JP2012501073A5 - - Google Patents

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Publication number
JP2012501073A5
JP2012501073A5 JP2011524215A JP2011524215A JP2012501073A5 JP 2012501073 A5 JP2012501073 A5 JP 2012501073A5 JP 2011524215 A JP2011524215 A JP 2011524215A JP 2011524215 A JP2011524215 A JP 2011524215A JP 2012501073 A5 JP2012501073 A5 JP 2012501073A5
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JP
Japan
Prior art keywords
spectral purity
purity filter
substrate
infrared radiation
antireflective coating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2011524215A
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English (en)
Japanese (ja)
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JP2012501073A (ja
JP5439485B2 (ja
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Priority claimed from PCT/EP2009/005487 external-priority patent/WO2010022839A2/en
Publication of JP2012501073A publication Critical patent/JP2012501073A/ja
Publication of JP2012501073A5 publication Critical patent/JP2012501073A5/ja
Application granted granted Critical
Publication of JP5439485B2 publication Critical patent/JP5439485B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2011524215A 2008-08-28 2009-07-29 スペクトル純度フィルタ、リソグラフィ装置および放射源 Active JP5439485B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US13633108P 2008-08-28 2008-08-28
US61/136,331 2008-08-28
US19320208P 2008-11-05 2008-11-05
US61/193,202 2008-11-05
PCT/EP2009/005487 WO2010022839A2 (en) 2008-08-28 2009-07-29 Spectral purity filter and lithographic apparatus

Publications (3)

Publication Number Publication Date
JP2012501073A JP2012501073A (ja) 2012-01-12
JP2012501073A5 true JP2012501073A5 (https=) 2012-09-13
JP5439485B2 JP5439485B2 (ja) 2014-03-12

Family

ID=41722000

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011524215A Active JP5439485B2 (ja) 2008-08-28 2009-07-29 スペクトル純度フィルタ、リソグラフィ装置および放射源

Country Status (6)

Country Link
US (1) US8665420B2 (https=)
JP (1) JP5439485B2 (https=)
KR (1) KR101668338B1 (https=)
CN (1) CN102132214B (https=)
NL (1) NL2003299A (https=)
WO (1) WO2010022839A2 (https=)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10690823B2 (en) 2007-08-12 2020-06-23 Toyota Motor Corporation Omnidirectional structural color made from metal and dielectric layers
US10870740B2 (en) 2007-08-12 2020-12-22 Toyota Jidosha Kabushiki Kaisha Non-color shifting multilayer structures and protective coatings thereon
US10788608B2 (en) 2007-08-12 2020-09-29 Toyota Jidosha Kabushiki Kaisha Non-color shifting multilayer structures
EP2550563A1 (en) 2010-03-24 2013-01-30 ASML Netherlands B.V. Lithographic apparatus and spectral purity filter
DE102012202057B4 (de) * 2012-02-10 2021-07-08 Carl Zeiss Smt Gmbh Projektionsobjektiv für EUV-Mikrolithographie, Folienelement und Verfahren zur Herstellung eines Projektionsobjektivs mit Folienelement
CN102798902A (zh) * 2012-07-23 2012-11-28 中国科学院长春光学精密机械与物理研究所 一种提高极紫外光谱纯度的新型多层膜
KR101812857B1 (ko) * 2012-08-28 2017-12-27 가부시키가이샤 니콘 기판 지지 장치, 및 노광 장치
DE102014204171A1 (de) * 2014-03-06 2015-09-24 Carl Zeiss Smt Gmbh Optisches Element und optische Anordnung damit
DE102014204660A1 (de) * 2014-03-13 2015-09-17 Carl Zeiss Smt Gmbh Spiegel, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage
DE112015001639B4 (de) 2014-04-01 2023-12-14 Toyota Jidosha Kabushiki Kaisha Nicht-farbverschiebende mehrschichtige strukturen
CN104020519A (zh) * 2014-04-28 2014-09-03 中国科学院上海光学精密机械研究所 紫外薄膜滤光片
CN104297820A (zh) * 2014-09-26 2015-01-21 中国科学院长春光学精密机械与物理研究所 一种提高了极紫外光谱纯度及抗氧化性的多层膜
CN104459835B (zh) * 2014-12-24 2016-06-29 南京波长光电科技股份有限公司 一种红外玻璃gasir1增透膜及其制备方法
DE102016110192A1 (de) * 2015-07-07 2017-01-12 Toyota Motor Engineering & Manufacturing North America, Inc. Omnidirektionale rote strukturelle Farbe hoher Chroma mit Halbleiterabsorberschicht
DE102015213253A1 (de) 2015-07-15 2017-01-19 Carl Zeiss Smt Gmbh Spiegel, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage
WO2020083578A1 (en) * 2018-10-22 2020-04-30 Asml Netherlands B.V. Radiation filter for a radiation sensor
TW202119136A (zh) * 2019-10-18 2021-05-16 美商應用材料股份有限公司 多層反射器及其製造和圖案化之方法
DE102022205302A1 (de) * 2022-05-25 2023-11-30 Carl Zeiss Smt Gmbh Spiegel, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage
US12442104B2 (en) 2023-04-20 2025-10-14 Applied Materials, Inc. Nanocrystalline diamond with amorphous interfacial layer

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US5086443A (en) * 1990-08-03 1992-02-04 The United States Of America As Represented By The United States Department Of Energy Background-reducing x-ray multilayer mirror
JPH06174897A (ja) 1992-12-10 1994-06-24 Nippon Telegr & Teleph Corp <Ntt> 多層膜x線ミラーおよび多層膜x線光学系
US5962854A (en) * 1996-06-12 1999-10-05 Ishizuka Electronics Corporation Infrared sensor and infrared detector
US7515336B2 (en) * 2001-12-21 2009-04-07 Bose Corporation Selective reflecting
JP4458330B2 (ja) * 2003-12-26 2010-04-28 キヤノン株式会社 光源ユニットの多層膜ミラーを交換する方法
US7262412B2 (en) * 2004-12-10 2007-08-28 L-3 Communications Corporation Optically blocked reference pixels for focal plane arrays
JP2006173490A (ja) * 2004-12-17 2006-06-29 Nikon Corp 光学素子及びこれを用いた投影露光装置
US7196343B2 (en) 2004-12-30 2007-03-27 Asml Netherlands B.V. Optical element, lithographic apparatus including such an optical element, device manufacturing method, and device manufactured thereby
JP4591686B2 (ja) * 2005-02-03 2010-12-01 株式会社ニコン 多層膜反射鏡
US7372623B2 (en) * 2005-03-29 2008-05-13 Asml Netherlands B.V. Multi-layer spectral purity filter, lithographic apparatus including such a spectral purity filter, device manufacturing method, and device manufactured thereby
US7336416B2 (en) 2005-04-27 2008-02-26 Asml Netherlands B.V. Spectral purity filter for multi-layer mirror, lithographic apparatus including such multi-layer mirror, method for enlarging the ratio of desired radiation and undesired radiation, and device manufacturing method
EP1744187A1 (en) * 2005-07-15 2007-01-17 Vrije Universiteit Brussel Folded radial brewster polariser
JP2007088237A (ja) * 2005-09-22 2007-04-05 Nikon Corp 多層膜反射鏡及びeuv露光装置
US7736820B2 (en) * 2006-05-05 2010-06-15 Asml Netherlands B.V. Anti-reflection coating for an EUV mask
NL1036469A1 (nl) * 2008-02-27 2009-08-31 Asml Netherlands Bv Optical element, lithographic apparatus including such an optical element, device manufacturing method, and device manufactured thereby.
JP2010272677A (ja) * 2009-05-21 2010-12-02 Nikon Corp 光学素子、露光装置及びデバイス製造方法

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