JP5898590B2 - 空間光変調器およびアナモルフィック投影光学系を用いるマルチライン単一パス画像形成 - Google Patents

空間光変調器およびアナモルフィック投影光学系を用いるマルチライン単一パス画像形成 Download PDF

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Publication number
JP5898590B2
JP5898590B2 JP2012179824A JP2012179824A JP5898590B2 JP 5898590 B2 JP5898590 B2 JP 5898590B2 JP 2012179824 A JP2012179824 A JP 2012179824A JP 2012179824 A JP2012179824 A JP 2012179824A JP 5898590 B2 JP5898590 B2 JP 5898590B2
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Prior art keywords
light
image
modulation
scanline
image forming
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JP2012179824A
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English (en)
Japanese (ja)
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JP2013048235A (ja
JP2013048235A5 (enExample
Inventor
パトリック・ワイ・マエダ
ティモシー・ディー・ストウ
フィリップ・エイチ・シュメルチェル
エリック・ピーターズ
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Palo Alto Research Center Inc
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Palo Alto Research Center Inc
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/435—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material
    • B41J2/465—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material using masks, e.g. light-switching masks

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Fax Reproducing Arrangements (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
  • Liquid Crystal (AREA)
JP2012179824A 2011-08-24 2012-08-14 空間光変調器およびアナモルフィック投影光学系を用いるマルチライン単一パス画像形成 Expired - Fee Related JP5898590B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US13/217,038 US8390917B1 (en) 2011-08-24 2011-08-24 Multiple line single-pass imaging using spatial light modulator and anamorphic projection optics
US13/217,038 2011-08-24

Publications (3)

Publication Number Publication Date
JP2013048235A JP2013048235A (ja) 2013-03-07
JP2013048235A5 JP2013048235A5 (enExample) 2015-11-19
JP5898590B2 true JP5898590B2 (ja) 2016-04-06

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JP2012179824A Expired - Fee Related JP5898590B2 (ja) 2011-08-24 2012-08-14 空間光変調器およびアナモルフィック投影光学系を用いるマルチライン単一パス画像形成

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US (1) US8390917B1 (enExample)
EP (1) EP2561997B1 (enExample)
JP (1) JP5898590B2 (enExample)

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* Cited by examiner, † Cited by third party
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US8767270B2 (en) * 2011-08-24 2014-07-01 Palo Alto Research Center Incorporated Single-pass imaging apparatus with image data scrolling for improved resolution contrast and exposure extent
KR20160075712A (ko) * 2013-10-25 2016-06-29 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치, 패터닝 디바이스, 및 리소그래피 방법
EP2876499B1 (en) * 2013-11-22 2017-05-24 Carl Zeiss SMT GmbH Illumination system of a microlithographic projection exposure apparatus
JP6546868B2 (ja) * 2015-04-08 2019-07-17 パロ アルト リサーチ センター インコーポレイテッド Ｖｃｓｅｌベースの可変画像光線発生装置
WO2017114658A1 (en) 2015-12-30 2017-07-06 Asml Netherlands B.V. Method and apparatus for direct write maskless lithography
KR102135316B1 (ko) 2015-12-30 2020-09-17 에이에스엠엘 네델란즈 비.브이. 직접 기입 마스크리스 리소그래피를 위한 방법 및 장치
CN108700821B (zh) 2015-12-30 2021-08-03 Asml荷兰有限公司 用于直接写入的无掩模光刻术的方法和设备
US10838217B2 (en) * 2016-06-07 2020-11-17 Inuitive Ltd. Laser diode collimator and a pattern projecting device using same
EP3734349A1 (de) * 2016-12-20 2020-11-04 EV Group E. Thallner GmbH Vorrichtung und verfahren zur belichtung einer lichtempfindlichen schicht
US11453165B2 (en) * 2019-02-05 2022-09-27 Silicon Light Machines Corporation Stacked PLV driver architecture for a microelectromechanical system spatial light modulator
KR102666060B1 (ko) * 2019-05-17 2024-05-16 삼성디스플레이 주식회사 수평 크로스토크를 보상하는 표시 장치

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US5754217A (en) 1995-04-19 1998-05-19 Texas Instruments Incorporated Printing system and method using a staggered array spatial light modulator having masked mirror elements
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JP4223936B2 (ja) 2003-02-06 2009-02-12 株式会社リコー 投射光学系、拡大投射光学系、拡大投射装置及び画像投射装置
US8282221B2 (en) 2003-11-01 2012-10-09 Silicon Quest Kabushiki Kaisha Projection apparatus using variable light source
US7061581B1 (en) 2004-11-22 2006-06-13 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
KR100814644B1 (ko) * 2006-07-31 2008-03-18 주식회사 나노브릭 이미지 프로젝션 시스템 및 방법
CN1916768A (zh) 2006-09-08 2007-02-21 中国科学院光电技术研究所 个性化隐形眼镜定制设备
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US8520045B2 (en) * 2011-08-24 2013-08-27 Palo Alto Research Center Incorporated Single-pass imaging system with spatial light modulator and catadioptric anamorphic optical system
US9030515B2 (en) * 2011-08-24 2015-05-12 Palo Alto Research Center Incorporated Single-pass imaging method using spatial light modulator and anamorphic projection optics
US8472104B2 (en) * 2011-08-24 2013-06-25 Palo Alto Research Center Incorporated Single-pass imaging system using spatial light modulator anamorphic projection optics
US8872875B2 (en) * 2011-08-24 2014-10-28 Palo Alto Research Center Incorporated Single-pass imaging system with anamorphic optical system
US8767270B2 (en) * 2011-08-24 2014-07-01 Palo Alto Research Center Incorporated Single-pass imaging apparatus with image data scrolling for improved resolution contrast and exposure extent

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Publication number Publication date
US20130050800A1 (en) 2013-02-28
US8390917B1 (en) 2013-03-05
JP2013048235A (ja) 2013-03-07
EP2561997A3 (en) 2014-01-22
EP2561997B1 (en) 2015-02-25
EP2561997A2 (en) 2013-02-27

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