CN102451824A - Rotating cleaning device - Google Patents
Rotating cleaning device Download PDFInfo
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- CN102451824A CN102451824A CN2011103278566A CN201110327856A CN102451824A CN 102451824 A CN102451824 A CN 102451824A CN 2011103278566 A CN2011103278566 A CN 2011103278566A CN 201110327856 A CN201110327856 A CN 201110327856A CN 102451824 A CN102451824 A CN 102451824A
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- cleaning device
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Abstract
The present invention provides a rotating cleaning device which can generate downward flows through a simpler structure. The rotating cleaning device (1) is provided with the following components: a rotating worktable (30) which is used for holding a workpiece; a motor (42) for rotating the rotating worktable (30) in a vertical direction as a rotation axis; a cleaning fluid supply nozzle (50) which supplies the cleaning fluid to the workpiece that is held in the rotating worktable (30); a housing (20) which is used for accommodating the rotating worktable (30); and blades (36A) which are connected with a motor (42). When the rotating worktable (30) rotates, the blades (36A) simultaneously rotate through the motor (42) for causing the housing (20) to generate the downward flows.
Description
Technical field
The present invention relates to rotary cleaning device through coming to the Workpiece supply cleaning fluid that rotates workpiece is cleaned.
Background technology
In the manufacturing process of semiconductor devices; Integrated circuit) or LSI (Large-scale Integration: semiconductor devices such as large scale integrated circuit) mark off a large amount of zones on the surface of the semiconductor wafer of circular plate shape roughly through being arranged in the cancellate preset lines of cutting apart, in each zone that marks off, form IC (Integrated Circuit:.And,, produce semiconductor devices one by one thus through cutting apart each zone along cutting apart the preset lines cutting semiconductor chip.The pollutants such as smear metal that generate in the time of can adhering to cutting on the surface of semiconductor wafer.Therefore, after cutting finishes, through rotary cleaning device semiconductor wafer is cleaned, said rotary cleaning device comes semiconductor wafer cleaning through supplying with cleaning fluid to the semiconductor wafer of rotation.
But, when utilizing rotary cleaning device to come semiconductor wafer cleaning, can be from the polluted mist that rotary cleaning device is kicked up to the cavity external diffusion of rotary cleaning device.Diffuse to the outer mist of cavity and can produce harmful effect the equipment or the parts of other devices such as cutter sweep.Therefore, propose that following technology is arranged: through cavity the top is set and suppresses polluted mist to the cavity external diffusion at rotary cleaning device.But, according to this technology, being attached to the mist gathering at top and becoming water droplet, water droplet drops to from the top on the surface of semiconductor wafer, and thus, pollutant can be attached to semiconductor wafer once more.According to such background, applicant of the present invention has proposed following such invention: suppress mist to the cavity external diffusion through in cavity, producing sinking (ダ ウ Application Off ロ one), contaminant restraining is attached to semiconductor wafer (with reference to patent documentation 1) once more simultaneously.
Patent documentation 1: TOHKEMY 2009-260094 communique
But according to patent documentation 1 described invention, except being used for also need being used to produce the Blast mechanism of sinking to carrying out the exhaust gear of exhaust in the cavity, therefore, it is complicated that the structure of rotary cleaning device becomes.Therefore, expectation provides a kind of rotary cleaning device that can produce sinking through simpler structure.
Summary of the invention
The present invention accomplishes in view of above-mentioned problem just, and its purpose is to provide a kind of rotary cleaning device that can produce sinking through simpler structure.
In order to solve above-mentioned problem to achieve the goal, rotary cleaning device of the present invention possesses: keep workbench, it is used to keep workpiece; Rotating part, it is that rotating shaft makes said maintenance workbench rotation with the vertical direction; Washer jet, it is to the Workpiece supply cleaning fluid that remains in said maintenance workbench; And housing, it is used to take in said maintenance workbench, wherein; Said rotary cleaning device possesses the blade that is connected with said rotating part; When said maintenance workbench rotated, said blade pass was crossed said rotating part and rotation simultaneously, so that produce sinking in the said housing.
According to rotary cleaning device of the present invention, owing to utilizing the blade that rotates along with the rotation of rotating part to produce sinking, therefore, do not need exhaust gear and Blast mechanism, thereby can produce sinking through simpler structure.
Description of drawings
Fig. 1 is the stereogram that illustrates as the structure of the rotary cleaning device of an embodiment of the invention.
Fig. 2 is the stereogram that illustrates as the structure of the major part of the rotary cleaning device of an embodiment of the invention.
Fig. 3 is used to explain that sinking illustrated in figures 1 and 2 produces the sketch map with the structure of parts.
Fig. 4 is the sketch map that is used to explain the action of rotary cleaning device illustrated in figures 1 and 2.
Fig. 5 illustrates sinking generation illustrated in figures 1 and 2 plane with the structure of the variation of parts.
Label declaration
1: rotary cleaning device; 20: shell; 30: rotary table; 35: post (Port ス ト); 36A: blade; 42: motor; 50: the cleaning solution supplying nozzle.
The specific embodiment
Below, with reference to accompanying drawing structure and action as the rotary cleaning device of an embodiment of the invention are described.
(structure of rotary cleaning device)
At first, referring to figs. 1 through Fig. 3, the structure as the rotary cleaning device of an embodiment of the invention is described.Fig. 1 is the stereogram that illustrates as the structure of the rotary cleaning device of an embodiment of the invention.Fig. 2 is the stereogram that illustrates as the structure of the major part of the rotary cleaning device of an embodiment of the invention.Fig. 3 is used to explain that sinking illustrated in figures 1 and 2 produces the sketch map with the structure of parts.
As depicted in figs. 1 and 2, be mounted on the processing unit (plant) that workpiece is processed to clean the device of processed workpiece as the rotary cleaning device 1 of an embodiment of the invention.As processing unit (plant), can illustration go out to carry out the processing unit (plant) of the cutting processing (comprise the cutting that utilizes cutting tool to carry out, or the cutting that utilizes laser radiation to carry out) of workpiece, the perforate processing of using laser, grinding, attrition process, expansion (Expand) division processing etc.As workpiece; Not special the qualification; Can illustration go out for example semiconductor wafers such as silicon wafer, GaAs (GaAs) wafer, SiC (carborundum) wafer; As chip encapsulation with and Die Attached Film) be arranged at the DAF (die bonding film: adhering part such as, the packaging body of semiconductor product, pottery, glass, sapphire (Al of chip back surface
2O
3) etc. the inorganic material substrate, and various electronic units such as LCD driver.
Rotary cleaning device 1 is supported in the precalculated position on the pedestal of processing unit (plant) via supporting base 10.Supporting base 10 possesses: the plate 11 of level, and it is fixed in the pedestal of processing unit (plant); A plurality of shanks 12, its setting are arranged on the plate 11; And supporting part 13, it is fixed in the upper end of these shanks 12.Supporting part 13 is that the periphery at the base plate of not shown circle is provided with the housing 13a of ring-type and the parts that constitute, embeds and be supported with the shell cylindraceous 20 of the main body that constitutes rotary cleaning device 1 at this supporting part 13.Shell 20 plays a role as housing of the present invention.
The shell 20 that is supported on supporting part 13 forms the axle center along the state of vertical direction (illustrated Z-direction) roughly.The inside of this shell 20 becomes purge chamber 21, and in purge chamber 21, discoideus rotary table 30 is adapted to and 20 one-tenth concentric shapes of shell.Rotary table 30 is in the chimeric discoideus adsorption section 32 that is made up of porous plastid of the upper surface of discoideus framework 31 and the parts that constitute.Rotary table 30 plays a role as maintenance workbench of the present invention.
The 31 one-tenth concentric shapes in adsorption section 32 and framework; And adsorption section 32 occupies the major part of the upper surface of rotary table 30; The upper surface of the framework 31 of the upper surface of adsorption section 32 and ring-type on every side is same plane, thereby forms the smooth maintenance face 30A that is used to keep workpiece.Rotary table 30 is connected with not shown vacuum plant via the not shown pipe arrangement of suction air; When making not shown vacuum plant running; The air of 32 tops, adsorption section is aspirated; Through this air swabbing action, carry the workpiece put on rotary table 30 and be adsorbed and remain in adsorption section 32.
Rotary table 30 is supported in the upper end of post 35 with freely the mode of can rotating, and the base plate ground that this post 35 runs through supporting part 13 extends along vertical direction.Post 35 has the stretching structure as the telescope configuration that for example a plurality of cylindrical body are combined, and this post 35 is provided in the center of shell 20.When post 35 elongations, rotary table 30 is exposed to the top of shell 20, and rises to the delivery position (position P1 shown in Figure 4) of workpiece.On the other hand, when post 35 shortened, rotary table 30 dropped to the predetermined cleaning positions (position P2 shown in Figure 4) that is set in the purge chamber 21.Thereby have the flexible not shown lift component of motors that rotary table 30 goes up and down etc. that makes of post 35 is fixed on the plate 11.
In addition, on plate 11, be fixed with the motor 42 that makes rotary table 30 rotations.In the framework 31 of rotary table 30, be connected with the not shown rotary transfer machine of the rotation that is used to transmit motor 42, when motor 42 runnings, framework 31, be that rotary table 30 is rotating shaft and to illustrated arrow R direction rotation with the vertical direction.Rotary table 30 goes up and down along with the flexible of post 35 as above-mentioned, but as long as this rotary table 30 can rotate when being located in cleaning positions in decline.Therefore, adopt such structure: when rotary table 30 was positioned cleaning positions, rotary transfer machine was connected with the framework 31 of rotary table 30.In addition, can certainly be rotary transfer machine always be connected with rotary table 30 and with the irrelevant structure of the up-down of rotary table 30.The elevating mechanism of rotary table 30 and rotating mechanism are not limited to above-mentioned embodiment, so long as the structure that can go up and down and rotate then can be selected any structure.Motor 42 plays a role as rotating part of the present invention.
Around rotary table 30, be equipped with a plurality of binding clasps 34, be held under the situation of framework, thereby the clamped device 34 of framework is controlled and is held at workpiece.Each binding clasp 34 is fixed in the framework 31 of rotary table 30.The top opening of shell 20 opens and closes through coiled capping (Off ラ Star プ) 25.This capping 25 forms band shape by having flexible material, when with capping 25 when the coiling portion 26 of the side of the top that is provided in shell 20 pulls out, the top opening of shell 20 is closed.Capping 25 closing state are through keeping with inferior method: the terminal part of capping 25 is colluded be hung on shell 20 and make it engaging.When capping 25 is closed, become air-tight state in the purge chamber 21.In addition, in order to improve the leak tightness of purge chamber 21, preferred being closed with seal with the base plate of shell 20 by hole that post 35 ran through etc.
In purge chamber 21, be provided with two cleaning solution supplying nozzles 50, the upper surface ejection of the workpiece of this cleaning solution supplying nozzle 50 on the maintenance face 30A that remains on rotary table 30 is also supplied with cleaning fluid.Cleaning fluid uses pure water perhaps to add CO in order to prevent static
2Pure water.Cleaning solution supplying nozzle 50 is arranged on the end of pipe arrangement 51 with the mode that sprays cleaning fluid downwards.Pipe arrangement 51 is bearing on the rotating shaft 52 that is installed in the shell 20 with mode that can horizontal rotation, and this pipe arrangement 51 is through reciprocating rotating, cleaning fluid is ejected into equably is rotated that workbench 30 keeps and the upper surface of the workpiece of rotation.Cleaning solution supplying nozzle 50 plays a role as washer jet of the present invention.
Position below the ratio rotary table 30 of post 35 leans on, with rotary table 30 concentric shapes be equipped with discoideus sinking and produce with parts 36, this sinking generation has the diameter bigger than the diameter of rotary table 30 with parts 36.Sinking produces and is connected with the parts that rotate through motor 42 (being post 35 in this embodiment) with parts 36, and rotates simultaneously when illustrated arrow R direction is rotated at rotary table 30.Sinking produces has a plurality of blade 36A along circumferential array with parts 36.As shown in Figure 3, the blade 36A flat parts that (illustrated XY plane) has a gradient by with respect to the horizontal plane constitute, and with the mode that separates predetermined space along circumferential array.At the air of the upper side of blade 36A along with sinking produces with the rotation of parts 36 between blade 36A through gap and mobile towards the lower side of blade 36A.Thus, can around rotary table 30, produce the flowing of (illustrated-directions X) below vertical direction of air equably, i.e. sinking A.
In the bottom of shell 20, be provided with and be used for lead the outside of shell 20 and be expelled to the discharge outlet 37 of predetermined treatment facility and the drainpipe 38 that is connected with discharge outlet 37 of cleaning fluid.Drainpipe 38 is connected with not shown predetermined treatment facility.
(action of rotary cleaning device)
Below, with reference to Fig. 4 the action of rotary cleaning device 1 is described.Fig. 4 is the sketch map that is used to explain the action of rotary cleaning device illustrated in figures 1 and 2.
To in processing unit (plant), accomplish on the rotary table 30 of work delivery to rotary cleaning device 1 of manufacturing procedure.Workpiece carries out under following state to the handing-over of rotary table 30: the state of opening from capping 25 begins, and rotary table 30 is risen and is positioned the delivery position P1 of shell 20 tops through not shown lift component.In rotary table 30, make vacuum plant running in advance, thereby when workpiece being concentric shape ground through the conveyance member that processing unit (plant) had and year placing maintenance face 30A, this workpiece is adsorbed maintenance.Under the situation that workpiece is being supported by framework, keep framework through binding clasp 34.In addition, to workpiece under situation about handling under the free state, only this is used for workpiece is remained in rotary table 30 on the adsorption section 32 through workpiece is adsorbed on.
The rotary table 30 that maintains workpiece drops in the purge chamber 21 through not shown lift component and is positioned at cleaning positions P2.Capping 25 is closed.Under this state, accomplished the preparation of cleaning, next made rotary table 30, and when making pipe arrangement 51 reciprocating rotatings, sprayed cleaning fluids through cleaning solution supplying nozzle 50 with the for example rotation of the speed about 800rpm.Cleaning fluid is sprayed and be supplied to the upper surface of the workpiece of rotation equably, thus, utilize cleaning fluid to wash being attached to workpiece pollution composition (for example smear metal or grindstone dust).
After through predetermined scavenging period, stop the supply of cleaning fluid, and make rotary table 30 continue rotation utilizing centrifugal force that cleaning fluid is driven away from workpiece, and then make workpiece dry.In this dry run, the rotating speed of rotary table 30 is promoted to for example about 3000rpm, so that carry out drying rapidly.In addition; In this embodiment, supply with cleaning fluid from two cleaning solution supplying nozzles 50; But also can constitute a nozzle ejection cleaning fluid from two cleaning solution supplying nozzles 50; And, can also constitute when cleaning, and when drying, switch and from another air supply nozzle ejection air from a cleaning solution supplying nozzle ejection cleaning fluid from another cleaning solution supplying nozzle ejection air.In addition, can also constitute and make two cleaning solution supplying nozzle 50 both sides ejection cleaning fluid when cleaning, and when drying, spray air.If when drying, spray air like this from the cleaning solution supplying nozzle, then can make workpiece drier, be preferred therefore.
After through predetermined drying time, the rotation of the workbench 30 that stops the rotation is opened capping 25 and is made rotary table 30 rise to delivery position, stops the running of above-mentioned vacuum plant.Then, through manipulator that processing unit (plant) had etc. workpiece is picked up from rotary table 30, and be received into predetermined taking in the member.
In the process of above-mentioned cleaning and drying,, can produce the mist that contain pollutant component from workpiece through Workpiece supply cleaning fluid to rotation.Prevented of external leaks and the diffusion of this mist through shell 20 and capping 25 to purge chamber 21.In addition, sinking produces with parts 36 rotation simultaneously along with the rotation of rotary table 30.Along with sinking produces the rotation with parts 36, around rotary table 30, produce the flowing below vertical direction of air equably, i.e. sinking A.Utilize this sinking A, can suppress to cause pollutant to be attached to workpiece once more because of mist is attached to workpiece.The cleaning fluid and the mist that are directed to the bottom of shell 20 through sinking A are sent to not shown predetermined treatment facility via discharge outlet 37 and drainpipe 38.
More than, be illustrated having used the working of an invention mode of accomplishing by present inventors, but the present invention is not limited to constitute record and the accompanying drawing based on the disclosed part of the present invention of above-mentioned embodiment.For example, in this embodiment, produce sinking, still, also can as for example shown in Figure 5, blade 36A be set and produce sinking through framework 31 at rotary table 30 through below rotary table 30, setting sinking production part 36.In structure shown in Figure 5, blade 36A rotates along with the rotation of rotary table 30, can produce sinking thus.Like this, other embodiments, embodiment and the application technology etc. accomplished based on above-mentioned embodiment by those skilled in the art all are contained in the scope of the present invention.
Claims (1)
1. rotary cleaning device, it possesses: keep workbench, it is used to keep workpiece; Rotating part, it is that rotating shaft makes said maintenance workbench rotation with the vertical direction; Washer jet, it is to the Workpiece supply cleaning fluid that remains in said maintenance workbench; And housing, it is used to take in said maintenance workbench, and said rotary cleaning device is characterised in that,
Said rotary cleaning device possesses the blade that is connected with said rotating part,
When said maintenance workbench rotated, said blade pass was crossed said rotating part and rotation simultaneously, so that produce sinking in the said housing.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010-240182 | 2010-10-26 | ||
| JP2010240182A JP2012094659A (en) | 2010-10-26 | 2010-10-26 | Spinner cleaning device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN102451824A true CN102451824A (en) | 2012-05-16 |
Family
ID=46035747
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2011103278566A Pending CN102451824A (en) | 2010-10-26 | 2011-10-25 | Rotating cleaning device |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP2012094659A (en) |
| CN (1) | CN102451824A (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN103855059A (en) * | 2012-11-30 | 2014-06-11 | 株式会社迪思科 | Cleaning apparatus |
| CN103913855A (en) * | 2014-04-02 | 2014-07-09 | 广州市彩标立体眼镜有限公司 | Rotary glasses cleaning equipment and cleaning basket thereof |
| CN104289463A (en) * | 2013-07-18 | 2015-01-21 | 株式会社迪思科 | Spinner cleaning apparatus |
| CN108648989A (en) * | 2018-05-16 | 2018-10-12 | 福建北电新材料科技有限公司 | A kind of single crystal silicon carbide substrate wafer cleaning method |
| WO2020034179A1 (en) * | 2018-08-17 | 2020-02-20 | 戴文凤 | Drill bit cleaning tool |
| CN116984292A (en) * | 2023-09-28 | 2023-11-03 | 哈尔滨岛田大鹏工业股份有限公司 | Energy-saving cleaning and drying device |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN103855059A (en) * | 2012-11-30 | 2014-06-11 | 株式会社迪思科 | Cleaning apparatus |
| CN104289463A (en) * | 2013-07-18 | 2015-01-21 | 株式会社迪思科 | Spinner cleaning apparatus |
| CN103913855A (en) * | 2014-04-02 | 2014-07-09 | 广州市彩标立体眼镜有限公司 | Rotary glasses cleaning equipment and cleaning basket thereof |
| CN103913855B (en) * | 2014-04-02 | 2016-02-10 | 广州市彩标立体眼镜有限公司 | A kind of rotary glasses cleaning equipment and cleaning basket thereof |
| CN108648989A (en) * | 2018-05-16 | 2018-10-12 | 福建北电新材料科技有限公司 | A kind of single crystal silicon carbide substrate wafer cleaning method |
| CN108648989B (en) * | 2018-05-16 | 2020-12-25 | 福建北电新材料科技有限公司 | Method for cleaning single crystal silicon carbide substrate wafer |
| WO2020034179A1 (en) * | 2018-08-17 | 2020-02-20 | 戴文凤 | Drill bit cleaning tool |
| CN116984292A (en) * | 2023-09-28 | 2023-11-03 | 哈尔滨岛田大鹏工业股份有限公司 | Energy-saving cleaning and drying device |
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| JP2012094659A (en) | 2012-05-17 |
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Application publication date: 20120516 |