JP6095750B2 - Substrate liquid processing apparatus and substrate liquid processing method - Google Patents

Description

  The present invention relates to a substrate liquid processing apparatus and a substrate liquid processing method for processing a substrate with a processing liquid.

  Conventionally, when manufacturing semiconductor parts, flat panel displays, etc., multiple types of cleaning liquids, etching liquids, rinsing liquids, etc. are used to clean and etch semiconductor wafers and liquid crystal substrates in the manufacturing process. A substrate liquid processing apparatus that performs liquid processing with the above processing liquid is used.

  The substrate liquid processing apparatus includes a substrate processing chamber formed in a housing, a substrate rotating mechanism for holding and rotating the substrate in the substrate processing chamber, a processing liquid supply mechanism for supplying the processing liquid to the substrate, and a processing And a processing liquid recovery mechanism for recovering the liquid.

  In the processing liquid recovery mechanism, a recovery cup is disposed around the substrate, a discharge port is formed in the recovery cup, and a gas-liquid separator is connected to the discharge port.

  Then, the substrate liquid processing apparatus supplies the processing liquid from the processing liquid supply mechanism toward the rotating substrate, and the processing liquid scattered around the substrate by the centrifugal force due to the rotation of the substrate is collected in the recovery cup together with the atmosphere around the substrate. The collected processing liquid and atmosphere are sent from the discharge port to the gas-liquid separator, and separated into a liquid processing liquid and a gaseous atmosphere by the gas-liquid separator, and each is discharged to the outside (for example, (See Patent Document 1).

JP-A-9-64009

  However, since the conventional substrate liquid processing apparatus has a structure in which a gas-liquid separator is connected to the discharge port of the recovery cup, a gas-liquid separator is required separately from the recovery cup. There is a possibility that the liquid processing apparatus will be enlarged.

  In particular, in a substrate liquid processing apparatus, in order to liquid-treat a substrate with a plurality of types of processing liquids according to the liquid processing applied to the substrate, a plurality of types of processing liquids can be selectively supplied to the substrate. If a plurality of gas-liquid separation devices corresponding to each type of processing liquid used in the processing apparatus are provided, the substrate liquid processing apparatus may be further increased in size.

Therefore, in the present invention, in a substrate liquid processing apparatus for processing a substrate with a processing liquid, a substrate rotating mechanism for holding the substrate and rotating the held substrate and a plurality of types of processing liquids are selectively supplied to the substrate. A processing liquid supply mechanism, a recovery cup for recovering the processing liquid after being supplied to the substrate, a plurality of liquid recovery parts formed in the recovery cup for recovering the processing liquid, and a partition that partitions the plurality of liquid recovery parts Fixed to cover the wall, the drain port formed at the bottom of the recovery cup to discharge the processing liquid recovered from the liquid recovery unit, the exhaust port formed at the top of the partition wall, and the upper part of the exhaust port A fixed cover, an elevating cup provided so as to be movable up and down above the fixed cover to guide the processing liquid supplied to the substrate to the liquid recovery unit, and a cup for elevating the elevating cup according to the type of the processing liquid An elevating mechanism, The serial fixed cover not covered by the support recess formed in the elevating cup, and the lifting cup is located below the upper end of the lower end is the fixed cover of said support recess even when raising the lifting cup It was decided to shield between the fixed cover .
The liquid recovery unit includes a first liquid recovery unit and a second liquid recovery unit, and the exhaust port includes a first exhaust port and a second exhaust port, and the fixed cover. Is fixed without forming a gap on one side of the first exhaust port, and fixed without forming a gap on one side of the second exhaust port, and a first fixed cover that is open on the other side. A second fixed cover that is open on the other side, wherein the elevating cup is positioned above the first fixed cover and has a lower end formed with a support recess, and the first elevating cup 2 and a second elevating cup provided with a shielding member extending downward, and even if the first elevating cup is raised, the support recess The lower end is positioned below the upper end of the first fixed cover, and the first elevating cup and the first Even when the second elevating cup is raised by shielding the fixed cover, the lower end of the shielding member is positioned below the upper end of the second fixed cover, and the second elevating / lowering cup is located. It was decided to shield between the cup and the second fixed cover.

  In addition, a plurality of drain ports are formed for each type of processing liquid supplied from the processing liquid supply mechanism.

  In addition, the elevating cup is moved up and down by a cup elevating mechanism so that the liquid recovery unit and any one of the drainage ports communicate with each other.

  In addition, the fixing cover is formed with a flange portion that protrudes above and to the side of the exhaust port.

  In addition, a plurality of exhaust ports are provided, and a plurality of exhaust ports are connected in communication at the bottom of the recovery cup.

  Further, the exhaust port is arranged between the plurality of liquid recovery units.

Further, in the present invention, in a substrate liquid processing method for processing a substrate with a processing liquid, a plurality of types of processing liquids are selectively supplied to a rotating substrate, and the processing liquid supplied to the substrate is recovered using a recovery cup, The processing liquid collected from the liquid recovery part of the recovery cup is discharged from the drain port, exhausted from the exhaust port formed above the drain port, and fixed to the fixed cover to cover the upper side of the exhaust port Even if the elevating cup that covers the fixed cover with the support recess is raised and lowered according to the type of processing liquid and the elevating cup is raised, the lower end of the support recess is positioned below the upper end of the fixed cover. was Rukoto be shielded between said stationary cover and the lifting cup with.

  Further, the processing liquid is discharged from a plurality of drain ports formed for each type of processing liquid supplied from the processing liquid supply mechanism.

  Further, the liquid collecting part of the collecting cup is made to communicate with any one of the drainage ports by raising and lowering the elevating cup.

  In the present invention, the treatment liquid and the atmosphere can be gas-liquid separated inside the collection cup, and it is not necessary to provide a gas-liquid separation device separately from the collection cup. Even when various types of processing liquids are selectively supplied to the substrate, the substrate liquid processing apparatus can be downsized.

The top view which shows a substrate liquid processing apparatus. The schematic diagram which shows a substrate processing chamber. The expanded sectional side view which shows a collection | recovery cup. Sectional side view which shows a fixed cover. Explanatory drawing which shows operation | movement of a substrate processing chamber (acid processing liquid). Explanatory drawing which shows operation | movement of a substrate processing chamber (alkaline processing liquid). Explanatory drawing which shows operation | movement of a substrate processing chamber (organic processing liquid).

  Hereinafter, a specific configuration of a substrate liquid processing apparatus and a substrate liquid processing method using the substrate liquid processing apparatus according to the present invention will be described with reference to the drawings.

  As shown in FIG. 1, the substrate liquid processing apparatus 1 includes a plurality of substrates 2 (in this case, semiconductor wafers) (for example, 25 wafers) as objects to be processed at the front end, and is loaded and unloaded by a carrier 3. And a substrate transfer part 5 for transferring the substrate 2 accommodated in the carrier 3 is formed at the rear part of the substrate carry-in / out part 4, and the substrate is provided at the rear part of the substrate transfer part 5. The substrate processing unit 6 for performing various processes such as cleaning and drying of 2 is formed.

  The substrate carry-in / out unit 4 can be placed with a gap left and right with the four carriers 3 in close contact with the front wall 7 of the substrate transport unit 5.

  The substrate transfer unit 5 accommodates a substrate transfer device 8 and a substrate delivery table 9 inside. The substrate transfer device 8 transfers the substrate 2 between any one of the carriers 3 placed on the substrate carry-in / out unit 4 and the substrate delivery table 9.

  The substrate processing unit 6 accommodates the substrate transfer device 10 in the center, and accommodates the substrate processing chambers 11 to 22 side by side on the left and right sides of the substrate transfer device 10.

  The substrate transfer apparatus 10 transfers the substrates 2 one by one between the substrate transfer table 9 of the substrate transfer unit 5 and each of the substrate processing chambers 11 to 22, and each of the substrate processing chambers 11 to 22 transfers the substrate 2. Process one by one.

  The substrate processing chambers 11 to 22 have the same configuration, and the configuration of the substrate processing chamber 11 will be described as a representative. As shown in FIG. 2, the substrate processing chamber 11 includes a substrate rotating mechanism 23 for rotating the substrate 2 while holding it horizontally, and a plurality of types of processing toward the upper surface of the substrate 2 rotated by the substrate rotating mechanism 23. A processing liquid supply mechanism 24 for selectively supplying the liquid, and a processing liquid recovery mechanism 25 for recovering the processing liquid supplied from the processing liquid supply mechanism 24 to the substrate 2. The mechanism 23, the treatment liquid supply mechanism 24, and the treatment liquid recovery mechanism 25 are configured to be controlled by a control mechanism 26. The control mechanism 26 controls the entire substrate liquid processing apparatus 1 such as the substrate transfer apparatuses 8 and 10.

  An annular table 28 is horizontally attached to the upper end portion of the hollow cylindrical rotating shaft 27 in the substrate rotating mechanism 23. A plurality of substrate holders 29 that are in contact with the peripheral portion of the substrate 2 and horizontally hold the substrate 2 are attached to the peripheral portion of the table 28 at intervals in the circumferential direction. A rotary drive mechanism 30 is connected to the rotary shaft 27, and the rotary drive mechanism 30 rotates the rotary shaft 27 and the table 28 to rotate the substrate 2 held by the substrate holder 29 on the table 28. The rotation drive mechanism 30 is connected to the control mechanism 26, and the rotation is controlled by the control mechanism 26.

  Further, in the substrate rotating mechanism 23, an elevating shaft 31 is inserted in a hollow portion at the center of the rotating shaft 27 and the table 28 so as to be movable up and down, and a disc-shaped elevating plate 32 is attached to an upper end portion of the elevating shaft 31. . A plurality of elevating pins 33 for elevating the substrate 2 in contact with the lower surface of the substrate 2 are attached to the peripheral portion of the elevating plate 32 at intervals in the circumferential direction. An elevating mechanism 34 is connected to the elevating shaft 31, and the elevating shaft 31 and the elevating plate 32 are raised and lowered by the elevating mechanism 34, and the substrate 2 held by the elevating pins 33 formed on the elevating plate 32 is raised and lowered. The substrate 2 is received from the substrate transfer device 10 to the substrate holder 29 of the table 28 or transferred from the substrate holder 29 to the substrate transfer device 10. The lifting mechanism 34 is connected to the control mechanism 26 and is controlled to be lifted and lowered by the control mechanism 26.

  The processing liquid supply mechanism 24 includes a first processing liquid discharge mechanism 35 that supplies an acidic processing liquid, a second processing liquid discharge mechanism 36 that supplies an alkaline processing liquid, and a third processing liquid discharge that supplies an organic processing liquid. The mechanism 37 is configured to selectively supply a plurality of kinds of treatment liquids (here, three kinds of treatment liquids of an acidic treatment liquid, an alkaline treatment liquid, and an organic treatment liquid) to the substrate 2.

  The first to third processing liquid discharge mechanisms 35, 36, and 37 have the same configuration. The arms 38, 39, 40 are arranged so as to be horizontally movable above the table 28, and the nozzles 41, 42, 43 are attached to the tips of the arms 38, 39, 40, and the arms 38, 39, 40 are mounted. Rotating shafts 44, 45, and 46 are attached to the base end portion. Rotation drive mechanisms 47, 48, 49 are connected to the respective rotation shafts 44, 45, 46, and the respective arm 38, 39, 40 and nozzles 41, 42, 49 are connected by the respective rotation drive mechanisms 47, 48, 49. 43 is moved horizontally between a retreat position outside the substrate 2 and a start position above the center of the substrate 2. The rotation drive mechanisms 47, 48, and 49 are connected to the control mechanism 26, respectively, and are controlled to move independently by the control mechanism 26.

  The first to third processing liquid discharge mechanisms 35, 36, and 37 are connected to the nozzles 41, 42, and 43 with the first to third processing liquid supply sources 50, 51, and 52, respectively. The flow rate of the processing liquid discharged from any one of the nozzles 41, 42, 43 is adjusted by the flow rate regulators 53, 54, 55. The flow regulators 53, 54, 55 are connected to the control mechanism 26, and open / close control and flow control are independently performed by the control mechanism 26, and the processing liquid is supplied from any one of the nozzles 41, 42, 43 to the substrate 2. Are selectively discharged.

  As shown in FIGS. 2 and 3, the processing liquid recovery mechanism 25 performs substrate processing on a recovery cup 56 that surrounds the lower portion of the substrate 2 (table 28) and the outer periphery and opens the upper portion of the substrate 2 (table 28). It is fixed in chamber 11. The recovery cup 56 is not limited to being directly fixed to the substrate processing chamber 11, and may be fixed via a fixing member.

  The collection cup 56 forms a collection port 57 outside the outer periphery of the substrate 2 (table 28), and forms a collection space 58 communicating with the collection port 57 below.

  The recovery cup 56 is formed with concentric double ring-shaped first and second partition walls 59, 60 at the bottom of the recovery space 58, and the bottom of the recovery space 58 is formed with first to first concentric triple ring-shaped first to second rings. 3 liquid collecting sections 61, 62, 63. A plurality of first to third drainage ports 64, 65, 66 are formed in the bottom of the first to third liquid recovery units 61, 62, 63 at intervals in the circumferential direction. A drainage pipe (not shown) is connected to the third drainage ports 64, 65, 66 via suction mechanisms 67, 68, 69. The suction mechanisms 67, 68, and 69 are independently suction controlled by the control mechanism 26. Note that the drainage pipe may be connected to the drainage line of the factory equipment and drained by the weight of the processing liquid.

  In addition, the recovery cup 56 is located above the first to third drainage ports 64, 65, 66 in the middle of the first and second partition walls 59, 60, and adjacent to the first to first A plurality of first and second exhaust ports 70, 71 are formed between the third drain ports 64, 65, 66 at intervals in the circumferential direction. A hollow exhaust casing 92 is attached to the bottom of the recovery cup 56 to form a connection flow path 93 that connects the first and second exhaust ports 70 and 71 in communication. The first and second exhaust ports 70, 71 are connected to an exhaust pipe (not shown) through the exhaust switching valve 73 attached to the suction mechanism 72 by attaching a suction mechanism 72 to the connection channel 93. The suction mechanism 72 and the exhaust switching valve 73 are controlled by the control mechanism 26, respectively. Note that the exhaust pipe may be connected to an exhaust line of factory equipment and exhausted by suction of the exhaust line. A suction mechanism may be connected to the first and second exhaust ports 70 and 71, respectively. The first and second exhaust ports 70 and 71 may be opened over the entire circumference of the recovery cup 56.

  In addition, the recovery cup 56 is fixed in the middle of the first and second partition walls 59 and 60 directly above the first and second exhaust ports 70 and 71 with a predetermined interval therebetween. Fixed covers 74 and 75 are formed. The left and right side portions of the first and second fixed covers 74 and 75 have flange portions 76 and 77 that project outward and downward to cover the upper and side portions of the first and second exhaust ports 70 and 71. Form. Further, the recovery cup 56 forms annular support convex portions 78 and 79 by projecting the upper portions of the first and second fixed covers 74 and 75 upward. The first and second fixed covers 74 and 75 are fixed to the recovery cup 56 directly or via a fixing member separately from the recovery cup 56.

  Further, the recovery cup 56 is provided with first and second elevating cups 80 and 81 above the first and second partition walls 59 and 60 (above the first and second fixed covers 74 and 75). It has been. Connected to the first and second elevating cups 80 and 81 are first and second elevating rods 82 and 83 inserted through the first and second partition walls 59 and 60 so as to be movable up and down. The first and second cup lifting mechanisms 84 and 85 are connected to the second lifting rods 82 and 83. The first and second elevating cups 80 and 81 and the first and second elevating rods 82 and 83 are connected by, for example, magnetic force, and move up and down integrally. The first and second cup lifting mechanisms 84 and 85 are connected to the control mechanism 26 and are controlled to be lifted and lowered independently by the control mechanism 26.

  The first and second elevating cups 80 and 81 have supporting concave portions 86 and 87 having a downwardly annular concave shape at the lower end portions. The support concave portions 86 and 87 cover the support convex portions 78 and 79 of the first and second fixed covers 74 and 75 of the recovery cup 56, and incline inward and upward to the recovery port 57 of the recovery cup 56 at the upper end portion. Inclined wall portions 88 and 89 are formed. The support recesses 86 and 87 and the support protrusions 78 and 79 are such that the lower ends of the support recesses 86 and 87 are the upper ends of the support protrusions 78 and 79 even when the first and second elevating cups 80 and 81 are raised. It is formed so as to be positioned below. The first elevating cup 80 extends the inclined wall portion 88 in parallel with the inclined wall 90 of the recovery space 58 to the recovery port 57 of the recovery cup 56, and the inclined wall portion 88 is the recovery space 58 of the recovery cup 56. It comes to be close to the inclined wall 90. The second elevating cup 81 extends the inclined wall portion 89 in parallel along the inclined wall portion 88 of the upper first elevating cup 80 to the recovery port 57 of the recovery cup 56, and the inclined wall portion 89 is The inclined wall portion 88 of one lifting cup 80 is in close proximity.

  When the first and second elevating cups 80 and 81 are lowered using the first and second cup elevating mechanisms 84 and 85, the inclined wall 90 of the recovery cup 56 and the first A flow path leading from the recovery port 57 to the first drain port 64 of the first recovery unit 61 is formed between the inclined wall portion 88 of the elevating cup 80 (see FIG. 5). Further, when the first elevating cup 80 is raised using the first and second cup elevating mechanisms 84 and 85 and the second elevating cup 81 is lowered, the first elevating cup 80 is brought into the collection space 58. A channel is formed between the inclined wall portion 88 and the inclined wall portion 89 of the second lifting cup 81 from the recovery port 57 to the second drainage port 65 of the second recovery portion 62 (see FIG. 6). Further, when the first and second elevating cups 80 and 81 are raised using the first and second cup elevating mechanisms 84 and 85, the inclined wall portion 89 of the second elevating cup 81 is provided inside the collection space 58. Is formed with a flow path leading from the collection port 57 to the third drainage port 66 of the third collection unit 63 (see FIG. 7).

  As shown in FIG. 4 (a), the fixed cover 94 formed on the recovery cup 56 forms a flange 96 that is folded downward on either the left or right side of the exhaust port 95. A support convex portion 97 may be formed on the upper portion of 96, and the support convex portion 97 may be covered with a support concave portion 99 formed at the lower end of the elevating cup 98.

  4B, the entire upper portion of the fixed cover 100 may be covered with a support recess 102 formed at the lower end of the elevating cup 101.

  As shown in FIG. 4C, the shapes of the first fixed cover 105 and the second fixed cover 106 provided above the first exhaust port 103 and the second exhaust port 104 are different. May be. The first and second exhaust ports 103 and 104 are opened over the entire circumference of the recovery cup 56. The first fixed cover 105 is fixed to the inner peripheral side (rotary shaft 27 side) of the first exhaust port 103, and forms a flange portion 107 that is folded downward on the outer peripheral side. The first fixed cover 105 is fixed without forming a gap on the inner peripheral side of the first exhaust port 103, and is fixed to the first exhaust port 103 directly or via a fixing member. Above the first fixed cover 105, a first elevating cup 109 having a recess 108 formed at the lower end is provided. The recess 108 formed in the first elevating cup 109 extends downward only on the inner peripheral side, and even when the first elevating cup 109 is raised, the lower end of the recess 108 is The first elevating cup 109 and the first fixed cover 105 are shielded by being positioned below the upper end of one fixed cover 105.

  On the other hand, the second fixed cover 106 is fixed to the inner peripheral side of the second exhaust port 104, and forms a flange portion 110 having a shape folded downward on the outer peripheral side. The upper portion of the flange portion 110 extends toward the upper side of the second fixed cover 106. The second fixed cover 106 is fixed to the inner peripheral side of the second exhaust port 104 without forming a gap, and is fixed to the second exhaust port 104 directly or via a fixing member. A second elevating cup 111 is provided above the second fixed cover 106. The second elevating cup 111 is provided with a shielding member 112 extending downward. Even when the second elevating cup 111 is raised, the lower end of the shielding member 112 is positioned below the upper end of the flange 110 extending upward from the second fixed cover 106, and the second The space between the elevating cup 110 and the second fixed cover 106 is shielded.

  The substrate liquid processing apparatus 1 is configured as described above, and the substrate 2 is processed in each of the substrate processing chambers 11 to 22 in accordance with a substrate liquid processing program stored in a storage medium 91 readable by the control mechanism 26 (computer). Is treated with a treatment solution. The storage medium 91 may be any medium that can store various programs such as a substrate liquid processing program. Even if it is a semiconductor memory type storage medium such as a ROM or RAM, a disk type storage such as a hard disk or a CD-ROM is used. It may be a medium.

  Then, when the substrate liquid processing apparatus 1 processes the substrate 2 with the processing liquid, the processing liquid supply mechanism 24 selectively switches the type of the processing liquid supplied to the substrate 2 and processes according to the type of the processing liquid. The first and second elevating cups 80, 81 of the liquid recovery mechanism 25 are moved up and down to drain from any one of the first to third drain ports 64, 65, 66, and at the same time inside the recovery cup 56 Gas-liquid separation is performed and exhausted from the first and second exhaust ports 70 and 71.

  For example, when the substrate liquid processing apparatus 1 performs liquid processing on the substrate 2 by discharging the acidic processing liquid from the first processing liquid discharge mechanism 35 of the processing liquid supply mechanism 24 to the substrate 2, as shown in FIG. While the rotation drive mechanism 30 is controlled by the mechanism 26 and the substrate 2 held by the table 28 of the substrate rotation mechanism 23 and the substrate holder 29 of the table 28 is rotated at a predetermined rotation speed, the flow controller 53 is controlled by the control mechanism 26. The acidic processing liquid supplied from the first processing liquid supply source 50 is discharged and discharged from the nozzle 41 toward the upper surface of the substrate 2 by opening and controlling the flow rate.

  At that time, the substrate liquid processing apparatus 1 controls the first and second cup elevating mechanisms 84 and 85 by the control mechanism 26 to lower the first and second elevating cups 80 and 81, thereby collecting the recovery port 57. To the first drainage port 64 of the first recovery part 61 is formed. Further, the substrate liquid processing apparatus 1 drives the suction mechanism 67 connected to the first drain port 64 and the suction mechanism 72 connected to the first and second exhaust ports 70 and 71 by the control mechanism 26 and switches the exhaust. The valve 73 is switched to the acidic exhaust passage.

  Then, the acidic treatment liquid supplied to the substrate 2 is spun off toward the outer periphery of the substrate 2 by the action of the centrifugal force due to the rotation of the substrate 2, and the atmosphere around the substrate 2 by the suction force of the suction mechanisms 67 and 72. At the same time, it is recovered from the recovery port 57 of the recovery cup 56 to the first recovery part 61 of the recovery space 58. The collected acidic processing liquid and atmosphere are separated into gas and liquid by the first recovery unit 61, and the liquid acidic processing liquid is discharged from the first drain port 64 to the outside through the suction mechanism 67. At the same time, the gaseous atmosphere is discharged to the outside through the suction mechanism 72 and the exhaust switching valve 73 from the first and second exhaust ports 70 and 71.

  Further, when the substrate liquid processing apparatus 1 discharges an alkaline processing liquid to the substrate 2 from the second processing liquid discharge mechanism 36 of the processing liquid supply mechanism 24 and performs liquid processing on the substrate 2, as shown in FIG. The regulator 54 is opened and the flow rate is controlled, and the alkaline processing liquid supplied from the second processing liquid supply source 51 is discharged from the nozzle 42 toward the upper surface of the substrate 2. At that time, the substrate liquid processing apparatus 1 controls the first cup raising / lowering mechanism 84 to raise only the first raising / lowering cup 80, and the second drainage liquid of the second collection unit 62 is collected from the collection port 57. The flow path leading to the port 65 is formed, and the suction mechanism 68 connected to the second drainage port 65 and the suction mechanism 72 connected to the first and / or second exhaust ports 70 and 71 are driven and exhausted. The switching valve 73 is switched to the alkaline exhaust flow path. The alkaline processing liquid supplied to the substrate 2 is recovered together with the atmosphere around the substrate 2 from the recovery port 57 of the recovery cup 56 to the second recovery unit 62 of the recovery space 58, and gas-liquid separation is performed in the second recovery unit 62. Then, the liquid alkaline processing liquid is discharged to the outside from the second drainage port 65 through the suction mechanism 68, and the gaseous atmosphere is discharged from the first and / or second exhaust ports 70 and 71. The gas is discharged to the outside through the suction mechanism 72 and the exhaust switching valve 73.

  Further, when the substrate processing apparatus 1 discharges the organic processing liquid from the third processing liquid discharge mechanism 37 of the processing liquid supply mechanism 24 to the substrate 2 to process the substrate 2, as shown in FIG. The flow rate regulator 55 is opened and the flow rate is controlled to discharge the organic processing liquid supplied from the third processing liquid supply source 52 from the nozzle 43 toward the upper surface of the substrate 2. At that time, the substrate liquid processing apparatus 1 controls the first and second cup elevating mechanisms 84 and 85 to raise the first and second elevating cups 80 and 81, and from the recovery port 57 to the third A flow path leading to the third drain port 66 of the recovery unit 63 is formed, and connected to the suction mechanism 69 connected to the third drain port 66 and the first and / or second exhaust ports 70 and 71. The suction mechanism 72 is driven and the exhaust switching valve 73 is switched to the organic exhaust passage. The organic processing liquid supplied to the substrate 2 is recovered together with the atmosphere around the substrate 2 from the recovery port 57 of the recovery cup 56 to the third recovery unit 63 of the recovery space 58, and the gas / liquid is recovered by the third recovery unit 63. After being separated, the liquid organic processing liquid is discharged to the outside from the third drain port 66 through the suction mechanism 69, and the gaseous atmosphere is the first and / or second exhaust port 70, 71 is discharged to the outside through a suction mechanism 72 and an exhaust switching valve 73.

  As described above, the substrate liquid processing apparatus 1 holds the substrate 2 and the substrate rotating mechanism 23 for rotating the held substrate 2 and the process of selectively supplying a plurality of types of processing liquids to the substrate 2. A liquid supply mechanism 24 and a processing liquid recovery mechanism 25 that recovers the processing liquid supplied to the substrate 2 are provided.

  The processing liquid recovery mechanism 25 recovers from the recovery cup 56 for recovering the processing liquid supplied to the substrate 2, the recovery port 57 formed in the recovery cup 56 for recovering the processing liquid, and the recovery port 57. The drainage ports (first to third drainage ports 64, 65, 66) formed in the recovery cup 56 for discharging the processing liquid and the drainage ports (first to third drainage fluids) of the recovery cup 56 Exhaust ports (first and second exhaust ports 70, 71) formed above the ports 64, 65, 66) and above the exhaust ports (first and second exhaust ports 70, 71) are predetermined. A fixed cover (first and second fixed covers 74 and 75) fixed to the recovery cup 56 to cover the recovery cup 56, and a lift cup (first and second lift) Cups 80, 81) and a cup lifting mechanism (first and second cups) for raising and lowering the lifting cups (first and second lifting cups 80, 81) according to the type of processing liquid. And it has a configuration with a lifting mechanism 84, 85) and. In addition, the drainage port, the exhaust port, the fixed cover, the elevating cup, and the cup elevating mechanism are not limited to being provided in a plural number, and may be provided only in one.

  According to the present invention, the substrate liquid processing apparatus 1 having the above-described configuration can gas-liquid separate the processing liquid and the atmosphere inside the recovery cup 56 by the drain port and the exhaust port formed in the recovery cup 56, There is no need to provide a gas-liquid separation device separately from the recovery cup 56, and even when a plurality of types of processing liquids are selectively supplied to the substrate 2 according to the liquid processing applied to the substrate 2, the substrate liquid processing apparatus 1 can be reduced in size.

  In addition, when gas-liquid separation is enabled inside the recovery cup 56, the effective cross-sectional area of the flow path leading to the exhaust port changes when the elevating cup is moved up and down just above the exhaust port according to the type of processing liquid. The exhaust pressure may fluctuate and the processing liquid adhering to the elevating cup may flow into the exhaust port. However, in the substrate liquid processing apparatus 1 configured as described above, the exhaust port (first and second exhaust ports 70, 71), by providing a fixed cover (first and second fixed covers 74, 75) above, even if the elevating cup (first and second elevating cups 80, 81) is raised and lowered, The inflow of the processing liquid can be prevented, and the processing liquid and the atmosphere can be well separated and discharged.

  In the substrate liquid processing apparatus 1, a plurality of different drainage ports (first to third drainage ports 64, 65, 66) are formed for each type of processing liquid supplied to the substrate 2, and the cup is moved up and down. By raising and lowering the elevating cup (first and second elevating cups 80 and 81) by the mechanism (first and second cup elevating mechanisms 84 and 85), Since the liquid ports 64, 65, 66) and the recovery port 57 are communicated with each other, processing is performed by raising and lowering the elevating cups (first and second elevating cups 80, 81) for each type of processing liquid. The processing liquid can be collected separately for each type of liquid, and different types of processing liquids can be prevented from mixing and reacting.

  In the substrate liquid processing apparatus 1, the lower ends of the support recesses 86 and 87 are located below the upper ends of the support projections 78 and 79 even when the first and second elevating cups 80 and 81 are raised. Thereby, the flow path through which the treatment liquid collected in the collection units 61, 62, and 63 flows can be more reliably divided, and the treatment liquid can be separated and collected for each type.

  In the substrate liquid processing apparatus 1, the fixing covers 105 and 106 are fixed to one side (for example, the inner peripheral side (rotating shaft side)) of the exhaust ports 103 and 104 without forming a gap, and the other side (for example, the outer peripheral side). The flange portions 107 and 110 having a shape folded downward are formed (see FIG. 4C). As a result, the exhaust ports 103 and 104 can be formed in each recovery unit, and not only the processing liquid but also the atmosphere can be sorted and exhausted for each type of processing liquid. Moreover, in the said substrate liquid processing apparatus 1, while fixing one side of the fixing covers 105 and 106 and the exhaust ports 103 and 104 without forming a clearance gap, the lower end of the recessed part 108 and the shielding member 112 is fixed also when the raising / lowering cups 109 and 111 raise. Since it is located below the upper ends of the covers 105, 106 and shields between the elevating cups 109, 111 and the fixed covers 105, 106, it is possible to prevent the processing liquid and atmosphere from flowing into the adjacent recovery section and exhaust port. Thus, the processing liquid and atmosphere can be sorted and discharged by type.

1 Substrate liquid processing device 2 Substrate
23 Substrate rotation mechanism
24 Treatment liquid supply mechanism
56 Collection cup
61,62,63 First to third liquid recovery sections
64,65,66 1st to 3rd drainage ports
70,71 first and second outlets
74,75 First and second fixed covers
80,81 first and second lifting cups
84,85 First and second cup lifting mechanism

Claims (10)

In a substrate liquid processing apparatus for processing a substrate with a processing liquid,
A substrate rotating mechanism for holding the substrate and rotating the held substrate;
A processing liquid supply mechanism for selectively supplying a plurality of types of processing liquids to the substrate;
A recovery cup for recovering the processing liquid after being supplied to the substrate;
A plurality of liquid recovery sections formed in the recovery cup to recover the processing liquid;
A partition wall for partitioning a plurality of liquid recovery sections;
A drain port formed at the bottom of the recovery cup to discharge the processing liquid recovered from the liquid recovery part,
An exhaust port formed in the upper part of the partition wall;
A fixed cover fixed to cover the upper part of the exhaust port;
An elevating cup provided so as to be movable up and down above the fixed cover in order to guide the processing liquid supplied to the substrate to the liquid recovery unit;
A cup elevating mechanism for elevating the elevating cup according to the type of treatment liquid;
Have
Have covered by the support recess forming the fixed cover to the lifting cup, and the lifting cup is located below the upper end of even when raising the lifting cup lower end of the support recess the fixing cover A substrate liquid processing apparatus that shields between the fixed cover . The liquid recovery part has a first liquid recovery part and a second liquid recovery part,
The exhaust port has a first exhaust port and a second exhaust port,
The fixed cover is fixed without forming a gap on one side of the first exhaust port, and forms a gap on one side of the second exhaust port with the first fixed cover opened on the other side. A second fixed cover that is fixed without opening and the other side is opened,
The elevating cup is located above the first fixed cover and has a first elevating cup having a support recess formed at the lower end thereof, and a shield located above the second fixed cover and extending downward. A second lifting cup provided with a member,
Even when the first elevating cup is raised, the lower end of the support recess is positioned below the upper end of the first fixed cover, and the first elevating cup and the first fixed cover Shield between
Even when the second elevating cup is raised, the lower end of the shielding member is positioned lower than the upper end of the second fixed cover, and the second elevating cup and the second fixed cover The substrate liquid processing apparatus according to claim 1, wherein the gap is shielded. 3. The substrate liquid processing apparatus according to claim 1, wherein a plurality of the drain ports are formed for each type of processing liquid supplied from the processing liquid supply mechanism. 4. The substrate liquid processing apparatus according to claim 3 , wherein the elevating cup communicates between the liquid recovery unit and any one of the liquid discharge ports by being moved up and down by a cup elevating mechanism.   5. The substrate liquid processing apparatus according to claim 1, wherein a collar portion protruding above and to the side of the exhaust port is formed on the fixed cover.   The substrate liquid processing apparatus according to claim 1, wherein a plurality of the exhaust ports are provided, and a plurality of exhaust ports are connected in communication with each other at a bottom portion of the recovery cup.   The substrate liquid processing apparatus according to claim 1, wherein the exhaust port is disposed between the plurality of liquid recovery units. In a substrate liquid processing method for processing a substrate with a processing liquid,
Selectively supply multiple types of processing liquid to the rotating substrate,
Collect the processing liquid supplied to the substrate using the recovery cup,
The processing liquid recovered from the liquid recovery part of the recovery cup is discharged from the drain port, and exhausted from the exhaust port formed above the drain port,
Wherein for a fixed fixed cover for covering the upper side of the exhaust port, to lift according to elevating cup covering the fixed cover support recess on the type of the processing liquid, even when raising the lifting cup substrate solution processing method the lower end of the supporting recess, characterized that you shield between the fixed cover and the lifting cup is located below the upper end of the fixed cover.   9. The substrate liquid processing method according to claim 8, wherein the processing liquid is discharged from a plurality of drainage ports formed for each type of processing liquid supplied from the processing liquid supply mechanism. The substrate liquid processing method according to claim 9, wherein the liquid recovery part of the recovery cup is communicated with any one of the liquid discharge ports by moving the lift cup up and down.

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