JP2012501252A5 - - Google Patents
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- JP2012501252A5 JP2012501252A5 JP2011525047A JP2011525047A JP2012501252A5 JP 2012501252 A5 JP2012501252 A5 JP 2012501252A5 JP 2011525047 A JP2011525047 A JP 2011525047A JP 2011525047 A JP2011525047 A JP 2011525047A JP 2012501252 A5 JP2012501252 A5 JP 2012501252A5
- Authority
- JP
- Japan
- Prior art keywords
- abrasive
- layer
- particles
- translucent film
- meth
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 238000005296 abrasive Methods 0.000 claims 24
- 239000002245 particle Substances 0.000 claims 11
- OFJATJUUUCAKMK-UHFFFAOYSA-N Cerium(IV) oxide Chemical compound [O-2]=[Ce+4]=[O-2] OFJATJUUUCAKMK-UHFFFAOYSA-N 0.000 claims 10
- 239000011230 binding agent Substances 0.000 claims 8
- 238000005498 polishing Methods 0.000 claims 5
- 239000002131 composite material Substances 0.000 claims 4
- OZAIFHULBGXAKX-UHFFFAOYSA-N precursor Substances N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 claims 4
- 239000004721 Polyphenylene oxide Substances 0.000 claims 3
- 239000002253 acid Substances 0.000 claims 3
- NIXOWILDQLNWCW-UHFFFAOYSA-M acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims 3
- 150000001732 carboxylic acid derivatives Chemical class 0.000 claims 3
- 238000004519 manufacturing process Methods 0.000 claims 3
- 229920000570 polyether Polymers 0.000 claims 3
- 229920000193 polymethacrylate Polymers 0.000 claims 3
- 239000011164 primary particle Substances 0.000 claims 3
- 239000007795 chemical reaction product Substances 0.000 claims 2
- 230000003750 conditioning Effects 0.000 claims 2
- 239000006185 dispersion Substances 0.000 claims 2
- 239000012530 fluid Substances 0.000 claims 1
- 239000002904 solvent Substances 0.000 claims 1
Claims (3)
- 少なくとも半透明なフィルム裏材と、
前記少なくとも半透明なフィルム裏材上に配置され、かつ複数の成形研磨複合材を含む研磨層であって、前記成形研磨複合材が、結合剤に分散した研磨粒子を含み、前記研磨粒子が、100ナノメートル未満の平均一次粒径を有するセリア粒子から本質的に成り、前記結合剤が、ポリエーテル酸と、カルボン酸(メタ)アクリレート及びポリ(メタ)アクリレートを含む成分の反応生成物とを含み、前記研磨層の総重量に基づいて、前記研磨粒子が、少なくとも70重量%の量存在する、研磨層と、を含む、構造化研磨物品。 - 構造化研磨物品を作製する方法であって、
セリア粒子、ポリエーテル酸、カルボン酸(メタ)アクリレート、及び溶媒を組み合わせて分散液を形成する工程であって、前記セリア粒子が100ナノメートル未満の平均一次粒径を有する、工程と、
前記分散液とポリ(メタ)アクリレートを含む成分を組み合わせて、結合剤前駆体を形成する工程と、
少なくとも半透明なフィルム裏材上に前記結合剤前駆体の層を形成する工程と、
複数の精密に成形されたくぼみを有する生産用具と前記結合剤前駆体を接触させる工程と、
前記結合剤前駆体を硬化させて、前記少なくとも半透明なフィルム裏材上に配置された研磨層を形成する工程と、
前記研磨層を前記生産用具から分離させて、前記構造化研磨物品を提供する工程であって、前記研磨層の総重量に基づいて、前記セリア粒子が少なくとも70重量%の量存在する、工程と、を含む、方法。 - ウエハの酸化物表面をコンディショニングする方法であって、
少なくとも半透明なフィルム裏材と、
前記少なくとも半透明なフィルム裏材上に配置され、かつ複数の成形研磨複合材を含む研磨層であって、前記成形研磨複合材が、結合剤に分散した研磨粒子を含み、前記研磨粒子が、100ナノメートル未満の平均一次粒径を有するセリア粒子から本質的に成り、前記結合剤が、ポリエーテル酸と、カルボン酸(メタ)アクリレート及びポリ(メタ)アクリレートを含む成分の反応生成物とを含み、前記研磨層の総重量に基づいて、前記研磨粒子が、少なくとも70重量%の量存在する、研磨層と、を含む、構造化研磨物品を提供する工程と、
前記研磨層をコンディショニングする工程と、
前記少なくとも半透明なフィルム裏材をサブパッドと接触させる工程であって、前記サブパッドがそれを貫いて延在する第1のウィンドウを有する、工程と、
前記サブパッドを圧盤に固定する工程であって、前記圧盤が、それを貫いて延在し、かつ前記第1のウィンドウに隣接している第2のウィンドウを有する、工程と、
前記研磨層を前記ウエハの前記酸化物表面と摩擦により接触させる工程と、
前記研磨層又は前記ウエハの少なくとも1つを移動させて、作動液と接触しながら前記ウエハの前記表面を研磨する工程と、
前記第1のウィンドウ、前記第2のウィンドウ、及び前記構造化研磨物品を通して導かれる可視光線を用いて、前記ウエハの表面特性をモニタする工程と、を含む、方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US9252108P | 2008-08-28 | 2008-08-28 | |
US61/092,521 | 2008-08-28 | ||
PCT/US2009/052188 WO2010025003A2 (en) | 2008-08-28 | 2009-07-30 | Structured abrasive article, method of making the same, and use in wafer planarization |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2012501252A JP2012501252A (ja) | 2012-01-19 |
JP2012501252A5 true JP2012501252A5 (ja) | 2012-07-05 |
JP5351967B2 JP5351967B2 (ja) | 2013-11-27 |
Family
ID=41722203
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2011525047A Expired - Fee Related JP5351967B2 (ja) | 2008-08-28 | 2009-07-30 | 構造化研磨物品、その製造方法、及びウエハの平坦化における使用 |
Country Status (7)
Country | Link |
---|---|
US (1) | US8251774B2 (ja) |
EP (1) | EP2327088B1 (ja) |
JP (1) | JP5351967B2 (ja) |
KR (1) | KR101602001B1 (ja) |
CN (1) | CN102138203B (ja) |
TW (1) | TWI429735B (ja) |
WO (1) | WO2010025003A2 (ja) |
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-
2009
- 2009-07-30 KR KR1020117006536A patent/KR101602001B1/ko active IP Right Grant
- 2009-07-30 JP JP2011525047A patent/JP5351967B2/ja not_active Expired - Fee Related
- 2009-07-30 WO PCT/US2009/052188 patent/WO2010025003A2/en active Application Filing
- 2009-07-30 EP EP09810426.8A patent/EP2327088B1/en not_active Not-in-force
- 2009-07-30 CN CN200980134338.3A patent/CN102138203B/zh not_active Expired - Fee Related
- 2009-08-11 TW TW098126988A patent/TWI429735B/zh not_active IP Right Cessation
- 2009-08-12 US US12/539,798 patent/US8251774B2/en not_active Expired - Fee Related
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