JP2012505313A5 - - Google Patents

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Publication number
JP2012505313A5
JP2012505313A5 JP2011531218A JP2011531218A JP2012505313A5 JP 2012505313 A5 JP2012505313 A5 JP 2012505313A5 JP 2011531218 A JP2011531218 A JP 2011531218A JP 2011531218 A JP2011531218 A JP 2011531218A JP 2012505313 A5 JP2012505313 A5 JP 2012505313A5
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JP
Japan
Prior art keywords
chamber
substrate support
support assembly
return path
disposed
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JP2011531218A
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English (en)
Japanese (ja)
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JP2012505313A (ja
JP5683469B2 (ja
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Priority claimed from PCT/US2009/060230 external-priority patent/WO2010042860A2/en
Publication of JP2012505313A publication Critical patent/JP2012505313A/ja
Publication of JP2012505313A5 publication Critical patent/JP2012505313A5/ja
Application granted granted Critical
Publication of JP5683469B2 publication Critical patent/JP5683469B2/ja
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JP2011531218A 2008-10-09 2009-10-09 大型プラズマ処理チャンバのｒｆ復路 Active JP5683469B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US10425408P 2008-10-09 2008-10-09
US61/104,254 2008-10-09
US11474708P 2008-11-14 2008-11-14
US61/114,747 2008-11-14
PCT/US2009/060230 WO2010042860A2 (en) 2008-10-09 2009-10-09 Rf return path for large plasma processing chamber

Publications (3)

Publication Number Publication Date
JP2012505313A JP2012505313A (ja) 2012-03-01
JP2012505313A5 true JP2012505313A5 (https=) 2014-05-22
JP5683469B2 JP5683469B2 (ja) 2015-03-11

Family

ID=42097738

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011531218A Active JP5683469B2 (ja) 2008-10-09 2009-10-09 大型プラズマ処理チャンバのｒｆ復路

Country Status (6)

Country Link
US (1) US20100089319A1 (https=)
JP (1) JP5683469B2 (https=)
KR (1) KR101641130B1 (https=)
CN (1) CN102177769B (https=)
TW (1) TWI495402B (https=)
WO (1) WO2010042860A2 (https=)

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