CN102580938A - Rotary cleaning device - Google Patents

Rotary cleaning device Download PDF

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Publication number
CN102580938A
CN102580938A CN2012100018909A CN201210001890A CN102580938A CN 102580938 A CN102580938 A CN 102580938A CN 2012100018909 A CN2012100018909 A CN 2012100018909A CN 201210001890 A CN201210001890 A CN 201210001890A CN 102580938 A CN102580938 A CN 102580938A
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CN
China
Prior art keywords
workbench
cavity
workpiece
pipeline
cleaning device
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Granted
Application number
CN2012100018909A
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Chinese (zh)
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CN102580938B (en
Inventor
大谷秀明
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Disco Corp
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Disco Corp
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Abstract

The invention provides a rotary cleaning device, wherein mists away from a pipeline in a cavity can be transported to the pipeline and the air discharging inside the cavity is more efficient. A workpiece (W) is held on a holding workbench (10) in a cavity (40), wherein the upper surface of the workpiece (W) is provided with cleaning liquid (C) during the rotation of the workbench (10). The peripheral side surface (12) of the workbench (10) is provided with a plurality of blades (13) for generating airflow around the peripheral side surface of the workbench (10).

Description

Rotary cleaning device
Technical field
The present invention relates to the rotary cleaning device that cleans of Workpiece supply cleaning fluids such as semiconductor wafer to rotation.
Background technology
In semiconductor devices manufacturing process; Cut apart the device area that preset lines marks off a large amount of rectangular shapes in that the surface by utilizing of workpiece such as semiconductor wafer is cancellate; And form by IC (Integrated Circuit on the surface of these device areas; Integrated circuit), the electronic circuit that constitutes such as LSI (Large Scale Integration, large scale integrated circuit), then behind the grinding back side, implement necessary processing such as grinding; Then workpiece is cut off, cuts apart along cutting apart preset lines, thereby obtain a large amount of devices by Zhang Gong's part.
As the device of cutting apart workpiece; The known topping machanism that possesses cutting member and rotary cleaning device; Said cutting member cuts off the cutting tool incision workpiece of rotation at a high speed, and said rotary cleaning device cleans (patent documentation 1) to the workpiece that cuts off.This rotary cleaning device forms following structure: with workpiece absorption and remain on the maintenance workbench that is equipped in the cavity cylindraceous and make and keep the workbench rotation; Come cleaning workpiece from the cleaning solution supplying nozzle towards the workpiece ejection cleaning fluid of rotation, then make workpiece dry to workpiece ejection air from air nozzle.
Patent documentation 1: TOHKEMY 2006-128359 communique
In this kind cleaning device, keep workbench to rotate at high speed owing to make, therefore when to the Workpiece supply cleaning fluid, can produce contaminated mist.Therefore, pipeline is set, mist is discharged to the outside via the air in the pipeline suction cavity at above-mentioned cavity.But because pipeline generally is the one-sided of the opening internal face that is arranged at cavity, therefore having produced can't be by the such problem of efficient discharge apart near the mist the internal face of pipeline opposition side farthest, that be equivalent to this pipeline.
Summary of the invention
The present invention In view of the foregoing accomplishes just, and its major technology problem is for providing a kind of rotary cleaning device, even the interior mist that is positioned at away from the position of pipeline of cavity also can be transported to pipe side, and can be than in the past efficiently to carrying out exhaust in the cavity.
Rotary cleaning device of the present invention has: the maintenance workbench of disc-shape, and said maintenance workbench is used to keep workpiece; It is the rotating shaft rotation with the vertical direction that rotating part, said rotating part make said maintenance workbench; Cavity, said cavity are used to take in said maintenance workbench, and the upper surface open of said cavity; And pipeline; Said pipeline is discharged gas in said cavity, said rotary cleaning device is characterised in that this rotary cleaning device has blade; Said blade shaped is formed in the circumferential lateral surface of said maintenance workbench; When making the rotation of said maintenance workbench through said rotating part, said blade rotates simultaneously, and produces along the air-flow of the air of the peripheral of said maintenance workbench with to said pipeline channeling conduct.
According to the present invention, can produce along the air-flow of the air of this peripheral at the peripheral that keeps workbench through coming with the blade that keeps workbench to rotate, can mist be guided to pipeline along with the air-flow of this air.Thus, even the mist that is positioned at away from the position of pipeline in the cavity also can be transported to pipe side.
The alleged workpiece of the present invention is not special to be limited; For example can enumerate out by the semiconductor wafer of silicon, GaAs (GaAs), carborundum formations such as (SiC), be used to chip is installed and be located at DAF adhering part, packaging body, pottery or the glass of semiconductor product, the sapphire (Al such as (Die Attach Film, chip attachment films) at the back side of wafer 2O 3) type or various electronic units such as the lcd driver of the inorganic material substrate of silicon class, control driving liquid crystal device and the various rapidoprints etc. that require micron-sized Working position precision.
According to the present invention, played following effect: a kind of rotary cleaning device is provided, even the mist that is positioned at away from the position of pipeline in the cavity also can be transported to pipe side, therefore can be than in the past efficiently to carrying out exhaust in the cavity.
Description of drawings
Fig. 1 is the longitudinal section of the rotary cleaning device that relates to of an embodiment of the invention.
Fig. 2 is the cutaway view of observing along the II-II arrow of Fig. 1.
Fig. 3 is the cutaway view of observing along the III-III arrow of Fig. 1 (not shown flashboard).
Fig. 4 is the cutaway view of observing along the VI-VI arrow of Fig. 1, and it shows flashboard and enters into the state in the cavity.
Fig. 5 is the cutaway view that the VI-VI arrow along Fig. 1 under the state retreated of flashboard is observed.
Label declaration
1: rotary cleaning device;
10: keep workbench;
12: the circumferential lateral surface that keeps workbench;
13: blade;
20: rotating part;
30: nozzle;
40: cavity;
46: the upper surface open of cavity;
50: pipeline;
C: cleaning fluid;
W: workpiece.
The specific embodiment
Below, an embodiment that the present invention relates to reference to description of drawings.
Fig. 1 and Fig. 2 show the rotary cleaning device of the embodiment that the discoideus workpiece W such as semiconductor wafer that implemented predetermined processing are cleaned.This rotary cleaning device 1 is possessed by not shown processing unit (plant), perhaps under independent state, uses.As the processing that workpiece W is implemented, the division processing that for example can enumerate out the division processing of cutting apart workpiece W through the cutting that realizes by cutting tool or laser light irradiation, realize by expansion, the perforate processing that realizes by laser light irradiation, grinding, attrition process etc.
The structure of rotary cleaning device
The rotary cleaning device 1 of this embodiment possesses: the maintenance workbench 10 of disc-shape, and it is used to keep workpiece W; Rotating part 20, it makes, and to keep workbench 10 be the rotating shaft rotation with the vertical direction; Nozzle 30, it supplies with cleaning fluid and dry air to workpiece W; The cavity 40 that the round-ended cylinder shape is arranged, it is used to take in maintenance workbench 10 and nozzle 30, and the upper surface open of this cavity 40; And pipeline 50, it is discharged gas in cavity 40.
Cavity 40 has side wall portion 41 cylindraceous and the base plate 42 that makes the lower surface closure of openings of side wall portion 41, and this cavity 40 is supported to the state of the axle center of side wall portion 41 along vertical direction by not shown support unit.Bottom at side wall portion 41 is formed with minor diameter part 45 via stage portion 44, and said stage portion 44 has the upper surface 43 of the ring-type of level, is provided with base plate 42 in the lower end of this minor diameter part 45.
Inside at cavity 40 is equipped with maintenance workbench 10 via rotating part 20 with being concentric shape.Keeping workbench 10 is the workbench of general known vacuum chuck formula; Thereby it makes as the horizontal upper surface of the maintenance face 11 of workpiece W and produces negative pressure with workpiece W absorption and remain on this maintenance face 11, and this maintenance workbench 10 is rotated portion's 20 driven in rotation.Circumferential lateral surface 12 keeping workbench 10 equally spaced is formed with a plurality of blades 13 along circumferentially spaced.These blades 13 are the plate of rectangular shape with the longitudinal size corresponding with the thickness that keeps workbench 10 and appropriate lateral dimension, and these blades 13 are to be formation radially along the radially mode integral body of extension that keeps workbench 10.
Driving the rotating part 20 that keeps workbench 10 rotations is made up of rotating shaft 21 and the motor 22 that makes these rotating shaft 21 rotations.Motor 22 is fixed on the lower surface of the base plate 42 of cavity 40, and rotating shaft 21 runs through base plate 42 and extends to vertical top, and the center fixation of the lower surface of maintenance workbench 10 is in the upper end of this rotating shaft 21.
In addition, the structure of the rotating shaft of rotating part 20 21 for stretching, and form by telescoping mechanism such as not shown cylinder and stretch.As shown in Figure 1, keep workbench 10 to go up and down between these two positions of cleaning positions (illustrating) in cavity 40 with solid line near the delivery position (illustrating) of the upper surface open 46 of cavity 40 and bottom with double dot dash line along with the flexible of rotating shaft 21.The upper surface open 46 of cavity 40 forms through not shown cover and opens and closes.
In cavity 40, be equipped with nozzle 30, said nozzle 30 is to the upper surface ejection that remains in the workpiece W on the maintenance face 11 that keeps workbench 10 and supply with cleaning fluid C.As shown in figures 1 and 3; Nozzle 30 forms through the ejection portion 32 that downward ejection cleaning fluid C is set at the end along the crooked pipe arrangement portion 31 of the inner surface of the side wall portion 41 of cavity 40, and this nozzle 30 to be supported to the base portion with pipe arrangement portion 31 to be the rotating shaft horizontal rotation above the maintenance workbench 10 that is positioned cleaning positions.In addition, in Fig. 3, the diagram of the flashboard of having stated after having omitted for the structure that makes nozzle 30 is clear and definite 60.
As shown in Figure 3; Nozzle 30 forms revolution between ejection position (illustrating with solid line) and retreating position (illustrating with double dot dash line); Said ejection position is the position of the top at the center that ejection portion 32 is positioned to keep workbench 10, and said retreating position is the position of ejection portion 32 near the inner surface of side wall portion 41.Utilize this nozzle 30, also spray cleaning fluids from ejection portion 32 simultaneously through making its reciprocating rotating between ejection position and retreating position, thereby spray cleaning fluid equably to the whole face of upper surface that remains in the workpiece W that keeps workbench 10 and rotation.In addition, also, this nozzle 30 is formed the supply that can switch cleaning fluid and dry air from nozzle 30 ejection dry airs.
Be positioned at nozzle 30 under the state of retreating position, keep workbench 10 to form can between cleaning positions and delivery position, going up and down and not with nozzle 30 interference.As shown in Figure 1, be provided with discharge outlet 47 in the base plate 42 of cavity 40, this discharge outlet 47 is used for the waste liquid of cleaning fluid C is directed to the outside and is discharged to predetermined treatment facility.In addition, cleaning fluid C preferably adopts pure water perhaps to add CO in order to prevent static 2Pure water.
As shown in Figure 1, be formed with exhaust outlet 48 in the bottom of the side wall portion 41 of cavity 40, be provided with pipeline 50 at this exhaust outlet 48.Pipeline 50 levels and extend abreast with the tangential direction of side wall portion 41.Pipeline 50 extends to till the not shown predetermined treatment facility, pipeline 50 midway or be equipped with not shown exhaust fan at this treatment facility, the air in the said exhaust fan suction cavity 40 is so that it flows into pipeline 50.The height and position that is provided with the exhaust outlet 48 of pipeline 50 forms with the height and position of the cleaning positions that keeps workbench 10 roughly the same.
Side wall portion 41 at cavity 40 is provided with a plurality of flashboards 60, and said a plurality of flashboards 60 moving radially and advancing and retreat with respect to cavity 40 inter-syncs ground along side wall portion 41.As shown in Figure 4, flashboard 60 is for circumferentially forming roughly circular-arc plate-shaped member along side wall portion 41.As shown in Figure 1; Each flashboard 60 forms the state that is inserted in the slit 411 that is formed at side wall portion 41, and each flashboard 60 moves back and forth in the in-position and shown in Figure 5 the keeping out of the way between the retreating position of opening than blade 13 position in the outer part that enter in the cavity 40 shown in Figure 4 through driving and reversing mechanisms such as cylinder 61.The height and position of flashboard 60 is set between exhaust outlet 48 and the nozzle 30.
When flashboard 60 is positioned the in-position, as shown in Figure 1, in cavity 40, form along circumferential groove shape space 49 through the upper surface 43 of flashboard 60, stage portion 44 and the inner surface of side wall portion 41.This groove shape space 49 be formed at the circumferential lateral surface 12 that keeps workbench 10 around, and the end side that forms the blade 13 that forms in the circumferential lateral surface that keeps workbench 10 12 gets into groove shape space 49.The exhaust outlet 48 that is communicated with pipeline 50 is to groove shape space 49 openings.When flashboard 60 when the in-position is retreated and be positioned retreating position, keep workbench 10 between cleaning positions and delivery position, to go up and down and not with flashboard 60 interference.
The action of rotary cleaning device and action effect
More than be the structure of the rotary cleaning device 1 of this embodiment, next to coming the action of cleaning workpiece W and action effect to describe through this device 1.
At first, make to keep workbench 10 risings and be positioned delivery position, open above-mentioned cover and workpiece W is carried the maintenance face 11 that keeps workbench 10 that places from the upper surface open 46 of cavity 40, and with workpiece W absorption and the maintenance face of remaining in 11.Make when keeping workbench 10 to rise, nozzle 30 and flashboard 60 are positioned not and the retreating position that keeps workbench 10 to interfere.
Then, the maintenance workbench 10 that has kept workpiece W is descended and be positioned cleaning positions.Next, make flashboard 60 get in the cavitys 40 and be positioned Fig. 1 and in-position shown in Figure 4.In addition, close above-mentioned cover, and make above-mentioned exhaust fan running, the air in the cavity 40 is discharged to the outside through pipeline 50.Thus, accomplished the preparation of cleaning, then, make to keep workbench 10 to rotate with the for example speed about 800rpm, and the ejection portion 32 from this nozzle 30 has sprayed cleaning fluid C downwards when making nozzle 30 reciprocating rotatings to the arrow R of Fig. 2 direction.Thus, supply with cleaning fluid C equably, utilize cleaning fluid C flushing to be attached to the pollutant component (for example cutting swarf or grindstone dust) of workpiece W to the whole face of the upper surface of workpiece W.
Behind the predetermined scavenging period of process, stop the supply of cleaning fluid C; The rotation that keeps workbench 10 is continued; Thereby utilize centrifugal force to get rid of to be attached to the cleaning fluid C of workpiece W, and the ejection portion 32 ejection dry airs of the nozzle of from reciprocating rotating 30, make workpiece W dry.In this dry run, the rotary speed that keeps workbench 10 is for example risen to about 3000rpm so that promptly carry out drying.
The rotation that after the drying time that process is scheduled to, stops to keep workbench 10.Then, make nozzle 30 and flashboard 60 get back to retreating position, make to keep workbench 10 to rise to till the delivery position.After this, remove the maintenance of workpiece W, pick up workpiece W and be transferred to subsequent processing from keeping workbench 10 with respect to maintenance face 11.
It more than is the once circulation of moving into workpiece W and cleaning, take out of such rotary cleaning device 1.But, in the cleaning of workpiece W and dry process, owing to supply with cleaning fluid C to the workpiece W of rotation, thereby can produce the mist that contain pollutant component from workpiece W.This mist can not spill from cavity 40, but is discharged to outside from exhaust outlet 48 through pipeline 50 through the air swabbing action from pipeline 50.
At this moment, such problem can take place: be difficult to arrive exhaust outlet 48 at the mist away from the position of exhaust outlet 48 and can't be discharged efficiently thereby waft in the past.But in this embodiment; Through producing along the air-flow of the air of circumferential lateral surface 12 at the peripheral that keeps workbench 10 with the blade 13 that keeps workbench 10 rotations, mist arrives exhaust outlet 48 and is directed to pipeline 50 along with the air-flow of this air.Thus, the mist that is positioned at away from the position of pipeline 50 in the cavity 40 also is transported to pipeline 50 sides, therefore with compared can be efficiently to carrying out exhaust in the cavity 40 in the past.
Especially; In this embodiment;, flashboard 60 around the circumferential lateral surface 12 that keeps workbench 10, forms groove shape space 49 through being got in the cavitys 40; Thus, the situation of being escaped to above-below direction by the air of peripheral blade 13 generations, that keep workbench 10 is suppressed, and said air flows in groove shape space 49.Thus, produced the air-flow of the air that produces at the peripheral that keeps workbench 10 effectively, consequently, more air is transported to exhaust outlet 48, has realized the further raising of venting quality.

Claims (1)

1. rotary cleaning device, it has:
The maintenance workbench of disc-shape, said maintenance workbench is used to keep workpiece;
It is the rotating shaft rotation with the vertical direction that rotating part, said rotating part make said maintenance workbench;
Cavity, said cavity are used to take in said maintenance workbench, and the upper surface open of said cavity; And
Pipeline, said pipeline is discharged gas in said cavity,
Said rotary cleaning device is characterised in that,
This rotary cleaning device has blade, and said blade shaped is formed in the circumferential lateral surface of said maintenance workbench,
When making the rotation of said maintenance workbench through said rotating part, said blade rotates simultaneously, and produces along the air-flow of the air of the peripheral of said maintenance workbench with to said pipeline channeling conduct.
CN201210001890.9A 2011-01-05 2012-01-05 Rotary cleaning device Active CN102580938B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2011000627A JP2012139660A (en) 2011-01-05 2011-01-05 Spinner cleaning device
JP2011-000627 2011-01-05

Publications (2)

Publication Number Publication Date
CN102580938A true CN102580938A (en) 2012-07-18
CN102580938B CN102580938B (en) 2015-04-08

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CN (1) CN102580938B (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104289463A (en) * 2013-07-18 2015-01-21 株式会社迪思科 Spinner cleaning apparatus
CN106123555A (en) * 2016-08-23 2016-11-16 高桥金属制品(苏州)有限公司 A kind of two station wind cut drying machine
CN112521023A (en) * 2020-12-18 2021-03-19 湖南中泰华瑞光学玻璃制造有限公司 AG glass production line with automatic plate turning function

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JPH11297651A (en) * 1998-04-13 1999-10-29 Sony Corp Single-wafer spin-type wafer cleaning apparatus
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JP2009231710A (en) * 2008-03-25 2009-10-08 Dainippon Screen Mfg Co Ltd Substrate processing device
CN101559428A (en) * 2008-04-18 2009-10-21 株式会社迪思科 Rotary washing device and processing device
TW201013815A (en) * 2008-08-06 2010-04-01 Tokyo Electron Ltd Liquid processing apparatus

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Publication number Priority date Publication date Assignee Title
JPS51126070A (en) * 1975-04-25 1976-11-02 Hitachi Ltd Weber treatment equipment
JPS59181357A (en) * 1983-03-31 1984-10-15 Kanegafuchi Chem Ind Co Ltd Photoconductive material
JPH11297651A (en) * 1998-04-13 1999-10-29 Sony Corp Single-wafer spin-type wafer cleaning apparatus
JP2001127033A (en) * 1999-10-25 2001-05-11 Tokyo Electron Ltd Board processor
JP2009231710A (en) * 2008-03-25 2009-10-08 Dainippon Screen Mfg Co Ltd Substrate processing device
CN101559428A (en) * 2008-04-18 2009-10-21 株式会社迪思科 Rotary washing device and processing device
TW201013815A (en) * 2008-08-06 2010-04-01 Tokyo Electron Ltd Liquid processing apparatus

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104289463A (en) * 2013-07-18 2015-01-21 株式会社迪思科 Spinner cleaning apparatus
TWI664029B (en) * 2013-07-18 2019-07-01 迪思科股份有限公司 Rotary washing device
CN106123555A (en) * 2016-08-23 2016-11-16 高桥金属制品(苏州)有限公司 A kind of two station wind cut drying machine
CN106123555B (en) * 2016-08-23 2018-10-30 高桥金属制品(苏州)有限公司 Two station wind of one kind cutting drying machine
CN112521023A (en) * 2020-12-18 2021-03-19 湖南中泰华瑞光学玻璃制造有限公司 AG glass production line with automatic plate turning function
CN112521023B (en) * 2020-12-18 2022-07-19 湖南中泰华瑞光学玻璃制造有限公司 AG glass production line with automatic plate turning function

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CN102580938B (en) 2015-04-08
JP2012139660A (en) 2012-07-26

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