JP2012507173A5 - - Google Patents

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Publication number
JP2012507173A5
JP2012507173A5 JP2011534488A JP2011534488A JP2012507173A5 JP 2012507173 A5 JP2012507173 A5 JP 2012507173A5 JP 2011534488 A JP2011534488 A JP 2011534488A JP 2011534488 A JP2011534488 A JP 2011534488A JP 2012507173 A5 JP2012507173 A5 JP 2012507173A5
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JP
Japan
Prior art keywords
substrate
template
alignment
detector
light
Prior art date
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Application number
JP2011534488A
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English (en)
Japanese (ja)
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JP2012507173A (ja
JP5159957B2 (ja
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Priority claimed from US12/580,324 external-priority patent/US8345242B2/en
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Publication of JP2012507173A publication Critical patent/JP2012507173A/ja
Publication of JP2012507173A5 publication Critical patent/JP2012507173A5/ja
Application granted granted Critical
Publication of JP5159957B2 publication Critical patent/JP5159957B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2011534488A 2008-10-28 2009-10-20 ステージ制御用光学システム Expired - Fee Related JP5159957B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US10894108P 2008-10-28 2008-10-28
US61/108,941 2008-10-28
US12/580,324 2009-10-16
US12/580,324 US8345242B2 (en) 2008-10-28 2009-10-16 Optical system for use in stage control
PCT/US2009/005690 WO2010051015A1 (en) 2008-10-28 2009-10-20 Optical system for use in stage control

Publications (3)

Publication Number Publication Date
JP2012507173A JP2012507173A (ja) 2012-03-22
JP2012507173A5 true JP2012507173A5 (cg-RX-API-DMAC7.html) 2012-12-06
JP5159957B2 JP5159957B2 (ja) 2013-03-13

Family

ID=42116699

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011534488A Expired - Fee Related JP5159957B2 (ja) 2008-10-28 2009-10-20 ステージ制御用光学システム

Country Status (3)

Country Link
US (1) US8345242B2 (cg-RX-API-DMAC7.html)
JP (1) JP5159957B2 (cg-RX-API-DMAC7.html)
WO (1) WO2010051015A1 (cg-RX-API-DMAC7.html)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5498448B2 (ja) * 2011-07-21 2014-05-21 株式会社東芝 インプリント方法及びインプリントシステム
CN103631086A (zh) * 2012-08-21 2014-03-12 华中科技大学 一种用于集成光电子器件的微纳图形的制作方法及应用
US10248018B2 (en) * 2015-03-30 2019-04-02 Canon Kabushiki Kaisha Imprint apparatus and method of manufacturing article
DE102015110264A1 (de) * 2015-06-25 2016-12-29 Cl Schutzrechtsverwaltungs Gmbh Vorrichtung zur generativen Herstellung wenigstens eines dreidimensionalen Objekts
JP6799397B2 (ja) * 2015-08-10 2020-12-16 キヤノン株式会社 インプリント装置、および物品の製造方法
WO2018027073A1 (en) * 2016-08-03 2018-02-08 Board Of Regents, The University Of Texas System Wafer-scale programmable films for semiconductor planarization and for imprint lithography
US10416576B2 (en) * 2016-09-14 2019-09-17 Canon Kabushiki Kaisha Optical system for use in stage control
US9971147B2 (en) 2016-09-26 2018-05-15 Xerox Corporation Integrated micro-channel heatsink in DMD substrate for enhanced cooling capacity
JP6818522B2 (ja) * 2016-11-17 2021-01-20 キヤノン株式会社 インプリント装置、および物品製造方法
JP6827785B2 (ja) * 2016-11-30 2021-02-10 キヤノン株式会社 インプリント装置、インプリント方法、および物品の製造方法
JP6606567B2 (ja) * 2017-04-17 2019-11-13 キヤノン株式会社 インプリント装置及び物品の製造方法
US10998190B2 (en) * 2017-04-17 2021-05-04 Canon Kabushiki Kaisha Imprint apparatus and method of manufacturing article
CN110500968B (zh) * 2019-07-11 2021-04-20 北京理工大学 基于稀疏傅里叶变换的数字莫尔干涉相位实时测量方法

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US6873087B1 (en) 1999-10-29 2005-03-29 Board Of Regents, The University Of Texas System High precision orientation alignment and gap control stages for imprint lithography processes
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JP2004505273A (ja) 2000-08-01 2004-02-19 ボード・オブ・リージエンツ，ザ・ユニバーシテイ・オブ・テキサス・システム 転写リソグラフィのための透明テンプレートと基板の間のギャップおよび配向を高精度でセンシングするための方法
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TWI340875B (en) 2004-08-10 2011-04-21 Asml Netherlands Bv Imprint lithographic apparatus, device manufacturing method and device manufactured thereby
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US20070231421A1 (en) 2006-04-03 2007-10-04 Molecular Imprints, Inc. Enhanced Multi Channel Alignment
KR20070086766A (ko) 2004-12-01 2007-08-27 몰레큘러 임프린츠 인코퍼레이티드 임프린트 리소그래피 공정용 열관리를 위한 노출 방법
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US7547398B2 (en) 2006-04-18 2009-06-16 Molecular Imprints, Inc. Self-aligned process for fabricating imprint templates containing variously etched features
US7837907B2 (en) 2007-07-20 2010-11-23 Molecular Imprints, Inc. Alignment system and method for a substrate in a nano-imprint process
US20090147237A1 (en) 2007-12-05 2009-06-11 Molecular Imprints, Inc. Spatial Phase Feature Location

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