JP2012507634A - テストガラス変動システム - Google Patents
テストガラス変動システム Download PDFInfo
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- JP2012507634A JP2012507634A JP2011535044A JP2011535044A JP2012507634A JP 2012507634 A JP2012507634 A JP 2012507634A JP 2011535044 A JP2011535044 A JP 2011535044A JP 2011535044 A JP2011535044 A JP 2011535044A JP 2012507634 A JP2012507634 A JP 2012507634A
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- Prior art keywords
- test glass
- test
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- coating
- glass
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
- C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
- C23C14/547—Controlling the film thickness or evaporation rate using measurement on deposited material using optical methods
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
- C23C14/566—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases using a load-lock chamber
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
- G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
- G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
- G01B11/0683—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating measurement during deposition or removal of the layer
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Physical Vapour Deposition (AREA)
- Testing Resistance To Weather, Investigating Materials By Mechanical Methods (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
Abstract
Description
2 ターンテーブル
3 真空被覆装置
4 回動装置
5 回動軸線
5’ 軸線
6 凹部
6’ 貫通孔
7 基板
8,8’’ テストガラスホルダ
9,9’’ 回動装置
10,10’’ テストガラス変動システム
11 被覆ステーション
12 スパッタリング装置
13 測定ステーション
14 光学式の測定装置
15 測定光線
16 ディテクタ
17 天井
18 床
19 窓
20 基板ロードロック室
21 持上げ装置
22 パンチ
23 大円
24 テストガラス
24’,24’’ 測定ガラス
25 基体
26 テストガラスプレート
26’ モニタガラス
26’’ 支持プレート
27,27’’ 開口
28,28’’ カバー
29,29’’ 測定窓
30,30’’ 基準窓
31 領域
31’ 別の領域
32 変動ステーション
33,33’’ 角度
34,34’’ 持上げ/回動装置
35,35’’ 環状体
36 持上げエレメント
36’ ピン
36’’ ウェブ
37,37’’ 環状体
38 持上げエレメント
38’ ピン
38’’ ウェブ
39,39’’ 中心点
40 中心点
41 中空室
42 内室
43’’ 管区分
44’’ 縁部
Claims (9)
- 真空被覆装置(3)の被覆チャンバ(1)内でテストガラス(24,24’’)を選択的に被覆しかつ光学的に測定するためのテストガラス変動システム(10,10’’)であって、被覆チャンバ(1)内に、被覆材料の流れを通る軌道において少なくとも1つの基板(7)を案内するための可動のターンテーブル(2)が配置されており、
−テストガラス変動システム(10,10’’)が、テストガラスホルダ(8,8’’)を有しており、該テストガラスホルダ(8,8’’)が、テストガラス(24,24’’)を収容するためのテストガラスプレート(26)と、該テストガラスプレート(26)を選択的に覆うためのカバー(28,28’’)とを有しており、
−テストガラス変動システム(10)が、ターンテーブル(2)の回動軸線(5)に対してほぼ平行に方向付けられた軸線(5’)を中心としてテストガラスプレート(26)を回動させるための回動装置(9)を有している形式のものにおいて、
テストガラスホルダ(8,8’’)が、ユニットとしてターンテーブル(2)に位置決め可能であり、被覆チャンバ(1)から取出し可能であることを特徴とする、真空被覆装置の被覆チャンバ内でテストガラスを選択的に被覆しかつ光学的に測定するためのテストガラス変動システム。 - テストガラスプレート(26)が、円板状のモニタガラス(26’)によって形成されている、請求項1記載のテストガラス変動システム。
- モニタガラス(26’)が、中心の開口(27)を有している、請求項2記載のテストガラス変動システム。
- テストガラスプレート(26)が、多数のテストガラス(24’’)を収容するための支持プレート(26’’)として形成されている、請求項1記載のテストガラス変動システム。
- テストガラス回動装置(9)が、持上げ/回動装置(34)として形成されており、該持上げ/回動装置(34)によって、
−テストガラスプレート(26)が、ターンテーブル(2)に対して軸線方向(5’)に移動可能であり、
−カバー(28,28’’)が、テストガラスプレート(26)に対して軸線方向(5’)に移動可能であり、
−テストガラスプレート(26)が、軸線方向(5’)を中心として回動可能である、
請求項1から4までのいずれか1項記載のテストガラス変動システム。 - 持上げ/回動装置(34)が、カバー(28,28’’)を持ち上げるための第1の環状体(37,37’’)と、テストガラスプレート(26)を持ち上げかつ回動させるための第2の環状体(35,35’’)とを有している、請求項5記載のテストガラス変動システム。
- 持上げ/回動装置(34)が、加工チャンバ(1)内に定置に配置されている、請求項5または6記載のテストガラス変動システム。
- 持上げ/回動装置(34)が、ターンテーブル(2)に配置されている、請求項5または6記載のテストガラス変動システム。
- ターンテーブル(2)に前記基板を装着するための基板ロードロック室(20)が設けられている、請求項1から8までのいずれか1項記載のテストガラス変動システム。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102008056125.8 | 2008-11-06 | ||
DE102008056125A DE102008056125A1 (de) | 2008-11-06 | 2008-11-06 | Testglaswechselsystem zur selektiven Beschichtung und optischen Messung von Schichteigenschaften in einer Vakuumbeschichtungsanlage |
PCT/EP2009/007938 WO2010052000A1 (de) | 2008-11-06 | 2009-11-05 | Testglaswechselsystem |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2012507634A true JP2012507634A (ja) | 2012-03-29 |
JP5675632B2 JP5675632B2 (ja) | 2015-02-25 |
Family
ID=41571836
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2011535044A Expired - Fee Related JP5675632B2 (ja) | 2008-11-06 | 2009-11-05 | テストガラス変動システム |
Country Status (7)
Country | Link |
---|---|
US (1) | US9157147B2 (ja) |
EP (1) | EP2356265B1 (ja) |
JP (1) | JP5675632B2 (ja) |
KR (1) | KR20110083701A (ja) |
CN (1) | CN102272348B (ja) |
DE (1) | DE102008056125A1 (ja) |
WO (1) | WO2010052000A1 (ja) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102012010794A1 (de) * | 2011-09-02 | 2013-03-07 | Leybold Optics Gmbh | Testglaswechseln |
US10811285B2 (en) * | 2017-05-31 | 2020-10-20 | Taiwan Semiconductor Manufacturing Company, Ltd. | Vapor shield replacement system and method |
CN111218649A (zh) * | 2018-11-27 | 2020-06-02 | 深圳市融光纳米科技有限公司 | 一种光学薄膜颜料片的制备方法及制备装置 |
DE102020201829A1 (de) * | 2020-02-13 | 2021-08-19 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung eingetragener Verein | Vorrichtung und Verfahren zur Herstellung von Schichten mit verbesserter Uniformität bei Beschichtungsanlagen mit horizontal rotierender Substratführung mit zusätzlichen Plasmaquellen |
CN112176309B (zh) * | 2020-11-27 | 2021-04-09 | 江苏永鼎光电子技术有限公司 | 用于镀膜机的激光直接光控装置 |
DE112021006491A5 (de) * | 2020-12-17 | 2024-04-25 | Solayer Gmbh | Verfahren und Vorrichtung zum Wechsel von Testsubstraten in einer Vakuumdurchlaufanlage, Behandlungsverfahren und Vakuumdurchlaufanlage |
Citations (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5367684A (en) * | 1976-11-26 | 1978-06-16 | Bosch Gmbh Robert | Method and apparatus for continuously coating glass or ceramic substrate by cathode sputtering |
JPS62192605A (ja) * | 1986-02-14 | 1987-08-24 | ライボルト−ヘレ−ウス・ゲゼルシヤフト・ミツト・ベシユレンクテル・ハフツング | 真空式コ−テイング機械内の、コ−テイング膜特性を光学的に測定するためのテストガラス交換装置 |
JPH0641746A (ja) * | 1992-03-30 | 1994-02-15 | Leybold Ag | 多室形被覆装置 |
JPH06310438A (ja) * | 1993-04-22 | 1994-11-04 | Mitsubishi Electric Corp | 化合物半導体気相成長用基板ホルダおよび化合物半導体気相成長装置 |
JPH0770749A (ja) * | 1993-09-03 | 1995-03-14 | Canon Inc | 薄膜形成方法および装置 |
JPH0772307A (ja) * | 1993-09-03 | 1995-03-17 | Canon Inc | 薄膜形成方法及び装置 |
US5911856A (en) * | 1993-09-03 | 1999-06-15 | Canon Kabushiki Kaisha | Method for forming thin film |
JP2000054131A (ja) * | 1998-08-04 | 2000-02-22 | Leybold Syst Gmbh | 真空室内の基板をコ―ティングするための装置 |
JP2002022418A (ja) * | 2000-07-07 | 2002-01-23 | Nikon Corp | 膜厚測定方法 |
JP2005320622A (ja) * | 2004-03-15 | 2005-11-17 | Applied Films Gmbh & Co Kg | 交換可能メンテナンス弁 |
JP2007023380A (ja) * | 2005-07-19 | 2007-02-01 | Applied Materials Inc | ハイブリッドpvd−cvdシステム |
JP2007231303A (ja) * | 2006-02-27 | 2007-09-13 | Shincron:Kk | 薄膜形成装置 |
JP2008038225A (ja) * | 2006-08-09 | 2008-02-21 | Tokyo Electron Ltd | 成膜装置、成膜システムおよび成膜方法 |
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US3698946A (en) * | 1969-11-21 | 1972-10-17 | Hughes Aircraft Co | Transparent conductive coating and process therefor |
DD202897A1 (de) * | 1981-07-31 | 1983-10-05 | Ulrike Ehrlich | Einrichtung zum wechseln von testglaesern in vakuum-bedampfungsanlagen |
US4878755A (en) * | 1986-03-29 | 1989-11-07 | Leybold Aktiengesellschaft | Process and device for measuring the optical properties of thin layers |
JP2913745B2 (ja) * | 1990-04-10 | 1999-06-28 | 松下電器産業株式会社 | 真空蒸着装置 |
CH691306A5 (de) * | 1996-05-10 | 2001-06-29 | Satis Vacuum Ind Vertriebs Ag | Vakuum-Beschichtunsanlage zum Aufdampfen von Vergütungsschichten auf optische Substrate. |
DE10204075B4 (de) * | 2002-02-01 | 2006-09-07 | Leybold Optics Gmbh | Vorrichtung für Einrichtungen zur Bestimmung von Eigenschaften aufgebrachter Schichten |
US6879744B2 (en) * | 2003-01-07 | 2005-04-12 | Georgi A. Atanasov | Optical monitoring of thin film deposition |
-
2008
- 2008-11-06 DE DE102008056125A patent/DE102008056125A1/de not_active Withdrawn
-
2009
- 2009-11-05 KR KR1020117012573A patent/KR20110083701A/ko not_active Application Discontinuation
- 2009-11-05 CN CN200980153904.5A patent/CN102272348B/zh not_active Expired - Fee Related
- 2009-11-05 US US13/127,520 patent/US9157147B2/en not_active Expired - Fee Related
- 2009-11-05 JP JP2011535044A patent/JP5675632B2/ja not_active Expired - Fee Related
- 2009-11-05 WO PCT/EP2009/007938 patent/WO2010052000A1/de active Application Filing
- 2009-11-05 EP EP09778893.9A patent/EP2356265B1/de not_active Not-in-force
Patent Citations (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5367684A (en) * | 1976-11-26 | 1978-06-16 | Bosch Gmbh Robert | Method and apparatus for continuously coating glass or ceramic substrate by cathode sputtering |
JPS62192605A (ja) * | 1986-02-14 | 1987-08-24 | ライボルト−ヘレ−ウス・ゲゼルシヤフト・ミツト・ベシユレンクテル・ハフツング | 真空式コ−テイング機械内の、コ−テイング膜特性を光学的に測定するためのテストガラス交換装置 |
JPH0641746A (ja) * | 1992-03-30 | 1994-02-15 | Leybold Ag | 多室形被覆装置 |
JPH06310438A (ja) * | 1993-04-22 | 1994-11-04 | Mitsubishi Electric Corp | 化合物半導体気相成長用基板ホルダおよび化合物半導体気相成長装置 |
JPH0770749A (ja) * | 1993-09-03 | 1995-03-14 | Canon Inc | 薄膜形成方法および装置 |
JPH0772307A (ja) * | 1993-09-03 | 1995-03-17 | Canon Inc | 薄膜形成方法及び装置 |
US5911856A (en) * | 1993-09-03 | 1999-06-15 | Canon Kabushiki Kaisha | Method for forming thin film |
JP2000054131A (ja) * | 1998-08-04 | 2000-02-22 | Leybold Syst Gmbh | 真空室内の基板をコ―ティングするための装置 |
JP2002022418A (ja) * | 2000-07-07 | 2002-01-23 | Nikon Corp | 膜厚測定方法 |
JP2005320622A (ja) * | 2004-03-15 | 2005-11-17 | Applied Films Gmbh & Co Kg | 交換可能メンテナンス弁 |
JP2007023380A (ja) * | 2005-07-19 | 2007-02-01 | Applied Materials Inc | ハイブリッドpvd−cvdシステム |
JP2007231303A (ja) * | 2006-02-27 | 2007-09-13 | Shincron:Kk | 薄膜形成装置 |
JP2008038225A (ja) * | 2006-08-09 | 2008-02-21 | Tokyo Electron Ltd | 成膜装置、成膜システムおよび成膜方法 |
Also Published As
Publication number | Publication date |
---|---|
CN102272348B (zh) | 2014-11-26 |
KR20110083701A (ko) | 2011-07-20 |
US20110265583A1 (en) | 2011-11-03 |
US9157147B2 (en) | 2015-10-13 |
WO2010052000A1 (de) | 2010-05-14 |
JP5675632B2 (ja) | 2015-02-25 |
EP2356265A1 (de) | 2011-08-17 |
EP2356265B1 (de) | 2014-03-05 |
DE102008056125A1 (de) | 2010-05-12 |
CN102272348A (zh) | 2011-12-07 |
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