JP2012532353A - ビーム用のフィルタ材料を製造するための複合物、フィルタ材料用の複合物を製造するための方法、ビームをフィルタリングするための材料、および当該材料を含むオプトエレクトロニクス構成素子 - Google Patents

ビーム用のフィルタ材料を製造するための複合物、フィルタ材料用の複合物を製造するための方法、ビームをフィルタリングするための材料、および当該材料を含むオプトエレクトロニクス構成素子 Download PDF

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JP2012532353A
JP2012532353A JP2012518898A JP2012518898A JP2012532353A JP 2012532353 A JP2012532353 A JP 2012532353A JP 2012518898 A JP2012518898 A JP 2012518898A JP 2012518898 A JP2012518898 A JP 2012518898A JP 2012532353 A JP2012532353 A JP 2012532353A
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Prior art keywords
composite
solvent
silicone
colorant
red
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Japanese (ja)
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JP2012532353A5 (enExample
Inventor
ヘーン クラウス
シューマン ミヒャエル
ゾッセンハイマー ディアク
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Ams Osram International GmbH
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Osram Opto Semiconductors GmbH
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Publication of JP2012532353A publication Critical patent/JP2012532353A/ja
Publication of JP2012532353A5 publication Critical patent/JP2012532353A5/ja
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/208—Filters for use with infrared or ultraviolet radiation, e.g. for separating visible light from infrared and/or ultraviolet radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K13/00—Use of mixtures of ingredients not covered by one single of the preceding main groups, each of these compounds being essential
    • C08K13/02—Organic and inorganic ingredients
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04—Polysiloxanes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/204—Filters in which spectral selection is performed by means of a conductive grid or array, e.g. frequency selective surfaces
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/207—Filters comprising semiconducting materials
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F30/00—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors
    • H10F30/20—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors
    • H10F30/21—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to infrared, visible or ultraviolet radiation
    • H10F30/22—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to infrared, visible or ultraviolet radiation the devices having only one potential barrier, e.g. photodiodes
    • H10F30/221—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to infrared, visible or ultraviolet radiation the devices having only one potential barrier, e.g. photodiodes the potential barrier being a PN homojunction
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00—Constructional details of devices covered by this subclass
    • H10F77/30—Coatings
    • H10F77/306—Coatings for devices having potential barriers
    • H10F77/331—Coatings for devices having potential barriers for filtering or shielding light, e.g. multicolour filters for photodetectors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00—Constructional details of devices covered by this subclass
    • H10F77/40—Optical elements or arrangements

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Wood Science & Technology (AREA)
  • Toxicology (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optical Filters (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Solid State Image Pick-Up Elements (AREA)
JP2012518898A 2009-07-06 2010-06-30 ビーム用のフィルタ材料を製造するための複合物、フィルタ材料用の複合物を製造するための方法、ビームをフィルタリングするための材料、および当該材料を含むオプトエレクトロニクス構成素子 Pending JP2012532353A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102009031915.8 2009-07-06
DE102009031915A DE102009031915A1 (de) 2009-07-06 2009-07-06 Zusammensetzung zur Herstellung eines Filtermaterials für Strahlung, Verfahren zur Herstellung einer Zusammensetzung für ein Filtermaterial, Material zur Filterung von Strahlung und ein optoelektronisches Bauelement umfassend das Material
PCT/EP2010/059288 WO2011003788A1 (de) 2009-07-06 2010-06-30 Zusammensetzung zur herstellung eines filtermaterials für strahlung, verfahren zur herstellung einer zusammensetzung für ein filtermaterial, material zur filterung von strahlung und ein optoelektronisches bauelement umfassend das material

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2014206491A Division JP5933663B2 (ja) 2009-07-06 2014-10-07 オプトエレクトロニクス構成素子および当該オプトエレクトロニクス構成素子の製造方法

Publications (2)

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JP2012532353A true JP2012532353A (ja) 2012-12-13
JP2012532353A5 JP2012532353A5 (enExample) 2013-05-02

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JP2012518898A Pending JP2012532353A (ja) 2009-07-06 2010-06-30 ビーム用のフィルタ材料を製造するための複合物、フィルタ材料用の複合物を製造するための方法、ビームをフィルタリングするための材料、および当該材料を含むオプトエレクトロニクス構成素子
JP2014206491A Active JP5933663B2 (ja) 2009-07-06 2014-10-07 オプトエレクトロニクス構成素子および当該オプトエレクトロニクス構成素子の製造方法

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JP2014206491A Active JP5933663B2 (ja) 2009-07-06 2014-10-07 オプトエレクトロニクス構成素子および当該オプトエレクトロニクス構成素子の製造方法

Country Status (7)

Country Link
US (1) US9310538B2 (enExample)
EP (1) EP2452215B1 (enExample)
JP (2) JP2012532353A (enExample)
KR (1) KR101700469B1 (enExample)
CN (1) CN102483478B (enExample)
DE (1) DE102009031915A1 (enExample)
WO (1) WO2011003788A1 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103665778B (zh) * 2012-08-30 2016-05-04 普立万聚合体（上海）有限公司 保护β-胡萝卜素的组合物
CN103275515B (zh) * 2013-06-18 2014-10-29 海宁市现代化工有限公司 一种橙色萘环酮染料及其制备方法
DE102014206995A1 (de) * 2014-04-11 2015-10-15 Osram Opto Semiconductors Gmbh Optoelektronisches Halbleiterelement, optoelektronisches Halbleiterbauteil und Verfahren zur Herstellung einer Mehrzahl von optoelektronischen Halbleiterelementen
US10363710B2 (en) * 2016-01-22 2019-07-30 Indizen Optical Technologies of America, LLC Creating homogeneous optical elements by additive manufacturing
DE102023134624A1 (de) * 2023-12-11 2025-06-12 Ams-Osram International Gmbh Filterelement, optoelektronisches bauelement, verfahren zur herstellung eines filterelements und verfahren zur herstellung eines optoelektronischen bauelements

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11500545A (ja) * 1996-07-25 1999-01-12 エイチイー・ホールディングス・インコーポレーテッド・ドゥーイング・ビジネス・アズ・ヒューズ・エレクトロニクス 接着性の赤外線透過ポリマー層を含む赤外線透過構造
JP2005066914A (ja) * 2003-08-21 2005-03-17 Asahi Rubber:Kk 樹脂複合体及びその製造方法
WO2007149624A1 (en) * 2006-06-19 2007-12-27 General Electric Company Infrared transmissive thermoplastic composition, and articles formed therefrom

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GB1201066A (en) * 1966-09-02 1970-08-05 Polaroid Corp Plastics optical elements
US3620888A (en) 1966-09-02 1971-11-16 Polaroid Corp Transparent laminate having at least one layer of a cellulose derivative matrix containing infrared absorber
US4039467A (en) 1975-06-16 1977-08-02 American Cyanamid Company Visibly opaque infrared transmitting optical filter containing a combination of copper and vanadyl phthalocyanine sulfonamides
DE69530488T2 (de) * 1994-06-30 2004-04-01 Minnesota Mining And Mfg. Co., St. Paul Zahnabdruckmaterial, das einen farbstoff zur sichtbarmachung der härtung enthält
JPH09132718A (ja) 1995-11-08 1997-05-20 Toray Dow Corning Silicone Co Ltd 二液型硬化性液状シリコーン組成物
JP4105440B2 (ja) 2002-01-30 2008-06-25 浜松ホトニクス株式会社 半導体光検出装置
JP2003262701A (ja) 2002-03-08 2003-09-19 Kanegafuchi Chem Ind Co Ltd 光学材料用組成物、光学材料、それを用いた液晶表示装置、発光ダイオードおよびそれらの製造方法
CN101472738B (zh) 2006-06-16 2013-11-06 阿基里斯株式会社 在近红外线区域具有光反射性能的深色片状物
JP4653028B2 (ja) 2006-06-30 2011-03-16 三菱エンジニアリングプラスチックス株式会社 ポリカーボネート樹脂組成物及び赤外線レーザー用フィルター
WO2008035554A1 (en) 2006-09-20 2008-03-27 Konica Minolta Holdings, Inc. Novel squarylium metal complex compound, dye, and composition, color toner, ink, optical recording medium, color filter and front filter for display containing the same
US20080103267A1 (en) * 2006-10-31 2008-05-01 General Electric Company Infrared transmissive thermoplastic composition
US20080285165A1 (en) * 2007-05-14 2008-11-20 Wu Kuohua Angus Thin film filter system and method

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11500545A (ja) * 1996-07-25 1999-01-12 エイチイー・ホールディングス・インコーポレーテッド・ドゥーイング・ビジネス・アズ・ヒューズ・エレクトロニクス 接着性の赤外線透過ポリマー層を含む赤外線透過構造
JP2005066914A (ja) * 2003-08-21 2005-03-17 Asahi Rubber:Kk 樹脂複合体及びその製造方法
WO2007149624A1 (en) * 2006-06-19 2007-12-27 General Electric Company Infrared transmissive thermoplastic composition, and articles formed therefrom

Also Published As

Publication number Publication date
JP2015072476A (ja) 2015-04-16
US9310538B2 (en) 2016-04-12
WO2011003788A1 (de) 2011-01-13
CN102483478A (zh) 2012-05-30
DE102009031915A1 (de) 2011-01-13
EP2452215B1 (de) 2017-08-09
KR20120107913A (ko) 2012-10-04
US20120104291A1 (en) 2012-05-03
JP5933663B2 (ja) 2016-06-15
CN102483478B (zh) 2014-09-24
EP2452215A1 (de) 2012-05-16
KR101700469B1 (ko) 2017-01-26

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