JP2013048235A5 - - Google Patents

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Publication number
JP2013048235A5
JP2013048235A5 JP2012179824A JP2012179824A JP2013048235A5 JP 2013048235 A5 JP2013048235 A5 JP 2013048235A5 JP 2012179824 A JP2012179824 A JP 2012179824A JP 2012179824 A JP2012179824 A JP 2012179824A JP 2013048235 A5 JP2013048235 A5 JP 2013048235A5
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JP
Japan
Prior art keywords
light
modulation
image
image data
scanline
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JP2012179824A
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English (en)
Japanese (ja)
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JP5898590B2 (ja
JP2013048235A (ja
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Priority claimed from US13/217,038 external-priority patent/US8390917B1/en
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Publication of JP2013048235A publication Critical patent/JP2013048235A/ja
Publication of JP2013048235A5 publication Critical patent/JP2013048235A5/ja
Application granted granted Critical
Publication of JP5898590B2 publication Critical patent/JP5898590B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2012179824A 2011-08-24 2012-08-14 空間光変調器およびアナモルフィック投影光学系を用いるマルチライン単一パス画像形成 Expired - Fee Related JP5898590B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US13/217,038 US8390917B1 (en) 2011-08-24 2011-08-24 Multiple line single-pass imaging using spatial light modulator and anamorphic projection optics
US13/217,038 2011-08-24

Publications (3)

Publication Number Publication Date
JP2013048235A JP2013048235A (ja) 2013-03-07
JP2013048235A5 true JP2013048235A5 (enExample) 2015-11-19
JP5898590B2 JP5898590B2 (ja) 2016-04-06

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012179824A Expired - Fee Related JP5898590B2 (ja) 2011-08-24 2012-08-14 空間光変調器およびアナモルフィック投影光学系を用いるマルチライン単一パス画像形成

Country Status (3)

Country Link
US (1) US8390917B1 (enExample)
EP (1) EP2561997B1 (enExample)
JP (1) JP5898590B2 (enExample)

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US8767270B2 (en) * 2011-08-24 2014-07-01 Palo Alto Research Center Incorporated Single-pass imaging apparatus with image data scrolling for improved resolution contrast and exposure extent
WO2015058978A1 (en) * 2013-10-25 2015-04-30 Asml Netherlands B.V. Lithography apparatus, patterning device, and lithographic method
EP2876498B1 (en) 2013-11-22 2017-05-24 Carl Zeiss SMT GmbH Illumination system of a microlithographic projection exposure apparatus
JP6546868B2 (ja) * 2015-04-08 2019-07-17 パロ アルト リサーチ センター インコーポレイテッド Ｖｃｓｅｌベースの可変画像光線発生装置
US10527946B2 (en) 2015-12-30 2020-01-07 Asml Netherlands B.V. Method and apparatus for direct write maskless lithography
WO2017114653A1 (en) 2015-12-30 2017-07-06 Asml Netherlands B.V. Method and apparatus for direct write maskless lithography
WO2017114658A1 (en) 2015-12-30 2017-07-06 Asml Netherlands B.V. Method and apparatus for direct write maskless lithography
US10838217B2 (en) * 2016-06-07 2020-11-17 Inuitive Ltd. Laser diode collimator and a pattern projecting device using same
US10852528B2 (en) * 2016-12-20 2020-12-01 Ev Group E. Thallner Gmbh Method and device for exposure of photosensitive layer
US11453165B2 (en) * 2019-02-05 2022-09-27 Silicon Light Machines Corporation Stacked PLV driver architecture for a microelectromechanical system spatial light modulator
KR102666060B1 (ko) * 2019-05-17 2024-05-16 삼성디스플레이 주식회사 수평 크로스토크를 보상하는 표시 장치

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US8472104B2 (en) * 2011-08-24 2013-06-25 Palo Alto Research Center Incorporated Single-pass imaging system using spatial light modulator anamorphic projection optics
US9030515B2 (en) * 2011-08-24 2015-05-12 Palo Alto Research Center Incorporated Single-pass imaging method using spatial light modulator and anamorphic projection optics
US8405913B2 (en) * 2011-08-24 2013-03-26 Palo Alto Research Center Incorporated Anamorphic projection optical system
US8872875B2 (en) * 2011-08-24 2014-10-28 Palo Alto Research Center Incorporated Single-pass imaging system with anamorphic optical system
US8520045B2 (en) * 2011-08-24 2013-08-27 Palo Alto Research Center Incorporated Single-pass imaging system with spatial light modulator and catadioptric anamorphic optical system
US8767270B2 (en) * 2011-08-24 2014-07-01 Palo Alto Research Center Incorporated Single-pass imaging apparatus with image data scrolling for improved resolution contrast and exposure extent

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