JP2012519231A - コーティング系及びコーティング系を製造するためのコーティング方法 - Google Patents
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Abstract
Description
例:工具試験及び成形工具
工具鋼:DIN 1.2379
1.工具は、プラズマ窒化され、窒化硬化深さは約100μmであった
2.工具を研磨
3.加熱/イオン洗浄
400℃に加熱
10分間、Arを用いるAEGDイオン洗浄、200V
3分間、VZrを用いる金属イオン衝撃(bombardment)、1000V
4.コーティング、200V
−200nmのVZr層
−7.1μmのVZrN層、窒素反応ガス5Pa
5.結果は、HFクラス1
6.層を、0.9μmのRzまで研磨
適用例
成形される材料:HSS(JIS:SAPH400)
材料の厚さ:2〜3mm
プレス能力:3000t
耐久性試験の結果
PVDコーティング(CrN):1000ストローク
CVDコーティング(TiC):4000ストローク
例1によるVZrNコーティング:7,200ストローク
(試験の状態−さらに継続可能)
Claims (30)
- 基材(100)の表面に、特に成形工具の表面に、表面層を形成するための層系であって、(VaMebMcXd)α(NuCvOw)βの組成の少なくとも1つの第1表面層を含み、式中、該層に存在する原子Va、Meb、Mc、Xdに関して、(a+b+c+d)=α、α=100%であり、該層に存在する原子N、C、Oに関して、(u+v+w)=β、β=100%であり、該層における全原子の合計(α+β)=100at%であり、ここで40≦α≦80at%が適用され、そしてMebは、化学元素の周期律表の
−Zr、Hf、Nb、Ta、Mo、W、Ni、Cu、Sc、Y、La、Ce、Pr、Nd、Pm、Sm
を含む化学元素の群からの少なくとも1種の元素であり、
Mcは、
−Ti、Cr
を含む化学元素の群からの少なくとも1種の元素であり、かつ
Xdは、化学元素の周期律表の
−S、Se、Si、B
を含む化学元素の群からの少なくとも1種の元素であり、
式中、0≦u≦100、0≦v≦100、かつ0≦w≦80であって、
50≦a≦99、1≦b≦50、0≦c≦50、かつ0≦d≦20
であることを特徴とする上記層系。 - 40≦α≦80、特に、45≦α≦55である、請求項1に記載の層系。
- 80≦aである、請求項1又は2に記載の層系。
- c=0、かつd=0、かつv=0、かつw=0である、請求項1から3までのいずれか一項に記載の層系。
- Mebが元素Zrである、請求項1から4までのいずれか一項に記載の層系。
- a=80である、請求項4又は5に記載の層系。
- a=84である、請求項4又は5に記載の層系。
- a=88である、請求項4又は5に記載の層系。
- a=97である、請求項4又は5に記載の層系。
- 前記表面層が、(V95Me5)α(NuCvOw)βの組成を有し、式中、u=30、v=65、w=5であり、かつMeが好ましくはNiである、請求項1から3までのいずれか一項に記載の層系。
- 前記表面層が、(V96Me4)α(NuCvOw)βの組成を有し、式中、u=65、v=25、w=10であり、かつMeが好ましくはCeである、請求項1から3までのいずれか一項に記載の層系。
- 前記表面層が、(V75Me15X10)αNβの組成を有し、かつMeが好ましくはMoであり、及び/又は、Xが好ましくはSである、請求項1から3までのいずれか一項に記載の層系。
- 前記表面層が、(V75Me15X10)α(NuCvOw)βの組成を有し、式中、u=25、v=70、w=5であり、かつMが好ましくはMoであり、並びに/又は、Xが好ましくは等割合のSi及びBである、請求項1から3までのいずれか一項に記載の層系。
- 前記表面層が、(V75Me15M10)α(NuCvOw)βの組成を有し、式中、u=25、v=70、w=5であり、かつMが好ましくはMoであり、及び/又は、Mが好ましくはCであり、かつαが52at%である、請求項1から3までのいずれか一項に記載の層系。
- 前記表面層が、(V96Zr4)α(NuCvOw)βの組成を有し、式中、u=0、v=100、w=0であり、かつαが40at%に等しい、請求項1から3までのいずれか一項に記載の層系。
- 40≦α≦60、特に、45≦α≦55、好ましくは、a≒50である、請求項1から15までのいずれか一項に記載の層系。
- 特に前記基材の表面に直接付けられる接着層である、さらなる部分層が、前記表面層と前記基材との間に設けられる、請求項1から16までのいずれか一項に記載の層系。
- 前記部分層が、V97Zr3の組成の接着層である、請求項17に記載の層系。
- 前記部分層が、V80Zr20の組成の接着層である、請求項17又は18に記載の層系。
- 前記部分層が、(Al55Ti45)γNδ(式中、γ+δ=100at%、かつ40≦γ≦60であり、好ましくは、γ≒50である)の組成であり、かつ特に、接着層、殊に、前記基材に直接付けられる接着層である、請求項17から19までのいずれか一項に記載の層系。
- 前記部分層が、(Al69Cr29Mg1Si1)γNδ(式中、γ+δ=100at%、かつ40≦γ≦60であり、好ましくは、γ≒50である)の組成であり、かつ特に、接着層、殊に、前記基材に直接付けられる接着層である、請求項17から20までのいずれか一項に記載の層系。
- 前記部分層が、(Al60Cr30Mg5Si5)γNδ(式中、γ+δ=100at%、かつ40≦γ≦60であり、好ましくは、γ≒50である)の組成であり、かつ特に、接着層、殊に、前記基材に直接付けられる接着層である、請求項17から21までのいずれか一項に記載の層系。
- 前記部分層が、(Cr91Ni3Al3Si3)γNδ(式中、γ+δ=100at%、かつ40≦γ≦60であり、好ましくは、γ≒50である)の組成であり、かつ特に、接着層、殊に、前記基材に直接付けられる接着層である、請求項17から22までのいずれか一項に記載の層系。
- 前記部分層が、TiN部分層であり、特に接着層、殊に、前記基材に直接付けられる接着層である、請求項17から23までのいずれか一項に記載の層系。
- 前記部分層が、Cr部分層であり、特に接着層、殊に、前記基材に直接付けられる接着層である、請求項17から24までのいずれか一項に記載の層系。
- 前記層系及び/又は前記部分層及び/又は前記表面層の硬度が、1500と3500の間のHK0.025硬度、殊に、1000と3100の間のHK0.025硬度、特に、2100と2900の間のHK0.025硬度を有する、請求項1から25までのいずれか一項に記載の層系。
- 前記層系及び/又は前記部分層及び/又は前記表面層の厚さが、0.01μmと100μmの間、殊に、0.1μmと8μmの間であり、好ましくは、0.2μmと7.5μmの間である、請求項1から26までのいずれか一項に記載の層厚。
- 前記表面層が、0.2μmと10μmの間、特に、0.5μmと5μmの間、好ましくは、0.5μmと1.5μmの間の表面粗さRzを有する、請求項1から27までのいずれか一項に記載の層系。
- 前記層系及び/又は前記部分層及び/又は前記表面層の接着強度が、HF1からHF3、特にHF2であり、好ましくはHF1である、請求項1から28までのいずれか一項に記載の層系。
- 請求項1から29までのいずれか一項に記載の層系(1)の製造のためのコーティング系であって、PVD法、好ましくは、アーク法などのアークコーティング法、スパッタリング法、又はアークコーティング法とスパッタリング法を組み合わせた方法である上記コーティング方法。
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PCT/EP2009/058322 WO2010097124A1 (de) | 2009-02-27 | 2009-07-02 | Schichtsystem sowie beschichtungsverfahren zur herstellung eines schichtsystems |
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CN102691036A (zh) * | 2011-03-22 | 2012-09-26 | 鸿富锦精密工业(深圳)有限公司 | 抗菌镀膜件及其制备方法 |
CN104388788B (zh) * | 2014-11-23 | 2017-02-22 | 北京科技大学 | 一种低成本制备铌基合金的方法 |
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ES2663533T3 (es) | 2018-04-13 |
JP5625000B2 (ja) | 2014-11-12 |
CN107034465A (zh) | 2017-08-11 |
US8956722B2 (en) | 2015-02-17 |
CN102333907A (zh) | 2012-01-25 |
US20120189841A1 (en) | 2012-07-26 |
EP2401419A1 (de) | 2012-01-04 |
EP2401419B1 (de) | 2018-01-03 |
WO2010097124A1 (de) | 2010-09-02 |
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