JP2013032354A5 - - Google Patents
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- Publication number
- JP2013032354A5 JP2013032354A5 JP2012156138A JP2012156138A JP2013032354A5 JP 2013032354 A5 JP2013032354 A5 JP 2013032354A5 JP 2012156138 A JP2012156138 A JP 2012156138A JP 2012156138 A JP2012156138 A JP 2012156138A JP 2013032354 A5 JP2013032354 A5 JP 2013032354A5
- Authority
- JP
- Japan
- Prior art keywords
- organometallic compound
- stripping column
- inlet
- alkyl
- crude
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 150000002902 organometallic compounds Chemical class 0.000 claims description 22
- 239000012530 fluid Substances 0.000 claims description 6
- 239000007791 liquid phase Substances 0.000 claims description 5
- 238000000034 method Methods 0.000 claims 11
- 239000007789 gas Substances 0.000 claims 3
- 239000011261 inert gas Substances 0.000 claims 3
- 229910052751 metal Inorganic materials 0.000 claims 3
- 239000002184 metal Substances 0.000 claims 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 claims 2
- 125000003282 alkyl amino group Chemical group 0.000 claims 2
- 238000009835 boiling Methods 0.000 claims 2
- 238000007710 freezing Methods 0.000 claims 2
- 230000008014 freezing Effects 0.000 claims 2
- 229910052732 germanium Inorganic materials 0.000 claims 2
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims 2
- 229910052736 halogen Inorganic materials 0.000 claims 2
- 150000002367 halogens Chemical class 0.000 claims 2
- 239000003446 ligand Substances 0.000 claims 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 claims 2
- 125000000027 (C1-C10) alkoxy group Chemical group 0.000 claims 1
- 125000003837 (C1-C20) alkyl group Chemical group 0.000 claims 1
- 125000004169 (C1-C6) alkyl group Chemical group 0.000 claims 1
- 125000006649 (C2-C20) alkynyl group Chemical group 0.000 claims 1
- 125000000882 C2-C6 alkenyl group Chemical group 0.000 claims 1
- 125000000172 C5-C10 aryl group Chemical group 0.000 claims 1
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 claims 1
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 claims 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims 1
- 125000003342 alkenyl group Chemical group 0.000 claims 1
- 125000003545 alkoxy group Chemical group 0.000 claims 1
- 229910052782 aluminium Inorganic materials 0.000 claims 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims 1
- 229910052786 argon Inorganic materials 0.000 claims 1
- 125000003118 aryl group Chemical group 0.000 claims 1
- 125000004093 cyano group Chemical group *C#N 0.000 claims 1
- 229910052733 gallium Inorganic materials 0.000 claims 1
- 229910052735 hafnium Inorganic materials 0.000 claims 1
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 claims 1
- 239000001307 helium Substances 0.000 claims 1
- 229910052734 helium Inorganic materials 0.000 claims 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 claims 1
- 239000012535 impurity Substances 0.000 claims 1
- 229910052738 indium Inorganic materials 0.000 claims 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims 1
- 229910052749 magnesium Inorganic materials 0.000 claims 1
- 239000011777 magnesium Substances 0.000 claims 1
- 150000002736 metal compounds Chemical class 0.000 claims 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Substances N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims 1
- 229910052757 nitrogen Inorganic materials 0.000 claims 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 claims 1
- 239000003960 organic solvent Substances 0.000 claims 1
- FVZVCSNXTFCBQU-UHFFFAOYSA-N phosphanyl Chemical group [PH2] FVZVCSNXTFCBQU-UHFFFAOYSA-N 0.000 claims 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 claims 1
- 239000001294 propane Substances 0.000 claims 1
- 229910052710 silicon Inorganic materials 0.000 claims 1
- 239000010703 silicon Substances 0.000 claims 1
- 229910052718 tin Inorganic materials 0.000 claims 1
- 229910052726 zirconium Inorganic materials 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201161507334P | 2011-07-13 | 2011-07-13 | |
| US61/507,334 | 2011-07-13 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2013032354A JP2013032354A (ja) | 2013-02-14 |
| JP2013032354A5 true JP2013032354A5 (cg-RX-API-DMAC10.html) | 2016-04-28 |
| JP6054659B2 JP6054659B2 (ja) | 2016-12-27 |
Family
ID=46466361
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012156138A Expired - Fee Related JP6054659B2 (ja) | 2011-07-13 | 2012-07-12 | 有機金属化合物精製および装置 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US8901335B2 (cg-RX-API-DMAC10.html) |
| EP (1) | EP2545973B1 (cg-RX-API-DMAC10.html) |
| JP (1) | JP6054659B2 (cg-RX-API-DMAC10.html) |
| KR (1) | KR101912111B1 (cg-RX-API-DMAC10.html) |
| CN (1) | CN102875582B (cg-RX-API-DMAC10.html) |
| TW (1) | TWI486354B (cg-RX-API-DMAC10.html) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6108704B2 (ja) * | 2011-07-13 | 2017-04-05 | ダウ グローバル テクノロジーズ エルエルシー | 有機金属化合物精製 |
| EP2559682B1 (en) | 2011-08-15 | 2016-08-03 | Rohm and Haas Electronic Materials LLC | Organometallic compound preparation |
| EP2559681B1 (en) | 2011-08-15 | 2016-06-22 | Dow Global Technologies LLC | Organometallic compound preparation |
| JP6243215B2 (ja) * | 2013-12-18 | 2017-12-06 | 大陽日酸株式会社 | トリイソシアナトシランの精製方法及び供給方法 |
| WO2018207764A1 (ja) * | 2017-05-12 | 2018-11-15 | 出光興産株式会社 | 有機材料の精製装置 |
| CN108976250A (zh) * | 2018-09-03 | 2018-12-11 | 上海芯渊光电科技有限公司 | 一种三甲基铟的制备方法 |
| CN113563198B (zh) * | 2021-09-24 | 2021-12-14 | 苏州源展材料科技有限公司 | 四（二甲氨基）锆的合成方法 |
| KR20250019125A (ko) | 2022-06-02 | 2025-02-07 | 젤리스트 인코퍼레이티드 | 고순도 알킬 주석 화합물 및 이의 제조 방법 |
| TW202413383A (zh) | 2022-08-12 | 2024-04-01 | 美商蓋列斯特股份有限公司 | 含不飽和取代基之高純度錫化合物及其製造方法 |
| US12606577B2 (en) | 2022-09-28 | 2026-04-21 | Gelest, Inc. | Iodoalkyl tin compounds and preparation methods thereof |
| CN119998302A (zh) | 2022-10-04 | 2025-05-13 | 盖列斯特有限公司 | 环状氮杂锡烷和环状氧杂锡烷化合物及其制备方法 |
| WO2025115332A1 (ja) | 2023-12-01 | 2025-06-05 | 三菱ケミカル株式会社 | スズ化合物およびそれを用いたレジスト溶液、パターン形成方法、薄膜、パターン化された薄膜、並びにスズ化合物の製造方法 |
Family Cites Families (27)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1167837B (de) | 1957-04-03 | 1964-04-16 | Sumitomo Chemical Co | Verfahren zur Herstellung von Aluminiumtriaethyl |
| US3135802A (en) * | 1958-02-20 | 1964-06-02 | Callery Chemical Co | Preparation of boron containing fuels |
| US4251453A (en) | 1979-08-22 | 1981-02-17 | Conoco, Inc. | Production of aluminum alkyls |
| US4925962A (en) | 1988-10-24 | 1990-05-15 | Ethyl Corporation | Trimethylaluminum process |
| JPH03215195A (ja) | 1990-01-17 | 1991-09-20 | Japan Servo Co Ltd | 記録装置 |
| US4948906A (en) | 1990-02-16 | 1990-08-14 | Ethyl Corporation | Trimethylaluminum process |
| JP3215195B2 (ja) | 1992-11-09 | 2001-10-02 | 東ソー・ファインケム株式会社 | 有機金属化合物の精製法 |
| WO1997040053A1 (en) * | 1996-04-19 | 1997-10-30 | Albemarle Corporation | Process for making aluminoxanes |
| JP3525371B2 (ja) | 1996-06-25 | 2004-05-10 | 信越化学工業株式会社 | 有機金属化合物の精製方法 |
| US5696287A (en) * | 1996-07-22 | 1997-12-09 | Ducoa, L. P. | Process for making aqueous betaine solutions |
| US5756786A (en) | 1997-06-25 | 1998-05-26 | Morton International, Inc. | High purity trimethylindium, method of synthesis |
| GB2344822A (en) | 1998-12-19 | 2000-06-21 | Epichem Ltd | Organometallic compound production using distillation |
| GB0017968D0 (en) | 2000-07-22 | 2000-09-13 | Epichem Ltd | An improved process and apparatus for the isolation of pure,or substantially pure,organometallic compounds |
| EP1335415B1 (en) | 2002-01-17 | 2005-08-03 | Shipley Co. L.L.C. | Organoindium compounds for use in chemical vapour deposition processes |
| US6770769B2 (en) | 2002-04-06 | 2004-08-03 | Shipley Company, L.L.C. | Trialkylindium preparation |
| JP2006001896A (ja) | 2004-06-18 | 2006-01-05 | Shin Etsu Chem Co Ltd | 高純度トリメチルアルミニウム及びトリメチルアルミニウムの精製方法 |
| JP4488186B2 (ja) | 2004-06-18 | 2010-06-23 | 信越化学工業株式会社 | トリメチルアルミニウムの精製方法 |
| TW200619222A (en) | 2004-09-02 | 2006-06-16 | Rohm & Haas Elect Mat | Method for making organometallic compounds |
| US7816550B2 (en) | 2005-02-10 | 2010-10-19 | Praxair Technology, Inc. | Processes for the production of organometallic compounds |
| CN1872861A (zh) | 2005-06-03 | 2006-12-06 | 大连保税区科利德化工科技开发有限公司 | 三甲基镓生产方法及设备 |
| CN1872862A (zh) | 2005-06-03 | 2006-12-06 | 大连保税区科利德化工科技开发有限公司 | 三甲基镓制备和提纯方法 |
| JP4784729B2 (ja) * | 2005-06-09 | 2011-10-05 | 信越化学工業株式会社 | トリメチルガリウムの製造方法 |
| US7638645B2 (en) | 2006-06-28 | 2009-12-29 | President And Fellows Of Harvard University | Metal (IV) tetra-amidinate compounds and their use in vapor deposition |
| US7659414B2 (en) | 2007-07-20 | 2010-02-09 | Rohm And Haas Company | Method of preparing organometallic compounds |
| JP6108704B2 (ja) * | 2011-07-13 | 2017-04-05 | ダウ グローバル テクノロジーズ エルエルシー | 有機金属化合物精製 |
| EP2559681B1 (en) | 2011-08-15 | 2016-06-22 | Dow Global Technologies LLC | Organometallic compound preparation |
| EP2559682B1 (en) | 2011-08-15 | 2016-08-03 | Rohm and Haas Electronic Materials LLC | Organometallic compound preparation |
-
2012
- 2012-07-12 EP EP12176093.8A patent/EP2545973B1/en active Active
- 2012-07-12 JP JP2012156138A patent/JP6054659B2/ja not_active Expired - Fee Related
- 2012-07-13 TW TW101125266A patent/TWI486354B/zh not_active IP Right Cessation
- 2012-07-13 CN CN201210336140.7A patent/CN102875582B/zh not_active Expired - Fee Related
- 2012-07-13 US US13/549,401 patent/US8901335B2/en not_active Expired - Fee Related
- 2012-07-13 KR KR1020120076612A patent/KR101912111B1/ko not_active Expired - Fee Related
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