JP2012529765A5 - - Google Patents

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Publication number
JP2012529765A5
JP2012529765A5 JP2012514535A JP2012514535A JP2012529765A5 JP 2012529765 A5 JP2012529765 A5 JP 2012529765A5 JP 2012514535 A JP2012514535 A JP 2012514535A JP 2012514535 A JP2012514535 A JP 2012514535A JP 2012529765 A5 JP2012529765 A5 JP 2012529765A5
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JP
Japan
Prior art keywords
index
value
substrate
processing space
growth
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2012514535A
Other languages
English (en)
Japanese (ja)
Other versions
JP2012529765A (ja
Filing date
Publication date
Priority claimed from GBGB0910040.5A external-priority patent/GB0910040D0/en
Application filed filed Critical
Publication of JP2012529765A publication Critical patent/JP2012529765A/ja
Publication of JP2012529765A5 publication Critical patent/JP2012529765A5/ja
Pending legal-status Critical Current

Links

JP2012514535A 2009-06-11 2010-05-25 プラズマ付着により成長させた基材構造 Pending JP2012529765A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
GBGB0910040.5A GB0910040D0 (en) 2009-06-11 2009-06-11 Substrate structure
GB0910040.5 2009-06-11
PCT/GB2010/050856 WO2010142972A1 (en) 2009-06-11 2010-05-25 Substrate structure grown by plasma deposition

Publications (2)

Publication Number Publication Date
JP2012529765A JP2012529765A (ja) 2012-11-22
JP2012529765A5 true JP2012529765A5 (enExample) 2013-07-11

Family

ID=40937232

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012514535A Pending JP2012529765A (ja) 2009-06-11 2010-05-25 プラズマ付着により成長させた基材構造

Country Status (5)

Country Link
US (2) US20120052242A1 (enExample)
EP (1) EP2440685A1 (enExample)
JP (1) JP2012529765A (enExample)
GB (1) GB0910040D0 (enExample)
WO (1) WO2010142972A1 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9460912B2 (en) * 2012-04-12 2016-10-04 Air Products And Chemicals, Inc. High temperature atomic layer deposition of silicon oxide thin films
GB201210836D0 (en) * 2012-06-19 2012-08-01 Fujifilm Mfg Europe Bv Method and device for manufacturing a barrier layer on a flexible substrate
JP7630165B2 (ja) 2021-07-07 2025-02-17 国立研究開発法人産業技術総合研究所 粗さ解析のための方法及び情報処理システム

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6146724A (en) * 1994-06-06 2000-11-14 The University Of Tennessee Research Corporation One atmosphere uniform glow discharge plasma coating with gas barrier properties
JP2000169969A (ja) * 1998-09-29 2000-06-20 Sekisui Chem Co Ltd 放電プラズマ処理方法
JP4546675B2 (ja) * 2001-08-17 2010-09-15 積水化学工業株式会社 多段型の放電プラズマ処理方法及び装置
EP1403902A1 (en) * 2002-09-30 2004-03-31 Fuji Photo Film B.V. Method and arrangement for generating an atmospheric pressure glow discharge plasma (APG)
JP2005104793A (ja) * 2003-10-01 2005-04-21 Nippon Sheet Glass Co Ltd 電波透過熱線反射合わせ構造体およびその製造方法
EP1982348A1 (en) * 2006-02-09 2008-10-22 Fuji Film Manufacturing Europe B.V. Short pulse atmospheric pressure glow discharge method and apparatus
EP2024533A1 (en) * 2006-05-30 2009-02-18 Fuji Film Manufacturing Europe B.V. Method and apparatus for deposition using pulsed atmospheric pressure glow discharge
EP2032738A1 (en) * 2006-06-16 2009-03-11 Fuji Film Manufacturing Europe B.V. Method and apparatus for atomic layer deposition using an atmospheric pressure glow discharge plasma
JP2008085300A (ja) * 2006-08-29 2008-04-10 Konica Minolta Holdings Inc 薄膜の成膜方法、薄膜トランジスタの製造方法、および薄膜トランジスタ
WO2008100139A1 (en) * 2007-02-13 2008-08-21 Fujifilm Manufacturing Europe B.V. Substrate plasma treatment using magnetic mask device
WO2008147184A2 (en) * 2007-05-25 2008-12-04 Fujifilm Manufacturing Europe B.V. Atmospheric pressure glow discharge plasma method and system using heated substrate
EP2245647B1 (en) * 2008-02-21 2012-08-01 Fujifilm Manufacturing Europe B.V. Method for treatment of a substrate with atmospheric pressure glow discharge electrode configuration

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