JP2012533746A5 - - Google Patents

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Publication number
JP2012533746A5
JP2012533746A5 JP2012521094A JP2012521094A JP2012533746A5 JP 2012533746 A5 JP2012533746 A5 JP 2012533746A5 JP 2012521094 A JP2012521094 A JP 2012521094A JP 2012521094 A JP2012521094 A JP 2012521094A JP 2012533746 A5 JP2012533746 A5 JP 2012533746A5
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JP
Japan
Prior art keywords
interferogram
dimensional
narrowband
light
broadband
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JP2012521094A
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English (en)
Japanese (ja)
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JP5748753B2 (ja
JP2012533746A (ja
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Priority claimed from GB0912799.4A external-priority patent/GB2472059B/en
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Publication of JP2012533746A5 publication Critical patent/JP2012533746A5/ja
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JP2012521094A 2009-07-23 2010-07-20 干渉法により二次元光路分布の絶対測定を行う装置 Expired - Fee Related JP5748753B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
GB0912799.4A GB2472059B (en) 2009-07-23 2009-07-23 Apparatus for the absolute measurement of two dimensional optical path distributions using interferometry
GB0912799.4 2009-07-23
PCT/GB2010/001379 WO2011010092A1 (en) 2009-07-23 2010-07-20 Apparatus for the absolute measurement of two dimensional optical path distributions using interferometry

Publications (3)

Publication Number Publication Date
JP2012533746A JP2012533746A (ja) 2012-12-27
JP2012533746A5 true JP2012533746A5 (https=) 2013-08-15
JP5748753B2 JP5748753B2 (ja) 2015-07-15

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JP2012521094A Expired - Fee Related JP5748753B2 (ja) 2009-07-23 2010-07-20 干渉法により二次元光路分布の絶対測定を行う装置

Country Status (6)

Country Link
US (1) US8908186B2 (https=)
EP (1) EP2459958B1 (https=)
JP (1) JP5748753B2 (https=)
CN (1) CN102656420B (https=)
GB (1) GB2472059B (https=)
WO (1) WO2011010092A1 (https=)

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DE102010041556A1 (de) * 2010-09-28 2012-03-29 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage für die Mikrolithographie und Verfahren zur mikrolithographischen Abbildung
DE102011078089A1 (de) * 2011-06-27 2012-12-27 Robert Bosch Gmbh Verfahren und Anordnung zur Abstandsmessung bei einer Laserbearbeitungsanlage
JP5954979B2 (ja) * 2011-12-15 2016-07-20 キヤノン株式会社 多波長干渉計を有する計測装置
WO2013098942A1 (ja) * 2011-12-27 2013-07-04 キヤノン株式会社 情報信号生成方法
EP2662661A1 (de) * 2012-05-07 2013-11-13 Leica Geosystems AG Messgerät mit einem Interferometer und einem ein dichtes Linienspektrum definierenden Absorptionsmedium
US9155465B2 (en) 2013-04-30 2015-10-13 IDx, LLC Snapshot spectral domain optical coherence tomographer
WO2014201504A1 (en) * 2013-06-20 2014-12-24 Cylite Pty Ltd Wavefront analyser
DE102013113773B4 (de) * 2013-12-10 2016-09-29 RUHR-UNIVERSITäT BOCHUM Methode zur mikroskopischen Vermessung von Proben mittels Kurzkohärenter Interferometrie
RU2557681C1 (ru) * 2014-03-04 2015-07-27 Вячеслав Васильевич Орлов Двусторонний интерферометр для измерения концевых мер длины
FR3022346B1 (fr) * 2014-06-16 2022-10-07 Commissariat Energie Atomique Dispositif et procede de caracterisation d'un faisceau de lumiere
CN109387155B (zh) * 2017-08-10 2020-09-22 上海微电子装备(集团)股份有限公司 形貌检测装置与形貌检测方法
WO2019059632A1 (ko) * 2017-09-25 2019-03-28 한국과학기술원 프리즘을 이용한 초분광 영상 재구성 방법 및 시스템
CN108459417B (zh) * 2018-02-05 2020-06-26 华侨大学 一种单目窄带多光谱立体视觉系统及其使用方法
CN108507596B (zh) * 2018-03-05 2020-06-30 中国科学院上海光学精密机械研究所 二维gold矩阵绝对位置编码方法及其解码方法
WO2019211910A1 (ja) * 2018-05-02 2019-11-07 オリンパス株式会社 データ取得装置
CN109343068A (zh) * 2018-12-13 2019-02-15 中国电子科技集团公司第三十四研究所 一种空间长度的测量装置及测量方法
US12399461B1 (en) * 2021-12-08 2025-08-26 Wavefront Analysis Systems Llc Totagraphy: coherent diffractive/digital information reconstruction by iterative phase recovery using reference wave
CN115040066B (zh) * 2022-08-12 2022-11-08 北京心联光电科技有限公司 一种多功能眼底扫描方法及系统
CN115980744B (zh) * 2022-11-10 2024-03-22 国家卫星海洋应用中心 一种星载sar影像数据无叠掩多峰海浪图像谱分离的方法
WO2025115430A1 (ja) * 2023-11-29 2025-06-05 タカノ株式会社 段差測定装置、画像処理装置、段差測定方法及びプログラム
CN118565381B (zh) * 2024-07-31 2024-10-11 宁波舜宇光电信息有限公司 反射镜面型测量系统、反射镜面型测量方法和电子设备

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