JP2012513681A5 - - Google Patents
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- Publication number
- JP2012513681A5 JP2012513681A5 JP2011542667A JP2011542667A JP2012513681A5 JP 2012513681 A5 JP2012513681 A5 JP 2012513681A5 JP 2011542667 A JP2011542667 A JP 2011542667A JP 2011542667 A JP2011542667 A JP 2011542667A JP 2012513681 A5 JP2012513681 A5 JP 2012513681A5
- Authority
- JP
- Japan
- Prior art keywords
- light extraction
- extraction structure
- semiconductor chip
- radiation propagation
- area
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000605 extraction Methods 0.000 claims 27
- 239000004065 semiconductor Substances 0.000 claims 27
- 239000000463 material Substances 0.000 claims 20
- 230000005855 radiation Effects 0.000 claims 17
- 230000005693 optoelectronics Effects 0.000 claims 14
- 229910010413 TiO 2 Inorganic materials 0.000 claims 2
- 238000000034 method Methods 0.000 claims 2
- 238000000059 patterning Methods 0.000 claims 2
- 229910002704 AlGaN Inorganic materials 0.000 claims 1
- 230000005670 electromagnetic radiation Effects 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 239000000758 substrate Substances 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102008062932.4 | 2008-12-23 | ||
| DE102008062932A DE102008062932A1 (de) | 2008-12-23 | 2008-12-23 | Optoelektronischer Halbleiterchip und Verfahren zur Herstellung eines optoelektronischen Halbleiterchips |
| PCT/DE2009/001550 WO2010072187A2 (de) | 2008-12-23 | 2009-11-02 | Optoelektronischer halbleiterchip und verfahren zur herstellung eines optoelektronischen halbleiterchips |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2012513681A JP2012513681A (ja) | 2012-06-14 |
| JP2012513681A5 true JP2012513681A5 (enExample) | 2012-11-29 |
| JP5646503B2 JP5646503B2 (ja) | 2014-12-24 |
Family
ID=42063943
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011542667A Active JP5646503B2 (ja) | 2008-12-23 | 2009-11-02 | オプトエレクトロニクス半導体チップおよびオプトエレクトロニクス半導体チップの製造方法 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US8816353B2 (enExample) |
| EP (1) | EP2368278B1 (enExample) |
| JP (1) | JP5646503B2 (enExample) |
| KR (1) | KR101678242B1 (enExample) |
| CN (1) | CN102227825B (enExample) |
| DE (1) | DE102008062932A1 (enExample) |
| WO (1) | WO2010072187A2 (enExample) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102009019161A1 (de) | 2009-04-28 | 2010-11-04 | Osram Opto Semiconductors Gmbh | Leuchtdiode und Verfahren zur Herstellung einer Leuchtdiode |
| DE102011117381A1 (de) | 2011-10-28 | 2013-05-02 | Osram Opto Semiconductors Gmbh | Optoelektronischer Halbleiterchip und Verfahren zur Herstellung eines optoelektronischen Halbleiterchips |
| EP2613367A3 (en) * | 2012-01-06 | 2013-09-04 | Imec | Method for producing a led device . |
| US8896008B2 (en) | 2013-04-23 | 2014-11-25 | Cree, Inc. | Light emitting diodes having group III nitride surface features defined by a mask and crystal planes |
| JP7007923B2 (ja) * | 2018-01-16 | 2022-01-25 | 日機装株式会社 | 半導体発光素子および半導体発光素子の製造方法 |
| DE102018119622A1 (de) * | 2018-08-13 | 2020-02-13 | Osram Opto Semiconductors Gmbh | Optoelektronischer Halbleiterchip und Verfahren zur Herstellung eines optoelektronischen Halbleiterchips |
| US12055758B2 (en) | 2019-01-28 | 2024-08-06 | B.G. Negev Technologies & Applications Ltd., At Ben-Gurion University | Structure for a waveguide facet |
| EP4073557A4 (en) * | 2020-01-20 | 2023-10-18 | B.G. Negev Technologies and Applications Ltd., at Ben-Gurion University | STRUCTURE FOR A WAVEGUIDE FACET |
| DE102020112414A1 (de) * | 2020-05-07 | 2021-11-11 | OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung | Strahlung emittierendes Halbleiterbauelement und Verfahren zur Herstellung eines Strahlung emittierenden Halbleiterbauelements |
Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7026A (en) * | 1850-01-15 | Door-lock | ||
| DE10111501B4 (de) * | 2001-03-09 | 2019-03-21 | Osram Opto Semiconductors Gmbh | Strahlungsemittierendes Halbleiterbauelement und Verfahren zu dessen Herstellung |
| DE10139723A1 (de) | 2001-08-13 | 2003-03-13 | Osram Opto Semiconductors Gmbh | Strahlungsemittierender Chip und strahlungsemittierendes Bauelement |
| DE10234977A1 (de) * | 2002-07-31 | 2004-02-12 | Osram Opto Semiconductors Gmbh | Strahlungsemittierendes Dünnschicht-Halbleiterbauelement auf GaN-Basis |
| DE10313606A1 (de) * | 2003-03-26 | 2004-10-14 | Osram Opto Semiconductors Gmbh | Mechanische Mikrostrukturierung eines Halbleiterchips |
| DE10340271B4 (de) * | 2003-08-29 | 2019-01-17 | Osram Opto Semiconductors Gmbh | Dünnschicht-Leuchtdiodenchip und Verfahren zu seiner Herstellung |
| CN100499184C (zh) * | 2003-09-26 | 2009-06-10 | 奥斯兰姆奥普托半导体有限责任公司 | 发光薄膜半导体芯片 |
| US8835937B2 (en) | 2004-02-20 | 2014-09-16 | Osram Opto Semiconductors Gmbh | Optoelectronic component, device comprising a plurality of optoelectronic components, and method for the production of an optoelectronic component |
| JP4371029B2 (ja) * | 2004-09-29 | 2009-11-25 | サンケン電気株式会社 | 半導体発光素子およびその製造方法 |
| KR100631414B1 (ko) | 2005-05-19 | 2006-10-04 | 삼성전기주식회사 | 반도체 발광 다이오드 및 그 제조방법 |
| KR100631133B1 (ko) | 2005-05-31 | 2006-10-02 | 삼성전기주식회사 | 수직구조 질화물계 반도체 발광 다이오드 |
| JP4986445B2 (ja) | 2005-12-13 | 2012-07-25 | 昭和電工株式会社 | 窒化ガリウム系化合物半導体発光素子 |
| JP2007220972A (ja) * | 2006-02-17 | 2007-08-30 | Showa Denko Kk | 半導体発光素子及びその製造方法、並びにランプ |
| DE102006017573A1 (de) | 2006-04-13 | 2007-10-18 | Osram Opto Semiconductors Gmbh | Optoelektronischer Halbleiterkörper und Verfahren zu dessen Herstellung |
| KR100764403B1 (ko) * | 2006-05-11 | 2007-10-05 | 삼성전기주식회사 | 아조벤젠기 폴리머를 이용한 미세 패터닝 방법을 이용한 질화물계 반도체 발광소자의 제조방법 |
| KR100735470B1 (ko) * | 2006-05-19 | 2007-07-03 | 삼성전기주식회사 | 질화물계 반도체 발광소자의 제조방법 |
| JP5318353B2 (ja) * | 2007-02-14 | 2013-10-16 | 三菱化学株式会社 | GaN系LED素子および発光装置 |
| DE102007061140A1 (de) * | 2007-12-19 | 2009-06-25 | Osram Opto Semiconductors Gmbh | Optoelektronisches Bauelement mit Kühlelement |
-
2008
- 2008-12-23 DE DE102008062932A patent/DE102008062932A1/de not_active Withdrawn
-
2009
- 2009-11-02 US US13/138,034 patent/US8816353B2/en active Active
- 2009-11-02 JP JP2011542667A patent/JP5646503B2/ja active Active
- 2009-11-02 KR KR1020117017209A patent/KR101678242B1/ko active Active
- 2009-11-02 WO PCT/DE2009/001550 patent/WO2010072187A2/de not_active Ceased
- 2009-11-02 EP EP09796292.2A patent/EP2368278B1/de active Active
- 2009-11-02 CN CN200980148152.3A patent/CN102227825B/zh active Active
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