JP2012510149A5 - - Google Patents
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- JP2012510149A5 JP2012510149A5 JP2011536876A JP2011536876A JP2012510149A5 JP 2012510149 A5 JP2012510149 A5 JP 2012510149A5 JP 2011536876 A JP2011536876 A JP 2011536876A JP 2011536876 A JP2011536876 A JP 2011536876A JP 2012510149 A5 JP2012510149 A5 JP 2012510149A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- alkyl
- aryl
- groups
- alkenyl
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 125000005915 C6-C14 aryl group Chemical group 0.000 claims 25
- 125000000217 alkyl group Chemical group 0.000 claims 19
- 125000000753 cycloalkyl group Chemical group 0.000 claims 19
- 229920002554 vinyl polymer Polymers 0.000 claims 19
- 125000003118 aryl group Chemical group 0.000 claims 16
- 125000003837 (C1-C20) alkyl group Chemical group 0.000 claims 14
- 125000004169 (C1-C6) alkyl group Chemical group 0.000 claims 14
- 125000003358 C2-C20 alkenyl group Chemical group 0.000 claims 14
- 125000000882 C2-C6 alkenyl group Chemical group 0.000 claims 14
- 125000006649 (C2-C20) alkynyl group Chemical group 0.000 claims 11
- 229910052736 halogen Inorganic materials 0.000 claims 11
- 150000002367 halogens Chemical class 0.000 claims 11
- 125000001072 heteroaryl group Chemical group 0.000 claims 11
- 125000004093 cyano group Chemical group *C#N 0.000 claims 9
- 125000001188 haloalkyl group Chemical group 0.000 claims 9
- 125000004414 alkyl thio group Chemical group 0.000 claims 8
- 229920000642 polymer Polymers 0.000 claims 8
- 125000003545 alkoxy group Chemical group 0.000 claims 7
- 125000000332 coumarinyl group Chemical group O1C(=O)C(=CC2=CC=CC=C12)* 0.000 claims 6
- 125000000008 (C1-C10) alkyl group Chemical group 0.000 claims 5
- 125000000304 alkynyl group Chemical group 0.000 claims 5
- 239000000178 monomer Substances 0.000 claims 5
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims 5
- 125000000171 (C1-C6) haloalkyl group Chemical group 0.000 claims 4
- 125000006708 (C5-C14) heteroaryl group Chemical group 0.000 claims 4
- 125000006374 C2-C10 alkenyl group Chemical group 0.000 claims 4
- RDOXTESZEPMUJZ-UHFFFAOYSA-N anisole Chemical compound COC1=CC=CC=C1 RDOXTESZEPMUJZ-UHFFFAOYSA-N 0.000 claims 4
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 claims 4
- BGTOWKSIORTVQH-UHFFFAOYSA-N cyclopentanone Chemical compound O=C1CCCC1 BGTOWKSIORTVQH-UHFFFAOYSA-N 0.000 claims 4
- 239000004065 semiconductor Substances 0.000 claims 4
- 125000004191 (C1-C6) alkoxy group Chemical group 0.000 claims 3
- 229910003849 O-Si Inorganic materials 0.000 claims 3
- 229910003872 O—Si Inorganic materials 0.000 claims 3
- 238000000034 method Methods 0.000 claims 3
- 125000001424 substituent group Chemical group 0.000 claims 3
- 125000000027 (C1-C10) alkoxy group Chemical group 0.000 claims 2
- JESXATFQYMPTNL-UHFFFAOYSA-N 2-ethenylphenol Chemical group OC1=CC=CC=C1C=C JESXATFQYMPTNL-UHFFFAOYSA-N 0.000 claims 2
- 125000003601 C2-C6 alkynyl group Chemical group 0.000 claims 2
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 claims 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 claims 2
- 238000002835 absorbance Methods 0.000 claims 2
- 239000011248 coating agent Substances 0.000 claims 2
- 238000000576 coating method Methods 0.000 claims 2
- 229920001577 copolymer Polymers 0.000 claims 2
- 239000010408 film Substances 0.000 claims 2
- 230000009477 glass transition Effects 0.000 claims 2
- 238000004519 manufacturing process Methods 0.000 claims 2
- UZKWTJUDCOPSNM-UHFFFAOYSA-N methoxybenzene Substances CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 claims 2
- 239000002904 solvent Substances 0.000 claims 2
- 239000010409 thin film Substances 0.000 claims 2
- 239000008096 xylene Substances 0.000 claims 2
- 229920001665 Poly-4-vinylphenol Polymers 0.000 claims 1
- 229920002873 Polyethylenimine Polymers 0.000 claims 1
- 239000004793 Polystyrene Substances 0.000 claims 1
- 239000004372 Polyvinyl alcohol Substances 0.000 claims 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M acrylate group Chemical group C(C=C)(=O)[O-] NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims 1
- 238000004132 cross linking Methods 0.000 claims 1
- 238000000151 deposition Methods 0.000 claims 1
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 claims 1
- 125000000232 haloalkynyl group Chemical group 0.000 claims 1
- 125000004043 oxo group Chemical group O=* 0.000 claims 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 claims 1
- -1 polymaleimides Polymers 0.000 claims 1
- 238000006116 polymerization reaction Methods 0.000 claims 1
- 239000004926 polymethyl methacrylate Substances 0.000 claims 1
- 229920002223 polystyrene Polymers 0.000 claims 1
- 229920002689 polyvinyl acetate Polymers 0.000 claims 1
- 239000011118 polyvinyl acetate Substances 0.000 claims 1
- 229920002451 polyvinyl alcohol Polymers 0.000 claims 1
- 230000005855 radiation Effects 0.000 claims 1
- 239000000758 substrate Substances 0.000 claims 1
- 0 C*(C)C(CC(C)(C)C)c(cc1)ccc1OC(COc(cc1)cc(C=C2)c1OC2=O)=O Chemical compound C*(C)C(CC(C)(C)C)c(cc1)ccc1OC(COc(cc1)cc(C=C2)c1OC2=O)=O 0.000 description 8
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11740408P | 2008-11-24 | 2008-11-24 | |
| US61/117,404 | 2008-11-24 | ||
| PCT/EP2009/065569 WO2010057984A2 (en) | 2008-11-24 | 2009-11-20 | Photocurable polymeric dielectrics and methods of preparation and use thereof |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014139115A Division JP5960202B2 (ja) | 2008-11-24 | 2014-07-04 | 光硬化性ポリマー性誘電体、及びその製造方法、及びその使用方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2012510149A JP2012510149A (ja) | 2012-04-26 |
| JP2012510149A5 true JP2012510149A5 (https=) | 2013-02-14 |
| JP5684715B2 JP5684715B2 (ja) | 2015-03-18 |
Family
ID=42084518
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011536876A Active JP5684715B2 (ja) | 2008-11-24 | 2009-11-20 | 光硬化性ポリマー性誘電体、及びその製造方法、及びその使用方法 |
| JP2014139115A Expired - Fee Related JP5960202B2 (ja) | 2008-11-24 | 2014-07-04 | 光硬化性ポリマー性誘電体、及びその製造方法、及びその使用方法 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014139115A Expired - Fee Related JP5960202B2 (ja) | 2008-11-24 | 2014-07-04 | 光硬化性ポリマー性誘電体、及びその製造方法、及びその使用方法 |
Country Status (7)
| Country | Link |
|---|---|
| US (2) | US8937301B2 (https=) |
| EP (2) | EP2368281B1 (https=) |
| JP (2) | JP5684715B2 (https=) |
| KR (2) | KR101712680B1 (https=) |
| CN (2) | CN102224611B (https=) |
| TW (1) | TWI491622B (https=) |
| WO (1) | WO2010057984A2 (https=) |
Families Citing this family (27)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2011126076A1 (ja) * | 2010-04-09 | 2011-10-13 | 大日本印刷株式会社 | 薄膜トランジスタ基板 |
| CN103403127A (zh) | 2011-03-30 | 2013-11-20 | 株式会社艾迪科 | 聚合性液晶组合物、偏振发光性涂料、新型萘内酰胺衍生物、新型香豆素衍生物、新型尼罗红衍生物以及新型蒽衍生物 |
| TWI589602B (zh) * | 2012-02-07 | 2017-07-01 | 飛利斯有限公司 | 可光固化聚合材料及相關電子裝置 |
| US9171961B2 (en) | 2012-07-11 | 2015-10-27 | Polyera Corporation | Coating materials for oxide thin film transistors |
| CN105264648B (zh) * | 2013-06-07 | 2018-02-09 | 富士胶片株式会社 | 栅极绝缘膜形成用组合物、有机薄膜晶体管、电子纸及显示装置 |
| KR20160103083A (ko) | 2013-12-24 | 2016-08-31 | 폴리에라 코퍼레이션 | 탈부착형 2차원 플렉서블 전자 기기용 지지 구조물 |
| JP6034326B2 (ja) * | 2014-03-26 | 2016-11-30 | 富士フイルム株式会社 | 半導体素子及び絶縁層形成用組成物 |
| US10261634B2 (en) | 2014-03-27 | 2019-04-16 | Flexterra, Inc. | Infrared touch system for flexible displays |
| WO2015183567A1 (en) | 2014-05-28 | 2015-12-03 | Polyera Corporation | Low power display updates |
| US9606439B2 (en) | 2014-07-15 | 2017-03-28 | Eastman Kodak Company | Forming conductive metal patterns using water-soluble polymers |
| US10020456B2 (en) * | 2014-09-25 | 2018-07-10 | Basf Se | Ether-based polymers as photo-crosslinkable dielectrics |
| WO2016065276A1 (en) * | 2014-10-24 | 2016-04-28 | Polyera Corporation | Photopatternable compositions and methods of fabricating transistor devices using same |
| US9761817B2 (en) | 2015-03-13 | 2017-09-12 | Corning Incorporated | Photo-patternable gate dielectrics for OFET |
| US10254795B2 (en) | 2015-05-06 | 2019-04-09 | Flexterra, Inc. | Attachable, flexible display device with flexible tail |
| EP3133065A1 (en) * | 2015-08-21 | 2017-02-22 | Merck Patent GmbH | Compounds for optically active devices |
| WO2017038948A1 (ja) * | 2015-09-02 | 2017-03-09 | 富士フイルム株式会社 | 有機薄膜トランジスタ、有機薄膜トランジスタの製造方法、有機半導体組成物、有機半導体膜および有機半導体膜の製造方法 |
| DE102015119939A1 (de) | 2015-11-18 | 2017-05-18 | ALTANA Aktiengesellschaft | Vernetzbare polymere Materialien für dielektrische Schichten in elektronischen Bauteilen |
| CN105628262A (zh) * | 2015-12-20 | 2016-06-01 | 华南理工大学 | 基于有机弹性体栅绝缘层的薄膜晶体管压力传感器 |
| CN105810819B (zh) * | 2016-05-04 | 2018-09-04 | 国家纳米科学中心 | 一种有机分子螺旋生长薄膜场效应晶体管及其制备方法和应用 |
| JP6801374B2 (ja) * | 2016-10-31 | 2020-12-16 | 東ソー株式会社 | 重合体、絶縁膜及びこれを含む有機電界効果トランジスタデバイス |
| TWI614505B (zh) * | 2017-02-18 | 2018-02-11 | 以紫外光照射提高矽基表面原生氧化層品質之裝置與方法 | |
| WO2018168676A1 (ja) | 2017-03-16 | 2018-09-20 | 東ソー株式会社 | 光架橋性重合体、絶縁膜、平坦化膜、親撥パターニング膜及びこれを含む有機電界効果トランジスタデバイス |
| CN110418808B (zh) | 2017-03-16 | 2022-07-15 | 东曹株式会社 | 光交联性聚合物、绝缘膜、平坦化膜、亲疏图案化膜和包含其的有机场效应晶体管器件 |
| CN107621751B (zh) * | 2017-09-21 | 2021-02-09 | 儒芯微电子材料（上海）有限公司 | 含碱性香豆素结构的聚合物树脂及其光刻胶组合物 |
| KR102540663B1 (ko) * | 2021-04-29 | 2023-06-12 | 이화여자대학교 산학협력단 | 병솔 고분자를 포함하는 트랜지스터 게이트절연층용 고분자 박막 및 이를 포함하는 유기전계효과트랜지스터 |
| WO2023033873A1 (en) * | 2021-08-30 | 2023-03-09 | Flexterra, Inc. | Colored dielectric polymer materials and devices using them |
| CN113793901B (zh) * | 2021-09-16 | 2023-11-07 | 南京大学 | 一种基于聚合物掺杂n-型有机半导体的并五苯有机场效应晶体管 |
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| US7605225B2 (en) * | 2006-05-11 | 2009-10-20 | Northwestern University | Silole-based polymers and semiconductor materials prepared from the same |
| WO2007146250A2 (en) * | 2006-06-12 | 2007-12-21 | Northwestern University | Naphthalene-based semiconductor materials and methods of preparing and use thereof |
| KR101224723B1 (ko) * | 2006-09-15 | 2013-01-21 | 삼성전자주식회사 | 유기 절연막 조성물, 이를 이용하여 제조된 유기 절연막 및유기 박막 트랜지스터 |
| EP2089398A2 (en) * | 2006-10-25 | 2009-08-19 | Polyera Corporation | Organic semiconductor materials and methods of preparing and use thereof |
| US7892454B2 (en) | 2006-11-17 | 2011-02-22 | Polyera Corporation | Acene-based organic semiconductor materials and methods of preparing and using the same |
| WO2008063609A2 (en) | 2006-11-17 | 2008-05-29 | Polyera Corporation | Diimide-based semiconductor materials and methods of preparing and using the same |
| US7981989B2 (en) * | 2006-11-28 | 2011-07-19 | Polyera Corporation | Photopolymer-based dielectric materials and methods of preparation and use thereof |
| CN101622253B (zh) | 2007-01-08 | 2015-04-29 | 破立纪元有限公司 | 用于制备基于芳烃-双（二羧酰亚胺）的半导体材料的方法和用于制备它们的相关中间体 |
| WO2008091670A2 (en) * | 2007-01-24 | 2008-07-31 | Polyera Corporation | Organic semiconductor materials and precursors thereof |
| KR101316291B1 (ko) * | 2007-02-16 | 2013-10-08 | 삼성전자주식회사 | 공중합체, 유기절연층 조성물 및 그를 이용하여 제조된유기 절연층 및 유기 박막 트랜지스터 |
| JP4911469B2 (ja) * | 2007-09-28 | 2012-04-04 | 富士フイルム株式会社 | レジスト組成物及びこれを用いたパターン形成方法 |
| EP2240970B1 (en) * | 2008-02-05 | 2018-03-14 | Basf Se | Perylene semiconductors and methods of preparation and use thereof |
| EP2240529B1 (en) * | 2008-02-05 | 2017-07-19 | Basf Se | Naphthalene-imide semiconductor polymers |
| WO2009144205A1 (en) * | 2008-05-30 | 2009-12-03 | Basf Se | Rylene-based semiconductor materials and methods of preparation and use thereof |
| CN102083883B (zh) * | 2008-07-02 | 2016-01-20 | 巴斯夫欧洲公司 | 基于供体/受体交替共聚物的高性能可溶液加工半导体聚合物 |
| WO2011088343A2 (en) * | 2010-01-17 | 2011-07-21 | Polyera Corporation | Dielectric materials and methods of preparation and use thereof |
| US8883546B2 (en) * | 2010-09-02 | 2014-11-11 | Merck Patent Gmbh | Process for preparing an organic electronic device |
| US9171961B2 (en) * | 2012-07-11 | 2015-10-27 | Polyera Corporation | Coating materials for oxide thin film transistors |
-
2009
- 2009-11-20 WO PCT/EP2009/065569 patent/WO2010057984A2/en not_active Ceased
- 2009-11-20 EP EP09759719.9A patent/EP2368281B1/en not_active Not-in-force
- 2009-11-20 CN CN200980146851.4A patent/CN102224611B/zh not_active Expired - Fee Related
- 2009-11-20 KR KR1020117014710A patent/KR101712680B1/ko active Active
- 2009-11-20 CN CN201310529741.4A patent/CN103560206B/zh not_active Expired - Fee Related
- 2009-11-20 KR KR1020157036689A patent/KR101717398B1/ko active Active
- 2009-11-20 JP JP2011536876A patent/JP5684715B2/ja active Active
- 2009-11-20 US US13/128,961 patent/US8937301B2/en active Active
- 2009-11-20 EP EP20130179103 patent/EP2660889A3/en not_active Withdrawn
- 2009-11-24 TW TW098139975A patent/TWI491622B/zh not_active IP Right Cessation
-
2014
- 2014-07-04 JP JP2014139115A patent/JP5960202B2/ja not_active Expired - Fee Related
- 2014-08-25 US US14/467,839 patent/US9923158B2/en active Active
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