JP6739268B2 - Substrate processing equipment - Google Patents

Description

The present invention is for a semiconductor wafer, a liquid crystal display substrate, a plasma display substrate, an organic EL substrate, an FED (Field Emission Display) substrate, an optical display substrate, a magnetic disk substrate, a magneto-optical disk substrate, and a photomask. The present invention relates to a substrate processing apparatus that supplies a processing liquid to a substrate and a solar cell substrate (hereinafter, simply referred to as a substrate), and particularly to a technique of a cup that collects the processing liquid.

Conventionally, as a device of this type, a substrate holding part, a rotation drive mechanism, a first nozzle, a second nozzle, a cup body, a first drainage conduit, and a second drainage conduit. There is a substrate processing apparatus provided with an exhaust pipe line and a movable cup (for example, refer to Patent Document 1).

The substrate holding unit holds the substrate in a horizontal posture. The rotation drive mechanism drives the substrate holder to rotate about the vertical axis. The first nozzle supplies a developer for positive tone development. The second nozzle supplies a developing solution for negative tone development. The cup body surrounds the periphery of the substrate held by the substrate holder and collects the developing solution supplied to the substrate. The first drainage conduit and the second drainage conduit are connected to the cup body so as to communicate with each other. By moving up and down inside the cup body, the movable cup guides the developing solution to only one of the first drainage conduit and the second drainage conduit.

When the first nozzle supplies the developing solution, for example, the movable cup guides the developing solution to the first drainage line, and when the second nozzle supplies the developing solution, the movable cup moves to the developing solution. To the second drain line. The first drainage line discharges the developer for positive tone development, and the second drainage line discharges the developer for negative tone development. At this time, the exhaust pipe discharges the gas in the cup body containing the mist of the developing solution. This can prevent the developer for positive tone development and the developer for negative tone development from being mixed in the first drain pipe and the second drain pipe. The exhaust pipe discharges the gas in the cup body containing the mist of the developing solution when the first nozzle and the second nozzle supply the developing solution.

JP, 2014-75575, A

However, the conventional example having such a configuration has the following problems.
That is, in the conventional apparatus, since the exhaust pipe line is configured by one, the mist of the developer in the cup is discharged from the same exhaust pipe line during both the positive tone development processing and the negative tone development processing. To be done. Therefore, mist of different kinds of developer may be mixed in one exhaust pipe line. As a result, it becomes difficult to keep the atmosphere in the cup clean, and it becomes difficult to process the substrate with good quality.

The present invention has been made in view of the above circumstances, and an object of the present invention is to provide a substrate processing apparatus capable of processing a substrate with good quality.

The present invention has the following configuration in order to achieve such an object.
That is, the invention according to claim 1 is, in a substrate processing apparatus for processing a substrate with a processing liquid, a substrate holding unit that holds the substrate in a horizontal posture, and a rotation drive unit that rotates the substrate holding unit around a vertical axis. A first processing liquid supply unit that supplies a first processing liquid to the substrate held by the substrate holding unit, and a second processing that supplies a second processing liquid to the substrate held by the substrate holding unit A liquid supply unit; an outer cup arranged laterally around the substrate holding unit; and an inner cup arranged between the substrate holding unit and the outer cup, wherein the inner cup is a flat surface. The outer cup includes an inner cup body having an annular shape when viewed, and an inner cup discharge port that is formed in a lower portion of the inner cup body and discharges a first processing liquid and gas in the inner cup body downward. Is formed on the bottom surface of the outer cup body, the outer cup body that constitutes the bottom portion of the outer cup body, and the outer bottom cup, and the first cup discharged from the inner cup discharge port. A first drain port for discharging the processing liquid; a first exhaust port formed in the outer lower cup for discharging the gas discharged from the inner cup discharge port; A second drain port formed on the bottom surface for discharging the second processing liquid in the outer cup body, and a second drain hole formed in the outer lower cup for discharging the gas in the outer cup body. An exhaust port; and a partition wall that stands upright in a ring shape on the bottom surface of the outer lower cup in a plan view and separates the first drainage port and the second drainage port from each other. The exhaust ports are arranged at a plurality of positions that are in an equiangular positional relationship from the center in plan view, and the inner cup body has a collection position where the inner cup collects the treatment liquid and the outer cup collects the treatment liquid. The outer cup body is provided with an outer side surface cup that constitutes a side surface of the outer lower cup body, and each of the second exhaust ports is disposed on an outer peripheral portion of the outer cup body. The outer surface cup has a through hole at a position corresponding to each of the second exhaust ports, and each of the second exhaust ports has an upper end located above an upper part of the through port. It is characterized by having an exhaust pipe .

[Operation/Effect] According to the first aspect of the invention, the substrate holder is rotated together with the substrate by the rotation drive unit in a state where the inner cup body is located at the recovery position, and the first processing liquid supply unit is operated. The first processing liquid is supplied to the substrate. In this state, the first processing liquid scattered around the substrate is collected by the inner cup body of the inner cup, and is collected by the bottom surface of the outer cup through the inner cup discharge port. The first processing liquid collected on the bottom surface formed on the outer cup body of the outer cup is discharged through the first drainage port which is separated from the second drainage port by the partition wall on the bottom face. To be done. The gas in the inner cup containing the mist of the first treatment liquid is collected from the inner cup body through the inner cup outlet and is collected by the outer cup, and is discharged through the first outlet of the outer lower cup. Further, the second processing liquid is supplied from the second processing liquid supply unit to the substrate while the inner cup body is moved to the retracted position. In this state, the second processing liquid scattered around the substrate is collected by the outer cup body of the outer cup and is collected by the bottom surface of the outer lower cup. The second processing liquid collected on the bottom surface of the outer cup body is discharged through the second drain port which is separated from the first drain port by the partition wall on the bottom surface. The gas in the outer cup containing the mist of the second processing liquid is recovered by the outer cup and discharged through the second exhaust port of the outer lower cup. By moving the inner cup to the recovery position and the retreat position, the first treatment liquid is discharged through the first drain port, and the gas containing the mist of the first treatment liquid is discharged through the first exhaust port. The second processing liquid is discharged, and the second processing liquid is discharged through the second drain port, and the gas containing the mist of the second processing liquid is discharged through the second exhaust port. Therefore, the gas in the inner cup and the gas in the outer cup do not mix, so that the substrate can be processed with good quality regardless of whether the inner cup or the outer cup is used. Further, since the first exhaust ports are arranged in the inner cup in the same positional relationship in plan view, the gas containing the mist of the first processing liquid can be uniformly exhausted from the inner cup. Therefore, the atmosphere in the inner cup can be made uniform, and the in-plane uniformity of the processing of the substrate by the first processing liquid can be improved. Further, since each of the second exhaust ports can be arranged on the outer peripheral side of the outer cup, a sufficient distance from the first exhaust port can be secured. Therefore, the exhaust structure can be prevented from becoming complicated. Further, since the airflow rising toward the upper end of the exhaust pipe through the through hole of the outer side cup is exhausted, only the gas containing mist can be exhausted, and the second processing liquid mixes in the second exhaust port. Can be prevented.

According to a second aspect of the present invention, in a substrate processing apparatus that processes a substrate with a processing liquid, a substrate holding unit that holds the substrate in a horizontal posture, and a rotation drive unit that rotates the substrate holding unit around a vertical axis. A first processing liquid supply unit that supplies a first processing liquid to the substrate held by the substrate holding unit, and a second processing that supplies a second processing liquid to the substrate held by the substrate holding unit A liquid supply unit; an outer cup arranged laterally around the substrate holding unit; and an inner cup arranged between the substrate holding unit and the outer cup, wherein the inner cup is a flat surface. The outer cup includes an inner cup body having an annular shape when viewed, and an inner cup discharge port that is formed in a lower portion of the inner cup body and discharges a first processing liquid and gas in the inner cup body downward. Is formed on the bottom surface of the outer cup body, the outer cup body that constitutes the bottom portion of the outer cup body, and the outer bottom cup, and the first cup discharged from the inner cup discharge port. A first drain port for discharging the processing liquid; a first exhaust port formed in the outer lower cup for discharging the gas discharged from the inner cup discharge port; A second drain port formed on the bottom surface for discharging the second processing liquid in the outer cup body, and a second drain hole formed in the outer lower cup for discharging the gas in the outer cup body. An exhaust port; and a partition wall that stands upright in an annular shape on the bottom surface of the outer lower cup in plan view and separates the first drainage port and the second drainage port from each other. The exhaust ports are arranged at a plurality of positions that are in an equiangular positional relationship from the center in plan view, and the inner cup body has a collection position where the inner cup collects the treatment liquid and the outer cup collects the treatment liquid. The outer cup body is provided with an outer side surface cup that constitutes a side surface of the outer lower cup body, and each of the second exhaust ports is disposed on an outer peripheral portion of the outer cup body. The outer surface cup has a through hole at a position corresponding to each of the second exhaust ports, and each of the second exhaust ports has an upper end located above an upper part of the through port. It is characterized by having an exhaust pipe .

[Operation/Effect] According to the second aspect of the invention, the substrate holding unit is rotated together with the substrate by the rotation drive unit in the state where the inner cup body is located at the recovery position, and the first processing liquid supply unit is operated. The first processing liquid is supplied to the substrate. In this state, the first processing liquid scattered around the substrate is collected by the inner cup body of the inner cup, and is collected by the bottom surface of the outer cup through the inner cup discharge port. The first processing liquid collected on the bottom surface formed on the outer cup body of the outer cup is discharged through the first drainage port which is separated from the second drainage port by the partition wall on the bottom face. To be done. The gas in the inner cup containing the mist of the first treatment liquid is collected from the inner cup body through the inner cup outlet and is collected by the outer cup, and is discharged through the first outlet of the outer lower cup. Further, the second processing liquid is supplied from the second processing liquid supply unit to the substrate while the inner cup body is moved to the retracted position. In this state, the second processing liquid scattered around the substrate is collected by the outer cup body of the outer cup and is collected by the bottom surface of the outer lower cup. The second processing liquid collected on the bottom surface of the outer cup body is discharged through the second drain port which is separated from the first drain port by the partition wall on the bottom surface. The gas in the outer cup containing the mist of the second processing liquid is recovered by the outer cup and discharged through the second exhaust port of the outer lower cup. By moving the inner cup to the recovery position and the retreat position, the first treatment liquid is discharged through the first drain port, and the gas containing the mist of the first treatment liquid is discharged through the first exhaust port. The second processing liquid is discharged, and the second processing liquid is discharged through the second drain port, and the gas containing the mist of the second processing liquid is discharged through the second exhaust port. Therefore, the gas in the inner cup and the gas in the outer cup do not mix, so that the substrate can be processed with good quality regardless of whether the inner cup or the outer cup is used. Further, since the second exhaust ports are arranged in the outer cup in the same positional relationship in plan view, the gas containing the mist of the second processing liquid can be uniformly exhausted from the outer cup. Therefore, the atmosphere in the outer cup can be made uniform, and the in-plane uniformity of the processing of the substrate by the second processing liquid can be improved. Further, since each of the second exhaust ports can be arranged on the outer peripheral side of the outer cup, a sufficient distance from the first exhaust port can be secured. Therefore, the exhaust structure can be prevented from becoming complicated. Further, since the airflow rising toward the upper end of the exhaust pipe through the through hole of the outer side cup is exhausted, only the gas containing mist can be exhausted, and the second processing liquid mixes in the second exhaust port. Can be prevented.

According to a third aspect of the present invention, in a substrate processing apparatus that processes a substrate with a processing liquid, a substrate holding unit that holds the substrate in a horizontal posture, and a rotation drive unit that rotates the substrate holding unit around a vertical axis. A first processing liquid supply unit that supplies a first processing liquid to the substrate held by the substrate holding unit, and a second processing that supplies a second processing liquid to the substrate held by the substrate holding unit A liquid supply unit; an outer cup arranged laterally around the substrate holding unit; and an inner cup arranged between the substrate holding unit and the outer cup, wherein the inner cup is a flat surface. The outer cup includes an inner cup body having an annular shape when viewed, and an inner cup discharge port that is formed in a lower portion of the inner cup body and discharges a first processing liquid and gas in the inner cup body downward. Is formed on the bottom surface of the outer cup body, the outer cup body that constitutes the bottom portion of the outer cup body, and the outer bottom cup, and the first cup discharged from the inner cup discharge port. A first drain port for discharging the processing liquid; a first exhaust port formed in the outer lower cup for discharging the gas discharged from the inner cup discharge port; A second drain port formed on the bottom surface for discharging the second processing liquid in the outer cup body, and a second drain hole formed in the outer lower cup for discharging the gas in the outer cup body. an exhaust port, is erected annularly in plan view the bottom surface of the outer lower cup, and a separation partition wall separating the first drain port and said second drain port, said first The exhaust ports are arranged at a plurality of locations that are in an equiangular positional relationship from the center in plan view, and the second exhaust ports are in a plurality of locations that are in an equiangular positional relationship from each other in plan view. And the inner cup body is moved between a collecting position where the inner cup collects the processing liquid and a retracting position where the outer cup collects the processing liquid, and the outer cup body is the outer lower cup body. An outer surface cup that constitutes a side surface of the outer cup body, each of the second exhaust ports being disposed on an outer peripheral portion of the outer cup body, and the outer surface cup corresponding to each of the second exhaust ports. A substrate processing apparatus , wherein a through-hole is formed in each of the second exhaust ports, and each of the second exhaust ports includes an exhaust pipe having an upper end located above an upper part of the through-hole .

[Operation/Effect] According to the invention described in claim 3, in the state where the inner cup body is located at the recovery position, the substrate holder is rotated together with the substrate by the rotation drive unit, and the first processing liquid supply unit is operated. The first processing liquid is supplied to the substrate. In this state, the first processing liquid scattered around the substrate is collected by the inner cup body of the inner cup, and is collected by the bottom surface of the outer cup through the inner cup discharge port. The first processing liquid collected on the bottom surface formed on the outer cup body of the outer cup is discharged through the first drainage port which is separated from the second drainage port by the partition wall on the bottom face. To be done. The gas in the inner cup containing the mist of the first treatment liquid is collected from the inner cup body through the inner cup outlet and is collected by the outer cup, and is discharged through the first outlet of the outer lower cup. Further, the second processing liquid is supplied from the second processing liquid supply unit to the substrate while the inner cup body is moved to the retracted position. In this state, the second processing liquid scattered around the substrate is collected by the outer cup body of the outer cup and is collected by the bottom surface of the outer lower cup. The second processing liquid collected on the bottom surface of the outer cup body is discharged through the second drain port which is separated from the first drain port by the partition wall on the bottom surface. The gas in the outer cup containing the mist of the second processing liquid is recovered by the outer cup and discharged through the second exhaust port of the outer lower cup. By moving the inner cup to the recovery position and the retreat position, the first treatment liquid is discharged through the first drain port, and the gas containing the mist of the first treatment liquid is discharged through the first exhaust port. The second processing liquid is discharged, and the second processing liquid is discharged through the second drain port, and the gas containing the mist of the second processing liquid is discharged through the second exhaust port. Therefore, the gas in the inner cup and the gas in the outer cup do not mix, so that the substrate can be processed with good quality regardless of whether the inner cup or the outer cup is used. Further, since the first exhaust ports are arranged in the inner cup in the same positional relationship in a plan view, the gas containing the mist of the first processing liquid can be uniformly exhausted from the inner cup, Since the exhaust ports are arranged in the outer cup in the same positional relationship in plan view, the gas containing the mist of the second processing liquid can be uniformly exhausted from the outer cup. Therefore, the atmosphere in the inner cup and the atmosphere in the outer cup can be made even and uniform, so that the in-plane uniformity of the processing of the substrate by the first processing liquid and the in-plane uniformity of the processing of the substrate by the second processing liquid are uniform. It is possible to improve the property. Further, since each of the second exhaust ports can be arranged on the outer peripheral side of the outer cup, a sufficient distance from the first exhaust port can be secured. Therefore, the exhaust structure can be prevented from becoming complicated. Further, since the airflow rising toward the upper end of the exhaust pipe through the through hole of the outer side cup is exhausted, only the gas containing mist can be exhausted, and the second processing liquid mixes in the second exhaust port. Can be prevented.

Further, in the present invention, it is preferable that each of the first exhaust ports is arranged such that a positional relationship of each of the second exhaust ports is shifted by 90 degrees in a plan view (claim 5 ).

Even if the plurality of first exhaust ports and the plurality of second exhaust ports are arranged, the respective exhaust ports can be arranged sufficiently apart from each other, so that the structure related to the exhaust ports can be prevented from becoming complicated. ..

Further, in the present invention, it is preferable that the first exhaust port has an opening formed at a tip of a hollow portion extending upward from a bottom surface of the outer lower cup (claim 6 ).

Since the opening of the first exhaust port is separated upward from the bottom surface of the outer lower cup, it is possible to prevent the first processing liquid collected on the bottom surface from mixing with the gas.

In addition, in the present invention, the inner cup body includes a guide portion that guides the first processing liquid scattered around the substrate downward, and a partition wall storage portion that is formed in an inverted U shape below the guide portion. Preferably, the inner cup body stores the separation partition in the partition storage section at the retracted position, and stores only the upper part of the separation partition in the partition storage section at the recovery position. 7).

In the retracted position, the partition wall of the inner cup body stores the partition wall, and in the collection position, the partition wall of the inner cup body stores only the upper part of the partition wall, so the outer lower cup is shared by the inner cup and the outer cup. However, the inner cup body and the outer lower cup can be completely separated. Therefore, the gas containing the second treatment liquid and its mist can be collected only in the outer cup, and the gas containing the first treatment liquid and its mist can be collected only in the inner cup while being guided by the guide portion. Further, since the partition wall storage section and the separation partition function as guides, the inner cup body can be stably moved up and down.

Further, in the present invention, the outer cup body is provided with a middle cup on the inner peripheral side of the separation partition wall, and the lower surface of the middle cup is formed apart from the opening of the first exhaust port, and the outer peripheral surface is Is preferably separated from the inner peripheral surface of the separation partition wall, and the outer peripheral end thereof is separated from the bottom surface of the outer cup body (claim 8 ).

Since it is possible to prevent the first treatment liquid from flowing into the first exhaust port by the middle cup, it is possible to increase the degree of gas-liquid separation and discharge the gas in the inner cup.

Further, in the present invention, it is preferable that the outer lower cup is formed with a slanted surface on the bottom surface that decreases toward the first drainage port and the second drainage port in the circumferential direction ( Claim 9).

The first processing liquid and the second processing liquid that have flowed down to a position far from the first drainage port and the second drainage port formed on the bottom surface of the outer lower cup also have the first drainage port and the second drainage port due to the inclined surface. It can be made to flow down to the second drainage port. Therefore, the recovery efficiency of the first processing liquid and the second processing liquid can be improved.

According to the substrate processing apparatus of the present invention, the gas in the inner cup and the gas in the outer cup do not mix, so that the substrate can be processed with good quality both when using the inner cup and when using the outer cup. It can be carried out. Further, since the first exhaust ports are arranged in the inner cup in the same positional relationship in plan view, the gas containing the mist of the first processing liquid can be uniformly exhausted from the inner cup. Therefore, the atmosphere in the inner cup can be made uniform, and the in-plane uniformity of the processing of the substrate by the first processing liquid can be improved. Further, since each of the second exhaust ports can be arranged on the outer peripheral side of the outer cup, a sufficient distance from the first exhaust port can be secured. Therefore, the exhaust structure can be prevented from becoming complicated. Further, since the airflow rising toward the upper end of the exhaust pipe through the through hole of the outer side cup is exhausted, only the gas containing mist can be exhausted, and the second processing liquid mixes in the second exhaust port. Can be prevented.

It is a whole lineblock diagram showing the schematic structure of the substrate processing device concerning an example, and is a longitudinal section showing the state where an inner cup is in a recovery position. FIG. 1 is an overall configuration diagram showing a schematic configuration of a substrate processing apparatus according to an embodiment, and is a vertical cross-sectional view showing a state in which an inner cup is in a retracted position. It is a longitudinal cross-sectional view which partially enlarged and showed the state in which the inner cup is in the recovery position. It is the longitudinal cross-sectional view which partially enlarged and showed the state in which the inner cup is in the retracted position. It is a top view of an annular member. FIG. 7 is a perspective view of the outer lower cup with the outer cup body and the inner cup body removed. It is a top view which shows the positional relationship of each exhaust port. It is a side view of an exhaust port. It is a top view which shows the arrangement position of each exhaust port and each drainage port.

An embodiment of the present invention will be described below with reference to the drawings.

1 is an overall configuration diagram showing a schematic configuration of a substrate processing apparatus according to an embodiment, and is a vertical cross-sectional view showing a state in which an inner cup is in a recovery position, and FIG. 2 is a substrate processing apparatus according to an embodiment. It is a whole lineblock diagram showing a schematic structure, and is a longitudinal section showing a state where an inner cup is in a retracted position. Further, FIG. 3 is a vertical cross-sectional view showing a partially enlarged state of the inner cup in the recovery position, and FIG. 4 is a vertical cross-sectional view showing a partially enlarged state of the inner cup in the retracted position. It is a figure.

The substrate processing apparatus 1 according to the present embodiment supplies a processing liquid to one substrate W (for example, a semiconductor wafer having a circular shape in plan view) and sequentially processes the substrates W one by one. is there. Specifically, this substrate processing apparatus can perform both the negative tone phenomenon process and the positive tone development process on the substrate W.

The substrate holding unit 3 holds the substrate W in a horizontal posture. The substrate holding unit 3 sucks and holds the central portion of the lower surface of the substrate W by vacuum suction, for example. The substrate W may be held by a mechanism different from the suction holding type.

The rotary drive unit 5 includes an electric motor 7 and a rotary shaft 9. The electric motor 7 has a lower end of a rotating shaft 9 connected thereto, and the upper end of the rotating shaft 9 is connected to a lower end of the substrate holding unit 3. Therefore, when the electric motor 7 is driven, the rotating shaft 9 is rotationally driven around the axis P, and the substrate W is rotationally driven in the horizontal plane.

The processing liquid supply unit 11 supplies various processing liquids, and includes, for example, four supply nozzles 13 to 16. For example, the nozzle 13 supplies a developer for positive tone development as a treatment liquid, and the nozzle 14 supplies a rinse liquid for positive tone development as a treatment liquid. The nozzle 15 supplies a developing solution for negative tone development as a processing solution, and the nozzle 16 supplies a rinse solution for negative tone developing as a processing solution.

The developer for positive tone development is an alkaline developer, for example, tetramethylammonium hydroxide (TMAH: Tetra Methyl Ammonium Hydroxide). The rinse liquid for positive tone development is, for example, pure water. The developer for negative tone development is, for example, a developer containing an organic solvent such as butyl acetate. The rinse solution for negative tone development contains, for example, an organic solvent such as 4-methyl-2-pentanol (MIBC: Methyl Iso Butyl Carbinol).

The developer and rinse solution for positive tone development described above correspond to the "first processing solution" in the present invention, and the developer and rinse solution for negative tone development described above are the "second processing solution" in the present invention. Equivalent to.

Below the substrate holding part 3, a dispersion disk 17 is provided. The dispersion disk 17 is attached to the substrate holding unit 3 so as to rotate integrally with the substrate holding unit 3. The spray disc 17 supplies the cleaning liquid from a cleaning liquid supply unit (not shown) to the cup 19 described later to clean the inner surface of the cup 19. A detailed description of the spreading disc 17 will be omitted.

The cup 19 is arranged so as to surround the side of the substrate holding unit 3, and collects the processing liquid supplied to the substrate W. The cup 19 includes an outer cup 21 and an inner cup 23. The inner cup 23 is arranged between the substrate holder 3 and the outer cup 21. As shown in FIGS. 1 and 3, the inner cup 23 is provided with an inlet A for collecting the treatment liquid on the inner peripheral side (rotating shaft 9 side), and the outer cup 21 is as shown in FIGS. 2 and 4. An inlet B for collecting the treatment liquid is provided on the inner peripheral side.

The base portion 25 of the cup 19 is arranged on the outer peripheral side of the rotating shaft 9. A side plate 27 is attached to the outer peripheral portion of the base portion 25 on the outer peripheral side of the base portion 25 and below the outer peripheral edge of the substrate W held by the substrate holding portion 3. It should be noted that by moving the cup 19 and the base portion 25 up and down with respect to the substrate holding portion 3 by an elevating mechanism (not shown), the substrate holding portion 3 projects upward from the upper end of the cup 19. It is possible to switch between a state in which delivery with (not shown) is possible and a state in which the processing shown in FIGS. 1 and 2 is possible.

The outer cup 21 is arranged at the farthest position of the side plate 27, the inner cup 23 is arranged inside the outer cup 21, and the middle cup 29 is arranged inside the inner cup 23.

The outer cup 21 includes an outer cup body 31, an outer lower cup 33, and an outer surface cup 35. The outer cup body 31 has an annular shape in a plan view. The outer lower cup 33 constitutes the bottom portion of the outer cup body 31.

On the bottom surface of the outer lower cup 33, a partition wall 37 is provided upright. The separation partition wall 37 has an annular shape in a plan view and divides the bottom surface of the outer lower cup 33 into two parts, an inner peripheral side and an outer peripheral side. A first drainage port 39 is formed on the bottom surface on the inner peripheral side, and a second drainage port 41 is formed on the bottom surface on the outer peripheral side. The first waste liquid treatment is communicated with the first drainage port 39, and the second wastewater treatment is communicated with the second drainage port 41. Further, a first exhaust port 43 is formed on the inner peripheral side of the outer lower cup 33, and a second exhaust port 45 is formed on the outer peripheral side of the outer surface cup 35 of the outer lower cup 33. The first exhaust process is communicated with the first exhaust port 43, and the second exhaust process is communicated with the second exhaust port 45.

An inner cup body 47 is arranged above the outer lower cup 33 and inside the outer cup body 31. The inner cup body 47 has an annular shape in a plan view. The inner cup body 47 does not have a bottom portion, and the bottom portion constitutes an inner cup discharge port 49 for discharging the processing liquid or gas downward. The inner cup body 47 includes a guide portion 51 and a partition wall storage portion 53. The guide portion 51 guides the developer and rinse liquid for positive tone development scattered from the substrate W to the surroundings to the inner cup discharge port 49 below. The partition wall storage portion 53 is formed in the lower portion of the guide portion 51 and has a vertical U-shaped vertical cross section. The partition wall storage unit 53 stores the partition wall 37, and stores the partition wall 37 or only the upper portion of the partition wall 37 according to the operation described later.

The middle cup 29 is arranged such that its outer peripheral side is located on the inner peripheral side of the separation partition wall 37. The lower surface of the middle cup 29 is formed to be separated from the opening of the first exhaust port 43, the outer peripheral surface is separated from the inner peripheral surface of the separation partition wall 37, and the outer peripheral end is separated from the bottom surface of the outer lower cup 33. doing. Further, the middle cup 29 is subjected to a hydrophilic treatment, and the guide portion 51 smoothly guides the developer and rinse liquid for positive tone development scattered around the substrate W to the bottom surface of the outer lower cup 33. You can The hydrophilic treatment is preferably performed by roughening the surface by sandblasting instead of applying a chemical or the like.

The hydrophilic treatment of the middle cup 29 makes it difficult for the developer and the rinse liquid for positive tone development to flow back into the middle cup 29. Therefore, it is possible to prevent such a problem that the developer and rinse solution for positive tone development bounce off the middle cup 29 and adhere to the substrate W. In addition, since the fluidity of the developer and rinse liquid for positive tone development attached to the middle cup 29 can be improved, it can be easily collected at the first drainage port 39.

It is preferable that the inner cup body 47 is also subjected to a hydrophilic treatment. As a result, when the outer cup 21 collects the developer and rinse liquid for negative tone development, the developer and rinse liquid for negative tone development attached to the upper surface of the inner cup body 47 is transferred to the outer lower cup 33. It can be made to flow down easily, and can be easily collected at the second drainage port 41.

The side plate 27 has a notch 55 formed in a part thereof (left side in FIGS. 1 to 4) penetrating from the inner peripheral side to the outer peripheral side and elongated in the height direction. A link member 57 and an air cylinder 59 are arranged on the inner peripheral side of the cutout portion 55. The air cylinder 59 is attached to the base portion 25 with the operating piece oriented in the vertical direction, and its tip is connected to the bottom portion of the link member 57. An annular member 61 is arranged on the outer peripheral surface of the side plate 27.

The air cylinder 59 described above corresponds to the “drive unit” in the present invention.

Now refer to FIG. Note that FIG. 5 is a plan view of the annular member.

The annular member 61 has an annular shape in a plan view, and is slidably attached to the outer peripheral surface of the side plate 27 corresponding to the outer peripheral surface inside the outer cup body 31. In the annular member 61, the connecting portions 63 are extended to the outer peripheral side at three positions on the outer periphery at angles that are equidistant from each other in plan view. Each connecting portion 63 is locked to a protrusion 65 formed on the inner peripheral surface of the inner cup body 47. Each connecting portion 63 is connected to the protruding portion 65 through a vertical opening 67 formed in the middle cup 29. Therefore, the middle cup 29 and the connecting portion 63 do not interfere with each other.

As described above, the annular member 61 is connected to the inner cup body 47 by the three connecting portions 63 having the same positional relationship in a plan view. Therefore, even if the annular member 61 is quickly moved up and down, the inner cup body 47 can be moved in a stable posture, so that the processing can be switched quickly.

An upper portion of the link member 57 extends upward from the cutout portion 55 of the side plate 27 and is connected to a part of the inner peripheral surface of the annular member 61. As a result, when the air cylinder 59 is operated to move the operating piece up and down, the inner cup body 47 moves up and down together with the annular member 61 inside the outer cup 21. Specifically, when the operating piece of the air cylinder 59 is advanced, the inner cup body 47 rises to the “recovery position”, and when the operating piece of the air cylinder 59 is contracted, the inner cup body 47 moves to the “retracted position”. To descend. The recovery position is a position where the developer and rinse liquid for positive tone development are collected from the inlet A of the inner cup 23, and the retracted position is the developer and rinse for negative tone development from the inlet B of the outer cup 21. This is the position for collecting the liquid.

The partition wall storage portion 53 of the inner cup body 47 stores the separation partition wall 37 at the retracted position, and the partition wall storage portion 53 of the inner cup body 47 stores only the upper portion of the separation partition wall 37 at the recovery position. Even if the inner cup 23 and the outer cup 21 are commonly used, the inside of the inner cup body 47 and the inside of the outer lower cup 33 can be completely separated. Therefore, at the retracted position, the gas containing the negative tone developing solution and the rinsing liquid and its mist is collected only in the outer cup 21, and at the collecting position the positive tone developing solution and the rinsing liquid and its gas containing the mist are collected. Only the inner cup 23 can be recovered while guiding it by the guide portion 51. Further, since the partition wall storage portion 53 and the separation partition wall 37 serve as guides, the inner cup body 47 can be stably moved up and down.

The electric motor 7, the processing liquid supply unit 11, and the air cylinder 59 described above are controlled by the control unit 69. The control unit 69 includes a CPU, a memory, and the like, and operates each of the above units according to a recipe defining a processing procedure for the substrate W.

Reference is now made to FIGS. 6 is a perspective view of the outer lower cup with the outer cup body and the inner cup body removed, FIG. 7 is a plan view showing the positional relationship of the exhaust ports, and FIG. FIG. 9 is a side view of the mouth, and FIG. 9 is a plan view showing the arrangement positions of the exhaust ports and the drainage ports.

The above-described first exhaust ports 43 are formed at four locations, for example, as shown in FIGS. 7 and 9. Each of the first exhaust ports 43 is arranged so as to have a positional relationship of being equiangular with each other from the center in a plan view. In the present embodiment, since there are four, they have a positional relationship of 90 degrees to each other. The first exhaust port 43 includes a hollow portion 71 that extends upward from the bottom surface of the outer lower cup 33, and an opening 73 formed in the upper portion of the hollow portion 71. The height of the first exhaust port 43 is set so as not to contact the lower surface of the middle cup 29, and the opening 73 is formed in the direction opposite to the rotation direction of the substrate holding unit 3. Since the middle cup 29 is arranged so as to cover the upper side of the opening 73, it is possible to prevent the developer for positive tone development and the rinse liquid from flowing into the first exhaust port 43, so that the degree of gas-liquid separation is increased. The gas in the inner cup 23 can be discharged.

Since the opening 73 of the first exhaust port 43 is formed in the direction opposite to the direction of the air flow generated by the rotation, the developer for the positive tone development and the rinse liquid ride on the air flow and enter the first exhaust port 43. It can be prevented from flowing. Therefore, the degree of gas-liquid separation can be improved. Further, since the opening 73 of the first exhaust port 43 is separated upward from the bottom surface of the outer lower cup 33, the developer for the positive tone development and the rinse solution collected on the bottom surface of the outer lower cup 33 become gas. Mixing can be prevented.

The above-described second exhaust ports 45 are formed at four locations, for example, as shown in FIGS. 6 and 7. Each of the second exhaust ports 45 is arranged so that each of the second exhaust ports 45 has a positional relationship of being equiangular with each other from the center in a plan view. In the present embodiment, since there are four, they are arranged so as to have a positional relationship of 90°. Further, the positional relationship between the four second exhaust ports 45 and the four first exhaust ports 43 is shifted by 90 degrees from each other in plan view.

Even if the four first exhaust ports 43 and the four second exhaust ports 45 are arranged by the 90-degree displacement, the respective exhaust ports can be arranged sufficiently apart from each other. The structure related to the exhaust port can be prevented from becoming complicated.

Each of the second exhaust ports 45 described above is arranged at the four corners of the outer lower cup 33 extending laterally from the outer peripheral surface of the outer cup 19 having a circular shape in plan view. In other words, each second exhaust port 45 is arranged on the outer peripheral portion of the outer cup body 31. The outer surface cup 35 has a through hole 75 formed only at a position corresponding to each second exhaust port 45. The through hole 75 is covered with a through hole cover 77. An exhaust pipe 79 is attached to the outer lower cup 33 so that an upper end thereof opens into a space formed by the outer surface cup 35, the through-hole cover 77, and the outer lower cup 33. The exhaust pipe 79 is arranged such that its upper end is located above the upper portion of the through hole 75. That is, the gas flowing from the through hole 75 once rises upward, flows into the space formed by the through hole cover 77 and the outer lower cup 33, and then is discharged from the upper end of the exhaust pipe 79 to be second Is discharged from the exhaust port 45.

With such a structure, each of the second exhaust ports 45 can be arranged on the outer peripheral side of the outer cup 21, so that a sufficient distance from the first exhaust port 43 can be secured. Therefore, it is possible to prevent the exhaust structures from becoming dense and complicated. Further, since the airflow rising toward the upper end of the exhaust pipe 79 through the through hole 75 of the outer surface cup 35 is exhausted, only the gas containing mist can be exhausted, and the developer for negative tone development and the rinse liquid can be discharged. It is possible to prevent mixing into the opening 73 of the second exhaust port 45.

Since the first exhaust port 43 and the second exhaust port 45 are arranged as described above, it is possible to evenly exhaust the gas containing the mist of the developer for the positive tone development and the rinse liquid from the inner cup 23. Thus, the gas containing the mist of the developing solution for the negative tone development and the rinse solution can be uniformly exhausted from the outer cup 21. Therefore, the atmosphere in the inner cup 23 and the atmosphere in the outer cup 21 can be made uniform without unevenness, so that the in-plane uniformity of the processing of the substrate W by the developer for the positive tone development and the rinse solution and the atmosphere for the negative tone development can be achieved. The in-plane uniformity of the processing of the substrate W with the developing solution and the rinsing solution can be improved.

An inner peripheral flow path 81 is formed on the inner peripheral side separated by the separation partition wall 37 of the bottom surface of the outer lower cup 33, and an outer peripheral flow path 83 is formed on the outer peripheral side separated by the separation partition wall 37. .. The above-mentioned first drainage port 39 is formed at two locations in the inner peripheral flow passage 81. Specifically, they are formed at positions facing each other with the axis P interposed therebetween in plan view. Further, the above-described second drainage port 41 is formed at two locations in the outer peripheral flow path 83. Specifically, the vertical line formed at the positions facing each other across the axis P in plan view and having a positional relationship with the two first drainage ports 39 is a vertical line passing through the axis P in FIG. It is formed so as to be line-symmetric with respect to the vertical line when drawn.

The inner peripheral flow passage 81 has an inner peripheral inclined surface 85 that gradually lowers from the inner peripheral side of the circle C1 toward the first drainage port 39 with reference to the circle C1 passing through the centers of the two first drainage ports 39. And an outer peripheral inclined surface 87 that gradually decreases from the outer peripheral side of the circle C1 toward the first drainage port 39.

The outer peripheral flow path 83 has an inner peripheral inclined surface that gradually lowers from the inner peripheral side of the circle C2 toward the second drainage port 41 with reference to the circle C2 passing through the centers of the two second drainage ports 41. 89 and an outer peripheral inclined surface 91 that gradually decreases from the outer peripheral side of the circle C2 toward the second drainage port 41.

As described above, since the bottom surface of the outer lower cup 33 is provided with the inner peripheral inclined surface 85 and the outer peripheral inclined surface 87, the efficiency of discharging the developer and the rinse liquid for the positive tone development to the first drainage port 39 is improved. Can be improved. Further, since the bottom surface of the outer lower cup 33 is an inclined surface composed of the inner peripheral inclined surface 85 and the outer peripheral inclined surface 87, the developer for positive tone development and the rinse liquid which have flowed down from above bounce on the bottom surface and are again upward. It is possible to prevent such an inconvenience that it adheres to the substrate W toward the side. Further, since the bottom surface has the inner peripheral inclined surface 89 and the outer peripheral inclined surface 91, it is possible to improve the efficiency of discharging the developing solution for negative tone development and the rinse solution to the second drainage port 41. Further, since the bottom surface of the outer lower cup 33 is an inclined surface composed of the inner peripheral inclined surface 89 and the outer peripheral inclined surface 91, the developer for negative tone development and the rinse liquid which have flowed down from above bounce off at the bottom surface and are again upward. It is possible to prevent such an inconvenience that it adheres to the substrate W toward the side.

Further, the inner peripheral flow passage 81 is formed as an inclined surface that becomes lower toward each of the first drainage ports 39 in the circumferential direction. That is, in the present embodiment, in the inner peripheral flow passage 81, the vicinity of the middle of the two first drainage ports 39 is formed high and the inclined surface is formed so as to decrease toward each of the first drainage ports 39. ing. Similarly, the outer peripheral flow path 83 also has an inclined surface that becomes lower toward each of the second drainage ports 41 in the circumferential direction.

By forming such an inclined surface, for positive tone development and negative tone development that have flowed to a position far from the first drainage port 39 and the second drainage port 41 formed on the bottom surface of the outer lower cup 33. The developing solution and the rinse solution can also be made to flow down to the first drain port 39 and the second drain port 41 by the inclined surface. Therefore, the recovery efficiency of the developer and rinse liquid for positive tone development and negative tone development can be improved.

The bottom surface of the outer lower cup 33 is preferably subjected to a hydrophilic treatment. Specifically, it is preferable that the upper surfaces of the inner peripheral flow path 81 and the outer peripheral flow path 83 described above are hydrophilized.

In this way, if the bottom surface of the outer lower cup 33 is subjected to the hydrophilic treatment, especially the inner peripheral flow path 81, even if the developer and rinse liquid for positive tone development flow down, the bottom surface of the outer lower cup 33 is affected. It can be made difficult to bounce. Therefore, it is possible to prevent the inconvenience that the developer and rinse liquid for positive tone development adheres to the substrate W again upward. Further, since the developer for positive tone development and the developer for negative tone development and the rinse liquid can enhance the fluidity in the circumferential direction on the bottom surface of the outer lower cup 33, the first drain port 39 and the second drain port 39 can be formed. The drainage port 41 facilitates collection.

In the substrate processing apparatus configured as described above, when the positive photoresist is deposited on the substrate W held by the substrate holding unit 3, the control unit 69 causes the development for positive tone development. Perform development processing with the solution and rinse solution. First, the control unit 69 causes the air cylinder 59 to extend. As a result, the inner cup 23 is raised and moved to the “collection position”, and the inlet A is opened. Then, the control unit 69 moves the nozzle 13 to the axis P and drives the electric motor 7 to increase the rotation speed up to the processing rotation speed, and the developer for positive tone development on the substrate W is predetermined. Supply only for time. At this time, the developer for positive tone development scattered from the substrate W is collected by the inner cup 23 and is collected through the first drainage port 39. Further, the gas in the inner cup 23 containing the mist of the developer for positive tone development flows down in the inner cup 23 and is discharged through the first exhaust port 43. Next, the control unit 69 moves the nozzle 14 in place of the nozzle 13 to the axis P and supplies the rinse liquid for positive tone development for a predetermined time. At this time, in the same manner as above, the inner cup 23 collects and discharges a gas containing the rinse liquid for positive tone development and its mist.

Next, when the negative type photoresist is applied to the substrate W held by the substrate holding unit 3, the control unit 69 performs the developing process using the developing solution for the negative tone developing and the rinse solution. .. First, the control unit 69 causes the air cylinder 59 to contract. As a result, the inner cup 23 is lowered and moved to the "retracted position", and the introduction port B is opened. Then, the control unit 69 moves the nozzle 15 to the axis P and drives the electric motor 7 to increase the rotation speed up to the processing rotation speed, so that the developing solution for negative tone development on the substrate W is predetermined. Supply only for time. At this time, the developer for negative tone development scattered from the substrate W is collected by the outer cup 21 and is collected via the second drainage port 41. Further, the gas in the outer cup 21 containing the mist of the developer for negative tone development flows down in the outer cup 21 and is discharged through the second exhaust port 45. Then, the control unit 69 moves the nozzle 16 in place of the nozzle 15 to the axis P and supplies the rinse liquid for negative tone development for a predetermined time. At this time, in the same manner as above, the outer cup 21 collects and discharges a gas containing the rinse liquid for negative tone development and its mist.

According to the apparatus of the present embodiment, the gas in the inner cup 23 and the gas in the outer cup 21 do not mix, so that the substrate W is processed with good quality both when using the inner cup 23 and when using the outer cup 21. It can be performed. Further, since the first exhaust ports 43 are arranged in the inner cup 23 in the same positional relationship in plan view, the gas containing the mist of the developer for the positive tone development and the rinse liquid is uniformly exhausted from the inner cup. be able to. Therefore, the atmosphere in the inner cup 23 can be made uniform evenly, and the in-plane uniformity of the processing of the substrate W with the developer for the positive tone development and the rinse liquid can be improved.

The present invention is not limited to the above embodiment, but can be modified as follows.

(1) In the above-described embodiment, the substrate processing apparatus that performs positive tone development processing and negative tone development processing has been described as an example, but the present invention is not limited to this. For example, the present invention can be applied to various apparatuses that perform processing on the substrate W using a processing liquid, such as cleaning processing and coating processing on the substrate W.

(2) In the above-described embodiment, the four first exhaust ports 43 and the four second exhaust ports 45 are provided, and they are arranged 90 degrees apart in a plan view, but the exhaust structure is complicated. If it is not changed, it is not necessary to dispose them in a staggered manner, and the four first exhaust ports 43 and the four second exhaust ports 45 may be disposed at substantially the same angle position.

(3) In the above-described embodiment, each of the first exhaust port 43 and the second exhaust port 45 is provided with four, but at least three of each may be provided, and they may be evenly arranged in a plan view. Further, according to the present invention, it is not necessary to dispose both the first exhaust port 43 and the second exhaust port 45 at an equal angle in a plan view, and only the first exhaust port 43 has an equal angle in a plan view. Alternatively, only the second exhaust port 45 may be arranged at an equal angle in plan view.

(4) In the above-described embodiment, the inner cup body 47 is composed of the guide portion 51 and the partition wall accommodating portion 53. The partition wall accommodating portion 53 is not necessarily provided as long as the main body 47 can be stably moved up and down.

(5) In the above-described embodiment, the first exhaust port 43 is composed of the hollow portion 71 and the opening 73. If the height is higher than the drainage port 39, the hollow portion 71 may not be provided.

1... Substrate processing apparatus W... Substrate 3... Substrate holding section 7... Electric motor 9... Rotation shaft P... Shaft center 11... Treatment liquid supply section 13 to 16... Nozzle 19... Cup 21... Outer cup 23... Inner cup A, B ... Inlet port 29 ... Inner cup 31 ... Outer cup body 33 ... Outer lower cup 35 ... Outer side cup 37 ... Separating partition wall 39 ... First drainage port 41 ... Second drainage port 43 ... First exhaust port 45 Second exhaust port 47 Inner cup body 39 Inner cup outlet 51 Guide portion 53 Partition wall storage portion 59 Air cylinder 61 Annular member 71 Hollow portion 73 Opening 81 Inner peripheral passage 83 Outer peripheral passage 85, 89... Inner peripheral inclined surface 87, 91... Outer peripheral inclined surface

Claims (8)

In a substrate processing apparatus for processing a substrate with a processing liquid,
A board holding portion for holding the board in a horizontal posture,
A rotation drive unit that rotates the substrate holding unit around a vertical axis,
A first processing liquid supply unit that supplies a first processing liquid to the substrate held by the substrate holding unit;
A second processing liquid supply unit that supplies a second processing liquid to the substrate held by the substrate holding unit;
An outer cup arranged so as to surround the side of the substrate holder,
An inner cup disposed between the substrate holder and the outer cup,
Equipped with
The inner cup is
An inner cup body that is annular in plan view,
An inner cup discharge port that is formed in a lower portion of the inner cup body and discharges the first processing liquid and gas in the inner cup body downward;
Equipped with
The outer cup is
An outer cup body that is annular in plan view,
An outer lower cup that constitutes the bottom of the outer cup body,
A first drainage port formed on the bottom surface of the outer lower cup for discharging the first processing liquid discharged from the inner cup discharge port;
A first exhaust port formed in the outer lower cup and configured to exhaust the gas exhausted from the inner cup exhaust port;
A second drain port formed on the bottom surface of the outer lower cup for discharging the second processing liquid in the outer cup body;
A second exhaust port formed in the outer lower cup for discharging gas in the outer cup body;
A partition wall that is erected in a ring shape in plan view on the bottom surface of the outer lower cup and that separates the first drainage port and the second drainage port;
Equipped with
The first exhaust port is arranged at a plurality of locations that are in an equiangular positional relationship from the center in plan view,
The inner cup body is moved between a collecting position where the inner cup collects the processing liquid and a retreat position where the outer cup collects the processing liquid ,
The outer cup body includes an outer surface cup forming a side surface of the outer lower cup body,
Each of the second exhaust ports is disposed on an outer peripheral portion of the outer cup body,
The outer surface cup has a through hole formed at a position corresponding to each of the second exhaust ports,
The substrate processing apparatus , wherein each of the second exhaust ports includes an exhaust pipe having an upper end located above an upper portion of the through port . In a substrate processing apparatus for processing a substrate with a processing liquid,
A board holding portion for holding the board in a horizontal posture,
A rotation drive unit that rotates the substrate holding unit around a vertical axis,
A first processing liquid supply unit that supplies a first processing liquid to the substrate held by the substrate holding unit;
A second processing liquid supply unit that supplies a second processing liquid to the substrate held by the substrate holding unit;
An outer cup arranged so as to surround the side of the substrate holder,
An inner cup disposed between the substrate holder and the outer cup,
Equipped with
The inner cup is
An inner cup body that is annular in plan view,
An inner cup discharge port that is formed in a lower portion of the inner cup body and discharges the first processing liquid and gas in the inner cup body downward;
Equipped with
The outer cup is
An outer cup body that is annular in plan view,
An outer lower cup that constitutes the bottom of the outer cup body,
A first drainage port formed on the bottom surface of the outer lower cup for discharging the first processing liquid discharged from the inner cup discharge port;
A first exhaust port formed in the outer lower cup and configured to exhaust the gas exhausted from the inner cup exhaust port;
A second drain port formed on the bottom surface of the outer lower cup for discharging the second processing liquid in the outer cup body;
A second exhaust port formed in the outer lower cup for discharging gas in the outer cup body;
A partition wall that is erected in a ring shape in plan view on the bottom surface of the outer lower cup and that separates the first drainage port and the second drainage port;
Equipped with
The second exhaust ports are arranged at a plurality of positions having an equal angular relationship with each other from the center in plan view,
The inner cup body is moved between a collecting position where the inner cup collects the processing liquid and a retreat position where the outer cup collects the processing liquid ,
The outer cup body includes an outer surface cup forming a side surface of the outer lower cup body,
Each of the second exhaust ports is disposed on an outer peripheral portion of the outer cup body,
The outer surface cup has a through hole formed at a position corresponding to each of the second exhaust ports,
The substrate processing apparatus according to claim 1, wherein each of the second exhaust ports includes an exhaust pipe having an upper end located above an upper portion of the through port . In a substrate processing apparatus for processing a substrate with a processing liquid,
A board holding portion for holding the board in a horizontal posture,
A rotation drive unit that rotates the substrate holding unit around a vertical axis,
A first processing liquid supply unit that supplies a first processing liquid to the substrate held by the substrate holding unit;
A second processing liquid supply unit that supplies a second processing liquid to the substrate held by the substrate holding unit;
An outer cup arranged so as to surround the side of the substrate holder,
An inner cup disposed between the substrate holder and the outer cup,
Equipped with
The inner cup is
An inner cup body that is annular in plan view,
An inner cup discharge port that is formed in a lower portion of the inner cup body and discharges the first processing liquid and gas in the inner cup body downward;
Equipped with
The outer cup is
An outer cup body that is annular in plan view,
An outer lower cup that constitutes the bottom of the outer cup body,
A first drainage port formed on the bottom surface of the outer lower cup for discharging the first processing liquid discharged from the inner cup discharge port;
A first exhaust port formed in the outer lower cup and configured to exhaust the gas exhausted from the inner cup exhaust port;
A second drain port formed on the bottom surface of the outer lower cup for discharging the second processing liquid in the outer cup body;
A second exhaust port formed in the outer lower cup for discharging gas in the outer cup body;
A partition wall that is erected in a ring shape in plan view on the bottom surface of the outer lower cup and that separates the first drainage port and the second drainage port;
Equipped with
The first exhaust ports are arranged at a plurality of positions that are in an equiangular positional relationship from the center in a plan view, and the second exhaust ports are in an equiangular positional relationship from the center in a planar view. Will be placed in multiple locations,
The inner cup body is moved between a collecting position where the inner cup collects the processing liquid and a retreat position where the outer cup collects the processing liquid ,
The outer cup body includes an outer surface cup forming a side surface of the outer lower cup body,
Each of the second exhaust ports is disposed on an outer peripheral portion of the outer cup body,
The outer surface cup has a through hole formed at a position corresponding to each of the second exhaust ports,
The substrate processing apparatus , wherein each of the second exhaust ports includes an exhaust pipe having an upper end located above an upper portion of the through port . The substrate processing apparatus according to claim 3,
The substrate processing apparatus, wherein each of the first exhaust ports is arranged so that a positional relationship of each of the second exhaust ports is shifted by 90 degrees in a plan view. The substrate processing apparatus according to any one of claims 1 to 4 ,
The substrate processing apparatus, wherein the first exhaust port has an opening formed at a tip of a hollow portion extending upward from a bottom surface of the outer lower cup. The substrate processing apparatus according to any one of claims 1 to 5 ,
The inner cup body includes a guide portion that guides the first processing liquid scattered around the substrate downward, and a partition wall storage portion that is formed in an inverted U shape below the guide portion.
Equipped with
The substrate processing apparatus, wherein the inner cup body stores the separation partition in the partition storage section at the retracted position, and stores only the upper part of the separation partition in the partition storage section at the recovery position. The substrate processing apparatus according to any one of claims 1 to 6 ,
The outer cup body includes a middle cup on the inner peripheral side of the separation partition.
A lower surface of the middle cup is formed apart from the opening of the first exhaust port, an outer peripheral surface thereof is separated from an inner peripheral surface of the separation partition wall, and an outer peripheral end thereof is separated from a bottom surface of the outer cup body. A substrate processing apparatus characterized by the above. The substrate processing apparatus according to any one of claims 1 to 7 ,
The substrate processing apparatus according to claim 1, wherein the outer lower cup has a bottom surface with an inclined surface that decreases toward the first drainage port and the second drainage port in the circumferential direction.

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