JP2012506601A5 - - Google Patents

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Publication number
JP2012506601A5
JP2012506601A5 JP2011533240A JP2011533240A JP2012506601A5 JP 2012506601 A5 JP2012506601 A5 JP 2012506601A5 JP 2011533240 A JP2011533240 A JP 2011533240A JP 2011533240 A JP2011533240 A JP 2011533240A JP 2012506601 A5 JP2012506601 A5 JP 2012506601A5
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JP
Japan
Prior art keywords
thin film
magnetic thin
resist
pattern
high energy
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JP2011533240A
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English (en)
Japanese (ja)
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JP5640011B2 (ja
JP2012506601A (ja
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Priority claimed from US12/255,865 external-priority patent/US8551578B2/en
Priority claimed from US12/255,833 external-priority patent/US8535766B2/en
Application filed filed Critical
Priority claimed from PCT/US2009/060868 external-priority patent/WO2010048030A2/en
Publication of JP2012506601A publication Critical patent/JP2012506601A/ja
Publication of JP2012506601A5 publication Critical patent/JP2012506601A5/ja
Application granted granted Critical
Publication of JP5640011B2 publication Critical patent/JP5640011B2/ja
Expired - Fee Related legal-status Critical Current
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JP2011533240A 2008-10-22 2009-10-15 高エネルギーイオンを使用する磁気薄膜のパターン化 Expired - Fee Related JP5640011B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US12/255,865 US8551578B2 (en) 2008-02-12 2008-10-22 Patterning of magnetic thin film using energized ions and thermal excitation
US12/255,833 US8535766B2 (en) 2008-10-22 2008-10-22 Patterning of magnetic thin film using energized ions
US12/255,833 2008-10-22
US12/255,865 2008-10-22
PCT/US2009/060868 WO2010048030A2 (en) 2008-10-22 2009-10-15 Patterning of magnetic thin film using energized ions

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2014114835A Division JP5863882B2 (ja) 2008-10-22 2014-06-03 高エネルギーイオンを使用する磁気薄膜のパターン化

Publications (3)

Publication Number Publication Date
JP2012506601A JP2012506601A (ja) 2012-03-15
JP2012506601A5 true JP2012506601A5 (enExample) 2012-11-29
JP5640011B2 JP5640011B2 (ja) 2014-12-10

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ID=42119905

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2011533240A Expired - Fee Related JP5640011B2 (ja) 2008-10-22 2009-10-15 高エネルギーイオンを使用する磁気薄膜のパターン化
JP2014114835A Expired - Fee Related JP5863882B2 (ja) 2008-10-22 2014-06-03 高エネルギーイオンを使用する磁気薄膜のパターン化

Family Applications After (1)

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JP2014114835A Expired - Fee Related JP5863882B2 (ja) 2008-10-22 2014-06-03 高エネルギーイオンを使用する磁気薄膜のパターン化

Country Status (5)

Country Link
JP (2) JP5640011B2 (enExample)
KR (1) KR101622568B1 (enExample)
CN (2) CN102197426B (enExample)
TW (1) TWI478159B (enExample)
WO (1) WO2010048030A2 (enExample)

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JP5238781B2 (ja) * 2010-09-17 2013-07-17 株式会社東芝 磁気記録媒体の製造方法
US8679356B2 (en) 2011-05-19 2014-03-25 Varian Semiconductor Equipment Associates, Inc. Mask system and method of patterning magnetic media
FR2991096B1 (fr) * 2012-05-22 2014-06-20 Centre Nat Rech Scient Procede de fabrication d'un film comprenant des microstructures magnetiques tridimensionnelles
US9384773B2 (en) * 2013-03-15 2016-07-05 HGST Netherlands, B.V. Annealing treatment for ion-implanted patterned media
KR102260263B1 (ko) 2014-10-14 2021-06-02 엘지디스플레이 주식회사 터치 패널 및 터치 패널 일체형 유기 발광 표시 장치
KR102299875B1 (ko) 2014-11-07 2021-09-07 엘지디스플레이 주식회사 터치 패널, 이의 제조 방법 및 터치 패널 일체형 유기 발광 표시 장치
KR20170012798A (ko) * 2015-07-24 2017-02-03 에스케이하이닉스 주식회사 전자 장치 및 그 제조 방법

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