JP2012514611A - プリント電子部品のための機能性材料 - Google Patents
プリント電子部品のための機能性材料 Download PDFInfo
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- JP2012514611A JP2012514611A JP2011544796A JP2011544796A JP2012514611A JP 2012514611 A JP2012514611 A JP 2012514611A JP 2011544796 A JP2011544796 A JP 2011544796A JP 2011544796 A JP2011544796 A JP 2011544796A JP 2012514611 A JP2012514611 A JP 2012514611A
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- JP
- Japan
- Prior art keywords
- oxide
- layer
- indium
- gallium
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000008204 material by function Substances 0.000 title description 2
- 239000002243 precursor Substances 0.000 claims abstract description 61
- 229910052733 gallium Inorganic materials 0.000 claims abstract description 42
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 claims abstract description 40
- 239000000203 mixture Substances 0.000 claims abstract description 40
- 229910052738 indium Inorganic materials 0.000 claims abstract description 38
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims abstract description 36
- 229910052735 hafnium Inorganic materials 0.000 claims abstract description 33
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 claims abstract description 33
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims abstract description 30
- 229910052726 zirconium Inorganic materials 0.000 claims abstract description 30
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical class [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims abstract description 28
- 239000011777 magnesium Substances 0.000 claims abstract description 28
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims abstract description 27
- 229910052749 magnesium Inorganic materials 0.000 claims abstract description 27
- 238000004519 manufacturing process Methods 0.000 claims abstract description 27
- 229910052779 Neodymium Inorganic materials 0.000 claims abstract description 24
- QEFYFXOXNSNQGX-UHFFFAOYSA-N neodymium atom Chemical compound [Nd] QEFYFXOXNSNQGX-UHFFFAOYSA-N 0.000 claims abstract description 24
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims abstract description 18
- 229910052707 ruthenium Inorganic materials 0.000 claims abstract description 18
- 230000005669 field effect Effects 0.000 claims abstract description 14
- 239000003446 ligand Substances 0.000 claims abstract description 10
- 239000010410 layer Substances 0.000 claims description 107
- 238000000034 method Methods 0.000 claims description 51
- 239000000758 substrate Substances 0.000 claims description 44
- 238000007639 printing Methods 0.000 claims description 37
- 239000004065 semiconductor Substances 0.000 claims description 37
- 230000008569 process Effects 0.000 claims description 28
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims description 24
- 238000004528 spin coating Methods 0.000 claims description 23
- 229910052718 tin Inorganic materials 0.000 claims description 22
- 239000012212 insulator Substances 0.000 claims description 20
- 229910052782 aluminium Inorganic materials 0.000 claims description 19
- 238000000576 coating method Methods 0.000 claims description 19
- 239000000919 ceramic Substances 0.000 claims description 18
- 239000011248 coating agent Substances 0.000 claims description 18
- 238000007641 inkjet printing Methods 0.000 claims description 18
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 17
- 239000011521 glass Substances 0.000 claims description 16
- PLDDOISOJJCEMH-UHFFFAOYSA-N neodymium(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Nd+3].[Nd+3] PLDDOISOJJCEMH-UHFFFAOYSA-N 0.000 claims description 16
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 16
- 238000003618 dip coating Methods 0.000 claims description 14
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 claims description 14
- -1 methoxyimino Chemical group 0.000 claims description 14
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 claims description 12
- KYKLWYKWCAYAJY-UHFFFAOYSA-N oxotin;zinc Chemical compound [Zn].[Sn]=O KYKLWYKWCAYAJY-UHFFFAOYSA-N 0.000 claims description 12
- 239000011787 zinc oxide Substances 0.000 claims description 12
- 239000000395 magnesium oxide Substances 0.000 claims description 11
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims description 11
- 229910000449 hafnium oxide Inorganic materials 0.000 claims description 10
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 claims description 10
- 125000002524 organometallic group Chemical group 0.000 claims description 10
- 229910001928 zirconium oxide Inorganic materials 0.000 claims description 10
- 239000002253 acid Substances 0.000 claims description 9
- 239000004020 conductor Substances 0.000 claims description 9
- WIHZLLGSGQNAGK-UHFFFAOYSA-N hafnium(4+);oxygen(2-) Chemical compound [O-2].[O-2].[Hf+4] WIHZLLGSGQNAGK-UHFFFAOYSA-N 0.000 claims description 9
- 229910052751 metal Inorganic materials 0.000 claims description 9
- 239000002184 metal Substances 0.000 claims description 9
- 230000015556 catabolic process Effects 0.000 claims description 8
- AJNVQOSZGJRYEI-UHFFFAOYSA-N digallium;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Ga+3].[Ga+3] AJNVQOSZGJRYEI-UHFFFAOYSA-N 0.000 claims description 8
- 229910001195 gallium oxide Inorganic materials 0.000 claims description 8
- 229910001925 ruthenium oxide Inorganic materials 0.000 claims description 7
- WOCIAKWEIIZHES-UHFFFAOYSA-N ruthenium(iv) oxide Chemical compound O=[Ru]=O WOCIAKWEIIZHES-UHFFFAOYSA-N 0.000 claims description 7
- 238000007646 gravure printing Methods 0.000 claims description 6
- 239000002800 charge carrier Substances 0.000 claims description 5
- 238000005259 measurement Methods 0.000 claims description 5
- AVXURJPOCDRRFD-UHFFFAOYSA-N Hydroxylamine Chemical compound ON AVXURJPOCDRRFD-UHFFFAOYSA-N 0.000 claims description 4
- 239000011888 foil Substances 0.000 claims description 4
- 239000001301 oxygen Substances 0.000 claims description 4
- 229910052760 oxygen Inorganic materials 0.000 claims description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 3
- 238000001035 drying Methods 0.000 claims description 3
- 238000010438 heat treatment Methods 0.000 claims description 3
- TYEYBOSBBBHJIV-UHFFFAOYSA-N 2-oxobutanoic acid Chemical compound CCC(=O)C(O)=O TYEYBOSBBBHJIV-UHFFFAOYSA-N 0.000 claims description 2
- HHLFWLYXYJOTON-UHFFFAOYSA-N glyoxylic acid Chemical compound OC(=O)C=O HHLFWLYXYJOTON-UHFFFAOYSA-N 0.000 claims description 2
- 230000001678 irradiating effect Effects 0.000 claims description 2
- 239000002346 layers by function Substances 0.000 claims description 2
- 239000004033 plastic Substances 0.000 claims description 2
- 229920003023 plastic Polymers 0.000 claims description 2
- 239000002985 plastic film Substances 0.000 claims description 2
- 229920006255 plastic film Polymers 0.000 claims description 2
- 239000000243 solution Substances 0.000 description 42
- 239000000463 material Substances 0.000 description 27
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 21
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 21
- 239000010408 film Substances 0.000 description 20
- 238000006243 chemical reaction Methods 0.000 description 19
- 238000012545 processing Methods 0.000 description 18
- DAEPDZWVDSPTHF-UHFFFAOYSA-M sodium pyruvate Chemical compound [Na+].CC(=O)C([O-])=O DAEPDZWVDSPTHF-UHFFFAOYSA-M 0.000 description 18
- 238000002360 preparation method Methods 0.000 description 16
- 150000001875 compounds Chemical class 0.000 description 15
- 239000007789 gas Substances 0.000 description 15
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 12
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 12
- 239000011701 zinc Substances 0.000 description 12
- 239000012071 phase Substances 0.000 description 11
- 229910052725 zinc Inorganic materials 0.000 description 11
- 238000004566 IR spectroscopy Methods 0.000 description 10
- 238000005481 NMR spectroscopy Methods 0.000 description 10
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 10
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 10
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 10
- 238000010304 firing Methods 0.000 description 10
- XNXVOSBNFZWHBV-UHFFFAOYSA-N hydron;o-methylhydroxylamine;chloride Chemical compound Cl.CON XNXVOSBNFZWHBV-UHFFFAOYSA-N 0.000 description 10
- 229920000307 polymer substrate Polymers 0.000 description 10
- 239000010703 silicon Substances 0.000 description 10
- 229910052710 silicon Inorganic materials 0.000 description 10
- BTANRVKWQNVYAZ-UHFFFAOYSA-N butan-2-ol Chemical compound CCC(C)O BTANRVKWQNVYAZ-UHFFFAOYSA-N 0.000 description 9
- 239000000976 ink Substances 0.000 description 9
- 239000002707 nanocrystalline material Substances 0.000 description 9
- 239000000843 powder Substances 0.000 description 9
- 229940054269 sodium pyruvate Drugs 0.000 description 9
- 239000000706 filtrate Substances 0.000 description 8
- 239000000047 product Substances 0.000 description 8
- 239000000725 suspension Substances 0.000 description 8
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 6
- 238000005516 engineering process Methods 0.000 description 6
- 239000010409 thin film Substances 0.000 description 6
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 5
- 229910052737 gold Inorganic materials 0.000 description 5
- 239000010931 gold Substances 0.000 description 5
- 235000017557 sodium bicarbonate Nutrition 0.000 description 5
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 5
- 238000003756 stirring Methods 0.000 description 5
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 5
- 229910001887 tin oxide Inorganic materials 0.000 description 5
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 238000000151 deposition Methods 0.000 description 4
- 238000013461 design Methods 0.000 description 4
- CHPZKNULDCNCBW-UHFFFAOYSA-N gallium nitrate Chemical compound [Ga+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O CHPZKNULDCNCBW-UHFFFAOYSA-N 0.000 description 4
- 229910010272 inorganic material Inorganic materials 0.000 description 4
- 239000011147 inorganic material Substances 0.000 description 4
- 239000007791 liquid phase Substances 0.000 description 4
- MFUVDXOKPBAHMC-UHFFFAOYSA-N magnesium;dinitrate;hexahydrate Chemical compound O.O.O.O.O.O.[Mg+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O MFUVDXOKPBAHMC-UHFFFAOYSA-N 0.000 description 4
- 230000003647 oxidation Effects 0.000 description 4
- 238000007254 oxidation reaction Methods 0.000 description 4
- 239000000523 sample Substances 0.000 description 4
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 4
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000007983 Tris buffer Substances 0.000 description 3
- 238000000026 X-ray photoelectron spectrum Methods 0.000 description 3
- 239000011149 active material Substances 0.000 description 3
- 229910052783 alkali metal Inorganic materials 0.000 description 3
- 150000001340 alkali metals Chemical class 0.000 description 3
- 238000004458 analytical method Methods 0.000 description 3
- 238000007774 anilox coating Methods 0.000 description 3
- 239000002585 base Substances 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 3
- PSCMQHVBLHHWTO-UHFFFAOYSA-K indium(iii) chloride Chemical compound Cl[In](Cl)Cl PSCMQHVBLHHWTO-UHFFFAOYSA-K 0.000 description 3
- ZLNQQNXFFQJAID-UHFFFAOYSA-L magnesium carbonate Chemical compound [Mg+2].[O-]C([O-])=O ZLNQQNXFFQJAID-UHFFFAOYSA-L 0.000 description 3
- 238000000691 measurement method Methods 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 239000011368 organic material Substances 0.000 description 3
- 235000012239 silicon dioxide Nutrition 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- LENZDBCJOHFCAS-UHFFFAOYSA-N tris Chemical compound OCC(N)(CO)CO LENZDBCJOHFCAS-UHFFFAOYSA-N 0.000 description 3
- XNDZQQSKSQTQQD-UHFFFAOYSA-N 3-methylcyclohex-2-en-1-ol Chemical compound CC1=CC(O)CCC1 XNDZQQSKSQTQQD-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- ZDVFOXIBFYUVNY-UHFFFAOYSA-M C([O-])(O)=O.[Na+].CON=C(C(=O)O)C Chemical compound C([O-])(O)=O.[Na+].CON=C(C(=O)O)C ZDVFOXIBFYUVNY-UHFFFAOYSA-M 0.000 description 2
- LCTONWCANYUPML-UHFFFAOYSA-N Pyruvic acid Chemical compound CC(=O)C(O)=O LCTONWCANYUPML-UHFFFAOYSA-N 0.000 description 2
- 239000012327 Ruthenium complex Substances 0.000 description 2
- 229910021626 Tin(II) chloride Inorganic materials 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N ZrO2 Inorganic materials O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 238000001354 calcination Methods 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 229920001940 conductive polymer Polymers 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 229940044658 gallium nitrate Drugs 0.000 description 2
- CJNBYAVZURUTKZ-UHFFFAOYSA-N hafnium(iv) oxide Chemical compound O=[Hf]=O CJNBYAVZURUTKZ-UHFFFAOYSA-N 0.000 description 2
- HRHKULZDDYWVBE-UHFFFAOYSA-N indium;oxozinc;tin Chemical compound [In].[Sn].[Zn]=O HRHKULZDDYWVBE-UHFFFAOYSA-N 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- ATINCSYRHURBSP-UHFFFAOYSA-K neodymium(iii) chloride Chemical compound Cl[Nd](Cl)Cl ATINCSYRHURBSP-UHFFFAOYSA-K 0.000 description 2
- 229910052574 oxide ceramic Inorganic materials 0.000 description 2
- 239000011224 oxide ceramic Substances 0.000 description 2
- 229920000172 poly(styrenesulfonic acid) Polymers 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 229940005642 polystyrene sulfonic acid Drugs 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 238000004611 spectroscopical analysis Methods 0.000 description 2
- 235000011150 stannous chloride Nutrition 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- KHMOASUYFVRATF-UHFFFAOYSA-J tin(4+);tetrachloride;pentahydrate Chemical compound O.O.O.O.O.Cl[Sn](Cl)(Cl)Cl KHMOASUYFVRATF-UHFFFAOYSA-J 0.000 description 2
- AXZWODMDQAVCJE-UHFFFAOYSA-L tin(II) chloride (anhydrous) Chemical compound [Cl-].[Cl-].[Sn+2] AXZWODMDQAVCJE-UHFFFAOYSA-L 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- VSANUNLQSRKIQA-UHFFFAOYSA-K trichlororuthenium hexahydrate Chemical compound O.O.O.O.O.O.Cl[Ru](Cl)Cl VSANUNLQSRKIQA-UHFFFAOYSA-K 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 2
- YOBOXHGSEJBUPB-MTOQALJVSA-N (z)-4-hydroxypent-3-en-2-one;zirconium Chemical compound [Zr].C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O YOBOXHGSEJBUPB-MTOQALJVSA-N 0.000 description 1
- KBCBQJGDSMHYLU-UHFFFAOYSA-K C([O-])(O)=O.[K+].[Mg+2].CON=C(C(=O)[O-])C.CON=C(C(=O)[O-])C Chemical compound C([O-])(O)=O.[K+].[Mg+2].CON=C(C(=O)[O-])C.CON=C(C(=O)[O-])C KBCBQJGDSMHYLU-UHFFFAOYSA-K 0.000 description 1
- DBFYIIFWVOLRMQ-UHFFFAOYSA-J C([O-])(O)=O.[Na+].[Al+3].CON=C(C(=O)[O-])C.CON=C(C(=O)[O-])C.CON=C(C(=O)[O-])C Chemical compound C([O-])(O)=O.[Na+].[Al+3].CON=C(C(=O)[O-])C.CON=C(C(=O)[O-])C.CON=C(C(=O)[O-])C DBFYIIFWVOLRMQ-UHFFFAOYSA-J 0.000 description 1
- JWUQZVDLFAZPSU-UHFFFAOYSA-J C([O-])(O)=O.[Na+].[In+3].CON=C(C(=O)[O-])C.CON=C(C(=O)[O-])C.CON=C(C(=O)[O-])C Chemical compound C([O-])(O)=O.[Na+].[In+3].CON=C(C(=O)[O-])C.CON=C(C(=O)[O-])C.CON=C(C(=O)[O-])C JWUQZVDLFAZPSU-UHFFFAOYSA-J 0.000 description 1
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 1
- JIRMQEPRKFTWOK-UHFFFAOYSA-L O.O.O.O.O.O.[Zn+2].CC([O-])=O.CC([O-])=O Chemical compound O.O.O.O.O.O.[Zn+2].CC([O-])=O.CC([O-])=O JIRMQEPRKFTWOK-UHFFFAOYSA-L 0.000 description 1
- 229920001665 Poly-4-vinylphenol Polymers 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 150000004716 alpha keto acids Chemical class 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- SRSXLGNVWSONIS-UHFFFAOYSA-N benzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-N 0.000 description 1
- 229940092714 benzenesulfonic acid Drugs 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000007707 calorimetry Methods 0.000 description 1
- 238000012512 characterization method Methods 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- PNOXNTGLSKTMQO-UHFFFAOYSA-L diacetyloxytin Chemical compound CC(=O)O[Sn]OC(C)=O PNOXNTGLSKTMQO-UHFFFAOYSA-L 0.000 description 1
- XXJWXESWEXIICW-UHFFFAOYSA-N diethylene glycol monoethyl ether Chemical compound CCOCCOCCO XXJWXESWEXIICW-UHFFFAOYSA-N 0.000 description 1
- 229940075557 diethylene glycol monoethyl ether Drugs 0.000 description 1
- 239000007888 film coating Substances 0.000 description 1
- 238000009501 film coating Methods 0.000 description 1
- PDPJQWYGJJBYLF-UHFFFAOYSA-J hafnium tetrachloride Chemical compound Cl[Hf](Cl)(Cl)Cl PDPJQWYGJJBYLF-UHFFFAOYSA-J 0.000 description 1
- MCFIMQJAFAOJPD-MTOQALJVSA-J hafnium(4+) (Z)-4-oxopent-2-en-2-olate Chemical compound [Hf+4].C\C([O-])=C\C(C)=O.C\C([O-])=C\C(C)=O.C\C([O-])=C\C(C)=O.C\C([O-])=C\C(C)=O MCFIMQJAFAOJPD-MTOQALJVSA-J 0.000 description 1
- XUBMPLUQNSSFHO-UHFFFAOYSA-M hydrogen carbonate;tetraethylazanium Chemical compound OC([O-])=O.CC[N+](CC)(CC)CC XUBMPLUQNSSFHO-UHFFFAOYSA-M 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 150000002471 indium Chemical class 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- RHZWSUVWRRXEJF-UHFFFAOYSA-N indium tin Chemical compound [In].[Sn] RHZWSUVWRRXEJF-UHFFFAOYSA-N 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
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Abstract
Description
i)追加のプロセス段階のない、気相からの調製:この場合において、極めて良好に絶縁する薄層を製造することが可能であるが、付随する高コストの真空技術および緩慢な層形成によって、大量市場における使用が限定される。
可溶性HfO2を用いる例は、例えば、Zherikova et al. Journal of Thermal Analysis and Calorimetry 2008, 92, 729(ハフニウムアセチルアセトネートから長時間にわたりT=150〜500℃にて)から知られている。
本発明を、多数の例示的態様を参照して、以下により詳細に説明する(図1〜8bを参照)。
用語「印刷可能な前駆体」は、その材料特性のために、湿式相から印刷プロセスによって加工することができる前駆体材料を意味するものと解釈される。印刷プロセス中、印刷用インクまたは印刷用ペーストを、印刷プロセスに応じて、貯蔵容器から基板に輸送する。
経験上、インクまたはペーストの種々の粘性範囲は、異なる印刷プロセスについて好ましいことが示される;例えば、インクジェット印刷(サーマル方式)について1〜5mPa・s、インクジェット印刷(ピエゾ方式)について5〜20mPa・s、グラビア印刷について50〜200mPa・s、フレキソ印刷について50〜500mPa・sおよびスクリーン印刷について2000〜40,000mPa・sである。
インジウム、ガリウムおよび亜鉛錯体前駆体の、半導体特性を有する機能性インジウムガリウム亜鉛酸化物層への熱変換を、≧150℃の温度にて行う。当該温度は、好ましくは150〜250℃である。
亜鉛およびスズ錯体前駆体の、半導体特性を有する機能性亜鉛スズ酸化物層への熱変換を、≧150℃の温度にて行う。当該温度は、好ましくは150〜250℃である。
絶縁破壊電圧を、DIN EN ISO 2376:2009-07に記載されている測定および評価方法によって決定することができる。
酸化インジウムスズ層(ITO層)は、好ましくは<10−3オーム・cmの比抵抗(四点測定によって決定)を有する。10−3〜10−5オーム・cmの比抵抗が、好ましい。
伝導率を、直流四探針法によって決定することができる。この測定法は、DIN 50431またはASTM F43-99に記載されている。
半導体材料のパラメーターの特性評価および決定を、IEEE 1620に記載されている測定および評価方法によって行うことができる。
FETは、3つの接続部を有する:
・ソース
・ゲート
・ドレイン。
・障壁層(barrier-layer)電界効果トランジスタ(JFET)
・ショットキー電界効果トランジスタ(MESFET)
・金属酸化物半導体FET(MOSFET)
・高電子移動度トランジスタ(HEMT)
・イオン感応性電界効果トランジスタ(ISFET)
・薄膜トランジスタ(TFT)。
・硬質またはフレキシブル導電性基板、あるいは導電層(ゲート)を有する絶縁基板
・対応する前駆体である、オキシメートのクラスからの少なくとも1種のリガンドを含有する有機金属アルミニウム、ガリウム、ネオジム、マグネシウム、ハフニウムまたはジルコニウム錯体から得られる酸化アルミニウム、ガリウム、ネオジム、マグネシウム、ハフニウムまたはジルコニウムを含む、絶縁体
・少なくとも1つの電極(ドレイン電極)
・半導体。
・対応する前駆体である、オキシメートのクラスからの少なくとも1種のリガンドを含有する有機金属インジウムおよびスズ錯体から得られる酸化インジウムスズ(ITO)を含む、導電層(ゲート)を有する硬質またはフレキシブル導電性基板あるいは絶縁基板
・絶縁体
・少なくとも1つの電極(ドレイン電極)
・半導体。
・導電層(ゲート)を有する、硬質またはフレキシブル導電性基板あるいは絶縁基板
・絶縁体
・少なくとも1つの電極(ドレイン電極)
・半導体。半導体は、対応する前駆体であって、オキシメートのクラスからの少なくとも1種のリガンドを含有する、有機金属インジウム、ガリウム、亜鉛錯体または亜鉛およびスズの錯体から得られ、インジウムガリウム亜鉛酸化物(IGZO)または、あるいはまた亜鉛スズ酸化物(ZTO)を含む、多元の(multinary)、非晶質相からなるものでなければならない。
a)本発明の有機金属アルミニウム、ガリウム、ネオジム、ルテニウム、マグネシウム、ハフニウム、ジルコニウム、インジウムおよび/またはスズ錯体またはその混合物を含む前駆体溶液を、達成するべき電子構造体に対応するいずれか1つまたは2つ以上の層において、浸漬塗布、回転塗布またはインクジェット印刷またはフレキソ印刷/グラビア印刷によって基板に適用し、
c)最後に、適用された電子構造体を、絶縁層によって密封することができ、これに接点を設け、完成する
ことを特徴とする、前記方法に関する。
以下の例は、本発明を説明することを意図する。
しかし、それら一切限定と見なされるべきではない。組成物中で用いることができる全ての化合物または成分は、既知であり、商業的に入手できるか、または既知の方法によって合成することができる。
炭酸水素カリウム(12.02g、120mmol)を、少量に分割して、撹拌しながら、100mlの水中の、ピルビン酸ナトリウム(6.60g、60mmol)およびメトキシルアミン塩酸塩(5.01g、60mmol)の溶液に加える。明らかなガスの発生が完了した際に、混合物を、さらに30分間撹拌する。硝酸マグネシウム六水和物(7.69g、30mmol)を、その後加え、混合物を、さらに1時間撹拌する。透明な溶液を、ロータリーエバポレーター中で半分の体積に濃縮し、約5度に冷却する。生成した白色沈殿物を濾別し、高温水から再結晶する。収量2.60g(34.8%)。このようにして得られた化合物を、IRおよびNMR分光法によって特性評価することができる。
あるいはまた、以下の反応手順が可能である。
ハイドロマグネサイト(20.0g)を、100mlの水中の、ピルビン酸(10.56g、120mmol)およびメトキシルアミン塩酸塩(10.04g、120mmol)の溶液に、分割して加える。明らかなガスの発生が完了したところで、混合物を1時間撹拌し、未反応のハイドロマグネサイトを濾別する。透明な溶液を、ロータリーエバポレーター中で半分の体積に濃縮し、約5度に冷却する。生成した白色沈殿物を濾別し、高温水から再結晶する。収量6.50g(43.5%)。このようにして得られた化合物を、IRおよびNMR分光法によって特性評価することができる。
例1または2に従って調製したマグネシウムオキシメートを、ガラス、セラミックスまたはポリマー基板に、回転塗布(または浸漬塗布、またはまたインクジェット印刷)によって適用する。コーティングを、その後210℃より高い温度にて空気中で10分間加熱する。このようにして得られた酸化マグネシウムフィルムは、均一であり、亀裂がなく、非孔質の表面形態を示す。焼成温度に依存して、当該層は、非晶質またはナノ結晶質材料からなる。当該層は、絶縁体特性を有する。
炭酸水素ナトリウム(7.56g、90mmol)を、100mlの水中の、ピルビン酸ナトリウム(9.90g、90mmol)およびメトキシルアミン塩酸塩(7.53g、90mmol)の溶液に、少量に分割して、撹拌しながら加える。明らかなガスの発生が完了したところで、混合物を、さらに30分間撹拌する。混合物を、その後ロータリーエバポレーター中で完全に蒸発乾固させる。125mlのテトラヒドロフラン中の四塩化ジルコニウム(5.24g、22.5mmol)の溶液を、このようにして得られた白色粉末に加え、混合物を2時間撹拌する。溶液を濾過し、ロータリーエバポレーター中で蒸発乾固させる。残留物を100mlのジクロロメタン中に取り込み、このようにして得られた懸濁液を再び濾過する。生成物を、その後大量のn−ヘキサンを用いて濾液から沈殿させ、濾別し、デシケーター中で乾燥する。収量3.50g。このようにして得られた化合物を、IRおよびNMR分光法によって特性評価することができる。
例4に従って調製したジルコニウムオキシメートを、ガラス、セラミックスまたはポリマー基板に、回転塗布(または浸漬塗布、またはまたインクジェット印刷)によって適用する。コーティングを、その後200℃より高い温度にて空気中で10分間加熱するか、またはこれに、UVを150mW/cm2にて15分間照射する。このようにして得られた酸化ジルコニウムフィルムは、均一であり、亀裂がなく、非孔質の表面形態を示す。焼成温度に依存して、当該層は、非晶質またはナノ結晶質材料からなる。当該層は、絶縁体特性を有する。
炭酸水素ナトリウム(7.56g、90mmol)を、少量に分割して、撹拌しながら、100mlの水中の、ピルビン酸ナトリウム(9.90g、90mmol)およびメトキシルアミン塩酸塩(7.53g、90mmol)の溶液に加える。明らかなガスの発生が完了したところで、混合物をさらに30分間撹拌する。混合物を、その後ロータリーエバポレーター中で完全に蒸発乾固させる。125mlのテトラヒドロフラン中の四塩化ハフニウム(7.21g、22.5mmol)をの溶液を、このようにして得られた白色粉末に加え、混合物を2時間撹拌する。溶液を濾過し、ロータリーエバポレーター中で蒸発乾固させる。残留物を100mlのジクロロメタン中に取り込み、このようにして得られた懸濁液を再び濾過する。生成物を、その後大量のn−ヘキサンを用いて濾液から沈殿させ、濾別し、デシケーター中で乾燥する。収量4.75g。このようにして得られた化合物を、IRおよびNMR分光法によって特性評価することができる。
例6に従って調製したハフニウムオキシメートを、ガラス、セラミックスまたはポリマー基板に、回転塗布(または浸漬塗布、またはまたインクジェット印刷)によって適用する。コーティングを、その後200℃より高い温度にて空気中で10分間加熱するか、またはこれに、UVを150mW/cm2にて15分間照射する。このようにして得られた酸化ハフニウムフィルムは、均一であり、亀裂がなく、非孔質の表面形態を示す。焼成温度に依存して、当該層は、非晶質またはナノ結晶質材料からなる。当該層は、絶縁体特性を有する。
炭酸水素ナトリウム(1.68g、20mmol)を、少量に分割して、撹拌しながら、50mlの水中の、ピルビン酸ナトリウム(2.20g、20mmol)およびメトキシルアミン塩酸塩(1.67g、20mmol)の溶液に加える。明らかなガスの発生が完了したところで、混合物をさらに30分間撹拌する。混合物を、その後ロータリーエバポレーター中で完全に蒸発乾固させる。125mlのメタノール中の硝酸アルミニウム九水和物(2.50g、6.6mmol)溶液を、このようにして得られた白色粉末に加え、混合物を2時間撹拌する。溶液を濾過し、ロータリーエバポレーター中で蒸発乾固させる。残留物を50mlのジクロロメタン中に取り込み、このようにして得られた懸濁液を再び濾過する。生成物を、その後大量のn−ヘキサンを用いて濾液から沈殿させ、濾別し、デシケーター中で乾燥する。収量1.12g(45.30%)。このようにして得られた化合物を、IRおよびNMR分光法によって特性評価することができる。
例8に従って調製したアルミニウムオキシメートを、ガラス、セラミックスまたはポリマー基板に、回転塗布(または浸漬塗布、またはまたインクジェット印刷)によって適用する。コーティングを、その後200℃より高い温度にて空気中で10分間加熱するか、またはこれに、UVを150mW/cm2にて15分間照射する。このようにして得られた酸化アルミニウムフィルムは、均一であり、亀裂がなく、非孔質の表面形態を示す。焼成温度に依存して、当該層は、ナノ結晶質材料からなる。当該層は、絶縁体特性を有する。
炭酸水素ナトリウム(1.68g、20mmol)を、少量に分割して、撹拌しながら、50mlの水中の、ピルビン酸ナトリウム(2.20g、20mmol)およびメトキシルアミン塩酸塩(1.67g、20mmol)の溶液に加える。明らかなガスの発生が完了したところで、混合物をさらに30分間撹拌する。混合物を、その後ロータリーエバポレーター中で完全に蒸発乾固させる。125mlのメタノール中の硝酸ガリウム六水和物(2.40g、6.6mmol)溶液を、このようにして得られた白色粉末に加え、混合物を2時間撹拌する。溶液を濾過し、ロータリーエバポレーター中で蒸発乾固させる。残留物を100mlのジクロロメタン中に取り込み、このようにして得られた懸濁液を再び濾過する。生成物を、その後大量のn−ヘキサンを用いて濾液から沈殿させ、濾別し、デシケーター中で乾燥する。収量0.96g(34.82%)。このようにして得られた化合物を、IRおよびNMR分光法によって特性評価することができる。
例10に従って調製したガリウムオキシメートを、ガラス、セラミックスまたはポリマー基板に、回転塗布(または浸漬塗布、またはまたインクジェット印刷)によって適用する。コーティングを、その後200℃より高い温度にて空気中で10分間加熱するか、またはこれに、UVを150mW/cm2にて15分間照射する。このようにして得られた酸化ガリウムフィルムは、均一であり、亀裂がなく、非孔質の表面形態を示す。焼成温度に依存して、当該層は、ナノ結晶質材料からなる。当該層は、絶縁体特性を有する。
炭酸水素ナトリウム(1.68g、20mmol)を、少量に分割して、撹拌しながら、50mlの水中の、ピルビン酸ナトリウム(2.20g、20mmol)およびメトキシルアミン塩酸塩(1.67g、20mmol)の溶液に加える。明らかなガスの発生が完了したところで、混合物をさらに30分間撹拌する。混合物を、その後ロータリーエバポレーター中で完全に蒸発乾固させる。125mlのメタノール中の無水三塩化ネオジム(1.65g、6.6mmol)溶液を、このようにして得られた白色粉末に加え、混合物を2時間撹拌する。溶液を濾過し、ロータリーエバポレーター中で蒸発乾固させる。残留物を100mlのジクロロメタン中に取り込み、このようにして得られた懸濁液を再び濾過する。生成物を、その後大量のn−ヘキサンを用いて濾液から沈殿させ、濾別し、デシケーター中で乾燥する。収量1.55g(47.83%)。このようにして得られた化合物を、IRおよびNMR分光法によって特性評価することができる。
例12に従って調製したネオジムオキシメートを、ガラス、セラミックスまたはポリマー基板に、回転塗布(または浸漬塗布、またはまたインクジェット印刷)によって適用する。コーティングを、その後200℃より高い温度にて空気中で10分間加熱するか、またはこれに、UVを150mW/cm2にて15分間照射する。このようにして得られた酸化ネオジムフィルムは、均一であり、亀裂がなく、非孔質の表面形態を示す。焼成温度に依存して、当該層は、ナノ結晶質材料からなる。当該層は、絶縁体特性を有する。
炭酸水素ナトリウム(1.68g、20mmol)を、少量に分割して、撹拌しながら、50mlの水中の、ピルビン酸ナトリウム(2.20g、20mmol)およびメトキシルアミン塩酸塩(1.67g、20mmol)の溶液に加える。明らかなガスの発生が完了したところで、混合物をさらに30分間撹拌する。混合物を、その後ロータリーエバポレーター中で完全に蒸発乾固させる。125mlのメタノール中の三塩化ルテニウム六水和物(2.08g、6.6mmol)の溶液を、このようにして得られた白色粉末に加え、混合物を2時間撹拌する。溶液を濾過し、ロータリーエバポレーター中で蒸発乾固させる。残留物を100mlのジクロロメタン中に取り込み、このようにして得られた懸濁液を再び濾過する。生成物を、その後大量のトルエンを用いて濾液から沈殿させ、濾別し、デシケーター中で乾燥する。収量1.34g(45.33%)。このようにして得られた化合物を、IRおよびNMR分光法によって特性評価することができる。
例14に従って調製したルテニウムオキシメートを、ガラス、セラミックスまたはポリマー基板に、回転塗布(または浸漬塗布、またはまたインクジェット印刷)によって適用する。コーティングを、その後200℃より高い温度にて空気中で10分間加熱するか、またはこれに、UVを150mW/cm2にて15分間照射する。このようにして得られた酸化ルテニウムフィルムは、均一であり、亀裂がなく、非孔質の表面形態を示す。焼成温度に依存して、当該層は、ナノ結晶質材料からなる。
例は、誘電体層の製造を示す。酸化ジルコニウムの層を、高濃度にn型ドープされた導電性シリコンウエハに、回転塗布または印刷によって適用し、その後200℃にて10分間焼成するか、または150mW/cm2にて15分間UV照射することによって形成する。対電極を適用した後、誘電体層についての絶縁破壊電圧値を、1MV/cmと決定することができる。
例は、図8aおよび8bによる電界効果トランジスタ(FET)を示す。当該部品は、誘電体層が適用された高濃度にn型ドープされたシリコンウエハからなる。次に、半導体層を作製し、金属の蒸着または金属インクの印刷によって作製された金属電極構造が続く(図8a)。あるいはまた、電極構造を先ず作製し、続いて半導体層を適用することができる(図8b)。
炭酸水素ナトリウム(1.68g、20mmol)を、少量に分割して、撹拌しながら、50mlの水中の、ピルビン酸ナトリウム(2.20g、20mmol)およびメトキシルアミン塩酸塩(1.67g、20mmol)の溶液に加える。明らかなガスの発生が完了したところで、混合物をさらに30分間撹拌する。混合物を、その後ロータリーエバポレーター中で完全に蒸発乾固させる。125mlのメタノール中の無水塩化インジウム(1.95g、6.6mmol)の溶液を、このようにして得られた白色粉末に加え、混合物を2時間撹拌する。溶液を濾過し、ロータリーエバポレーター中で蒸発乾固させる。残留物を100mlのジクロロメタン中に取り込み、このようにして得られた懸濁液を再び濾過する。生成物を、その後大量のn−ヘキサンを用いて濾液から沈殿させ、濾別し、デシケーター中で乾燥する。収量1.80g(58.9%)。このようにして得られた化合物を、IRおよびNMR分光法によって特性評価することができる。
炭酸水素ナトリウム(7.56g、90mmol)を、少量に分割して、撹拌しながら、100mlの水中の、ピルビン酸ナトリウム(9.90g、90mmol)およびメトキシルアミン塩酸塩(7.53g、90mmol)の溶液に加える。明らかなガスの発生が完了したところで、混合物をさらに30分間撹拌する。混合物を、その後ロータリーエバポレーター中で完全に蒸発乾固させる。250mlのメタノール中の無水塩化スズ五水和物(7.88g、22.5mmol)溶液を、このようにして得られた白色粉末に加え、混合物を2時間撹拌する。溶液を濾過し、ロータリーエバポレーター中で蒸発乾固させる。残留物を100mlのアセトンまたはジメトキシエタン中に取り込み、このようにして得られた懸濁液を再び濾過する。生成物を、その後大量のジエチルエーテルを用いて濾液から沈殿させ、濾別し、デシケーター中で乾燥する。収量3.7g。このようにして得られた化合物を、IRおよびNMR分光法によって特性評価することができる。
例18および19に従って調製したインジウムおよびスズオキシメートを、90:10のモル比で一緒に溶解し、ガラス、セラミックスまたはポリマー基板に回転塗布(または浸漬塗布、またはまたインクジェット印刷)によって適用する。コーティングを、その後200℃より高い温度にて空気中で60分間加熱するか、またはこれに、UVを150mW/cm2にて1時間照射する。このようにして得られた酸化インジウムスズフィルムは、均一であり、亀裂がなく、非孔質の表面形態を示す。焼成温度に依存して、当該層は、非晶質またはナノ結晶質材料からなる。当該層は、電気伝導性を有する。
例10および18に従って調製したインジウムおよび/またはガリウムオキシメートならびに亜鉛オキシメート(J.J. Schneider et al. Advanced Materials, 2008, 20, 3383-3387の方法によって得られる)を、好適なモル比で溶解する。半導体相の調製に適するモル比は、H. Hosono, Journal of Non-Crystalline Solids 2006, 352, 851-858に示されている;したがって、例えば、インジウム:ガリウム:亜鉛=1:1:1またはインジウム:亜鉛=2:3である。
例19に従って調製したスズオキシメートおよび亜鉛オキシメート(J.J. Schneider et al. Advanced Materials, 2008, 20, 3383-3387の方法によって得られる)を、好適な比率で一緒に溶解する。例えば0〜30モルパーセントのスズ含量Sn/(Sn+Zn)が、好適である。当該溶液を、ガラス、セラミックスまたはポリマー基板に、回転塗布(または浸漬塗布、またはまたインクジェット印刷)によって適用する。コーティングを、その後200℃より高い温度にて空気中で10分間加熱するか、またはこれに、UVを150mW/cm2にて15分間照射する。このようにして得られた亜鉛スズ酸化物フィルムは、均一であり、亀裂がなく、非孔質の表面形態を示す。焼成温度に依存して、当該層は、非晶質またはナノ結晶質材料からなる。当該層は、半導体特性を有する。
すべての場合において、10〜20重量パーセントの前駆体化合物の溶液を用いる。好適な溶媒は、2−メトキシエタノール、2−ブタノール、メタノール、ジメチルホルムアミドまたはそれらの混合物である。
印刷用インクの粘度を、レオメータ、例えばHaakeのMARS Rheometerを用いて決定することができる。決定を、標準環境条件(DIN 50 014-23)下で行う。
回転塗布:回転塗布のために、150μlの溶液を、基板に適用する。用いる基板は、20×20mmの石英または15×15mmのシリコンである(FETの製造のために金電極を有するもの)。時間および速度について選択されるパラメーターは、1000rpmの初期速度において10秒であり、2000rpmの最終速度において20秒である。
用いる印刷用インクは、メトキシエタノール中の、酸化ハフニウム前駆体である、ハフニウムヒドロキソ[2−(メトキシイミノ)プロパノエート]をの10重量パーセント溶液である。1mlの溶液を、手動でコンタクトゾーンに適用する。
・アニロックスロール/プレートシリンダー接触圧 10N
・プレートシリンダー/逆圧シリンダー接触圧 10N
・印刷速度 0.8m/s
・印刷版:フルトーン(full-tone)表面、90%のインク使用量(area coverage)
・アニロックスロール吸収体積 20ml/m2
Claims (16)
- 電子部品をコーティングするための前駆体であって、オキシメートのクラスからの少なくとも1種のリガンドを含有する、有機金属アルミニウム、ガリウム、ネオジム、ルテニウム、マグネシウム、ハフニウム、ジルコニウム、インジウムおよび/またはスズ錯体あるいはその混合物を含むことを特徴とする、前記前駆体。
- リガンドが、2−(メトキシイミノ)アルカノエート、2−(エトキシイミノ)アルカノエートまたは2−(ヒドロキシイミノ)アルカノエートであることを特徴とする、請求項1に記載の前駆体。
- 印刷可能であり、プリント電界効果トランジスタ(FET)において印刷用インクまたは印刷用ペーストの形態で用いることを特徴とする、請求項1または2に記載の前駆体。
- 以下の薄層:
・硬質またはフレキシブル導電性基板、あるいは導電層(ゲート)を有する絶縁基板
・請求項1〜3のいずれか一項に記載の対応する前駆体から得られる酸化アルミニウム、ガリウム、ネオジム、マグネシウム、ハフニウムまたはジルコニウムを含む、絶縁体
・少なくとも1つの電極(ドレイン電極)
・半導体
を有する、プリント電子部品。 - 以下の薄層:
・請求項1〜3のいずれか一項に記載の対応する前駆体から得られる酸化インジウムスズ(ITO)を含む、導電層(ゲート)を有する硬質またはフレキシブル導電性基板あるいは絶縁基板
・絶縁体
・少なくとも1つの電極(ドレイン電極)
・半導体
を有する、プリント電子部品。 - 以下の薄層:
・導電層(ゲート)を有する硬質またはフレキシブル導電性基板あるいは絶縁基板
・絶縁体
・少なくとも1つの電極(ドレイン電極)
・請求項1〜3のいずれか一項に記載の対応する前駆体から得られる、インジウムガリウム亜鉛酸化物(IGZO)または亜鉛スズ酸化物(ZTO)を含む、半導体
を有する、プリント電子部品。 - 基板が、例えばガラス、セラミックス、金属もしくはプラスチック基板などの硬質基板、またはフレキシブル基板、特にプラスチックフィルムもしくは金属箔のいずれかであり得ることを特徴とする、請求項4〜6のいずれか一項に記載のプリント電子部品。
- 請求項1〜3のいずれか一項に記載の前駆体の製造方法であって、少なくとも1種のオキソカルボン酸を、少なくとも1種のヒドロキシルアミンまたはアルキルヒドロキシルアミンと、塩基の存在下で反応させ、無機アルミニウム、ガリウム、ネオジム、ルテニウム、マグネシウム、ハフニウム、ジルコニウム、インジウムおよび/またはスズ塩あるいはその混合物を、その後加えることを特徴とする、前記方法。
- 用いるオキソカルボン酸が、オキソ酢酸、オキソプロピオン酸またはオキソ酪酸であることを特徴とする、請求項8に記載の方法。
- 酸化アルミニウム、ガリウム、ネオジム、ルテニウム、マグネシウム、ハフニウム、ジルコニウム、インジウムおよび/またはスズ層または表面またはその混合物を有する電子構造体の製造方法であって、
a.請求項1〜3のいずれか一項に記載の有機金属アルミニウム、マグネシウム、ガリウム、ネオジム、ルテニウム、ハフニウム、ジルコニウム、インジウムおよび/またはスズ錯体またはその混合物を含む前駆体溶液を、達成するべき電子構造体に対応するいずれか1つまたは2つ以上の層において、浸漬塗布、回転塗布またはインクジェット印刷またはフレキソ印刷/グラビア印刷によって基板に適用し、
b.酸化アルミニウム、ガリウム、ネオジム、ルテニウム、マグネシウム、ハフニウム、ジルコニウム、インジウムおよび/またはスズ層または表面あるいはその混合物を形成させながら、適用した前駆体層を空気中で、または酸素雰囲気中で加熱または乾燥し、
c.最後に、適用された電子構造体を、絶縁層によって密封することができ、これに接点を設け、完成する、
ことを特徴とする、前記方法。 - 加熱中の温度がT≧80℃であることを特徴とする、請求項10に記載の方法。
- 加熱または乾燥を、<400nmの波長を有するUV光を照射することによって行うことを特徴とする、請求項10に記載の方法。
- 酸化アルミニウム、酸化ガリウム、酸化ネオジム、酸化ルテニウム、酸化マグネシウム、酸化ハフニウムまたは酸化ジルコニウム層が、2種の導体の間で>0.1MV/cmの絶縁破壊電圧を有することを特徴とする、請求項10〜12のいずれか一項に記載の方法。
- 酸化インジウムスズ層(ITO層)が、四点測定によって決定される、<10−3オーム・cmの比抵抗を有することを特徴とする、請求項10〜12のいずれか一項に記載の方法。
- インジウムガリウム亜鉛酸化物(IGZO)層または亜鉛スズ酸化物(ZTO)層が、>10−3cm2/Vsの電荷キャリア移動度を有することを特徴とする、請求項10〜12のいずれか一項に記載の方法。
- 請求項1〜3のいずれか一項に記載の前駆体の、電界効果トランジスタにおける1つまたは2つ以上の機能性層の製造のための使用。
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CN104530815B (zh) | 2017-06-06 |
KR101724758B1 (ko) | 2017-04-07 |
US20110272691A1 (en) | 2011-11-10 |
CN102272094B (zh) | 2015-04-22 |
EP2376434A1 (de) | 2011-10-19 |
JP5798041B2 (ja) | 2015-10-21 |
CN104530815A (zh) | 2015-04-22 |
WO2010078907A1 (de) | 2010-07-15 |
TW201035018A (en) | 2010-10-01 |
TWI495630B (zh) | 2015-08-11 |
DE102009004491A1 (de) | 2010-07-15 |
CN102272094A (zh) | 2011-12-07 |
KR20110102509A (ko) | 2011-09-16 |
US8766251B2 (en) | 2014-07-01 |
EP2376434B1 (de) | 2017-05-24 |
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