TWI664029B - Rotary washing device - Google Patents
Rotary washing device Download PDFInfo
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- TWI664029B TWI664029B TW103118278A TW103118278A TWI664029B TW I664029 B TWI664029 B TW I664029B TW 103118278 A TW103118278 A TW 103118278A TW 103118278 A TW103118278 A TW 103118278A TW I664029 B TWI664029 B TW I664029B
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- fan member
- holding base
- cavity
- holding
- fan
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/02—Cleaning by the force of jets or sprays
- B08B3/022—Cleaning travelling work
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B15/00—Preventing escape of dirt or fumes from the area where they are produced; Collecting or removing dirt or fumes from that area
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
- H01L21/02043—Cleaning before device manufacture, i.e. Begin-Of-Line process
- H01L21/02052—Wet cleaning only
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68764—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a movable susceptor, stage or support, others than those only rotating on their own vertical axis, e.g. susceptors on a rotating caroussel
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
本發明之課題為提供一種在旋轉洗淨中，可防止洗淨時受污染的噴霧及洗淨水往晶圓再附著之情形的旋轉洗淨裝置。解決手段為，旋轉洗淨裝置中設有用以保持晶圓的保持基台、保持基台旋轉部、洗淨水噴射機構、收納保持基台的腔體、將氣體從腔體內排出的導管、將圍繞從保持基台的表面位置到腔體的開口部為止之保持基台的外周空間包覆而形成圓環形狀的風扇構件，及使風扇構件旋轉的風扇構件旋轉部。風扇構件是藉由風扇構件旋轉部而進行旋轉，以在保持基台的上方，並從風扇構件的圓環形狀內周部往風扇構件之外周部使氣流產生，以將洗淨時的洗淨水及噴霧往風扇構件的外部排出而導向導管。 An object of the present invention is to provide a rotary cleaning device that can prevent contaminated spray and cleaning water from re-adhering to a wafer during cleaning. The solution is that the rotary cleaning device is provided with a holding base for holding the wafer, a holding base rotating part, a washing water spray mechanism, a cavity for holding the holding base, a conduit for exhausting gas from the cavity, and a A fan member is formed around the outer peripheral space of the holding base from the surface position of the holding base to the opening of the cavity to form a ring-shaped fan member, and a fan member rotating portion that rotates the fan member. The fan member is rotated by the fan member rotating portion so as to generate airflow from the ring-shaped inner peripheral portion of the fan member to the outer peripheral portion of the fan member above the holding base, so as to be cleaned during washing. The water and spray are discharged to the outside of the fan member and guided to the duct.
Description
本發明是關於藉由提供洗淨水給旋轉之半導體晶圓等工件以將工件洗淨的旋轉洗淨裝置。 The present invention relates to a rotary cleaning device for washing workpieces by supplying washing water to workpieces such as a rotating semiconductor wafer.
在半導體裝置的製造步驟中，是在大致成圓板狀之半導體晶圓的表面以排列成格子狀的分割預定線劃分出多數個領域，並在所劃分出的各個領域中形成IC、LSI等半導體裝置。並且，藉由沿著分割預定線對半導體晶圓進行晶片切割(dicing)以分割各領域，進而製造出一個個半導體裝置。在半導體晶圓的表面，會有晶片切割時所產生的切削屑等髒污附著的情形。因此，晶片切割結束後，會透過可供應洗淨水給旋轉之半導體晶圓以將半導體晶圓洗淨之旋轉洗淨裝置將半導體晶圓洗淨。 In the manufacturing process of a semiconductor device, a plurality of areas are divided on a surface of a semiconductor wafer having a substantially circular plate shape by a predetermined division line arranged in a grid shape, and ICs, LSIs, and the like are formed in each of the divided areas. Semiconductor device. In addition, the semiconductor wafer is subjected to wafer dicing along a predetermined division line to divide each area, thereby manufacturing individual semiconductor devices. On the surface of the semiconductor wafer, dirt such as cutting chips generated during wafer dicing may adhere. Therefore, after the wafer dicing is completed, the semiconductor wafer is cleaned by a rotary cleaning device that can supply washing water to the rotating semiconductor wafer to clean the semiconductor wafer.
然而，當以旋轉洗淨裝置清洗半導體晶圓時，由旋轉洗淨裝置捲起的受污染噴霧會在旋轉洗淨裝置的腔體內擴散，因此會發生噴霧在半導體晶圓表面再附著的情形。為此，在習知的旋轉洗淨裝置中，已有藉由在腔體內產生沉降氣流(down flow)的方式，以抑制噴霧在腔體內擴散， 並抑制髒污往半導體晶圓再附著的方案被提出。(參照專利文獻1) However, when the semiconductor wafer is cleaned by the rotary cleaning device, the contaminated spray rolled up by the rotary cleaning device may diffuse in the cavity of the rotary cleaning device, so that the spray may reattach to the surface of the semiconductor wafer. For this reason, in the conventional rotary cleaning device, there has been a method of generating a downflow in the cavity to suppress the diffusion of the spray in the cavity. A scheme to suppress the re-attachment of dirt to the semiconductor wafer is proposed. (Refer to Patent Document 1)
專利文獻1：日本專利特開2012-94659號公報 Patent Document 1: Japanese Patent Laid-Open No. 2012-94659
但是，雖然可以用沉降氣流防止噴霧往晶圓再附著，但是，飛散之污染水會在腔體內壁等處飛濺，而有無法防止往晶圓再附著之情形的問題。 However, although it is possible to prevent the re-attachment of the spray to the wafer by the sedimentation airflow, the scattered contaminated water may splash on the inner wall of the cavity and the like, and there is a problem that the re-attachment to the wafer cannot be prevented.
本發明是有鑑於上述問題而作出者，其目的在於提供一種可在旋轉洗淨中，防止洗淨時被污染的噴霧及洗淨水往晶圓再附著之情形的旋轉洗淨裝置。 The present invention has been made in view of the above-mentioned problems, and an object thereof is to provide a rotary cleaning device that can prevent contaminated spray and cleaning water from re-adhering to a wafer during the rotary cleaning.
為了解決上述問題，並達成目的，本發明之旋轉洗淨裝置包含保持板狀物之圓盤狀的保持基台、使該保持基台以垂直方向作為旋轉軸旋轉的保持基台旋轉部、將洗淨水噴向保持於該保持基台的上表面之前述板狀物的洗淨水噴射機構。其特徵在於，該旋轉洗淨裝置具有收納前述保持基台且上表面形成有開口的圓筒狀之腔體、配置在該腔體的側壁並將氣體從該腔體內排出之導管、在洗淨時將圍繞該保持基台且從該保持基台的表面位置到該腔體的開口部為止的外周空間包覆而形成圓環形狀之風扇構件，及 使該風扇構件以垂直方向作為旋轉軸旋轉的風扇構件旋轉部。該風扇構件透過以該風扇構件旋轉部進行旋轉的方式，在該保持基台的上方且從該風扇構件的該圓環形狀內周部往該風扇構件的外周部使氣流產生，而將洗淨時的洗淨水及噴霧往該風扇構件的外部強制排出並導向該導管。 In order to solve the above problems and achieve the object, the rotary cleaning device of the present invention includes a disk-shaped holding base that holds a plate, a holding base rotating portion that rotates the holding base in a vertical direction as a rotation axis, and The washing water is sprayed onto the washing water spraying mechanism of the plate-shaped object held on the upper surface of the holding base. It is characterized in that the rotary cleaning device includes a cylindrical cavity that houses the holding base and has an opening formed on the upper surface, a duct that is disposed on a side wall of the cavity and discharges gas from the cavity, and is cleaned. The outer peripheral space surrounding the holding abutment and from the surface position of the holding abutment to the opening of the cavity is covered to form a ring-shaped fan member, and A fan member rotating portion that rotates the fan member in a vertical direction as a rotation axis. The fan member passes through the fan member rotating portion to rotate, and above the holding base and from the ring-shaped inner peripheral portion of the fan member to the outer peripheral portion of the fan member to generate airflow, and is cleaned. The washing water and spray at the time are forcibly discharged to the outside of the fan member and guided to the duct.
又，較理想的是，在上述的旋轉洗淨裝置中，前述風扇構件固定於前述保持基台旋轉部的外周，而將該保持基台旋轉部兼作為該風扇構件旋轉部，且該風扇構件與該保持基台的旋轉一起旋轉。 In the above-mentioned rotary cleaning device, it is preferable that the fan member is fixed to an outer periphery of the holding base rotating portion, and the holding base rotating portion also serves as the fan member rotating portion, and the fan member Rotate together with the rotation of the holding base.
本發明之旋轉洗淨裝置洗淨，是藉由以包覆到開口為止的圓環形狀風扇構件圍繞保持基台的外周，並在洗淨時使其旋轉的方式，強制地使晶圓上表面的噴霧及洗淨水往風扇構件的外周部排出並導向導管，因此可以防止受污染的洗淨水和噴霧再附著到晶圓上表面之情形。 The rotary cleaning device of the present invention cleans the upper surface of the wafer forcibly by surrounding the outer periphery of the holding base with a ring-shaped fan member covering the opening to the opening and rotating it during cleaning. The spray and washing water are discharged to the outer periphery of the fan member and guided to the duct, so that the contaminated washing water and spray can be prevented from being reattached to the upper surface of the wafer.
15、71‧‧‧保持基台旋轉部 15, 71‧‧‧ holding abutment rotation
1、70‧‧‧旋轉洗淨裝置 1. 70‧‧‧ rotating washing device
16、72‧‧‧保持基台支撐部 16, 72‧‧‧ Hold abutment support
W‧‧‧晶圓 W‧‧‧ Wafer
17、73‧‧‧保持基台旋轉軸 17, 73‧‧‧ keep the abutment rotation axis
11‧‧‧保持面 11‧‧‧ keep face
20‧‧‧風扇構件 20‧‧‧Fan member
10‧‧‧保持基台 10‧‧‧ maintain abutment
21‧‧‧翼片 21‧‧‧ wings
12‧‧‧夾具 12‧‧‧ Fixture
25、75‧‧‧風扇構件旋轉部 25, 75‧‧‧fan member rotating part
26‧‧‧風扇構件支撐部 26‧‧‧fan member support
42‧‧‧軸承固定構件 42‧‧‧bearing fixing member
27‧‧‧風扇構件軸部 27‧‧‧Fan member shaft
45‧‧‧導管 45‧‧‧ Catheter
28‧‧‧插通孔 28‧‧‧ through hole
50‧‧‧洗淨水噴射機構 50‧‧‧washing water spraying mechanism
29、43‧‧‧排水孔 29, 43‧‧‧ Drain holes
51‧‧‧洗淨水噴嘴 51‧‧‧washing water nozzle
30‧‧‧腔體 30‧‧‧ Cavity
60‧‧‧保持基台用馬達 60‧‧‧Motor for holding abutment
31‧‧‧上表面部 31‧‧‧upper surface
61‧‧‧風扇構件用馬達 61‧‧‧Motor for fan component
32‧‧‧折回部 32‧‧‧turn-back section
62‧‧‧風扇構件用驅動側皮帶輪 62‧‧‧Drive side pulley for fan member
33‧‧‧開口部 33‧‧‧ opening
34‧‧‧側壁 34‧‧‧ sidewall
63‧‧‧風扇構件用從動側皮帶輪 63‧‧‧Driven side pulley for fan member
36‧‧‧內周部 36‧‧‧Inner periphery
37‧‧‧外周部 37‧‧‧ Peripheral Department
65‧‧‧皮帶 65‧‧‧Belt
40‧‧‧分隔壁部 40‧‧‧partition wall
68‧‧‧風扇構件旋轉部軸承 68‧‧‧Fan member bearing
41‧‧‧孔部 41‧‧‧ Hole
78‧‧‧馬達 78‧‧‧ Motor
圖1為實施形態1之旋轉洗淨裝置的立體圖；圖2是圖1所示之旋轉洗淨裝置的垂直方向截面圖；及圖3是實施形態2之旋轉洗淨裝置的截面圖。 FIG. 1 is a perspective view of a rotary cleaning device according to a first embodiment; FIG. 2 is a vertical sectional view of the rotary cleaning device shown in FIG. 1; and FIG. 3 is a cross-sectional view of a rotary cleaning device according to a second embodiment.
以下，依據附圖，詳細地說明本發明之旋轉洗淨裝置的實施形態。再者，本發明並不因為這個實施形態而受到限定。而且，在下述實施形態的構成要素中，包含本 領域業者可能且容易置換者，或實質相同者。 Hereinafter, embodiments of the rotary cleaning device of the present invention will be described in detail with reference to the drawings. The present invention is not limited by this embodiment. The constituent elements of the following embodiments include the present Those in the field may be easily replaced, or substantially the same.
[實施形態1] [Embodiment 1]
圖1是實施形態1之旋轉洗淨裝置的立體圖。圖2是圖1所示之旋轉洗淨裝置的垂直方向截面圖。同圖中所示的旋轉洗淨裝置1是在對由半導體材料所製成的圓形薄板狀物之晶圓W施行過預定的加工後，用於將該晶圓W洗淨的裝置，可以配備在圖未示之加工裝置中，或以單獨的狀態被使用。對晶圓W所施加的加工，可列舉出例如，用切削刀進行之切削或利用雷射光線照射以分割晶圓W的分割加工、經由擴片(expanded)進行的分割加工、藉由雷射光線照射而進行的開孔加工、磨削加工、研磨加工等。 Fig. 1 is a perspective view of a rotary washing apparatus according to a first embodiment. FIG. 2 is a vertical cross-sectional view of the rotary cleaning device shown in FIG. 1. FIG. The rotary cleaning device 1 shown in the figure is a device for cleaning the wafer W after performing a predetermined process on a wafer W of a circular thin plate-like object made of a semiconductor material. It is equipped in a processing device (not shown) or used in a separate state. The processing to be performed on the wafer W includes, for example, cutting by a cutter or division processing by dividing the wafer W by irradiation with laser light, division processing by expanding, and laser processing. Drilling, grinding, grinding, etc. by light irradiation.
實施形態1之旋轉洗淨裝置1具備在設於上表面之保持面11上保持晶圓W的圓盤狀保持基台10、使保持基台10以垂直方向作為旋轉軸而旋轉的保持基台旋轉部15，及將洗淨水噴向保持在保持基台10之保持面11上的晶圓W之洗淨水噴射機構50。又，旋轉洗淨裝置1具有用以收納保持基台10且上表面形成有開口之圓筒狀腔體30，在腔體30的側壁34配置有將氣體從腔體30內排出的導管45。 The rotary cleaning device 1 according to Embodiment 1 includes a disk-shaped holding base 10 holding a wafer W on a holding surface 11 provided on an upper surface, and a holding base that rotates the holding base 10 in a vertical direction as a rotation axis. The rotating portion 15 and a washing water spraying mechanism 50 that sprays washing water on the wafer W held on the holding surface 11 of the holding base 10. In addition, the rotary washing apparatus 1 includes a cylindrical cavity 30 for holding and holding the base 10 and having an opening formed on the upper surface thereof. A side wall 34 of the cavity 30 is provided with a duct 45 for discharging gas from the cavity 30.
在腔體30的內部透過保持基台旋轉部15將保持基台10相對於腔體30配置成同心狀。保持基台10是藉由在作為晶圓W的保持面11之水平的上表面產生負壓，以將晶圓W吸附保持在保持面11上的一般周知的真空夾頭式物件。又，在保持基台10中配置有在晶圓W之加工時將安裝於晶圓W上以保持晶圓W的框架(圖示省略)保持住的夾具12。 The holding base 10 is arranged concentrically with respect to the cavity 30 through the holding base rotation part 15 inside the cavity 30. The holding base 10 is a generally known vacuum chuck-type object that generates a negative pressure on the upper surface that is the level of the holding surface 11 of the wafer W to suck and hold the wafer W on the holding surface 11. Further, the holding base 10 is provided with a jig 12 that holds a frame (not shown) mounted on the wafer W to hold the wafer W during processing of the wafer W.
使保持基台10旋轉的保持基台旋轉部15具有，形成為直徑比保持基台10還大的圓盤形狀以支撐保持基台10之保持基台支撐部16、以垂直方向作為旋轉軸使保持基台支撐部16旋轉的保持基台旋轉軸17，及作為保持基台10旋轉時之動力源的保持基台用馬達60。其中，保持基台支撐部16是配置在保持基台10的下表面側，亦即，位於保持基台10之保持面11側的相反側。保持基台10是與該保持基台支撐部16形成一體而可旋轉地被連結在保持基台支撐部16的上表面。 The holding base rotating portion 15 that rotates the holding base 10 has a holding base supporting portion 16 formed in a disc shape having a diameter larger than that of the holding base 10 to support the holding base 10, and using the vertical direction as a rotation axis. A holding base rotating shaft 17 holding the base supporting portion 16 is rotated, and a holding base motor 60 serving as a power source when the holding base 10 is rotated. The holding base support portion 16 is disposed on the lower surface side of the holding base 10, that is, on the opposite side to the holding surface 11 side of the holding base 10. The holding base 10 is integrally formed with the holding base supporting portion 16 and is rotatably connected to the upper surface of the holding base supporting portion 16.
又，保持基台旋轉軸17是將其上端連結至保持基台支撐部16之位於保持基台10之面側的相反側之面，並從保持基台支撐部16沿垂直方向朝下方延伸。也就是說，保持基台旋轉軸17是可與保持基台支撐部16一體旋轉地連結在保持基台支撐部16。保持基台旋轉軸17的下端側則被連結到保持基台用馬達60的輸出軸。藉此，保持基台10可藉由保持基台用馬達60所產生的動力，而變得可與保持基台旋轉軸17和保持基台支撐部16一起旋轉。 Further, the holding base rotation shaft 17 is connected to the upper end of the holding base supporting portion 16 on a surface of the holding base supporting portion 16 opposite to the side of the holding base 10, and extends downward from the holding base supporting portion 16 in the vertical direction. That is, the holding base rotating shaft 17 is connected to the holding base supporting portion 16 so as to be rotatable integrally with the holding base supporting portion 16. The lower end side of the holding base rotating shaft 17 is connected to the output shaft of the holding base motor 60. Thereby, the holding base 10 can be rotated together with the holding base rotation shaft 17 and the holding base support portion 16 by the power generated by the holding base motor 60.
腔體30具有在上端部分從側壁34朝筒的內側方向沿水平方向形成之板狀的上表面部31。上表面部31以和保持基台10的直徑同等大小之直徑的圓形做出開口，且在上表面部31之該形成開口的部分中，設有朝向下方折回的折回部32。在折回部32中，是將面向圓筒狀腔體30之軸心的部分形成開口部33。開口部33為腔體30的開口部分，且為開口成圓形的狀態。 The cavity 30 has a plate-shaped upper surface portion 31 formed on the upper end portion in a horizontal direction from the side wall 34 toward the inside of the tube. The upper surface portion 31 is opened in a circular shape having a diameter equal to the diameter of the holding base 10, and a folded-back portion 32 is provided in the portion of the upper surface portion 31 where the opening is formed. In the folded-back portion 32, a portion facing the axial center of the cylindrical cavity 30 is an opening portion 33. The opening portion 33 is an opening portion of the cavity 30 and has a state where the opening is circular.
洗淨水噴射機構50具有沿垂直方向延伸的軸部56，並藉由將軸部56配置在腔體30之上表面部31的表面側，將洗淨水噴射機構50轉動自如地安裝在腔體30上。軸部56上連結有可相對於軸部56以垂直方向作為軸方向轉動，且可相對於軸部56在垂直方向上作相對移動之昇降部55。亦即，昇降部55是相對於腔體30在垂直方向上昇降自如地配置在腔體30的上端側。 The washing water spraying mechanism 50 includes a shaft portion 56 extending in the vertical direction, and the washing water spraying mechanism 50 is rotatably installed in the cavity by disposing the shaft portion 56 on the surface side of the upper surface portion 31 of the cavity 30. Body 30. The shaft portion 56 is connected to a lifting portion 55 that is rotatable in the vertical direction relative to the shaft portion 56 and is relatively movable in the vertical direction relative to the shaft portion 56. That is, the raising / lowering part 55 is arrange | positioned in the vertical direction with respect to the cavity 30, and is arrange | positioned at the upper end side of the cavity 30 freely.
有從昇降部55沿水平方向延伸的管線部52，其前端，亦即，在管線部52之連接於昇降部55之側的端部的相反側端部，設有洗淨水噴嘴51。詳細而言，管線部52是藉由相對於軸部56轉動昇降部55的方式，於管線部52形成朝向腔體30軸心的方向時之腔體30軸心附近的位置處，將其向下方彎折。洗淨水噴嘴51是以可將洗淨水向下方噴射的方向安裝在管線部52之被彎折部分的前端。 There is a pipeline portion 52 extending in a horizontal direction from the lifting portion 55, and a front end thereof, that is, an end portion on the side opposite to the end portion of the pipeline portion 52 connected to the lifting portion 55 is provided with a washing water nozzle 51. In detail, the pipeline portion 52 rotates the lifting portion 55 relative to the shaft portion 56, and positions the pipeline portion 52 near the axis of the cavity 30 when the pipeline portion 52 forms a direction toward the axis of the cavity 30. Bend down. The washing water nozzle 51 is attached to the front end of the bent portion of the pipeline portion 52 in a direction in which washing water can be sprayed downward.
此外，在腔體30內，配置有將圍繞從保持基台10的表面位置到腔體30的開口部33為止之保持基台10的外周空間包覆以形成圓環形狀之風扇構件20，及使風扇構件20以垂直方向作為旋轉軸旋轉的風扇構件旋轉部25。 In addition, inside the cavity 30, a fan member 20 is formed to cover the outer peripheral space of the holding base 10 from the surface position of the holding base 10 to the opening portion 33 of the cavity 30 to form a ring shape, and A fan member rotating portion 25 that rotates the fan member 20 in a vertical direction as a rotation axis.
其中，風扇構件20是由複數個配置在保持基台10，或保持基台支撐部16周圍的翼片21所構成。該翼片21各自相對於保持基台10和保持基台支撐部16的直徑方向及圓周方向雙方皆成傾斜，並以在沿垂直方向延伸的方向上所形成的板狀之形狀被形成。複數個翼片21全部都是以相同形狀形成，且沿保持基台10和保持基台支撐部16的圓周方向 上各自間隔分開，而被配置在其周圍。又，複數個翼片21相對於保持基台10和保持基台支撐部16的直徑方向及圓周方向雙方的相對傾斜方向和角度，皆為相同的方向且形成相同的角度。 The fan member 20 includes a plurality of fins 21 arranged around the holding base 10 or the holding base support portion 16. Each of the fins 21 is inclined with respect to both the diameter direction and the circumferential direction of the holding base 10 and the holding base supporting portion 16, and is formed in a plate-like shape formed in a direction extending in the vertical direction. The plurality of fins 21 are all formed in the same shape and along the circumferential direction of the holding base 10 and the holding base supporting portion 16. The upper parts are spaced apart from each other and are arranged around them. The relative tilt directions and angles of the plurality of fins 21 with respect to both the radial direction and the circumferential direction of the holding base 10 and the holding base support portion 16 are the same direction and form the same angle.
風扇構件旋轉部25具有以垂直方向作為旋轉軸以使風扇構件支撐部26旋轉的風扇構件軸部27，及作為風扇構件20旋轉時之動力源的風扇構件用馬達61。 The fan member rotating portion 25 includes a fan member shaft portion 27 that rotates the fan member support portion 26 in a vertical direction as a rotation axis, and a fan member motor 61 as a power source when the fan member 20 rotates.
風扇構件支撐部26是配置在保持基台支撐部16的下表面側，亦即，保持基台支撐部16之連結有保持基台10之面側的相反側，且在風扇構件支撐部26中連結有構成風扇構件20的複數個翼片21。 The fan member support portion 26 is disposed on the lower surface side of the holding base support portion 16, that is, on the opposite side of the surface side of the holding base support portion 16 to which the holding base 10 is connected, in the fan member support portion 26. A plurality of fins 21 constituting the fan member 20 are connected.
詳而言之，各翼片21是將下端部連結於環狀的風扇構件支撐部26的外周端附近，並藉此讓複數個翼片21以在將環狀的軸心作為中心的圓周方向上排列之狀態彼此互相間隔而配置。 Specifically, each of the fins 21 connects the lower end portion to the vicinity of the outer peripheral end of the ring-shaped fan member support portion 26, and thereby the plurality of fins 21 are arranged in a circumferential direction with the ring-shaped axis as the center. The states of the upper array are arranged at intervals from each other.
又，由於風扇構件支撐部26會將其直徑形成得比開口部33的直徑還大，因此，翼片21是從風扇構件支撐部26朝向腔體30的上表面部31延伸。此外，翼片21的上端比腔體30的折回部32的下端還要位於上方處。藉此，具有複數個翼片21的風扇構件20，可將包含從作為保持基台10的保持面11之保持基台10的表面位置，到在垂直方向上位於腔體30的開口部33之部分為止的空間，且在以保持基台10的旋轉軸為中心之圓周方向上圍繞保持基台10的外周空間包覆，以做成風扇構件20整體而形成為圓環形狀。又，由 於風扇構件20是讓翼片21的上端位於折回部32的上方，因此風扇構件20可藉由支撐該風扇構件20的風扇構件支撐部26，將腔體30內之風扇構件20的內周側之空間與外周側之空間，大致地隔開。 In addition, since the fan member support portion 26 has a diameter larger than that of the opening portion 33, the fin 21 extends from the fan member support portion 26 toward the upper surface portion 31 of the cavity 30. In addition, the upper end of the flap 21 is located above the lower end of the folded-back portion 32 of the cavity 30. Thereby, the fan member 20 having the plurality of fins 21 can be included from the surface position of the holding base 10 as the holding surface 11 of the holding base 10 to the opening 33 located in the cavity 30 in the vertical direction. The outer space of the holding base 10 is covered around the outer peripheral space of the holding base 10 in a circumferential direction centered on the rotation axis of the holding base 10 to form the entire fan member 20 in a circular shape. Again, by In the fan member 20, the upper end of the fin 21 is positioned above the folded-back portion 32. Therefore, the fan member 20 can support the fan member 20 in the cavity 30 by supporting the fan member support portion 26 of the fan member 20 The space is roughly separated from the space on the outer peripheral side.
設置在腔體30上之導管45是在於垂直方向上為風扇構件20和風扇構件支撐部26所在之高度處設置在腔體30之側壁34的外周面，並連通至腔體30的內側空間。此導管45會延伸到用於執行旋轉洗淨裝置1之排氣處理的處理設備(圖示省略)處，在導管45的行進中段，或在該處理設備中，配備有可吸引腔體30內的空氣以使其流入導管45中的排氣風扇(圖示省略)。 The duct 45 provided on the cavity 30 is provided on the outer peripheral surface of the side wall 34 of the cavity 30 at a height of the fan member 20 and the fan member support portion 26 in a vertical direction, and communicates with the inner space of the cavity 30. This duct 45 is extended to a processing equipment (not shown) for performing the exhaust treatment of the rotary washing device 1. In the middle of the travel of the duct 45, or in the processing equipment, it is equipped with an attractable cavity 30. Exhaust air (not shown) to allow the air to flow into the duct 45.
又，風扇構件軸部27是將其上端連結於風扇構件支撐部26之位於保持基台10之面側的相反側之面上，並從風扇構件支撐部26沿垂直方向朝下方延伸。在此等風扇構件支撐部26與風扇構件軸部27中形成有位於軸心附近，以比保持基台旋轉軸17之直徑還要大的直徑沿垂直方向挖穿之孔的插通孔28。也就是說，風扇構件軸部27是形成圓筒狀，並將其上端連結在風扇構件支撐部26上。從保持基台支撐部16朝下方形成之保持基台旋轉軸17，是插入插通孔28而沿垂直方向延伸。 The fan member shaft portion 27 connects the upper end of the fan member support portion 26 to a surface of the fan member support portion 26 on the side opposite to the surface side of the holding base 10, and extends downward from the fan member support portion 26 in the vertical direction. The fan member support portion 26 and the fan member shaft portion 27 have insertion holes 28 formed in the vicinity of the shaft center and bored in the vertical direction with a diameter larger than the diameter of the abutment rotation shaft 17. That is, the fan member shaft portion 27 is formed in a cylindrical shape, and the upper end thereof is connected to the fan member support portion 26. The holding base rotating shaft 17 formed downward from the holding base supporting portion 16 is inserted into the insertion hole 28 and extends in the vertical direction.
支撐風扇構件20之風扇構件支撐部26，是以透過風扇構件用馬達61所產生的動力進行旋轉的方式，變成可使風扇構件20一體旋轉。詳細來說，在風扇構件用馬達61的輸出軸上連結有作為動力傳達用之風扇構件用驅動側皮 帶輪62，風扇構件用馬達61在進行風扇構件用馬達61之驅動時，與風扇構件用馬達61的輸出軸形成一體而被設置成可旋轉。 The fan member support portion 26 that supports the fan member 20 is configured to be capable of rotating the fan member 20 as a whole by rotating the power generated by the fan member motor 61. Specifically, a fan member driving side skin for power transmission is connected to the output shaft of the fan member motor 61. The pulley 62 and the fan member motor 61 are rotatably integrated with the output shaft of the fan member motor 61 when the fan member motor 61 is driven.
又，在風扇構件軸部27之下端連結有與風扇構件軸部27形成一體而旋轉之風扇構件用從動側皮帶輪63。與風扇構件軸部27相同地，在風扇構件用從動側皮帶輪63中，有在軸心的中心附近，以比保持基台旋轉軸17之直徑還大的直徑在垂直方向上開設之開孔，保持基台旋轉軸17是通過該開孔在垂直方向上延伸。 Further, a fan member driven-side pulley 63 is connected to the lower end of the fan member shaft portion 27 so as to be integrated with the fan member shaft portion 27 and rotates. Similar to the fan member shaft portion 27, the fan member driven-side pulley 63 has an opening formed in the vertical direction near the center of the shaft center with a diameter larger than the diameter of the holding base rotation shaft 17. The holding base rotating shaft 17 extends in the vertical direction through the opening.
在此等風扇構件用驅動側皮帶輪62與風扇構件用從動側皮帶輪63中，繞掛有在雙方之皮帶輪間作為動力之傳達用的皮帶65，而形成為風扇構件用馬達61所產生的動力，可透過風扇構件用驅動側皮帶輪62、皮帶65及風扇構件用從動側皮帶輪63傳達到風扇構件軸部27。風扇構件支撐部26藉由在風扇構件用馬達61所產生而傳達到風扇構件軸部27的動力，變成可與風扇構件20形成一體而旋轉。 The fan-side drive pulley 62 and the fan-driven follower pulley 63 are wound around a belt 65 serving as a power transmission between the pulleys of each of the fans to form power generated by the fan-member motor 61. It can be transmitted to the fan member shaft portion 27 through the fan member driving side pulley 62, the belt 65, and the fan member driven side pulley 63. The fan member supporting portion 26 is rotatably integrated with the fan member 20 by the power transmitted to the fan member shaft portion 27 by the fan member motor 61.
又，在腔體30的內側設置有分隔壁部40，以隔開配置有保持基台10之側的空間，與配置有保持基台用馬達60與風扇構件用馬達61之側的空間。 A partition wall portion 40 is provided inside the cavity 30 to separate a space on the side where the holding base 10 is arranged and a space on the side where the holding base motor 60 and the fan member motor 61 are arranged.
分隔壁部40是位於風扇構件支撐部26之位於保持基台支撐部16之側的相反側，並以將外周部分連結在腔體30之側壁34的內周面之圓環形狀而被形成。 The partition wall portion 40 is formed on the opposite side of the fan member support portion 26 from the side of the holding base support portion 16 and is formed in a ring shape that connects the outer peripheral portion to the inner peripheral surface of the side wall 34 of the cavity 30.
分隔壁部40設有孔部41，其具有在腔體30的軸心附近以比風扇構件軸部27的直徑還大的直徑在垂直方向上 開設之開孔。孔部41藉由形成圓筒形狀，而在內側具有開孔，風扇構件軸部27是通過孔部41內側之開孔在垂直方向上延伸。又，孔部41是從分隔壁部40沿垂直方向朝上方突出形成，且上端位於風扇構件支撐部26的附近下方。亦即，孔部41是包覆風扇構件軸部27的周圍，並從分隔壁部40延伸到風扇構件支撐部26的附近而設置。 The partition wall portion 40 is provided with a hole portion 41 having a diameter larger than the diameter of the fan member shaft portion 27 in the vertical direction near the axial center of the cavity 30. Opening for opening. The hole portion 41 is formed in a cylindrical shape and has an opening in the inside. The fan member shaft portion 27 extends in the vertical direction through the opening in the hole 41. In addition, the hole portion 41 is formed to protrude upward from the partition wall portion 40 in the vertical direction, and the upper end is positioned below the vicinity of the fan member support portion 26. That is, the hole portion 41 is provided around the fan member shaft portion 27 and extends from the partition wall portion 40 to the vicinity of the fan member support portion 26.
在分隔壁部40之配置有保持基台用馬達60與風扇構件用馬達61的空間側之面上，設置有軸承支撐構件42。軸承支撐構件42是從分隔壁部40朝向風扇構件軸部27的方向而設置，並在風扇構件軸部27側的端部，支撐著風扇構件旋轉部軸承68。風扇構件旋轉部軸承68為可旋轉地支撐風扇構件軸部27的軸承，軸承支撐構件42則是用於支撐作為該風扇構件軸部27用之軸承的風扇構件旋轉部軸承68。 A bearing support member 42 is provided on the space-side surface of the partition wall portion 40 where the holding base motor 60 and the fan member motor 61 are arranged. The bearing support member 42 is provided in a direction from the partition wall portion 40 toward the fan member shaft portion 27, and supports a fan member rotation portion bearing 68 at an end portion on the fan member shaft portion 27 side. The fan member rotating portion bearing 68 is a bearing that rotatably supports the fan member shaft portion 27, and the bearing support member 42 is a fan member rotating portion bearing 68 for supporting the fan member shaft portion 27.
此外，在這個分隔壁部40與風扇構件支撐部26形成有將部分洗淨水排出的排水孔。具體來說，在風扇構件支撐部26中，是在風扇構件支撐部26的外周附近，亦即，連結有翼片21之部分附近，形成沿垂直方向貫穿該風扇構件支撐部26之開孔，並藉由這個開孔形成排水孔29。又，在分隔壁部40中，是在分隔壁部40之外周附近，形成沿垂直方向貫穿該分隔壁部40之開孔，並藉由這個開孔形成排水孔43。 A drainage hole is formed in the partition wall portion 40 and the fan member support portion 26 to discharge a part of the washing water. Specifically, in the fan member support portion 26, an opening is formed near the outer periphery of the fan member support portion 26, that is, near the portion to which the fin 21 is connected, and penetrates the fan member support portion 26 in the vertical direction. The drainage hole 29 is formed by this opening. Further, in the partition wall portion 40, an opening is formed in the vicinity of the outer periphery of the partition wall portion 40 and penetrates the partition wall portion 40 in the vertical direction, and the drainage hole 43 is formed by the opening.
這個實施形態1之旋轉洗淨裝置1，是由如以上之構成所形成，以下，將說明其作用。在旋轉洗淨裝置1進行晶圓W之洗淨時，是以軸部56作為中心使洗淨水噴射機構 50旋轉，並使洗淨水噴射機構50移動到相對於開口部33在垂直方向上為不重疊之位置的退避位置處。此時，洗淨水噴射機構50是藉由使昇降部55上升，並以使洗淨水噴嘴51位於比腔體30之上表面部31還上方處的方式使洗淨水噴射機構50整體以朝上方移動的狀態，移動至退避位置。 The rotary cleaning device 1 according to the first embodiment is configured as described above, and its function will be described below. When the wafer W is cleaned by the rotary washing apparatus 1, the washing water spray mechanism is made with the shaft portion 56 as the center. 50 rotates and moves the washing water spraying mechanism 50 to a retreat position which is a position which does not overlap in the vertical direction with respect to the opening portion 33. At this time, the washing water spraying mechanism 50 raises the lifting portion 55 and makes the entire washing water spraying mechanism 50 such that the washing water nozzle 51 is positioned higher than the upper surface portion 31 of the cavity 30. When moving up, move to the retreat position.
接著，將進行加工後要洗淨前的晶圓W從開口部33放入腔體30內，以載置於保持基台10的保持面11上。保持基台10是藉由將晶圓W及保持面11之間形成負壓以吸附晶圓W，又，藉由用夾具12保持住用於保持晶圓W之框架，而將晶圓W保持在保持面11上。此外，藉由使可吸引腔體30內的空氣的排氣風扇作動，而經由導管45將腔體30內的空氣朝外部排出之方式，進行洗淨之準備。 Next, the wafer W to be cleaned after processing is put into the cavity 30 from the opening 33 and placed on the holding surface 11 of the holding base 10. The holding base 10 adsorbs the wafer W by forming a negative pressure between the wafer W and the holding surface 11, and also holds the wafer W by holding the frame for holding the wafer W with the jig 12. On the holding surface 11. In addition, the exhaust fan that can attract the air in the cavity 30 is operated, and the air in the cavity 30 is exhausted to the outside through the duct 45 to prepare for cleaning.
在這個狀態下，藉由使保持基台用馬達60作動，使保持基台10可與保持基台旋轉軸17及保持基台支撐部16一體地旋轉，並以例如，800rpm左右的旋轉速度使保持基台10旋轉。又，使風扇構件用馬達61也作動，以將風扇構件用馬達61所產生的動力透過皮帶65傳送到風扇構件軸部27，使風扇構件20可與風扇構件軸部27及風扇構件支撐部26一體地旋轉。此時的旋轉方向，是透過傾斜形成之翼片21的旋轉，使其以旋轉軸作為中心旋轉成可從風扇構件20的內側朝外側使氣流產生的方向。 In this state, by holding the holding base motor 60, the holding base 10 can be rotated integrally with the holding base rotation shaft 17 and the holding base support portion 16, and is rotated at a rotation speed of about 800 rpm, for example. The abutment 10 is kept rotating. The fan member motor 61 is also operated to transmit the power generated by the fan member motor 61 to the fan member shaft portion 27 through the belt 65, so that the fan member 20 can communicate with the fan member shaft portion 27 and the fan member support portion 26. Rotate integrally. The rotation direction at this time is a direction in which the airflow is generated from the inside of the fan member 20 to the outside through the rotation of the wing 21 formed obliquely with the rotation axis as the center.
藉此，構成風扇構件20之各翼片21會產生從成為風扇構件20之形狀的圓環形狀的內側往外側方向流動的氣流，並讓保持基台10上方的空氣往風扇構件20之圓環形狀 的外側流動。如此，風扇構件20可透過以風扇構件旋轉部25進行旋轉，而在保持基台10的上方，且從風扇構件20的圓環形狀內周部36往風扇構件20之外周部37使氣流產生。 As a result, each of the fins 21 constituting the fan member 20 generates an air current flowing from the inside of the annular shape that becomes the shape of the fan member 20 to the outside, and allows the air above the holding base 10 to go to the ring of the fan member 20. shape Outside flow. In this manner, the fan member 20 can be rotated by the fan member rotating portion 25 to generate airflow above the holding base 10 and from the annular inner peripheral portion 36 of the fan member 20 to the outer peripheral portion 37 of the fan member 20.
藉由使保持基台10和風扇構件20旋轉，而得以完成使晶圓W洗淨之準備後，藉由以軸部56作為中心使洗淨水噴射機構50旋轉，以使洗淨水噴嘴51位於保持基台10所保持之晶圓W的上方。然後，藉由使昇降部55下降，以使洗淨水噴嘴51朝晶圓W靠近。 After the holding base 10 and the fan member 20 are rotated to complete the preparation for cleaning the wafer W, the washing water spraying mechanism 50 is rotated by using the shaft portion 56 as a center to rotate the washing water nozzle 51. It is located above the wafer W held by the holding base 10. Then, the raising and lowering part 55 is lowered so that the washing water nozzle 51 approaches the wafer W.
在這個狀態下，藉由從洗淨水噴嘴51將洗淨水朝下方噴出，就可以將洗淨水噴向晶圓W。此時，是在使洗淨水噴嘴51位於晶圓W上方的範圍內，以軸部56作為中心一邊使洗淨水噴射機構50旋轉一邊進行噴出。因為在洗淨水噴出的過程中保持基台10也持續旋轉，故可將洗淨水供給到晶圓W的整個上表面，以用洗淨水將切削屑或磨削屑等附著於晶圓W的髒污成分沖洗掉。 In this state, by spraying the washing water downward from the washing water nozzle 51, the washing water can be sprayed onto the wafer W. At this time, the cleaning water nozzle 51 is positioned in a range above the wafer W, and the cleaning water spraying mechanism 50 is rotated with the shaft portion 56 as a center to perform ejection. Since the base table 10 is continuously rotated during the spraying of the washing water, the washing water can be supplied to the entire upper surface of the wafer W, so that cutting chips or grinding chips can be attached to the wafer with the washing water. Rinse off the dirty components.
洗淨晶圓W時，由於是像這樣藉由洗淨水將晶圓W的髒污成分沖洗掉，故在腔體30內會產生被這種髒污成分污染到的洗淨水和噴霧，但是可藉由旋轉的風扇構件20所產生的氣流，將這些洗淨水和噴霧從晶圓W的上方除去。也就是說，可將受到污染的洗淨水和噴霧，從保持基台10的上方排出到風扇構件20之圓環形狀的外側。 When the wafer W is cleaned, since the dirty components of the wafer W are washed away by the washing water in this way, the washing water and spray contaminated by the dirty components are generated in the cavity 30, However, these washing water and spray can be removed from above the wafer W by the airflow generated by the rotating fan member 20. That is, the contaminated washing water and spray can be discharged from above the holding base 10 to the outside of the annular shape of the fan member 20.
被排出到風扇構件20外側的洗淨水和噴霧，藉由可吸引腔體30內之空氣的排氣風扇，會和空氣一起通過腔體30而流進導管45，並從腔體30內被排出。也就是說，風 扇構件20是透過進行旋轉以讓保持基台10上方的空氣從風扇構件20的圓環形狀內周部36往風扇構件20的外周部37流動的方式，將洗淨晶圓W時的洗淨水及噴霧往風扇構件20的外部強制排出，並導向導管45。換言之，風扇構件20會對位於風扇構件20之外周部37側的空間中的空氣施加壓縮力，排氣風扇是用於吸引此空氣，被排出到風扇構件20的外周部37側的洗淨水和噴霧，可藉由此種壓縮力及吸引力，和位於風扇構件20之外周部37側的空間中的空氣一起流過腔體30內而從導管45排出。 The washing water and spray discharged to the outside of the fan member 20 are exhausted by the exhaust fan that can attract the air in the cavity 30, and together with the air flows into the duct 45 through the cavity 30, and is discharged from the cavity 30 discharge. In other words, the wind The fan member 20 is rotated to allow the air above the holding base 10 to flow from the annular inner peripheral portion 36 of the fan member 20 to the outer peripheral portion 37 of the fan member 20, and cleans the wafer W when it is cleaned. The water and spray are forcibly discharged to the outside of the fan member 20 and guided to the duct 45. In other words, the fan member 20 applies a compressive force to the air in the space on the outer peripheral portion 37 side of the fan member 20, and the exhaust fan is used to suck this air and is discharged to the washing water on the outer peripheral portion 37 side of the fan member 20. With this compression force and suction force, air in the space located on the outer peripheral portion 37 side of the fan member 20 flows through the cavity 30 and is discharged from the duct 45.
經過預定的洗淨時間後，會將洗淨水噴射機構50的洗淨水噴射停止，但讓保持基台10仍繼續旋轉，以藉由離心力將附著於晶圓W上的洗淨水趕出。此時，保持基台10是藉由使旋轉速度上升到3000rpm左右以增加離心力，而快速地將洗淨水趕出並使洗淨後的晶圓W乾燥。 After a predetermined washing time has elapsed, the washing water spraying from the washing water spraying mechanism 50 is stopped, but the holding base 10 is still rotated to drive out the washing water attached to the wafer W by centrifugal force. . At this time, the holding base 10 raises the rotation speed to about 3000 rpm to increase the centrifugal force, quickly drives out the washing water, and dries the cleaned wafer W.
此外，在這個乾燥過程中，雖然風扇構件20也會繼續旋轉，但是風扇構件20與保持基台10不同的是，並沒有使其提高旋轉速度，而是維持和洗淨時之旋轉速度相同的旋轉速度繼續旋轉。藉此，風扇構件20可以產生與洗淨時相同的氣流，將藉由晶圓W的離心力所趕出的洗淨水排出至風扇構件20的外部。 In addition, in this drying process, although the fan member 20 will continue to rotate, the fan member 20 is different from the holding base 10 in that it does not increase the rotation speed, but maintains the same rotation speed during cleaning and washing. The rotation speed continues to rotate. Thereby, the fan member 20 can generate the same airflow as during the cleaning, and the washing water driven out by the centrifugal force of the wafer W can be discharged to the outside of the fan member 20.
又，在乾燥過程中，由於吸引腔體30內的空氣之排氣風扇也會繼續運轉，故可將已排出到風扇構件20外部的洗淨水，通過腔體30內導向導管45。藉此，從風扇構件20趕出的洗淨水，可不回到晶圓W側地從導管45排出，以 乾燥晶圓W。 In addition, during the drying process, the exhaust fan that sucks the air in the cavity 30 will continue to operate, so the washing water that has been discharged to the outside of the fan member 20 can be guided to the duct 45 through the cavity 30. Thereby, the washing water driven out from the fan member 20 can be discharged from the duct 45 without returning to the wafer W side. Dry wafer W.
又，受污染的洗淨水中，未藉由風扇構件20排出到外周部37側的洗淨水，會流到位於保持基台10和保持基台旋轉部15的下方之風扇構件支撐部26上。已流到風扇構件支撐部26上的洗淨水，會從排水孔29排出，並流向分隔壁部40側。流到分隔壁部40側的洗淨水中，其中一部分會透過由風扇構件20及排氣風扇所產生之氣流，流向導管45，而從導管45排出。又，未從導管45排出而殘留在分隔壁部40上的洗淨水，會從分隔壁部40的排水孔43排出。 In addition, the contaminated washing water which has not been discharged to the outer peripheral portion 37 side by the fan member 20 flows to the fan member supporting portion 26 located below the holding base 10 and the holding base rotation portion 15. . The washing water that has flowed onto the fan member supporting portion 26 is discharged from the drainage hole 29 and flows to the partition wall portion 40 side. Part of the washing water flowing to the partition wall portion 40 passes through the airflow generated by the fan member 20 and the exhaust fan, flows to the duct 45, and is discharged from the duct 45. In addition, the washing water remaining on the partition wall portion 40 without being discharged from the duct 45 is discharged through the drainage hole 43 of the partition wall portion 40.
經過預定的乾燥時間後，將保持基台10與風扇構件20之旋轉停止，讓洗淨水噴射機構50退回到退避位置。之後，將保持基台10對晶圓W的保持解除，並將晶圓W從保持基台10取出以移送到下一個步驟。 After a predetermined drying time has elapsed, the rotation of the holding base 10 and the fan member 20 is stopped, and the washing water spraying mechanism 50 is retracted to the retracted position. After that, the holding of the wafer W by the holding base 10 is released, and the wafer W is taken out of the holding base 10 to be transferred to the next step.
以上的實施形態1之旋轉洗淨裝置1，可以藉由在圓周方向上排列的複數個翼片21，以設置將圍繞保持基台10的外周空間包覆而形成圓環形狀的風扇構件20，並藉由以風扇構件旋轉部25使風扇構件20旋轉之方式，在保持基台10的上方，產生從風扇構件20之圓環形狀內周部36側往外周部37的氣流。藉此，可以將洗淨時的洗淨水和噴霧強制地從晶圓W上方排出，並導向導管45。其結果為，在旋轉洗淨時，可以防止洗淨時受污染的噴霧及洗淨水往晶圓W再附著的情形。 The rotary washing device 1 of the first embodiment described above can be provided with a plurality of fins 21 arranged in the circumferential direction to provide a fan member 20 that covers the outer peripheral space surrounding the holding base 10 to form a ring shape. By rotating the fan member 20 with the fan member rotating portion 25, an air flow is generated from the annular inner peripheral portion 36 side of the fan member 20 to the outer peripheral portion 37 above the holding base 10. Thereby, the washing water and spray during washing can be forcibly discharged from above the wafer W and guided to the duct 45. As a result, it is possible to prevent the contaminated spray and the washing water from re-adhering to the wafer W during cleaning.
又，由於可以使風扇構件20和保持基台10獨立而旋轉，所以在晶圓W之洗淨時和乾燥時，可以使保持基台 10與風扇構件20各自因應要求以適當的旋轉數旋轉。例如，在晶圓W的洗淨過程中，就算在使保持基台10的旋轉速度作階梯式變化的情況中，也可以將風扇構件20的旋轉速度設定成固定，而可以將風扇構件20產生之往外側方向的吸引力形成為固定。其結果為，可防止洗淨時受污染的噴霧及洗淨水往晶圓W再附著之情形，同時可以使晶圓W的洗淨能力和乾燥能力提升。 In addition, since the fan member 20 and the holding base 10 can be rotated independently, the holding base can be made during the cleaning and drying of the wafer W. 10 and the fan member 20 are each rotated at an appropriate number of rotations as required. For example, during the cleaning process of the wafer W, even when the rotation speed of the holding base 10 is changed stepwise, the rotation speed of the fan member 20 may be set to be fixed, and the fan member 20 may be generated. The attractive force toward the outside is fixed. As a result, it is possible to prevent the contaminated spray and the washing water from re-adhering to the wafer W during cleaning, and at the same time, the washing ability and drying ability of the wafer W can be improved.
[實施形態2] [Embodiment 2]
實施形態2之旋轉洗淨裝置70，雖然與實施形態1之旋轉洗淨裝置1為大致相同的構成，但在將保持基台兼作風扇構件旋轉部之點上具有特徵。因為其他構成與實施形態1相同，故省略其說明，同時附加相同的符號。 The rotary cleaning device 70 according to the second embodiment has the same configuration as the rotary cleaning device 1 according to the first embodiment, but has a feature in that the holding base also serves as a rotating portion of the fan member. Since the other configurations are the same as those of the first embodiment, descriptions thereof are omitted, and the same reference numerals are attached.
圖3為實施形態2之旋轉洗淨裝置的截面圖。本實施形態2之旋轉洗淨裝置70，與實施形態1之旋轉洗淨裝置1相同地，設有保持晶圓W的保持基台10、使保持基台10旋轉的保持基台旋轉部71，以及朝晶圓W上噴射洗淨水的洗淨水噴射機構50，此外，還設有用於收納保持基台10，並於側壁34配置有導管45的腔體30。其中，保持基台旋轉部71具有用以支撐保持基台10的保持基台支撐部72、以垂直方向作為旋轉軸以使保持基台支撐部72旋轉的保持基台旋轉軸73、及作為保持基台10旋轉時之動力源的馬達78。 Fig. 3 is a sectional view of a rotary cleaning device according to a second embodiment. The rotary cleaning device 70 according to the second embodiment is the same as the rotary cleaning device 1 according to the first embodiment, and is provided with a holding base 10 that holds the wafer W and a holding base rotating portion 71 that rotates the holding base 10, A washing water spraying mechanism 50 that sprays washing water on the wafer W is further provided with a cavity 30 for accommodating and holding the base 10 and having a duct 45 disposed on the side wall 34. Among them, the holding base rotating portion 71 includes a holding base supporting portion 72 for supporting the holding base 10, a holding base rotating shaft 73 that uses the vertical direction as a rotation axis to rotate the holding base supporting portion 72, and serves as a holding A motor 78 as a power source when the base 10 rotates.
又，實施形態2之旋轉洗淨裝置70，與實施形態1之旋轉洗淨裝置1相同地，設有由複數個配置在保持基台10周圍的翼片21所構成的風扇構件20。與實施形態1之旋轉洗 淨裝置1不同之處在於，是將這個風扇構件20連結在保持基台旋轉部71所具有的保持基台支撐部72而受到支撐。也就是說，是將風扇構件20固定在保持基台支撐部72的外周，並將保持基台旋轉部71同時作為使風扇構件20以垂直方向作為旋轉軸旋轉的風扇構件旋轉部75。因此，風扇構件20是隨著保持基台10之旋轉而一起旋轉。詳細來說，構成風扇構件20之複數個翼片21，是在保持基台支撐部72上而將各翼片21的下端部連結在連結保持基台10之面的上表面。 The rotary cleaning device 70 of the second embodiment is provided with a fan member 20 composed of a plurality of fins 21 arranged around the holding base 10 in the same manner as the rotary cleaning device 1 of the first embodiment. Rotary washing with Embodiment 1 The clean device 1 is different in that this fan member 20 is connected to and supported by a holding base supporting portion 72 included in the holding base rotating portion 71. That is, the fan member 20 is fixed to the outer periphery of the holding base support portion 72 and the holding base rotation portion 71 is also used as the fan member rotation portion 75 that rotates the fan member 20 in the vertical direction as a rotation axis. Therefore, the fan member 20 rotates together with the rotation of the holding base 10. Specifically, the plurality of fins 21 constituting the fan member 20 are connected to the upper surface of the surface that connects and holds the base 10 by holding the base support portion 72 and the lower end portion of each fin 21.
又，保持基台支撐部72將直徑形成得比腔體30之開口部33的直徑還大，因此，翼片21是從保持基台支撐部72朝腔體30的上表面部31延伸。此外，翼片21的上端位於比腔體30的折回部32之下端還上方處。藉此，具有複數個翼片21的風扇構件20，可將包含從作為保持基台10的保持面11之保持基台10的表面位置，到在垂直方向上位於腔體30的開口部33之部分為止的空間，且在以保持基台10的旋轉軸為中心之圓周方向上圍繞保持基台10的外周空間包覆，以做成風扇構件20整體而形成為圓環形狀。 In addition, since the holding base support portion 72 is formed to have a diameter larger than the diameter of the opening portion 33 of the cavity 30, the flap 21 extends from the holding base support portion 72 toward the upper surface portion 31 of the cavity 30. In addition, the upper end of the fin 21 is located above the lower end of the folded-back portion 32 of the cavity 30. Thereby, the fan member 20 having the plurality of fins 21 can be included from the surface position of the holding base 10 as the holding surface 11 of the holding base 10 to the opening 33 located in the cavity 30 in the vertical direction. The outer space of the holding base 10 is covered around the outer peripheral space of the holding base 10 in a circumferential direction centered on the rotation axis of the holding base 10 to form the entire fan member 20 in a circular shape.
又，由於風扇構件20是讓翼片21的上端位於比折回部32的下端還上方處，因此風扇構件20可藉由支撐該風扇構件20的保持基台支撐部72，將腔體30內之風扇構件20的內周側之空間與外周側之空間，大致地隔開。 In addition, since the upper end of the fan member 20 is located above the lower end of the folded-back portion 32, the fan member 20 can hold the inside of the cavity 30 by the holding base support portion 72 that supports the fan member 20. The space on the inner peripheral side of the fan member 20 is substantially separated from the space on the outer peripheral side.
這個實施形態2之旋轉洗淨裝置70，是由如以上之構成所形成，以下，將就其作用進行說明。在旋轉洗淨裝置70進行晶圓W之洗淨時，是在以保持基台10之保持面 11保持洗淨前的晶圓W的狀態下，使可吸引腔體30內之空氣的排氣風扇作動，將腔體30內的空氣經過導管45排出到外部，以進行洗淨的準備。 The rotary cleaning device 70 according to the second embodiment is configured as described above, and its operation will be described below. When the wafer W is cleaned by the rotary cleaning device 70, the holding surface of the base 10 is held. 11 While keeping the wafer W before cleaning, an exhaust fan that can attract the air in the cavity 30 is operated, and the air in the cavity 30 is discharged to the outside through the duct 45 to prepare for cleaning.
在這個狀態下，藉由使馬達78作動，而使保持基台10可與保持基台旋轉軸73及保持基台支撐部72一體地旋轉，並可使保持基台10以例如，800rpm左右的旋轉速度旋轉。又，藉由像這樣使保持基台支撐部72旋轉，風扇構件20也會進行旋轉。也就是說，風扇構件20是與保持基台10形成一體而進行旋轉。藉由保持基台10旋轉時，風扇構件20也和保持基台10一起旋轉，使風扇構件20可在保持基台10的上方，且從風扇構件20的圓環形狀內周部36往風扇構件20的外周部37使氣流產生。 In this state, the holding base 10 can be rotated integrally with the holding base rotation shaft 73 and the holding base support portion 72 by operating the motor 78, and the holding base 10 can be rotated at, for example, about 800 rpm. Rotation speed. When the holding base support portion 72 is rotated in this manner, the fan member 20 is also rotated. That is, the fan member 20 is integrally rotated with the holding base 10. When the holding base 10 rotates, the fan member 20 also rotates together with the holding base 10, so that the fan member 20 can be above the holding base 10 and from the annular inner peripheral portion 36 of the fan member 20 to the fan member. The outer peripheral portion 37 of 20 generates an air flow.
藉由使保持基台10和風扇構件20旋轉，以使晶圓W洗淨之準備完成後，使洗淨水噴射機構50作動，以使洗淨水噴嘴51位於晶圓W的上方，並且朝晶圓W靠近。在這個狀態下，藉由一邊使洗淨水噴射機構50轉動，一邊從洗淨水噴嘴51朝晶圓W噴出洗淨水，以用洗淨水將附著於晶圓W的切削屑和磨削屑等髒污成分沖洗掉。 After the holding base 10 and the fan member 20 are rotated to prepare the wafer W for cleaning, the washing water spraying mechanism 50 is operated so that the washing water nozzle 51 is positioned above the wafer W and faces the wafer W. The wafer W approaches. In this state, the washing water spraying mechanism 50 is rotated, and the washing water is sprayed from the washing water nozzle 51 toward the wafer W, so that the chips and the grinding chips attached to the wafer W are washed with the washing water. Rinse off dirty components such as crumbs.
進行晶圓W之洗淨時受污染的洗淨水和噴霧，可藉由旋轉的風扇構件20所產生的氣流，從保持基台10的上方，朝風扇構件20之圓環形狀的外側排出，而從晶圓W的上方被除去。被排出到風扇構件20的外側的洗淨水和噴霧，可藉由用於吸引腔體30內之空氣的排氣風扇，與空氣一起通過腔體30流向導管45，而從腔體30內排出。 The contaminated washing water and spray during the cleaning of the wafer W can be discharged from the upper part of the holding base 10 toward the outside of the annular shape of the fan member 20 by the airflow generated by the rotating fan member 20, It is removed from above the wafer W. The washing water and spray discharged to the outside of the fan member 20 can be discharged from the cavity 30 together with the air through the cavity 30 to the duct 45 through an exhaust fan for attracting the air in the cavity 30. .
經過預定的洗淨時間後，會將洗淨水噴射機構50的洗淨水噴射停止，並藉由使保持基台10之旋轉速度上升以使離心力增加，而將洗淨水趕出並使晶圓W乾燥。在這種情況下，因為連結到保持基台支撐部72的風扇構件20的旋轉速度也會上升，所以由風扇構件20所產生的氣流也會變得比洗淨時還強。藉此，藉由晶圓W的離心力所趕出的洗淨水，會透過這個增強的氣流，更順勢地排出到風扇構件20的外部。 After a predetermined washing time has elapsed, the washing water spraying of the washing water spraying mechanism 50 is stopped, and the rotation speed of the holding base 10 is increased to increase the centrifugal force, and the washing water is driven out and the crystal Circle W is dry. In this case, since the rotation speed of the fan member 20 connected to the holding base support portion 72 also increases, the airflow generated by the fan member 20 also becomes stronger than that during washing. As a result, the washing water driven out by the centrifugal force of the wafer W passes through this enhanced airflow and is more smoothly discharged to the outside of the fan member 20.
因為被排出到風扇構件20外部的洗淨水會從導管45排出，且由風扇構件20趕出的洗淨水，不會有回到晶圓W側之情形，所以可讓晶圓W乾燥。經過預定的乾燥時間後，可將保持基台10與風扇構件20之旋轉停止，讓洗淨水噴射機構50退回到退避位置，以將晶圓W從保持基台10取出而移送到下一個步驟。 Since the washing water discharged to the outside of the fan member 20 is discharged from the duct 45 and the washing water driven out by the fan member 20 does not return to the wafer W side, the wafer W can be dried. After the predetermined drying time has elapsed, the rotation of the holding base 10 and the fan member 20 can be stopped, and the washing water spraying mechanism 50 can be returned to the retreat position to remove the wafer W from the holding base 10 and move it to the next step. .
以上的實施形態2之旋轉洗淨裝置70，是將風扇構件20固定在保持基台旋轉部71上，由於將保持基台旋轉部71兼作為風扇構件旋轉部75，因此不需要重新設置將風扇構件20支撐成可旋轉的構件和機構，就可以使風扇構件20旋轉。藉此，不需使構造複雜化，就可以設置用於使從晶圓W的上方往外側方向之氣流產生的風扇構件20。其結果為，可以將防止受污染的噴霧及洗淨水往晶圓W再附著時之製造成本降低。 In the above-mentioned rotary cleaning device 70 of the second embodiment, the fan member 20 is fixed to the holding base rotating portion 71. Since the holding base rotating portion 71 also serves as the fan member rotating portion 75, there is no need to newly install the fan The component 20 is supported as a rotatable component and mechanism, so that the fan component 20 can be rotated. Thereby, without complicating the structure, it is possible to provide the fan member 20 for generating an air flow in a direction from above the wafer W to the outside. As a result, it is possible to reduce manufacturing costs when contamination-resistant spray and cleaning water are reattached to the wafer W.
[變形例] [Modification]
再者，在實施形態1之旋轉洗淨裝置1中，在進行晶圓W洗淨後的乾燥時，相對於保持基台10將旋轉速度設定得比洗淨時的旋轉速度還高，風扇構件20的旋轉速度則是設定成與洗淨時的旋轉速度相同的旋轉速度而使其旋轉，但是也可以在乾燥時使風扇構件20的旋轉速度改變。例如，在乾燥時，將風扇構件20的旋轉速度設定成與保持基台10的旋轉速度同等亦可，或者，將風扇構件20的旋轉速度設定成比保持基台10的旋轉速度還高亦可。 Furthermore, in the rotary cleaning device 1 of Embodiment 1, when the wafer W is dried after cleaning, the rotation speed of the holding base 10 is set higher than the rotation speed during cleaning, and the fan member The rotation speed of 20 is set to the same rotation speed as the rotation speed at the time of washing, so that the rotation speed of the fan member 20 may be changed during drying. For example, during drying, the rotation speed of the fan member 20 may be set equal to the rotation speed of the holding base 10, or the rotation speed of the fan member 20 may be set higher than the rotation speed of the holding base 10 .
又，在實施形態1之旋轉洗淨裝置1中，因為可以使風扇構件20的旋轉速度相對於保持基台10的旋轉速度獨立而作改變，所以在晶圓W之洗淨和乾燥時，也可以不受保持基台10的旋轉速度影響地，因應需要使風扇構件20的旋轉速度改變。又，風扇構件20的旋轉方向相對於保持基台10的旋轉方向為相同方向以外者亦可，也可以使其反向旋轉。風扇構件20可透過因應晶圓W的大小或洗淨時的溫度等以設定旋轉速度和旋轉方向的方式，使受污染的洗淨水和噴霧可以更得當地從保持基台10的上方排出。 In the rotary cleaning device 1 of the first embodiment, since the rotation speed of the fan member 20 can be changed independently of the rotation speed of the holding base 10, the wafer W is also cleaned and dried during cleaning and drying. The rotation speed of the fan member 20 can be changed as needed without being affected by the rotation speed of the holding base 10. In addition, the rotation direction of the fan member 20 may be other than the same direction with respect to the rotation direction of the holding base 10, and the rotation direction may be reversed. The fan member 20 can set the rotation speed and the rotation direction in accordance with the size of the wafer W, the temperature during cleaning, and the like, so that the contaminated washing water and spray can be more properly discharged from above the holding base 10.
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| JP2013149666A JP2015023138A (en) | 2013-07-18 | 2013-07-18 | Spinner cleaning apparatus |
| JP2013-149666 | 2013-07-18 |
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| CN105327906A (en) * | 2015-11-11 | 2016-02-17 | 无为县鑫发盛汽车零部件有限公司 | Cleaning device for hollow parts |
| WO2017098823A1 (en) * | 2015-12-07 | 2017-06-15 | 東京エレクトロン株式会社 | Substrate cleaning apparatus |
| JP7007141B2 (en) * | 2017-09-26 | 2022-01-24 | 芝浦メカトロニクス株式会社 | Board processing equipment |
| CN108922858A (en) * | 2018-06-25 | 2018-11-30 | 世巨科技（合肥）有限公司 | A kind of Single-Wafer Cleaning equipment reagent controllable rotating spraying device |
| CN110076126A (en) * | 2019-05-30 | 2019-08-02 | 南京赛达机械制造有限公司 | A kind of aviation cleaning parts drying box |
| US20230040192A1 (en) * | 2021-08-05 | 2023-02-09 | Applied Materials, Inc. | Wet clean spray process chamber for substrates |
| KR20240105492A (en) * | 2021-11-23 | 2024-07-05 | 램 리써치 코포레이션 | Apparatuses and techniques for cleaning a multi-station semiconductor processing chamber |
| US20240222152A1 (en) * | 2022-12-30 | 2024-07-04 | Applied Materials, Inc. | Integrated clean and dry module for cleaning a substrate |
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| KR20150010630A (en) | 2015-01-28 |
| JP2015023138A (en) | 2015-02-02 |
| CN104289463A (en) | 2015-01-21 |
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