JP2012142269A5 - - Google Patents

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Publication number
JP2012142269A5
JP2012142269A5 JP2011270754A JP2011270754A JP2012142269A5 JP 2012142269 A5 JP2012142269 A5 JP 2012142269A5 JP 2011270754 A JP2011270754 A JP 2011270754A JP 2011270754 A JP2011270754 A JP 2011270754A JP 2012142269 A5 JP2012142269 A5 JP 2012142269A5
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JP
Japan
Prior art keywords
emitter
charged particle
emitters
control circuit
axis
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JP2011270754A
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English (en)
Japanese (ja)
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JP5988570B2 (ja
JP2012142269A (ja
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Publication of JP2012142269A5 publication Critical patent/JP2012142269A5/ja
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JP2011270754A 2010-12-31 2011-12-11 選択可能な複数の粒子放出器を備える荷電粒子源 Active JP5988570B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201061429014P 2010-12-31 2010-12-31
US61/429,014 2010-12-31

Publications (3)

Publication Number Publication Date
JP2012142269A JP2012142269A (ja) 2012-07-26
JP2012142269A5 true JP2012142269A5 (cg-RX-API-DMAC7.html) 2015-01-29
JP5988570B2 JP5988570B2 (ja) 2016-09-07

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Application Number Title Priority Date Filing Date
JP2011270754A Active JP5988570B2 (ja) 2010-12-31 2011-12-11 選択可能な複数の粒子放出器を備える荷電粒子源

Country Status (3)

Country Link
US (1) US8710453B2 (cg-RX-API-DMAC7.html)
EP (1) EP2472556B1 (cg-RX-API-DMAC7.html)
JP (1) JP5988570B2 (cg-RX-API-DMAC7.html)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8742361B2 (en) 2012-06-07 2014-06-03 Fei Company Focused charged particle column for operation at different beam energies at a target
JP6238978B2 (ja) 2012-06-29 2017-11-29 エフ・イ−・アイ・カンパニー 多種イオン源
CN103325132B (zh) * 2013-05-31 2019-02-22 新奥特（北京）视频技术有限公司 一种粒子发射方法和装置
CN103325133B (zh) * 2013-05-31 2019-02-22 新奥特（北京）视频技术有限公司 一种粒子发射方法和装置
US20160247657A1 (en) * 2015-02-25 2016-08-25 Ho Seob Kim Micro-electron column having nano structure tip with easily aligning
JP6927493B2 (ja) * 2016-10-11 2021-09-01 国立大学法人横浜国立大学 イオン源
US9899181B1 (en) 2017-01-12 2018-02-20 Fei Company Collision ionization ion source
US9941094B1 (en) 2017-02-01 2018-04-10 Fei Company Innovative source assembly for ion beam production
NL2024065B1 (en) * 2019-10-21 2021-06-22 Univ Delft Tech Multi-beam charged particle source with alignment means

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US4426582A (en) * 1980-01-21 1984-01-17 Oregon Graduate Center Charged particle beam apparatus and method utilizing liquid metal field ionization source and asymmetric three element lens system
NL8702570A (nl) * 1987-10-29 1989-05-16 Philips Nv Geladen deeltjes bundel apparaat.
US4914305A (en) * 1989-01-04 1990-04-03 Eaton Corporation Uniform cross section ion beam system
JPH04155739A (ja) * 1990-10-19 1992-05-28 Nippon Telegr & Teleph Corp <Ntt> 電子ビーム描画装置
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US5534311A (en) * 1995-05-31 1996-07-09 The United States Of America As Represented By The Secretary Of The Navy Production of structures by electrostatically-focused deposition
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