CN117393461A

CN117393461A - Cleaning device

Info

Publication number: CN117393461A
Application number: CN202310819544.XA
Authority: CN
Inventors: 和田健太郎
Original assignee: Disco Corp
Current assignee: Disco Corp
Priority date: 2022-07-11
Filing date: 2023-07-05
Publication date: 2024-01-12
Also published as: KR20240008251A; JP2024009449A; TW202402414A

Abstract

The invention provides a cleaning device, which can inhibit mist from adhering to a ceiling of a cleaning chamber without arranging additional components below a chuck workbench. The suction source communicating with the cleaning chamber via the communicating member having a front end portion opening downward at the same position as or lower than the holding surface of the chuck table is operated, whereby a downward flow is generated in a space (1 st space) located around the chuck table. This makes it possible to prevent mist from adhering to the ceiling of the cleaning chamber without providing additional components below the chuck table.

Description

Cleaning device

Technical Field

The present invention relates to a cleaning device for cleaning a workpiece.

Background

Chips of devices such as ICs (Integrated Circuit: integrated circuits) are indispensable components in various electronic devices such as mobile phones and personal computers. Such a chip is manufactured, for example, in the following order.

First, photolithography or the like is performed to form a large number of elements on the front surface of a workpiece such as a wafer, thereby forming a plurality of devices. Then, the rear surface side of the workpiece is ground to thin the workpiece. Next, the workpiece is cut along the boundaries of the plurality of devices to divide the workpiece into a plurality of chips.

In addition, before and after these processes, the workpiece is often cleaned in order to remove machining chips and the like adhering to the workpiece. The cleaning is typically performed in a cleaning device having: a chuck table capable of holding a workpiece placed on a holding surface; and a cleaning unit having a cleaning nozzle for jetting a cleaning liquid (e.g., water) toward the workpiece held by the chuck table.

The chuck table is rotatable about a straight line passing through the center of the holding surface. In this cleaning device, the workpiece is cleaned by ejecting the cleaning liquid from the cleaning nozzle toward the workpiece while the chuck table holding the workpiece on the holding surface is rotated.

In addition, when the workpiece is cleaned in this way, mist including machining chips and the like often diffuses around the chuck table. Therefore, the cleaning apparatus is generally provided with a cleaning chamber cover that defines a cleaning chamber in which the chuck table and the cleaning nozzle are provided (for example, refer to patent document 1). In this cleaning apparatus, the object to be processed is cleaned in the cleaning chamber, so that mist can be prevented from diffusing outside the cleaning chamber.

However, when cleaning a workpiece in the cleaning chamber, mist may adhere to the ceiling of the cleaning chamber (the upper portion of the cleaning chamber cover). When the mist adhering to the ceiling increases, large water droplets may be formed, and the water droplets may drop down toward the workpiece held on the holding surface of the chuck table. In this case, there is a concern that the machining chips and the like are reattached to the workpiece.

In view of this, in order to prevent mist from adhering to the ceiling of the cleaning chamber, a cleaning apparatus capable of generating a downward flow in the cleaning chamber has been proposed (for example, see patent literature 2). Specifically, in this cleaning apparatus, a downward flow generating member having a plurality of blades is provided below the chuck table, and the downward flow generating member is rotated to generate a downward flow in the cleaning chamber.

Patent document 1: japanese patent laid-open No. 2009-260094

Patent document 2: japanese patent application laid-open No. 2012-94659

However, a rotation mechanism (e.g., a motor or the like) for rotating the chuck table and a disposal mechanism (e.g., a drain pipe or the like) for the cleaning liquid are generally provided below the chuck table. Therefore, it is not easy to secure a space for installing additional components such as a downflow generating member below the chuck table.

Disclosure of Invention

In view of the above, an object of the present invention is to provide a cleaning apparatus capable of suppressing mist from adhering to a ceiling of a cleaning chamber without providing additional components below a chuck table.

According to the present invention, there is provided a cleaning apparatus for cleaning a workpiece, the cleaning apparatus including: a chuck table for holding the workpiece placed on the holding surface, the chuck table being rotatable about a straight line passing through the center of the holding surface as a rotation axis; a cleaning unit having a cleaning nozzle that sprays a cleaning liquid toward the workpiece while the chuck table holding the workpiece by the holding surface is rotated; a cleaning chamber cover defining a cleaning chamber provided with the chuck table and the cleaning nozzle; and a suction unit that sucks fluid in the cleaning chamber, the cleaning chamber including: 1 st space, it locates around the work table of this chuck; and a 2 nd space located outside the 1 st space and below the holding surface, the suction unit including: a suction source; and a communication member that communicates the suction source with the cleaning chamber, the communication member having: a base end portion connected to the suction source; and a tip portion that opens downward at a position outside the 1 st space and at the same position as the holding surface or at a position below the holding surface, and that generates a downward flow in the 1 st space and an upward flow in the 2 nd space when the suction source that communicates with the cleaning chamber via the communication member is operated.

In the present invention, it is preferable that an annular dividing plate is provided so as to surround the chuck table, the dividing plate including: a main body portion having a plurality of through holes formed therein; and a plurality of adjustment portions that can cover at least one of the plurality of through holes, respectively.

Alternatively, in the present invention, it is preferable that an annular dividing plate is provided so as to surround the chuck table, and a plurality of through holes including: a 1 st through hole; and a 2 nd through hole which is closer to the communication member than the 1 st through hole and has a smaller cross section than the 1 st through hole.

In the present invention, a suction source communicating with a cleaning chamber via a communicating member having a front end portion opening downward at the same position as or lower than a holding surface of a chuck table is operated, whereby a downward flow is generated in a space (1 st space) located around the chuck table. In this way, in the present invention, it is possible to prevent mist from adhering to the ceiling of the cleaning chamber without providing additional components below the chuck table.

Drawings

Fig. 1 is a partially cut-away perspective view schematically showing an example of a cleaning apparatus.

Fig. 2 is a partially cross-sectional side view schematically showing an example of the cleaning device.

Fig. 3 is a partially cross-sectional side view schematically showing other examples of the cleaning device.

Fig. 4 is an exploded perspective view schematically showing a partition plate provided to the cleaning device.

Fig. 5 (a), 5 (B) and 5 (C) are plan views schematically showing the relative positions of the main body portion and the adjustment portion, respectively.

Fig. 6 is a perspective view schematically showing another example of the dividing plate.

Description of the reference numerals

2: a cleaning device; 4: a chuck table (4 a: a porous plate); 6: a cleaning unit (6 a: support shaft, 6b: arm, 6c: nozzle (cleaning nozzle)); 8: drying units (8 a: support shafts, 8b: arms, 8c: nozzles (drying nozzles)); 10: cleaning the chamber cover; 11: a frame unit; 12: a lower part (12 a: outer peripheral wall, 12b: bottom wall, 12c: inner peripheral wall); 13: a workpiece (13 a: front surface, 13b: back surface); 14: an upper portion (14 a: top wall, 14b: side wall); 15: dividing a predetermined line; 16: a suction unit (16 a: a communication member); 17: a device; 18: a water outlet; 19: a belt; 20: a support leg; 21: a frame (21 a: opening); 22: a main shaft; 24: a housing; 26: a support mechanism; 28: a cylinder; 30: a support leg; 32: a housing; 34: a bearing; 36: an open tube; 38: a negative pressure supply tube; 40: a positive pressure supply tube; 42a, 42b: an oil seal; 44: a cover member; 46: an oil seal; 48: a cleaning device; 50: a dividing plate; 52: a main body (52 a: cutouts, 52b, 52c: through holes, 52d: screw holes); 54: a bolt; 56: adjustment sections (56 a, 56b: through holes); 58: dividing plate (58 a: cutout, 58b, 58c: through hole).

Detailed Description

Embodiments of the present invention will be described with reference to the accompanying drawings. Fig. 1 is a partially cut-away perspective view schematically showing an example of a cleaning device, and fig. 2 is a partially cut-away side view schematically showing an example of a cleaning device. The cleaning device 2 shown in fig. 1 and 2 cleans, for example, the workpiece 13 included in the frame unit 11.

The workpiece 13 has a front surface 13a and a rear surface 13b, which are circular, and is, for example, a wafer made of a semiconductor material such as silicon (Si). The workpiece 13 is divided into a plurality of regions by a plurality of lines 15 to be divided, which are set in a lattice shape, and devices 17 such as ICs are formed in each region.

The rear surface 13b of the workpiece 13 is adhered to a central region of a disk-shaped belt 19 having a diameter larger than the diameter of the workpiece 13. The belt 19 has, for example: a film-shaped base material layer having flexibility; and an adhesive layer (paste layer) provided on one surface (surface on the workpiece 13 side) of the base material layer.

Specifically, the base material layer is composed of Polyolefin (PO), polypropylene (PP), polyethylene terephthalate PET), polyvinyl chloride (PVC), polystyrene (PS), or the like. The adhesive layer is made of an ultraviolet-curable silicone rubber, an acrylic material, an epoxy material, or the like.

An annular frame 21 having a circular opening 21a larger in diameter than the workpiece 13 is attached to the outer peripheral region of the belt 19. The frame 21 is made of a metal material such as aluminum or stainless steel.

When the cleaning device 2 cleans the workpiece 13, the workpiece 13 is placed on the chuck table 4 with the belt 19 interposed therebetween. The chuck table 4 has a disk-shaped porous plate 4a with an exposed upper surface, and has a function of sucking and holding a frame unit 11 placed on the porous plate 4 a.

That is, in the chuck table 4, the upper surface of the porous plate 4a is a holding surface for holding the workpiece 13 via the belt 19. Further, a cleaning unit 6 and a drying unit 8 are provided around the chuck table 4. The washing unit 6 and the drying unit 8 have support shafts 6a, 8a, respectively.

The support shafts 6a and 8a are tubular members extending in the vertical direction. A rotation drive source (not shown) such as a motor for rotating the support shafts 6a and 8a is connected to the lower end portions of the support shafts 6a and 8a. The base ends of the arms 6b and 8b are connected to the upper ends of the support shafts 6a and 8a.

Each arm 6b, 8b is a tubular member extending in a direction perpendicular to the vertical direction by a length corresponding to a distance from the upper end portion of the support shaft 6a, 8a to the center of the chuck table 4 in a plan view. Further, nozzles 6c and 8c directed downward are provided at the distal ends of the arms 6b and 8b.

The nozzle (cleaning nozzle) 6c communicates with a cleaning liquid supply source (not shown) that supplies a cleaning liquid such as pure water, via an arm 6b, a support shaft 6a, and the like. The nozzle (drying nozzle) 8c is connected to a gas supply source (not shown) for supplying a gas such as air, oxygen, nitrogen, or argon via an arm 8b, a support shaft 8a, and the like.

In the cleaning apparatus 2, the workpiece 13 is cleaned in a space (cleaning chamber) in which the chuck table 4 and the nozzles 6c and 8c are provided. The cleaning chamber is delimited by a cleaning chamber cover 10. The cleaning chamber cover 10 includes: a lower portion 12 provided around the chuck table 4 and the nozzles 6c and 8 c; and an upper portion 14 detachably coupled to the lower portion 12.

The lower portion 12 of the cleaning chamber cover 10 has: a cylindrical outer peripheral wall 12a; an annular bottom wall 12b extending radially inward from a lower end portion of the outer peripheral wall 12a; and a cylindrical inner peripheral wall 12c erected from an inner end portion of the bottom wall 12b. The support shaft 6a of the washing unit 6 and the support shaft 8a of the drying unit 8 are provided to penetrate the bottom wall 12b.

The upper portion 14 of the cleaning chamber cover 10 has: a disk-shaped top wall 14a having a diameter substantially equal to the outer diameter of the bottom wall 12b; and a cylindrical side wall 14b which is perpendicularly provided from the outer peripheral portion of the top wall 14 a. In addition, a through hole for allowing the gas to flow into the cleaning chamber may be formed in the top wall 14a and/or the side wall 14b.

Further, a suction unit 16 for sucking the fluid in the cleaning chamber is connected to the outer peripheral wall 12a of the lower portion 12. Specifically, the suction unit 16 includes a communication member 16a provided to penetrate the outer peripheral wall 12a so that the tip end portion is positioned in the cleaning chamber.

The communication member 16a is a tubular member, and the tip end portion thereof is positioned outside the chuck table 4. The tip end portion of the communication member 16a is opened downward at the same position as the holding surface of the chuck table 4 or at a position lower than the holding surface of the chuck table 4.

The base end portion of the communication member 16a is connected to a suction source (not shown) such as a vacuum pump. When the suction source is operated, fluid in a space (the 2 nd space) below the distal end portion of the communication member 16a is sucked through the communication member 16a.

When the fluid existing in the 2 nd space is sucked, the fluid in the space (1 st space) outside the chuck table 4 flows downward and flows into the 2 nd space. That is, in this case, a down flow (down flow) is generated in the 1 st space, and an up flow (up flow) is generated in the 2 nd space.

A drain port 18 is formed in the bottom wall 12b, and a drain pipe (not shown) extending downward is connected to the drain port 18. A plurality of (e.g., two) support legs 20 are fixed to the lower surface of the bottom wall 12b. The plurality of support legs 20 are provided at substantially equal angular intervals along the circumferential direction of the bottom wall 12b, and support the lower portion 12 of the cleaning chamber cover 10.

In addition, the main shaft 22 passes up and down in a cylindrical space existing inside the inner peripheral wall 12c. The upper end of the spindle 22 is coupled to the chuck table 4 to support the chuck table 4. A rotary drive source such as a motor is connected to the lower end portion of the main shaft 22, and the rotary drive source is accommodated in the housing 24.

When the rotation driving source is operated, the spindle 22 and the chuck table 4 rotate about a straight line passing through the center of the holding surface of the chuck table 4 and extending in the vertical direction as the rotation axis. The housing 24 is supported by a support mechanism 26 so as to be able to be lifted.

The support mechanism 26 includes, for example, a plurality of (e.g., 3) cylinders 28 attached to the housing 24, and support legs 30 are connected to the lower portions of the cylinders 28. When the plurality of air cylinders 28 are operated simultaneously, the housing 24, the spindle 22, and the chuck table 4 are lifted and lowered.

For example, when the frame unit 11 is carried into the chuck table 4 or carried out of the chuck table 4, the support mechanism 26 is operated to position the chuck table 4 at a high position (carrying-in/carrying-out position). In addition, when cleaning the workpiece 13 included in the frame unit 11, the support mechanism 26 is operated to position the chuck table 4 at a low position (cleaning position).

In fig. 1, the cleaning device 2 is schematically shown with the chuck table 4 in the carry-in and carry-out position. In fig. 2, the cleaning device 2 is schematically shown with the chuck table 4 in the cleaning position.

A housing 32 is provided around the spindle 22. The housing 32 has a cylindrical shape with an outer diameter smaller than an inner diameter of the inner peripheral wall 12c, and is fixed to the housing 24 via a connecting member (not shown). Further, a bearing 34 is provided on the inner peripheral surface of the upper portion of the housing 32.

The bearing 34 rotatably supports the spindle 22 with the inner ring in contact with the spindle 22. In addition, 3 through holes penetrating the housing 32 in the radial direction are provided in the housing 32 so as to be juxtaposed vertically. A tubular open pipe 36 is connected to the through hole closest to the bearing 34 among the 3 through holes.

The open pipe 36 communicates an annular space (open portion) a between the housing 32 and the spindle 22 with a space outside the housing 32. In addition, the open tube 36 may be omitted. That is, the opening a may communicate with the space outside the case 32 via a through hole penetrating the case 32.

A tubular negative pressure supply pipe 38 and a tubular positive pressure supply pipe 40 are connected to the remaining two through holes, respectively. The negative pressure supply pipe 38 communicates an annular space (pressure variable portion) B between the housing 32 and the spindle 22 farther from the bearing 34 than the opening portion a with a negative pressure supply source including an ejector or the like. The positive pressure supply pipe 40 communicates the pressure variable portion B with a positive pressure supply source including a gas cylinder or the like.

Annular oil seals 42a and 42B are provided at the boundary between the opening a and the pressure variable portion B and the boundary between the external space below the pressure variable portion B and the pressure variable portion B, respectively. The pressure variable portion B can communicate with a negative or positive pressure supply pipe 22a formed in the main shaft 22. The negative or positive pressure supply pipe 22a communicates with the space on the holding surface of the chuck table 4 via a flow path (not shown) formed inside the chuck table 4.

A cover member 44 is fixed to the upper end of the housing 32. The cover member 44 has: an annular top wall 44a; and a cylindrical side wall 44b extending downward from an outer end portion of the top wall 44 a. In addition, the top wall 44a has an inner diameter greater than the inner diameter of the bearing 34. In addition, the outer diameter of the top wall 44a and the inner diameter of the side wall 44b are larger than the outer diameter of the inner peripheral wall 12c.

An upper end portion of the spindle 22 protruding from the housing 32 is inserted inside the top wall 44 a. In other words, the cover member 44 has a through hole into which the upper end portion of the spindle 22 is inserted. An oil seal 46 is provided between the cover member 44 and the upper end portion of the main shaft 22 to shut off the communication between the space (for example, the opening a and the pressure variable portion B) between the housing 32 and the main shaft 22 and the cleaning chamber.

The cleaning of the workpiece 13 in the cleaning apparatus 2 is performed, for example, in the following order. First, in a state in which the upper portion 14 and the lower portion 12 of the cleaning chamber cover 10 are separated and the chuck table 4 is positioned at the carry-in and carry-out position, the frame unit 11 is carried into the cleaning apparatus 2 so that the workpiece 13 is placed on the chuck table 4 via the belt 19.

Next, the negative pressure supply source communicating with the pressure variable portion B and the negative pressure or positive pressure supply pipe 22a is operated. Thereby, the workpiece 13 is sucked and held by the chuck table 4. Next, the air cylinder 28 is operated to move the chuck table 4 to the cleaning position. Next, the upper portion 14 and the lower portion 12 are connected to each other so as to define a cleaning chamber by the cleaning chamber cover 10.

Next, the rotary drive source connected to the support shaft 6a of the cleaning unit 6 is operated to position the nozzle 6c above the workpiece 13. Next, the suction source communicating with the cleaning chamber via the communication member 16a is operated.

Thus, a downward flow is generated in the 1 st space of the cleaning chamber located around the chuck table 4, and an upward flow is generated in the 2 nd space located outside the 1 st space and below the holding surface of the chuck table 4.

Next, while the suction source is kept activated, the rotation driving source housed in the case 24 is activated to rotate the chuck table 4, and the cleaning liquid supply source communicating with the nozzle 6c via the support shaft 6a and the arm 6b is activated to spray the cleaning liquid toward the front surface 13a of the workpiece 13.

At this time, if necessary, the rotation driving source connected to the support shaft 6a may be operated so that the nozzle 6c rotates above the workpiece 13. Thereby, the front surface 13a of the workpiece 13 is cleaned.

In addition, along with the cleaning, mist containing machining chips and the like may spread in the 1 st space around the chuck table 4. However, a downward flow is generated in the 1 st space. Therefore, the mist can be suppressed from adhering to the ceiling of the washing chamber (specifically, the lower surface of the top wall 14a of the upper portion 14 of the washing chamber cover 10).

Next, while the suction source is kept activated, the rotary drive source connected to the support shaft 6a of the cleaning unit 6 is activated to retract the nozzle 6c from above the workpiece 13, and the rotary drive source connected to the support shaft 8a of the drying unit 8 is activated to position the nozzle 8c above the workpiece 13.

Next, while the suction source is kept activated, the rotary drive source housed in the case 24 is activated to rotate the chuck table 4, and the gas supply source communicating with the nozzle 8c via the support shaft 8a and the arm 8b is activated to spray gas toward the front surface 13a of the workpiece 13.

At this time, if necessary, the rotation driving source connected to the support shaft 8a may be operated so that the nozzle 8c rotates above the workpiece 13. This can remove the cleaning liquid adhering to the front surface 13a of the workpiece 13, and dry the front surface 13 a.

In addition, along with the drying, mist containing machining chips and the like may spread in the 1 st space around the chuck table 4. However, a downward flow is generated in the 1 st space. Therefore, the mist can be suppressed from adhering to the ceiling of the washing chamber (specifically, the lower surface of the top wall 14a of the upper portion 14 of the washing chamber cover 10).

Next, the rotary drive source connected to the support shaft 8a of the drying unit 8 is operated to retract the nozzle 8c from above the workpiece 13. Next, the upper portion 14 is separated from the lower portion 12 of the cleaning chamber cover 10 so as to open the cleaning chamber. Next, the cylinder 28 is operated to move the chuck table 4 to the carry-in and carry-out position.

Next, the operation of the negative pressure supply source communicating with the pressure variable portion B and the negative pressure or positive pressure supply pipe 22a is stopped, and the positive pressure supply source communicating with them is operated. Thereby, the chuck table 4 stops sucking the workpiece 13. Next, the frame unit 11 is carried out from the chuck table 42. Thereby, the cleaning of the workpiece 13 is completed.

In the cleaning apparatus 2, the suction source communicating with the cleaning chamber via the communication member 16a is operated, and the communication member 16a has a tip end portion that opens downward at the same position as or lower than the holding surface, thereby generating a downward flow in the 1 st space located around the chuck table 4. In this way, in the cleaning apparatus 2, it is possible to prevent mist from adhering to the ceiling of the cleaning chamber without providing additional components below the chuck table 4.

The above-described content is one embodiment of the present invention, and the content of the present invention is not limited to the above-described content. For example, in the cleaning apparatus of the present invention, a partition plate may be provided in the cleaning chamber to partition the cleaning chamber. Fig. 3 is a partially cross-sectional side view schematically showing an example of a cleaning apparatus in which such a partition plate is provided in a cleaning chamber.

In the cleaning device 48 shown in fig. 3, an annular dividing plate 50 is provided so as to surround the chuck table 4. Fig. 4 is an exploded perspective view schematically showing the partition plate 50 provided to the cleaning device 48. The partition plate 50 has an annular main body 52, and an outer peripheral portion of the main body 52 is fixed to the outer peripheral wall 12a of the lower portion 12 of the cleaning chamber cover 10.

The main body 52 is made of a metal material such as aluminum or stainless steel, and has an upper surface and a lower surface parallel to each other. Further, the main body 52 is formed with: a cutout 52a fitted to the distal end portion of the communication member 16a of the suction unit 16; and two through holes 52b through which the support shaft 6a of the washing unit 6 or the support shaft 8a of the drying unit 8 passes.

The body 52 is formed with a plurality of through holes 52c extending in the radial direction of the body 52 and having substantially the same cross-sectional shape. Further, a plurality of screw holes 52d are formed in the upper surface of the main body 52 at substantially equal angular intervals along the circumferential direction of the main body 52.

Bolts 54 are screwed into the screw holes 52d. The bolt 54 has: a columnar shaft portion extending in the vertical direction; and a hexagonal prism-shaped head portion having a diameter larger than the shaft portion and a length in the vertical direction smaller than the shaft portion. The shaft portion further includes: a lower portion (threaded portion) formed with a thread; and an upper portion (cylindrical portion) where no thread is formed. The screw portion of the bolt 54 is screwed into a screw hole 52d formed in the upper surface of the main body 52.

Further, an arc-shaped adjustment portion 56 is provided between the main body portion 52 and the head portion of each of the plurality of bolts 54. Specifically, a through hole 56a extending in the circumferential direction of the body 52 is formed at an end of the adjustment portion 56, and a cylindrical portion of the bolt 54 is inserted into the through hole 56 a.

The adjustment portion 56 is made of a metal material such as aluminum or stainless steel, and has an upper surface and a lower surface parallel to each other. The width of the main body 52 of the adjustment portion 56 in the radial direction is substantially equal to the main body 52, and the curvature of the adjustment portion 56 is substantially equal to the main body 52. The adjustment portion 56 includes a plurality of through holes 56b extending in the radial direction of the main body 52 and having a cross-sectional shape substantially equal to the through holes 52c formed in the main body 52.

The width of the body 52 in the radial direction of the through hole 56a formed at the end of the adjustment portion 56 is smaller than the width of the head of the bolt 54. The head of the bolt 54 is separated from the adjustment portion 56. Therefore, the adjustment portion 56 can slide along the circumferential direction of the main body portion 52 in the range of the cylindrical portion of the bolt 54 located in the through hole 56 a.

Fig. 5 (a), 5 (B) and 5 (C) are plan views schematically showing the relative positions of the main body 52 and the adjustment unit 56, respectively. Specifically, fig. 5 (a) shows a state in which the cylindrical portion of the bolt 54 is located at one end of the through hole 56a, fig. 5 (B) shows a state in which the cylindrical portion of the bolt 54 is located at the center of the through hole 56a, and fig. 5 (C) shows a state in which the cylindrical portion of the bolt 54 is located at the other end of the through hole 56 a.

When the adjustment portion 56 is slid so that the cylindrical portion of the bolt 54 is positioned at one end of the through hole 56a (see fig. 5 a), the through hole 52c formed in the main body 52 and the through hole 56b formed in the adjustment portion 56 are substantially overlapped. In this case, therefore, the communication between the upper portion and the lower portion of the cleaning chamber divided by the dividing plate 50 is smoothly performed.

When the adjustment portion 56 is slid so that the cylindrical portion of the bolt 54 is positioned at the center of the through hole 56a (see fig. 5B), the through hole 52c formed in the main body 52 and the through hole 56B formed in the adjustment portion 56 overlap each other, that is, a part of the through hole 52c is partially covered by the adjustment portion 56. Therefore, in this case, the communication between the upper portion and the lower portion of the cleaning chamber divided by the dividing plate 50 is possible, but is hindered.

When the adjustment portion 56 is slid so that the cylindrical portion of the bolt 54 is positioned at the other end of the through hole 56a (see fig. 5C), the through hole 52C formed in the main body portion 52 and the through hole 56b formed in the adjustment portion 56 are hardly overlapped, that is, the through hole 52C is almost entirely covered with the adjustment portion 56. Therefore, in this case, communication between the upper portion and the lower portion of the washing chamber divided by the dividing plate 50 cannot be performed or is difficult to be performed.

In the cleaning device 48, for example, the plurality of adjustment portions 56 are slid so that the closer to the communication member 16a of the suction unit 16, the more difficult the upper portion and the lower portion of the cleaning chamber communicate, that is, the greater the proportion of the through holes 52c covered by the adjustment portions 56. This can generate a uniform downward flow in the 1 st space of the cleaning chamber around the chuck table 4, independently of the distance from the communication member 16a.

In the cleaning device according to the present invention, the cleaning chamber may be provided with a partition plate that does not include the adjustment portion. Fig. 6 is a perspective view schematically showing an example of such a dividing plate. The dividing plate 58 shown in fig. 6 has an annular shape, and is fixed to the outer peripheral wall 12a of the lower portion 12 of the cleaning chamber cover 10 so as to surround the chuck table 4, for example.

The dividing plate 58 is made of a metal material such as aluminum or stainless steel, and has an upper surface and a lower surface parallel to each other. In addition, the dividing plate 58 is formed with: a cutout 58a fitted to the distal end portion of the communication member 16a of the suction unit 16; and two through holes 58b through which the support shaft 6a of the washing unit 6 or the support shaft 8a of the drying unit 8 passes.

In addition, in the dividing plate 58, a plurality of through holes 58c are formed at substantially equal angular intervals along the circumferential direction of the dividing plate 58, except in the vicinity of the cutout 58 a. The width of the radial through hole 58c of the dividing plate 58 is smaller as the through hole is closer to the notch 58a, for example.

That is, the plurality of through holes 58c include: a through hole (1 st through hole) formed at a position distant from the communication member 16 a; and a through hole (2 nd through hole) which is closer to the communication member 16a than the 1 st through hole and has a smaller cross section than the 1 st through hole. This can generate a uniform downward flow in the 1 st space of the cleaning chamber around the chuck table 4, independently of the distance from the communication member 16a.

In addition, the structure, method, and the like of the above embodiment can be modified and implemented as appropriate without departing from the scope of the object of the present invention.

Claims

1. A cleaning device for cleaning an object to be processed, wherein,

the cleaning device comprises:

a chuck table for holding the workpiece placed on the holding surface, the chuck table being rotatable about a straight line passing through the center of the holding surface as a rotation axis;

a cleaning unit having a cleaning nozzle that sprays a cleaning liquid toward the workpiece while the chuck table holding the workpiece by the holding surface is rotated;

a cleaning chamber cover defining a cleaning chamber provided with the chuck table and the cleaning nozzle; and

a suction unit for sucking the fluid in the cleaning chamber,

the cleaning chamber comprises:

1 st space, it locates around the work table of this chuck; and

a 2 nd space located outside the 1 st space and below the holding surface,

the suction unit has:

a suction source; and

a communicating member for communicating the suction source with the cleaning chamber,

the communication member has:

a base end portion connected to the suction source; and

a front end portion which is opened downward at a position outside the 1 st space and at the same position as or lower than the holding surface,

when the suction source communicating with the cleaning chamber via the communicating member is operated, a downward flow is generated in the 1 st space, and an upward flow is generated in the 2 nd space.

2. The cleaning device according to claim 1, wherein,

an annular dividing plate is provided so as to surround the chuck table,

the dividing plate includes:

a main body portion having a plurality of through holes formed therein; and

and a plurality of adjustment portions each capable of covering at least one of the plurality of through holes.

3. The cleaning device according to claim 1, wherein,

an annular dividing plate is provided so as to surround the chuck table,

a plurality of through holes are formed in the dividing plate,

the plurality of through holes include:

a 1 st through hole; and

and a 2 nd through hole which is closer to the communication member than the 1 st through hole and has a smaller cross section than the 1 st through hole.