JP6799409B2 - Board processing equipment - Google Patents

Description

The present invention relates to semiconductor wafers, liquid crystal display substrates, plasma display substrates, organic EL substrates, FED (Field Emission Display) substrates, optical display substrates, magnetic disk substrates, optical magnetic disk substrates, and photomasks. The present invention relates to a substrate processing apparatus that supplies a processing liquid to a substrate and a substrate for a solar cell (hereinafter, simply referred to as a substrate), and particularly relates to a cup technique for recovering the processing liquid.

Conventionally, as this kind of device, a substrate holding portion, a rotation drive mechanism, a first nozzle, a second nozzle, a cup body, a first drainage pipe, and a second drainage pipe are used. And, there is a substrate processing apparatus provided with an exhaust pipe line and a movable cup (see, for example, Patent Document 1).

The board holding portion holds the board in a horizontal position. The rotation drive mechanism rotationally drives the substrate holding portion around the vertical axis. The first nozzle supplies a developer for positive tone development. The second nozzle supplies a developer for negative tone development. The cup body surrounds the substrate held by the substrate holding portion and collects the developer supplied to the substrate. The first drainage pipe and the second drainage pipe are connected to the cup body in communication with each other. By moving up and down inside the cup body, the movable cup guides the developer only to either the first drainage pipe line or the second drainage pipe line.

When the first nozzle supplies the developer, for example, the movable cup guides the developer to the first drainage line, and when the second nozzle supplies the developer, the movable cup is the developer. To the second drainage pipeline. The first drainage line drains the developer for positive tone development, and the second drainage line drains the developer for negative tone development. At this time, the exhaust pipe line discharges the gas in the cup containing the mist of the developing solution. This makes it possible to prevent the developer for positive tone development and the developer for negative tone development from being mixed in the first drainage pipe and the second drainage pipe. When the first nozzle and the second nozzle supply the developer, the exhaust pipe discharges the gas in the cup containing the mist of the developer.

Japanese Unexamined Patent Publication No. 2014-75575

However, in the case of the conventional example having such a configuration, there are the following problems.
That is, since the conventional device is composed of one exhaust pipe line, the mist of the developer in the cup during both the positive tone development process and the negative tone development process is discharged from the same exhaust line. Will be done. Therefore, there is a risk that different types of developer mists will be mixed in one exhaust line. As a result, it becomes difficult to keep the atmosphere in the cup clean, and it becomes difficult to perform high-quality processing on the substrate.

The present invention has been made in view of such circumstances, and an object of the present invention is to provide a substrate processing apparatus capable of performing processing on a substrate with good quality.

The present invention has the following configuration in order to achieve such an object.
That is, the invention according to claim 1 is a substrate processing apparatus for processing a substrate with a processing liquid, which comprises a substrate holding portion that holds the substrate in a horizontal posture and a rotation driving portion that rotates the substrate holding portion around a vertical axis. A first processing liquid supply unit that supplies the first processing liquid to the substrate held by the substrate processing unit, and a second processing that supplies the second processing liquid to the substrate held by the substrate processing unit. A liquid supply unit, an outer cup arranged so as to surround the side of the substrate holding portion, and an inner cup arranged between the substrate holding portion and the outer cup are provided, and the inner cup is flat. The outer cup is provided with an inner cup body that is visually annular, and an inner cup discharge port that is formed in the lower part of the inner cup body and discharges a first treatment liquid and a gas in the inner cup body downward. Is formed on the outer cup body which is annular in a plan view, the outer lower cup which constitutes the bottom of the outer cup body, and the bottom surface of the outer lower cup, and is discharged from the inner cup discharge port. A first drainage port for discharging the treatment liquid, a first drainage port formed in the outer lower cup for discharging the gas discharged from the inner cup discharge port, and the outer lower cup. A second drainage port formed on the bottom surface for discharging the second treatment liquid in the outer cup body, and a second drainage port formed in the outer lower cup for discharging the gas in the outer cup body. It is provided with an exhaust port and a separation partition wall which is erected in a ring shape on the bottom surface of the outer lower cup in a plan view and separates the first drainage port and the second drainage port in a plan view. An annular member slidably attached to the outer peripheral surface of the outer cup body and connected to the inner peripheral side of the inner cup body so as not to block the inner cup discharge port, and the annular member is raised and lowered. The inner cup main body is provided with a collection position for collecting the processing liquid and a driving unit for moving the inner cup main body over a collection position where the outer cup collects the processing liquid. Is.

[Action / Effect] According to the first aspect of the present invention, the substrate holding portion is rotated together with the substrate by the rotation driving portion in a state where the annular member is moved by the driving portion and the inner cup main body is positioned at the collection position. , The first processing liquid is supplied to the substrate from the first processing liquid supply unit. In this state, the first processing liquid scattered around the substrate is collected by the inner cup main body of the inner cup, and is collected by the bottom surface of the outer cup through the inner cup discharge port. The first treatment liquid collected on the bottom surface formed on the outer cup body of the outer cup is discharged through the first drainage port separated from the second drainage port by the separation partition wall on the bottom surface. Will be done. The gas in the inner cup containing the mist of the first treatment liquid is collected from the inner cup body through the inner cup discharge port in the outer cup, and is discharged through the first discharge port of the outer lower cup. Further, the second processing liquid is supplied to the substrate from the second processing liquid supply unit in a state where the annular member is moved by the drive unit and the inner cup main body is moved to the retracted position. In this state, the second processing liquid scattered around the substrate is collected by the outer cup main body of the outer cup and collected by the bottom surface of the outer lower cup. The second treatment liquid collected on the bottom surface of the outer cup body is discharged through the second drainage port separated from the first drainage port by the separation partition wall on the bottom surface. The gas in the outer cup containing the mist of the second treatment liquid is collected by the outer cup and discharged through the second exhaust port of the outer lower cup. By moving the annular member up and down in the drive unit to move the inner cup to the collection position and the retracted position, the first treatment liquid is discharged at the first drain port and contains the mist of the first treatment liquid. The gas is discharged at the first exhaust port, the second treatment liquid is discharged at the second drain port, and the gas containing the mist of the second treatment liquid is discharged at the second exhaust port. To. Therefore, since the gas in the inner cup and the gas in the outer cup are not mixed, the substrate can be treated with good quality both when the inner cup is used and when the outer cup is used. Further, since the inner cup body does not have a bottom surface, the weight of the inner cup can be reduced. Therefore, the load when the inner cup main body is moved by the drive unit via the annular member can be reduced, and the inner cup main body can be moved quickly. Further, since the first treatment liquid is also collected on the bottom surface of the outer and lower cups separated downward, it is possible to prevent an adverse effect due to the rebound of the first treatment liquid.

Further, in the present invention, it is preferable that the annular member is provided with connecting portions with the inner cup main body at a plurality of locations having a positional relationship equal to each other from the center in a plan view (claim 2).

The annular member is connected to the inner cup body at a plurality of connecting portions having the same positional relationship in a plan view. Therefore, even if the annular member is quickly moved up and down by the drive unit, the inner cup body can be moved in a stable posture, so that the processing can be switched quickly.

Further, in the present invention, the inner cup main body includes a guide portion that guides the first treatment liquid scattered from the substrate to the surroundings downward, and a partition wall storage portion formed in an inverted U shape under the guide portion. The inner cup main body preferably stores the separation partition wall in the partition wall storage portion at the retracted position, and stores only the upper portion of the separation partition wall in the partition wall storage portion at the collection position (claim). 3).

In the retracted position, the partition wall storage part of the inner cup body stores the separation partition wall, and in the collection position, the partition wall storage part of the inner cup body stores only the upper part of the separation partition wall, so the outer lower cup is shared by the inner cup and the outer cup. Even so, the inside of the inner cup body and the inside of the outer lower cup can be completely separated. Therefore, the second treatment liquid and the gas containing the mist can be recovered only in the outer cup, and the first treatment liquid and the gas containing the mist can be recovered only in the inner cup while being guided by the guide portion. Further, since the partition wall storage portion and the separation partition wall serve as guides, the inner cup body can be raised and lowered stably.

Further, in the present invention, it is preferable that the first exhaust port has an opening formed at the tip of a hollow portion extending upward from the bottom surface of the outer lower cup (claim 4).

Since the opening of the first exhaust port is separated upward from the bottom surface of the outer lower cup, it is possible to prevent the first treatment liquid collected on the bottom surface from mixing with the gas.

Further, in the present invention, the outer cup main body is provided with an inner cup on the inner peripheral side of the separation partition wall, and the lower surface of the inner cup is formed so as to be separated from the opening of the first exhaust port, and the outer peripheral surface thereof. Is separated from the inner peripheral surface of the separation partition wall, and the outer peripheral end is preferably separated from the bottom surface of the outer cup body (claim 5).

Since the middle cup can prevent the first treatment liquid from flowing into the first exhaust port, the gas-liquid separation degree can be increased and the gas in the inner cup can be discharged.

Further, in the present invention, it is preferable that the outer and lower cups are formed on the bottom surface with an inclined surface that becomes lower toward the first drainage port and the second drainage port in the circumferential direction. Claim 6).

The first drainage port formed on the bottom surface of the outer lower cup and the first treatment liquid and the second treatment liquid that have flowed down to a position far from the second drainage port also have the first drainage port and the second drainage port due to the inclined surface. It can flow down to the second drainage port. Therefore, the recovery efficiency of the first treatment liquid and the second treatment liquid can be improved.

According to the substrate processing apparatus according to the present invention, the gas in the inner cup and the gas in the outer cup are not mixed, so that the substrate can be processed with good quality regardless of whether the inner cup is used or the outer cup is used. It can be carried out. Further, since the inner cup body does not have a bottom surface, the weight of the inner cup can be reduced. Therefore, the load when the inner cup main body is moved by the drive unit via the annular member can be reduced, and the inner cup main body can be moved quickly. Further, since the first treatment liquid is also collected on the bottom surface of the outer and lower cups separated downward, it is possible to prevent an adverse effect due to the rebound of the first treatment liquid.

It is an overall block diagram which shows the schematic structure of the substrate processing apparatus which concerns on embodiment, and is the vertical sectional view which shows the state which the inner cup is in a collection position. It is an overall block diagram which shows the schematic structure of the substrate processing apparatus which concerns on embodiment, and is the vertical sectional view which shows the state which the inner cup is in a retracted position. It is a vertical cross-sectional view which showed the state which the inner cup is in a collection position by partially enlarging. It is a vertical cross-sectional view which showed the state which the inner cup is in a retracted position by partially enlarging. It is a top view of the annular member. It is a perspective view of the outer lower cup with the outer cup main body and the inner cup main body removed. It is a top view which shows the positional relationship of each exhaust port. It is a side view of the exhaust port. It is a top view which shows the arrangement position of each exhaust port and each drain port.

Hereinafter, an embodiment of the present invention will be described with reference to the drawings.

FIG. 1 is an overall configuration diagram showing a schematic configuration of the substrate processing apparatus according to the embodiment, FIG. 1 is a vertical cross-sectional view showing a state in which the inner cup is in the collection position, and FIG. 2 is a vertical sectional view of the substrate processing apparatus according to the embodiment. It is an overall configuration view which shows the schematic structure, and is the vertical sectional view which shows the state which the inner cup is in a retracted position. Further, FIG. 3 is a vertical cross-sectional view showing a state in which the inner cup is in the collection position in a partially enlarged manner, and FIG. 4 is a vertical cross-sectional view showing a state in which the inner cup is in the retracted position in a partially enlarged manner. It is a figure.

The substrate processing apparatus 1 according to the present embodiment supplies a processing liquid to one substrate W (for example, a semiconductor wafer having a circular shape in a plan view), and sequentially processes the substrates W one by one. is there. Specifically, this substrate processing apparatus can perform both negative tone phenomenon processing and positive tone development processing on the substrate W.

The substrate holding portion 3 holds the substrate W in a horizontal posture. The substrate holding portion 3 sucks and holds the central portion of the lower surface of the substrate W by vacuum suction, for example. The substrate W may be held by a mechanism different from that of the suction holding type.

The rotation drive unit 5 includes an electric motor 7 and a rotation shaft 9. In the electric motor 7, the lower end of the rotating shaft 9 is connected, and the upper end of the rotating shaft 9 is connected to the lower end of the substrate holding portion 3. Therefore, when the electric motor 7 is driven, the rotating shaft 9 is rotationally driven around the axis P, and the substrate W is rotationally driven in the horizontal plane.

The treatment liquid supply unit 11 supplies various treatment liquids, and includes, for example, four supply nozzles 13 to 16. For example, the nozzle 13 supplies a developer for positive tone development as a treatment liquid, and the nozzle 14 supplies a rinse liquid for positive tone development as a treatment liquid. Further, the nozzle 15 supplies a developer for negative tone development as a treatment liquid, and the nozzle 16 supplies a rinse liquid for negative tone development as a treatment liquid.

The developer for positive tone development is an alkaline developer, for example, Tetra Methyl Ammonium Hydroxide (TMAH). The rinsing solution for positive tone development is, for example, pure water. The developer for negative tone development is, for example, a developer containing an organic solvent such as butyl acetate. The rinse solution for negative tone development contains, for example, an organic solvent such as 4-methyl-2-pentanol (MIBC: Methyl Iso Butyl Carbinol).

The above-mentioned developer and rinse solution for positive tone development correspond to the "first treatment solution" in the present invention, and the above-mentioned developer and rinse solution for negative tone development correspond to the "second treatment solution" in the present invention. Corresponds to.

A spraying disk 17 is provided below the substrate holding portion 3. The spray disc 17 is attached to the substrate holding portion 3 so as to rotate integrally with the substrate holding portion 3. The spraying disc 17 supplies a cleaning liquid from a cleaning liquid supply unit (not shown) to a cup 19 described later to clean the inner surface of the cup 19. A detailed description of the spray disc 17 will be omitted.

The cup 19 is arranged so as to surround the side of the substrate holding portion 3, and collects the processing liquid supplied to the substrate W. The cup 19 includes an outer cup 21 and an inner cup 23. The inner cup 23 is arranged between the substrate holding portion 3 and the outer cup 21. As shown in FIGS. 1 and 3, the inner cup 23 is provided with an introduction port A for collecting the treatment liquid on the inner peripheral side (rotation shaft 9 side), and the outer cup 21 is as shown in FIGS. 2 and 4. An introduction port B for collecting the treatment liquid is provided on the inner peripheral side.

The base portion 25 of the cup 19 is arranged on the outer peripheral side of the rotating shaft 9. A side plate 27 is attached to the outer peripheral portion of the base portion 25 on the outer peripheral side of the base portion 25 and near the lower side of the outer peripheral edge of the substrate W held by the substrate holding portion 3. A substrate transport mechanism in which the substrate holding portion 3 protrudes above the upper end of the cup 19 by moving the cup 19 and the base portion 25 up and down with respect to the substrate holding portion 3 by an elevating mechanism (not shown). It is possible to switch between a state in which delivery is possible with (not shown) and a state in which the processing shown in FIGS. 1 and 2 is possible.

The outer cup 21 is arranged at the farthest position of the side plate 27, the inner cup 23 is arranged inside the outer cup 21, and the middle cup 29 is arranged inside the inner cup 23.

The outer cup 21 includes an outer cup main body 31, an outer lower cup 33, and an outer surface cup 35. The outer cup body 31 exhibits an annular shape in a plan view. The outer lower cup 33 constitutes the bottom of the outer cup main body 31.

A separation partition wall 37 is erected on the bottom surface of the outer lower cup 33. The separation partition wall 37 has an annular shape in a plan view, and separates the bottom surface of the outer lower cup 33 into two on the inner peripheral side and the outer peripheral side. A first drainage port 39 is formed on the bottom surface on the inner peripheral side, and a second drainage port 41 is formed on the bottom surface on the outer peripheral side. The first waste liquid treatment is communicated with the first drain port 39, and the second waste liquid treatment is communicated with the second drain port 41. A first exhaust port 43 is formed on the inner peripheral side of the outer lower cup 33, and a second exhaust port 45 is formed on the outer peripheral side of the outer surface cup 35 of the outer lower cup 33. The first exhaust treatment is communicated to the first exhaust port 43, and the second exhaust treatment is communicated to the second exhaust port 45.

The inner cup main body 47 is arranged above the outer lower cup 33 and inside the outer cup main body 31. The inner cup body 47 exhibits an annular shape in a plan view. The inner cup main body 47 does not have a bottom portion, and the bottom portion constitutes an inner cup discharge port 49 for discharging a treatment liquid or a gas downward. The inner cup main body 47 includes a guide portion 51 and a partition wall storage portion 53. The guide portion 51 guides the developer and rinse liquid for positive tone development scattered from the substrate W to the surroundings to the lower inner cup discharge port 49. The partition wall storage portion 53 is formed below the guide portion 51 and has an inverted U-shape in vertical cross section. The partition wall storage portion 53 stores the separation partition wall 37, and stores the separation partition wall 37 or only the upper portion of the separation partition wall 37 according to the operation described later.

The middle cup 29 is arranged so that the outer peripheral side thereof is located on the inner peripheral side of the separation partition wall 37. The lower surface of the middle cup 29 is formed so as to be separated from the opening of the first exhaust port 43, the outer peripheral surface is separated inward from the inner peripheral surface of the separation partition wall 37, and the outer peripheral end is separated from the bottom surface of the outer lower cup 33. doing. Further, the middle cup 29 is hydrophilized, and the developing solution and the rinsing solution for positive tone development scattered from the substrate W to the surroundings are smoothly guided to the bottom surface of the outer lower cup 33 by the guide portion 51. Can be done. It is preferable that the hydrophilic treatment is performed by roughening the surface by sandblasting instead of applying a chemical or the like.

The hydrophilization treatment of the middle cup 29 makes it difficult for the developing solution and the rinsing solution for positive tone development to bounce off the middle cup 29. Therefore, it is possible to prevent the inconvenience that the developing solution and the rinsing solution for positive tone development bounce off the middle cup 29 and adhere to the substrate W. Further, since the fluidity of the developer and rinse solution for positive tone development adhering to the middle cup 29 can be increased, it can be easily collected at the first drain port 39.

It is preferable that the inner cup body 47 is also hydrophilized. As a result, when the developer and rinse solution for negative tone development are being collected by the outer cup 21, the developer and rinse solution for negative tone development adhering to the upper surface of the inner cup body 47 are transferred to the outer cup 33. It can be easily flowed down and can be easily collected at the second drainage port 41.

The side plate 27 penetrates from the inner peripheral side to the outer peripheral side at a partial position (left side in FIGS. 1 to 4), and a notch portion 55 formed long in the height direction is formed. A link member 57 and an air cylinder 59 are arranged on the inner peripheral side of the cutout portion 55. The air cylinder 59 is attached to the base portion 25 in a posture in which the operating piece faces in the vertical direction, and the tip thereof is connected to the bottom portion of the link member 57. An annular member 61 is arranged on the outer peripheral surface of the side plate 27.

The air cylinder 59 corresponds to the "driving unit" in the present invention.

Here, reference is made to FIG. Note that FIG. 5 is a plan view of the annular member.

The annular member 61 has an annular shape in a plan view, and is slidably attached to the outer peripheral surface of the side plate 27 corresponding to the outer peripheral surface in the outer cup main body 31. In the annular member 61, connecting portions 63 are extended to the outer peripheral side at three positions on the outer circumference at an angle equal to each other from the center in a plan view. Each connecting portion 63 is locked to a protruding portion 65 formed on the inner peripheral surface of the inner cup main body 47. Each connecting portion 63 is connected to the protruding portion 65 through the vertical opening 67 formed in the middle cup 29. Therefore, the middle cup 29 and the connecting portion 63 do not interfere with each other.

In this way, the annular member 61 is connected to the inner cup main body 47 by three connecting portions 63 having the same positional relationship in a plan view. Therefore, even if the annular member 61 is quickly moved up and down, the inner cup main body 47 can be moved in a stable posture, so that the processing can be switched quickly.

The upper portion of the link member 57 extends upward from the cutout portion 55 of the side plate 27, and is connected to one part of the inner peripheral surface of the annular member 61. As a result, when the air cylinder 59 is operated to raise and lower the operating piece, the inner cup body 47 moves up and down together with the annular member 61 inside the outer cup 21. Specifically, when the operating piece of the air cylinder 59 is advanced, the inner cup body 47 rises to the "recovery position", and when the operating piece of the air cylinder 59 is contracted, the inner cup body 47 moves to the "evacuation position". Descend. The collection position is the position where the developer and rinse solution for positive tone development are collected from the introduction port A of the inner cup 23, and the retracted position is the position where the developer and rinse solution for negative tone development are collected from the introduction port B of the outer cup 21. This is the position to collect the liquid.

In the retracted position, the partition wall storage portion 53 of the inner cup body 47 stores the separation partition wall 37, and in the collection position, the partition wall storage portion 53 of the inner cup body 47 stores only the upper part of the separation partition wall 37. The inside of the inner cup main body 47 and the inside of the outer lower cup 33 can be completely separated even if the inner cup 23 and the outer cup 21 share the above. Therefore, at the retracted position, the developer and rinse solution for negative tone development and the gas containing the mist are collected only in the outer cup 21, and at the recovery position, the developer and rinse solution for positive tone development and the gas containing the mist are collected. It can be collected only by the inner cup 23 while being guided by the guide unit 51. Further, since the partition wall storage portion 53 and the separation partition wall 37 serve as guides, the inner cup main body 47 can be stably moved up and down.

The electric motor 7, the processing liquid supply unit 11, and the air cylinder 59 described above are controlled by the control unit 69. The control unit 69 includes a CPU, a memory, and the like, and operates each of the above units according to a recipe that defines a processing procedure for the substrate W.

Here, reference is made to FIGS. 6 to 9. Note that FIG. 6 is a perspective view of the outer cup body and the outer cup body with the inner cup body removed, FIG. 7 is a plan view showing the positional relationship of each exhaust port, and FIG. 8 is an exhaust. It is a side view of the mouth, and FIG. 9 is a plan view which shows the arrangement position of each exhaust port and each drain port.

The first exhaust port 43 described above is formed at four locations, for example, as shown in FIGS. 7 and 9. Each of the first exhaust ports 43 is arranged so as to have an equiangular positional relationship with each other from the center in a plan view. In this embodiment, since there are four, the positional relationship is 90 degrees with each other. The first exhaust port 43 includes a hollow portion 71 extending upward from the bottom surface of the outer lower cup 33, and an opening 73 formed in the upper portion of the hollow portion 71. The height of the first exhaust port 43 is set so as not to abut on the lower surface of the middle cup 29, and the opening 73 is formed in a direction opposite to the rotation direction of the substrate holding portion 3. Since the middle cup 29 is arranged so as to cover the upper part of the opening 73 and can prevent the developer and the rinse liquid for positive tone development from flowing into the first exhaust port 43, the degree of gas-liquid separation is increased. The gas in the inner cup 23 can be discharged.

Since the opening 73 of the first exhaust port 43 is formed in the direction opposite to the direction of the air flow generated by the rotation, the developing solution and the rinsing solution for positive tone development get on the air flow and enter the first exhaust port 43. It can be prevented from flowing in. Therefore, the degree of gas-liquid separation can be improved. Further, since the opening 73 of the first exhaust port 43 is separated upward from the bottom surface of the outer lower cup 33, the developing solution and the rinsing solution for positive tone development collected on the bottom surface of the outer lower cup 33 are gas. It is possible to prevent mixing.

The second exhaust port 45 described above is formed at four locations, for example, as shown in FIGS. 6 and 7. Each of the second exhaust ports 45 is arranged so that each of the second exhaust ports 45 has a positional relationship of equal angles with each other from the center in a plan view. In this embodiment, since there are four pieces, they are arranged so as to have a positional relationship of 90 ° with each other. Further, the positional relationship between the four second exhaust ports 45 and the four first exhaust ports 43 is shifted by 90 degrees from each other in a plan view.

With the arrangement shifted by 90 degrees in this way, even if the four first exhaust ports 43 and the four second exhaust ports 45 are arranged, the respective exhaust ports can be arranged sufficiently separated from each other. The structure related to the exhaust port can be prevented from becoming complicated.

Each of the above-described second exhaust ports 45 is arranged at the four corners of the outer lower cup 33 extending laterally from the outer peripheral surface of the outer cup 19 having a circular shape in a plan view. In other words, each of the second exhaust ports 45 is arranged on the outer peripheral portion of the outer cup main body 31. The outer side cup 35 is formed with a through port 75 only at a position corresponding to each second exhaust port 45. The through-hole 75 is covered with a through-hole cover 77. An exhaust pipe 79 is attached to the outer lower cup 33 so that the upper end opens in the space formed by the outer surface cup 35, the through-hole cover 77, and the outer lower cup 33. Further, the exhaust pipe 79 is arranged so that the upper end thereof is located above the upper portion of the through port 75. That is, the gas flowing in from the through port 75 once rises upward, flows into the space formed by the through port cover 77 and the outer lower cup 33, and then is discharged from the upper end of the exhaust pipe 79 to be the second. It is discharged from the exhaust port 45 of.

With such a structure, each of the second exhaust ports 45 can be arranged on the outer peripheral side of the outer cup 21, so that a sufficient distance from the first exhaust port 43 can be obtained. Therefore, it is possible to prevent the exhaust structure from becoming dense and complicated. Further, since the airflow rising toward the upper end of the exhaust pipe 79 is exhausted through the through port 75 of the outer surface cup 35, only the gas containing mist can be exhausted, and the developer and rinse liquid for negative tone development can be exhausted. It is possible to prevent the mixture from being mixed in the opening 73 of the second exhaust port 45.

Since the first exhaust port 43 and the second exhaust port 45 are arranged as described above, the gas containing the developer for positive tone development and the mist of the rinse liquid can be evenly exhausted from the inner cup 23. It is possible to evenly exhaust the gas containing the developer for negative tone development and the mist of the rinse liquid from the outer cup 21. Therefore, the atmosphere inside the inner cup 23 and the inside of the outer cup 21 can be evenly equalized, so that the in-plane uniformity of the treatment of the substrate W with the developer for positive tone development and the rinse solution and for negative tone development can be achieved. The in-plane uniformity of the treatment of the substrate W with the developing solution and the rinsing solution can be improved.

Of the bottom surface of the outer lower cup 33, an inner peripheral flow path 81 is formed on the inner peripheral side separated by the separation partition wall 37, and an outer peripheral flow path 83 is formed on the outer peripheral side separated by the separation partition wall 37. .. The first drainage port 39 described above is formed at two locations in the inner peripheral flow path 81. Specifically, they are formed at positions facing each other with the axial center P in between in a plan view. Further, the above-mentioned second drainage port 41 is formed at two locations in the outer peripheral flow path 83. Specifically, it is formed at positions facing each other across the axial center P in a plan view, and the positional relationship with the two first drainage ports 39 is a vertical line passing through the axial center P in FIG. It is formed so that it is line-symmetrical with respect to the vertical line when drawn.

The inner peripheral flow path 81 has an inner peripheral inclined surface 85 that gradually becomes lower from the inner peripheral side of the circle C1 toward the first drainage port 39 with reference to the circle C1 passing through the center of the two first drainage ports 39. And an outer peripheral inclined surface 87 that gradually becomes lower from the outer peripheral side of the circle C1 toward the first drainage port 39.

The outer peripheral flow path 83 is an inner peripheral inclined surface that gradually becomes lower from the inner peripheral side of the circle C2 toward the second drainage port 41 with reference to the circle C2 passing through the center of the two second drainage ports 41. It includes 89 and an outer peripheral inclined surface 91 that gradually becomes lower from the outer peripheral side of the circle C2 toward the second drainage port 41.

As described above, since the bottom surface of the outer lower cup 33 is provided with the inner peripheral inclined surface 85 and the outer peripheral inclined surface 87, the efficiency of discharging the developing solution and the rinsing solution for positive tone development to the first drain port 39 can be achieved. Can be improved. Further, since the bottom surface of the outer lower cup 33 is an inclined surface composed of the inner peripheral inclined surface 85 and the outer peripheral inclined surface 87, the developing solution and the rinsing solution for positive tone development flowing down from above bounce off on the bottom surface and again upward. It is possible to prevent the inconvenience of adhering to the substrate W toward the substrate W. Further, since the bottom surface is provided with the inner peripheral inclined surface 89 and the outer peripheral inclined surface 91, the efficiency of discharging the developing solution and the rinsing solution for negative tone development to the second drain port 41 can be improved. Further, since the bottom surface of the outer lower cup 33 is an inclined surface composed of the inner peripheral inclined surface 89 and the outer peripheral inclined surface 91, the developing solution and the rinsing solution for negative tone development flowing down from above bounce off on the bottom surface and again upward. It is possible to prevent the inconvenience of adhering to the substrate W toward the substrate W.

Further, the inner peripheral flow path 81 is an inclined surface that becomes lower toward each of the first drainage ports 39 in the circumferential direction. That is, in this embodiment, in the inner peripheral flow path 81, an inclined surface is formed so as to be high near the middle of the two first drainage ports 39 and lower toward each of the first drainage ports 39. ing. Similarly, the outer peripheral flow path 83 is also an inclined surface that becomes lower toward each of the second drainage ports 41 in the circumferential direction.

By forming such an inclined surface, for positive tone development and negative tone development that flowed down to a position far from the first drain port 39 and the second drain port 41 formed on the bottom surface of the outer lower cup 33. The developing solution and the rinsing solution for use can also flow down to the first drain port 39 and the second drain port 41 by the inclined surface. Therefore, the recovery efficiency of the developer and rinse solution for positive tone development and negative tone development can be improved.

It is preferable that the bottom surface of the outer lower cup 33 is hydrophilized. Specifically, it is preferable that the upper surfaces of the inner peripheral flow path 81 and the outer peripheral flow path 83 described above are hydrophilized.

When the bottom surface of the outer lower cup 33 is hydrophilized, particularly the inner peripheral flow path 81 is hydrophilized, even if the developing solution and the rinsing solution for positive tone development flow down, the bottom surface of the outer lower cup 33 It can be hard to bounce. Therefore, it is possible to prevent the inconvenience that the developing solution and the rinsing solution for positive tone development adhere to the substrate W again upward. Further, since the developer for positive tone development and the developer for negative tone development and the rinse liquid can increase the fluidity in the circumferential direction on the bottom surface of the outer lower cup 33, the first drain port 39 and the second drain port 39 and the second It can be easily collected at the drain port 41.

In the substrate processing apparatus configured as described above, when the substrate W held by the substrate holding unit 3 is coated with a positive photoresist, the control unit 69 develops for positive tone development. Develop with a solution and a rinse solution. First, the control unit 69 extends the air cylinder 59. As a result, the inner cup 23 is raised and moved to the "collection position", and the introduction port A is opened. Then, the control unit 69 moves the nozzle 13 to the axial center P, drives the electric motor 7, increases the rotation speed to the processing rotation speed, and predetermines a developer for positive tone development with respect to the substrate W. Supply only time. At this time, the developer for positive tone development scattered from the substrate W is collected by the inner cup 23 and collected through the first drain port 39. Further, the gas in the inner cup 23 containing the mist of the developer for positive tone development flows down in the inner cup 23 and is discharged through the first exhaust port 43. Next, the control unit 69 moves the nozzle 14 to the axial center P instead of the nozzle 13, and supplies the rinse liquid for positive tone development for a predetermined time. At this time, in the same manner as described above, the rinsing solution for positive tone development and the gas containing the mist are recovered and discharged from the inner cup 23.

Next, when a negative type photoresist is adhered to the substrate W held by the substrate holding unit 3, the control unit 69 performs a developing process with a developing solution and a rinsing solution for negative tone developing. .. First, the control unit 69 contracts the air cylinder 59. As a result, the inner cup 23 is lowered and moved to the "evacuation position", and the introduction port B is opened. Then, the control unit 69 moves the nozzle 15 to the axial center P, drives the electric motor 7, increases the rotation speed to the processing rotation speed, and predetermines a developer for negative tone development with respect to the substrate W. Supply only time. At this time, the developing solution for negative tone development scattered from the substrate W is collected by the outer cup 21 and collected through the second drain port 41. Further, the gas in the outer cup 21 containing the mist of the developing solution for negative tone development flows down in the outer cup 21 and is discharged through the second exhaust port 45. Next, the control unit 69 moves the nozzle 16 to the axial center P instead of the nozzle 15, and supplies the rinse liquid for negative tone development for a predetermined time. At this time, in the same manner as described above, the rinsing liquid for developing negative tones and the gas containing the mist are recovered and discharged from the outer cup 21.

According to the apparatus of this embodiment, since the gas in the inner cup 23 and the gas in the outer cup 21 are not mixed, the substrate W is processed with good quality regardless of whether the inner cup 23 or the outer cup 21 is used. It can be performed. Further, since the inner cup body 47 does not have a bottom surface, the weight of the inner cup 23 can be reduced. Therefore, the load when the inner cup main body 47 is moved by the air cylinder 59 via the annular member 61 can be reduced, and the inner cup main body 47 can be moved quickly. Further, since the developer and rinse solution for positive tone development are also collected on the bottom surface of the outer and lower cups 33 separated downward, it is possible to prevent adverse effects due to the rebound of the developer and rinse solution for positive tone development.

The present invention is not limited to the above embodiment, and can be modified and implemented as follows.

(1) In the above-described embodiment, the substrate processing apparatus that performs the positive tone development process and the negative tone development process has been described as an example, but the present invention is not limited thereto. For example, the present invention can be applied to various devices that process a substrate W using a treatment liquid, such as a cleaning treatment or a coating treatment on the substrate W.

(2) In the above-described embodiment, the annular member 61 is provided with three connecting portions 63, which are arranged at equal intervals in a plan view, but the present invention is not limited to such an arrangement. That is, a plurality of connecting portions 63 may be arranged at unequal intervals in a plan view.

(3) In the above-described embodiment, the inner cup main body 47 is composed of the guide portion 51 and the partition wall storage portion 53, but the atmosphere on the inner peripheral side and the outer peripheral side of the separation partition wall 53 can be separated, and the inner cup If the main body 47 can be raised and lowered stably, it is not always necessary to provide the partition wall storage portion 53.

(4) In the above-described embodiment, the air cylinder 59 is illustrated as the drive unit, but the present invention does not limit the drive unit to the air cylinder 59. That is, the drive unit may be composed of, for example, a ball screw and an electric motor, as long as the annular member 61 can be displaced up and down.

(5) In the above-described embodiment, the first exhaust port 39 is composed of the hollow portion 71 and the opening 73, but the bottom surface of the outer lower cup 33 in which the first exhaust port 39 is arranged is the first. If the height is higher than the drain port 39, the hollow portion 71 may not be provided.

1 ... Board processing device W ... Board 3 ... Board holding part 7 ... Electric motor 9 ... Rotating shaft P ... Axis center 11 ... Processing liquid supply unit 13 to 16 ... Nozzle 19 ... Cup 21 ... Outer cup 23 ... Inner cup A, B … Introduction port 29… Middle cup 31… Outer cup body 33… Outer lower cup 35… Outer side cup 37… Separation partition 39… First drainage port 41… Second drainage port 43… First exhaust port 45 ... Second exhaust port 47 ... Inner cup body 39 ... Inner cup discharge port 51 ... Guide part 53 ... Bulk partition storage part 59 ... Air cylinder 61 ... Circular member 71 ... Hollow part 73 ... Opening 81 ... Inner peripheral flow path 83 ... Outer peripheral flow path 85, 89 ... Inner peripheral slope 87, 91 ... Outer slope

Claims (6)

In a substrate processing apparatus that processes a substrate with a processing liquid,
A board holding part that holds the board in a horizontal position,
A rotary drive unit that rotates the substrate holding unit around a vertical axis,
A first processing liquid supply unit that supplies the first processing liquid to the substrate held by the substrate processing unit, and
A second processing liquid supply unit that supplies the second processing liquid to the substrate held by the substrate processing unit, and
An outer cup arranged around the side of the substrate holding portion and
An inner cup arranged between the substrate holding portion and the outer cup,
With
The inner cup
The inner cup body, which has an annular shape in a plan view,
An inner cup discharge port formed in the lower part of the inner cup body and discharging the first treatment liquid and gas in the inner cup body downward.
With
The outer cup
The outer cup body, which has an annular shape in a plan view,
The outer cup that constitutes the bottom of the outer cup body and the outer cup
A first drainage port formed on the bottom surface of the outer lower cup and for discharging the first treatment liquid discharged from the inner cup discharge port, and a first drainage port.
A first exhaust port formed in the outer and lower cups for discharging the gas discharged from the inner cup discharge port, and
A second drainage port formed on the bottom surface of the outer cup and draining the second treatment liquid in the outer cup body,
A second exhaust port formed in the outer cup and for discharging the gas in the outer cup body,
A separation partition wall which is erected in a ring shape on the bottom surface of the outer lower cup in a plan view and separates the first drainage port and the second drainage port.
With
An annular member that exhibits an annular shape in a plan view, is slidably attached to the outer peripheral surface of the outer cup body , and is connected to the inner peripheral side of the inner cup body so as not to block the inner cup discharge port.
A drive unit that raises and lowers the annular member and moves the inner cup body between a collection position where the inner cup collects the processing liquid and a retracting position where the outer cup collects the treatment liquid.
A substrate processing apparatus characterized by being equipped with. In the substrate processing apparatus according to claim 1,
The substrate processing device is characterized in that the annular member is provided with connecting portions with the inner cup main body at a plurality of locations having a positional relationship equal to each other from the center in a plan view. In the substrate processing apparatus according to claim 1 or 2.
The inner cup main body includes a guide portion that guides the first treatment liquid scattered from the substrate to the surroundings downward, and a partition wall storage portion formed in an inverted U shape at the lower portion of the guide portion.
With
The inner cup main body is a substrate processing apparatus characterized in that the separation partition wall is stored in the partition wall storage portion at the retracted position, and only the upper portion of the separation partition wall is stored in the partition wall storage portion at the collection position. In the substrate processing apparatus according to any one of claims 1 to 3,
The substrate processing apparatus, wherein the first exhaust port is formed with an opening at the tip of a hollow portion extending upward from the bottom surface of the outer lower cup. In the substrate processing apparatus according to any one of claims 1 to 4,
The outer cup body is provided with an inner cup on the inner peripheral side of the separation partition wall.
The lower surface of the middle cup is formed so as to be separated from the opening of the first exhaust port, the outer peripheral surface is separated from the inner peripheral surface of the separation partition wall, and the outer peripheral end is separated from the bottom surface of the outer cup body. A substrate processing apparatus characterized in that. In the substrate processing apparatus according to any one of claims 1 to 5,
The outer lower cup is a substrate processing apparatus having a bottom surface formed with an inclined surface that becomes lower toward the first drainage port and the second drainage port in the circumferential direction.

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