JP2012533746A - 干渉法により二次元光路分布の絶対測定を行う装置 - Google Patents
干渉法により二次元光路分布の絶対測定を行う装置 Download PDFInfo
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Abstract
【選択図】図1A
Description
I(x,y,k)=I0(x,y)+I1(x,y)cos[kz(x,y)+φ0] (1)
ただし、xおよびyは2つの撮像面座標であり、zは、物体と基準波との間の光路差であり、φ0は、波と波の間の位相シフトであり、kは、波数2π/λであり(λはビームの波長)、I0およびI1は、それぞれ、直流(I0)および変調(I1)の強度である。レーザのような狭帯域光源を使用する場合、式(1)は、平滑波面またはスペックル波面を有する多様なクラスの2ビーム干渉計(たとえば、マイケルソン干渉計、マッハツェンダー干渉計など)に当てはまる。
z(x,y)=φu(x,y)/k (2)
そしてφuは、次式のようにφwに関連付けられる。
φu(x,y)=φw(x,y)+2πν(x,y) (3)
ただし、ν(x,y)は、整数の場変数である。
λs=λ1λ2/|λ1−λ2| (4)
このアプローチであれば、曖昧でない光路差を一桁分改善できるが、これは、可視波長では依然として、曖昧でない光路範囲が10μm以下であることに相当する。|λ1−λ2|を減らすことによってλsを増やすと、アンラッピング誤差のリスクが増えるため、より多くの強度測定を行わないと十分な信号対雑音比が得られなくなる。十分なデータ点を取得するのに時間がかかることは、そのような全場2波長システムが環境外乱に敏感であることを意味する。
複数の波長を有する光を物体に照射する光源と、
物体の少なくとも一部分の画像を形成する干渉計であって、その画像は広帯域干渉図形を含む、干渉計と、
干渉計と光通信を行い、広帯域干渉図形を複数の狭帯域二次元干渉図形にスペクトル的に分離するハイパースペクトル撮像装置と、
狭帯域干渉図形を空間的に位置合わせする位置合わせ装置と、
各狭帯域干渉図形内の対応する画素から一次元強度信号を抽出する抽出装置と、
物体上の各点における周波数を、その点に関連付けられた一次元強度信号から計算する計算装置と、を含む。
0≦z≦zm (6)
δz=γΔz (8)
ただし、定数γは、たとえば、矩形窓の場合は値2をとり、ハミング窓の場合は値4をとる。
z=2[h0−h(x,y)] (9)
ただし、h0は、サンプルの基準面からゼロ光路差の面までの既知の距離であり、h(x,y)は、基準面に対して測定されるサンプルの局所高さである。したがって、本発明の実施形態を用いて絶対光路(z)分布を測定すれば、式(9)から絶対高さ分布が得られる。
複数の波長を有する光を物体に照射することを、この光を干渉計に透過させて物体の広帯域干渉図形を生成することによって行うステップと、
広帯域干渉図形をスペクトル的に分離して複数の二次元狭帯域干渉図形を形成するステップと、
これらの二次元干渉図形を空間的に位置合わせするステップと、
各狭帯域干渉図形内の対応する画素から一次元強度信号を抽出するステップと、
物体上の各点における周波数を、その点に関連付けられた一次元信号から計算するステップと、を含む。
1.第1のスペクトル帯域の平均自由信号の離散フーリエ変換(図11(b)の丸印)のモジュラスの最大値として、zの第1の推定値(z=z1)を取得する。
2.第1のスペクトル帯域の平均自由信号の連続フーリエ変換(図11(b)の連続線)の(z=z2における)ピークの反復探索のための、zの初期推定値として、z=z1を用いる。
3.両スペクトル帯域の平均自由信号の連続フーリエ変換(図11(c)の連続線)の(z=z3における)ピークの反復探索のための、zの初期推定値として、z=z2を用いる。
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Claims (19)
- 二次元光路分布の絶対測定を行う装置であって、
複数の波長を有する光を物体に照射する光源と、
前記物体の少なくとも一部分の画像を形成する干渉計であって、前記少なくとも一部分の画像が広帯域干渉図形を含む、前記干渉計と、
前記干渉計と光通信を行い、前記広帯域干渉図形を複数の狭帯域二次元干渉図形にスペクトル的に分離するハイパースペクトル撮像装置と、
前記狭帯域干渉図形を空間的に位置合わせする位置合わせ装置と、
各狭帯域干渉図形内の対応する画素から一次元強度信号を抽出する抽出装置と、
前記物体上の各点における周波数を、前記各点に関連付けられた一次元強度信号から計算する計算装置と、
を備える装置。 - 前記光源が、周波数変調器に作用的に接続された狭帯域光源を備える、請求項1に記載の装置。
- 前記光源が、光周波数コム光源を含む、請求項1に記載の装置。
- 前記ハイパースペクトル撮像装置が、エタロンをさらに備える、請求項1または請求項2に記載の装置。
- 前記ハイパースペクトル撮像装置が、前記干渉計より下流に配置された分散素子を備える、請求項1から4のいずれか一項に記載の装置。
- 前記ハイパースペクトル撮像装置が、前記干渉計より下流に配置された反射ボリューム・ホログラムを備え、前記反射ボリューム・ホログラムには複数のブラッグ格子が書き込まれている、請求項1から4のいずれか一項に記載の装置。
- 前記ハイパースペクトル撮像装置に動作可能に接続されたデータ処理装置をさらに備える、請求項1から6のいずれか一項に記載の装置。
- 前記ハイパースペクトル撮像装置が、光検出器アレイを備える、請求項1から7のいずれか一項に記載の装置。
- 前記物体に照射するための複数の光源を備える、請求項1から8のいずれか一項に記載の装置。
- 前記複数の広帯域光源から発生する複数の光帯が、互いにスペクトル的に離れている、請求項9に記載の装置。
- 二次元光路分布の絶対測定を行う方法であって、
複数の波長を有する光を物体に照射することを、前記光を干渉計に透過させて前記物体の広帯域干渉図形を生成することによって行うステップと、
前記広帯域干渉図形をスペクトル的に分離して複数の二次元狭帯域干渉図形を形成するステップと、
前記二次元干渉図形を空間的に位置合わせするステップと、
各狭帯域干渉図形内の対応する画素から一次元強度信号を抽出するステップと、
前記物体上の各点における周波数を、前記各点に関連付けられた一次元信号から計算するステップと、
を含む方法。 - 広帯域光を物体に照射する前記ステップが、合成、または見かけ、の広帯域光源を生成するために、狭帯域光を高周波で変調するステップを含む、請求項11に記載の方法。
- 前記二次元干渉図形を空間的に位置合わせする前記ステップが、すべての前記狭帯域干渉図形内での、前記サンプル面上の共通箇所の画素位置を識別するステップを含む、請求項11または請求項12に記載の方法。
- 前記二次元干渉図形を空間的に位置合わせする前記ステップが、前記二次元狭帯域干渉図形の三次元強度分布を形成するステップを含む、請求項11から13のいずれか一項に記載の方法。
- 前記二次元狭帯域干渉図形の三次元強度分布を形成する前記ステップが、個々の狭帯域干渉図形をそれぞれのx座標およびy座標に対して位置合わせし、前記位置合わせされた干渉図形をk軸方向にスタックしてサンプルのハイパースペクトル画像ボリュームを形成するステップを含み、前記k軸は、各干渉図形の波数を表す、請求項14に記載の方法。
- 各干渉図形内の対応する画素から一次元強度信号を抽出する前記ステップが、前記空間的に位置合わせされた干渉図形から前記k軸方向の周波数を、一次元フーリエ変換によって測定するステップを含む、請求項11から15のいずれか一項に記載の方法。
- 広帯域光を物体に照射する前記ステップが、複数の光源からの広帯域光を前記物体に照射して複数の帯域の広帯域光を生成するステップを含み、各帯域は、他のどの帯域ともスペクトル的に離れている、請求項13から15のいずれか一項に記載の方法。
- 実質的には、添付図面に関してここまで説明されたとおりの装置。
- 実質的には、添付図面に関してここまで説明されたとおりの方法。
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