JP2013105923A5 - - Google Patents

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JP2013105923A5
JP2013105923A5 JP2011249242A JP2011249242A JP2013105923A5 JP 2013105923 A5 JP2013105923 A5 JP 2013105923A5 JP 2011249242 A JP2011249242 A JP 2011249242A JP 2011249242 A JP2011249242 A JP 2011249242A JP 2013105923 A5 JP2013105923 A5 JP 2013105923A5
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JP5779482B2 (ja
JP2013105923A (ja
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Priority to TW100148893A priority patent/TWI485769B/zh
Priority to KR1020120006929A priority patent/KR101274527B1/ko
Priority to US13/356,676 priority patent/US8828184B2/en
Publication of JP2013105923A publication Critical patent/JP2013105923A/ja
Priority to US14/449,516 priority patent/US9824866B2/en
Publication of JP2013105923A5 publication Critical patent/JP2013105923A5/ja
Publication of JP5779482B2 publication Critical patent/JP5779482B2/ja
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JP2011249242A 2011-11-15 2011-11-15 プラズマ処理装置およびプラズマ処理方法 Active JP5779482B2 (ja)

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Application Number Priority Date Filing Date Title
JP2011249242A JP5779482B2 (ja) 2011-11-15 2011-11-15 プラズマ処理装置およびプラズマ処理方法
TW100148893A TWI485769B (zh) 2011-11-15 2011-12-27 Plasma processing device and plasma processing method
KR1020120006929A KR101274527B1 (ko) 2011-11-15 2012-01-20 플라즈마 처리 장치 및 플라즈마 처리 방법
US13/356,676 US8828184B2 (en) 2011-11-15 2012-01-24 Plasma processing apparatus and plasma processing method
US14/449,516 US9824866B2 (en) 2011-11-15 2014-08-01 Plasma processing method

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JP2011249242A JP5779482B2 (ja) 2011-11-15 2011-11-15 プラズマ処理装置およびプラズマ処理方法

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JP2013105923A JP2013105923A (ja) 2013-05-30
JP2013105923A5 true JP2013105923A5 (enExample) 2015-05-14
JP5779482B2 JP5779482B2 (ja) 2015-09-16

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JP (1) JP5779482B2 (enExample)
KR (1) KR101274527B1 (enExample)
TW (1) TWI485769B (enExample)

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