JP2012139660A - Spinner cleaning device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a spinner cleaning device, in which the mist lying at a position far from a duct in a chamber can also bring to the duct side, and air inside the chamber is exhausted more efficiently than before.SOLUTION: Regarding the spinner cleaning device in which a workpiece W is held on a holding table 10 in a chamber 40 and cleaning water C is fed to the upper face of the workpiece W in a state where the holding table 10 is rotated, the flow of the air along the outer circumferential periphery of the holding table 10 is generated at the outer circumferential periphery by a plurality of blades 13 formed on the outer circumferential side surface 12 of the holding table 10, and the mist on the side opposite to the duct 50 in the chamber 40 is also led to the side of the duct 50 by the flow of the air.

Description

  The present invention relates to a spinner cleaning apparatus that supplies cleaning water to a workpiece such as a rotated semiconductor wafer to perform cleaning.

  In the semiconductor device manufacturing process, a large number of rectangular device areas are defined on the surface of a workpiece such as a semiconductor wafer by grid-shaped division lines, and electronic circuits made of IC, LSI, etc. are formed on the surface of these device areas. Then, after performing necessary processing such as grinding after polishing the back surface, the workpiece is cut and divided along a predetermined division line to obtain a large number of devices from one workpiece.

  As a device for dividing a workpiece, there is known a cutting device provided with a cutting means for cutting a workpiece by cutting a cutting blade rotated at high speed into the workpiece and a spinner cleaning device for cleaning the cut workpiece (Patent Document 1). ). The spinner cleaning device adsorbs and holds a work on a holding table disposed in a cylindrical chamber, rotates the holding table, and jets cleaning water from a cleaning water supply nozzle toward the rotating work. Then, the work is dried by blowing air from the air nozzle to the work.

JP 2006-128359 A

  In this type of cleaning apparatus, since the holding table is rotated at a high speed, a dirty mist is generated when cleaning water is supplied to the workpiece. Therefore, a duct is provided in the chamber, and air in the chamber is sucked through the duct to discharge the mist to the outside. However, since the duct is normally provided to be opened on one side of the inner wall surface of the chamber, there has been a problem that the mist near the inner wall surface that is the farthest from the duct and hits the opposite side of the duct cannot be efficiently discharged.

  The present invention has been made in view of the above circumstances, and its main technical problem is that mist located far from the duct in the chamber can also be transported to the duct side, and the inside of the chamber is more efficiently than in the past. An object of the present invention is to provide a spinner cleaning device that can be evacuated.

  The spinner cleaning apparatus of the present invention includes a disk-shaped holding table that holds a workpiece, a rotating unit that rotates the holding table around a vertical direction as a rotation axis, a chamber that accommodates the holding table and has an upper surface opened, A spinner cleaning device having a duct for discharging gas from the chamber, and having a wing formed on an outer peripheral side surface of the holding table, and the wing is rotated when the holding table is rotated by the rotating portion. It rotates at the same time, and the flow of air along the outer periphery of the holding table is generated and guided to the duct.

  According to the present invention, an air flow along the outer periphery of the holding table can be generated around the outer periphery of the holding table by the wings rotating together with the holding table, and the mist can be guided to the duct on the air flow. . For this reason, the mist located far from the duct in the chamber is also carried to the duct side.

The work referred to in the present invention is not particularly limited. For example, a semiconductor wafer made of silicon, gallium arsenide (GaAs), silicon carbide (SiC), or the like, a DAF (Die Attach Film) provided on the back surface of the wafer for chip mounting, or the like. Adhesive members, semiconductor product packages, ceramics and glass, sapphire (Al ₂ O ₃ ) -based or silicon-based inorganic material substrates, various electronic components such as LCD drivers that control and drive liquid crystal display devices, and micron-order processing Examples include various processing materials that require positional accuracy.

  According to the present invention, it is possible to carry a mist at a position far from the duct in the chamber to the duct side, thus providing an effect of providing a spinner cleaning device that can exhaust the inside of the chamber more efficiently than in the past. .

It is a longitudinal cross-sectional view of the spinner cleaning apparatus which concerns on one Embodiment of this invention. It is II-II arrow sectional drawing of FIG. FIG. 3 is a cross-sectional view taken along the line III-III in FIG. 2 (the shutter is not shown). It is the VI-VI arrow sectional drawing of FIG. 2, and has shown the state which the shutter advanced into the chamber. FIG. 6 is a cross-sectional view taken along the line VI-VI in FIG. 2 in a state where the shutter is retracted.

Hereinafter, an embodiment according to the present invention will be described with reference to the drawings.
1 and 2 show a spinner cleaning apparatus according to an embodiment for cleaning a disk-shaped workpiece W such as a semiconductor wafer subjected to predetermined processing. The spinner cleaning apparatus 1 is provided in a processing apparatus (not shown) or is used alone. Examples of the processing applied to the workpiece W include division processing for dividing the workpiece W by cutting with a cutting blade or laser beam irradiation, division processing by expanding, drilling processing by laser beam irradiation, grinding processing, polishing processing, and the like.

(1) Configuration of Spinner Cleaning Device A spinner cleaning device 1 according to the present embodiment includes a disc-shaped holding table 10 that holds a workpiece W, a rotating unit 20 that rotates the holding table 10 about a vertical direction as a rotation axis, and a workpiece W. A nozzle 30 for supplying cleaning water and dry air, a bottomed cylindrical chamber 40 containing the holding table 10 and the nozzle 30 and having an open top surface, and a duct 50 for discharging gas from the chamber 40. I have.

  The chamber 40 has a cylindrical side wall portion 41 and a bottom plate portion 42 that closes the lower surface opening of the side wall portion 41, and is supported by a support member (not shown) so that the axis of the side wall portion 41 is along the vertical direction. Is done. A small diameter portion 45 is formed at a lower end portion of the side wall portion 41 via a step portion 44 having a horizontal annular upper surface 43, and a bottom plate portion 42 is provided at the lower end of the small diameter portion 45.

  Inside the chamber 40, the holding table 10 is disposed concentrically via the rotating unit 20. The holding table 10 is a generally known vacuum chuck type that generates a negative pressure on a horizontal upper surface serving as the holding surface 11 of the workpiece W and sucks and holds the workpiece W on the holding surface 11. It is rotationally driven by. A plurality of wings 13 are formed on the outer peripheral side surface 12 of the holding table 10 at equal intervals in the circumferential direction. These wings 13 are rectangular plate pieces having a vertical dimension corresponding to the thickness of the holding table 10 and an appropriate horizontal dimension, and are formed radially so as to extend in the radial direction of the holding table 10.

  The rotating unit 20 that rotationally drives the holding table 10 includes a rotating shaft 21 and a motor 22 that rotates the rotating shaft 21. The motor 22 is fixed to the lower surface of the bottom plate portion 42 of the chamber 40, the rotary shaft 21 extends vertically upward through the bottom plate portion 42, and the center of the lower surface of the holding table 10 is fixed to the upper end thereof.

  The rotating shaft 21 of the rotating unit 20 has a structure that can be expanded and contracted, and is expanded and contracted by an expansion / contraction mechanism such as an air cylinder (not shown). As shown in FIG. 1, the holding table 10 has a delivery position (shown by a two-dot chain line) close to the upper surface opening 46 of the chamber 40 in the chamber 40 as the rotary shaft 21 expands and contracts, and a lower cleaning position (shown by a solid line). Can be moved up and down between two positions. The upper surface opening 46 of the chamber 40 is opened and closed by a cover (not shown).

  In the chamber 40, a nozzle 30 is provided that jets and supplies the cleaning water C to the upper surface of the work W held on the holding surface 11 of the holding table 10. As shown in FIGS. 1 and 3, the nozzle 30 is provided with an ejection portion 32 that ejects W downward at the tip of a piping portion 31 that is curved along the inner surface of the side wall portion 41 of the chamber 40. Above the holding table 10 positioned at the center, the base portion of the pipe portion 31 is supported so as to be horizontally rotatable about the rotation axis. In FIG. 3, the shutter 60 described later is not shown in order to clarify the configuration of the nozzle 30).

  As shown in FIG. 3, the nozzle 30 includes an ejection position (shown by a solid line) where the ejection part 32 is positioned above the center of the holding table 10, and a retracted position (two-dot chain line) close to the inner surface of the side wall part 41. ). According to this nozzle 30, the cleaning water is sprayed over the entire upper surface of the work W held and rotated by the holding table 10 by ejecting the cleaning water from the ejection part 32 while reciprocating between the ejection position and the retreat position. It is ejected evenly. Further, dry air is jetted from the nozzle 30 so that the supply of cleaning water and dry air can be switched.

With the nozzle 30 positioned at the retracted position, the holding table 10 can move up and down between the cleaning position and the delivery position without interfering with the nozzle 30. As shown in FIG. 1, the bottom plate portion 42 of the chamber 40 is provided with a drain port 47 for guiding the drainage of the cleaning water C to the outside and discharging it to a predetermined treatment facility. The washing water C is preferably pure water or pure water containing CO ₂ for preventing static electricity.

  As shown in FIG. 1, an exhaust port 48 is formed in the lower part of the side wall 41 of the chamber 40, and a duct 50 is provided in the exhaust port 48. The duct 50 extends horizontally and parallel to the tangential direction of the side wall 41. The duct 50 extends to a predetermined processing facility (not shown), and an exhaust fan (not shown) that sucks the air in the chamber 40 and flows into the duct 50 in the middle of the duct 50 or the processing facility. Yes. The height position of the exhaust port 48 provided with the duct 50 is substantially the same as the height position of the cleaning position of the holding table 10.

  The side wall 41 of the chamber 40 is provided with a plurality of shutters 60 that move in the radial direction of the side wall 41 and advance and retreat in synchronization with the inside of the chamber 40. As shown in FIG. 4, the shutter 60 is a plate-like member formed in a substantially arc shape along the circumferential direction of the side wall portion 41. Each shutter 60 is inserted into a slit 411 formed in the side wall portion 41 as shown in FIG. 1, and is advanced into the chamber 40 shown in FIG. 4 by an advance / retreat mechanism 61 such as an air cylinder. And reciprocating between the retracted position opened and retracted to the outside of the wing 5 shown in FIG. The height position of the shutter 60 is set between the exhaust port 48 and the nozzle 30.

  When the shutter 60 is positioned at the advanced position, as shown in FIG. 1, a groove-like space 49 along the circumferential direction is formed in the chamber 40 by the shutter 60, the upper surface 43 of the stepped portion 44, and the inner surface of the side wall portion 41. It is formed. The groove-like space 49 is formed around the outer peripheral side surface 12 of the holding table 10, and the tip side of the wing 13 formed on the outer peripheral side surface 12 of the holding table 10 enters the groove-like space 49. An exhaust port 48 communicating with the duct 50 opens into the groove-like space 49. When the shutter 60 moves backward from the advanced position and is positioned at the retracted position, the holding table 10 can move up and down between the cleaning position and the delivery position without interfering with the shutter 60.

(2) Operation and Effect of Spinner Cleaning Device The configuration of the spinner cleaning device 1 of the present embodiment has been described above. Next, the operation and operation effect of cleaning the workpiece W by this device 1 will be described.

  First, the holding table 10 is raised and positioned at the delivery position, the cover is opened, and the workpiece W is placed on the holding surface 11 of the holding table 10 from the upper surface opening 46 of the chamber 40 and is held by being adsorbed to the holding surface 11. . When the holding table 10 is raised, the nozzle 30 and the shutter 60 are positioned at a retracted position that does not interfere with the holding table 10.

  Next, the holding table 10 holding the workpiece W is lowered and positioned at the cleaning position. Then, the shutter 60 is advanced into the chamber 40 and positioned at the advanced position shown in FIGS. Further, the cover is closed and the exhaust fan is operated to discharge the air in the chamber 40 to the outside through the duct 50. This completes the preparation for cleaning. Subsequently, the holding table 10 is rotated in the direction of the arrow R in FIG. 2 at a speed of, for example, about 800 rpm, and the nozzle 30 is reciprocally swung while the ejection portion 32 of the nozzle 30 is rotated. Then, the washing water C is ejected downward. As a result, the cleaning water C is supplied evenly over the entire upper surface of the workpiece W, and dirt components (for example, cutting scraps and grinding scraps) adhering to the workpiece W are washed away with the cleaning water C.

  When the predetermined cleaning time has elapsed, the supply of the cleaning water C is stopped, the rotation of the holding table 10 is continued, and the cleaning water C adhering to the workpiece W is blown off by centrifugal force. Dry air is jetted from the jet nozzle 30 to dry the workpiece W. In this drying process, the rotation speed of the holding table 10 may be increased to, for example, about 3000 rpm so as to be quickly dried.

  When the predetermined drying time has elapsed, the rotation of the holding table 10 is stopped. Then, the nozzle 30 and the shutter 60 are returned to the retracted position, and the holding table 10 is raised to the delivery position. Thereafter, the holding of the workpiece W on the holding surface 11 is released, and the workpiece W is picked up from the holding table 10 and moved to the next step.

  The above is one cycle of the spinner cleaning apparatus 1 in which the workpiece W is loaded, cleaned, and unloaded. By the way, in the process of cleaning and drying the workpiece W, the cleaning water C is supplied to the rotating workpiece W, so that a mist containing a dirt component is generated from the workpiece W. This mist is discharged from the exhaust port 48 through the duct 50 by the air suction action from the duct 50 without leaking from the chamber 40.

  At this time, conventionally, there has been a problem that mist drifting away from the exhaust port 48 is difficult to reach the exhaust port 48 and is not efficiently discharged. However, in this embodiment, the air flow along the outer peripheral side surface 12 is generated around the outer periphery of the holding table 10 by the wings 13 rotating together with the holding table 10, and the mist reaches the exhaust port 48 along the air flow and enters the duct 50. Led. For this reason, the mist at a position far from the duct 50 in the chamber 40 is also carried to the duct 50 side, and thus the inside of the chamber 40 is exhausted more efficiently than in the prior art.

  In particular, in the present embodiment, the air around the outer periphery of the holding table 10 generated by the wings 13 is generated by moving the shutter 60 into the chamber 40 to form the groove-like space 49 around the outer peripheral side surface 12 of the holding table 10. It escapes in the vertical direction and flows in the groove-like space 49. For this reason, the flow of air generated around the outer periphery of the holding table 10 is effectively generated, and as a result, more air is carried to the exhaust port 48 and the exhaust performance is further improved.

DESCRIPTION OF SYMBOLS 1 ... Spinner washing | cleaning apparatus 10 ... Holding table 12 ... Outer peripheral side surface 13 ... Feather 20 ... Rotating part 30 ... Nozzle 40 ... Chamber 46 ... Upper surface opening 50 of a chamber ... Duct C ... Washing water W ... Workpiece

Claims (1)

A disk-shaped holding table for holding the workpiece;
A rotating unit that rotates the holding table around the vertical direction as a rotation axis;
A chamber containing the holding table and having an open top surface;
A duct for exhausting gas from within the chamber;
A spinner cleaning apparatus comprising:
Having wings formed on the outer peripheral side surface of the holding table;
The spinner cleaning device according to claim 1, wherein the wing rotates simultaneously with the rotation of the holding table by the rotating unit to generate an air flow along an outer periphery of the holding table and guide the air to the duct.

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