials 0.000 claims 5
- 150000004706 metal oxides Chemical class 0.000 claims 5
- 238000004519 manufacturing process Methods 0.000 claims 2
- 238000000034 method Methods 0.000 claims 2
- 238000005530 etching Methods 0.000 claims 1
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011252177A JP5912444B2 (ja) | 2011-11-18 | 2011-11-18 | 半導体装置の作製方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011252177A JP5912444B2 (ja) | 2011-11-18 | 2011-11-18 | 半導体装置の作製方法 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2015160928A Division JP6039150B2 (ja) | 2015-08-18 | 2015-08-18 | 半導体装置の作製方法及び半導体装置 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2013110176A JP2013110176A (ja) | 2013-06-06 |
JP2013110176A5 true JP2013110176A5 (enrdf_load_stackoverflow) | 2014-10-09 |
JP5912444B2 JP5912444B2 (ja) | 2016-04-27 |
Family
ID=48706672
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2011252177A Expired - Fee Related JP5912444B2 (ja) | 2011-11-18 | 2011-11-18 | 半導体装置の作製方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP5912444B2 (enrdf_load_stackoverflow) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2016001712A (ja) * | 2013-11-29 | 2016-01-07 | 株式会社半導体エネルギー研究所 | 半導体装置の作製方法 |
JP2018067672A (ja) * | 2016-10-21 | 2018-04-26 | 株式会社ブイ・テクノロジー | 酸化物半導体装置及びその製造方法 |
US11374117B2 (en) * | 2018-03-01 | 2022-06-28 | Semiconductor Energy Laboratory Co., Ltd. | Method for manufacturing semiconductor device |
JP7534083B2 (ja) * | 2019-11-26 | 2024-08-14 | 株式会社ジャパンディスプレイ | 薄膜トランジスタの製造方法 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0621088A (ja) * | 1992-06-29 | 1994-01-28 | Kawasaki Steel Corp | 半導体装置の製造方法 |
JPH08306698A (ja) * | 1995-05-10 | 1996-11-22 | Casio Comput Co Ltd | パターン形成方法 |
JPH11330486A (ja) * | 1998-05-16 | 1999-11-30 | Semiconductor Energy Lab Co Ltd | 半導体装置 |
JP2000150898A (ja) * | 1998-11-17 | 2000-05-30 | Matsushita Electric Ind Co Ltd | 薄膜トランジスターとその製造方法。 |
WO2003098699A1 (fr) * | 2002-05-22 | 2003-11-27 | Sharp Kabushiki Kaisha | Dispositif semiconducteur et afficheur comprenant ce dispositif |
JP2004022690A (ja) * | 2002-06-14 | 2004-01-22 | Seiko Epson Corp | 半導体装置及びその製造方法 |
JP5608347B2 (ja) * | 2008-08-08 | 2014-10-15 | 株式会社半導体エネルギー研究所 | 半導体装置及び半導体装置の作製方法 |
-
2011
- 2011-11-18 JP JP2011252177A patent/JP5912444B2/ja not_active Expired - Fee Related
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