JP2012108320A5 - - Google Patents

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Publication number
JP2012108320A5
JP2012108320A5 JP2010257148A JP2010257148A JP2012108320A5 JP 2012108320 A5 JP2012108320 A5 JP 2012108320A5 JP 2010257148 A JP2010257148 A JP 2010257148A JP 2010257148 A JP2010257148 A JP 2010257148A JP 2012108320 A5 JP2012108320 A5 JP 2012108320A5
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JP
Japan
Prior art keywords
binder
antireflection film
film according
producing
less
Prior art date
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Application number
JP2010257148A
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English (en)
Japanese (ja)
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JP2012108320A (ja
JP5340252B2 (ja
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Publication date
Application filed filed Critical
Priority claimed from JP2010257148A external-priority patent/JP5340252B2/ja
Priority to JP2010257148A priority Critical patent/JP5340252B2/ja
Priority to PCT/JP2011/073461 priority patent/WO2012066871A1/en
Priority to EP11779236.6A priority patent/EP2632993B1/en
Priority to CN201180054659.XA priority patent/CN103210045B/zh
Priority to US13/882,050 priority patent/US9798045B2/en
Publication of JP2012108320A publication Critical patent/JP2012108320A/ja
Publication of JP2012108320A5 publication Critical patent/JP2012108320A5/ja
Publication of JP5340252B2 publication Critical patent/JP5340252B2/ja
Application granted granted Critical
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2010257148A 2010-11-17 2010-11-17 反射防止膜及びその製造方法 Active JP5340252B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2010257148A JP5340252B2 (ja) 2010-11-17 2010-11-17 反射防止膜及びその製造方法
US13/882,050 US9798045B2 (en) 2010-11-17 2011-10-05 Antireflection film and method of producing the same
EP11779236.6A EP2632993B1 (en) 2010-11-17 2011-10-05 Antireflection film and method of producing the same
CN201180054659.XA CN103210045B (zh) 2010-11-17 2011-10-05 减反射膜及其制备方法
PCT/JP2011/073461 WO2012066871A1 (en) 2010-11-17 2011-10-05 Antireflection film and method of producing the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2010257148A JP5340252B2 (ja) 2010-11-17 2010-11-17 反射防止膜及びその製造方法

Publications (3)

Publication Number Publication Date
JP2012108320A JP2012108320A (ja) 2012-06-07
JP2012108320A5 true JP2012108320A5 (enExample) 2013-02-21
JP5340252B2 JP5340252B2 (ja) 2013-11-13

Family

ID=44908050

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010257148A Active JP5340252B2 (ja) 2010-11-17 2010-11-17 反射防止膜及びその製造方法

Country Status (5)

Country Link
US (1) US9798045B2 (enExample)
EP (1) EP2632993B1 (enExample)
JP (1) JP5340252B2 (enExample)
CN (1) CN103210045B (enExample)
WO (1) WO2012066871A1 (enExample)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20130140030A (ko) * 2010-12-24 2013-12-23 우베 에쿠시모 가부시키가이샤 반사 방지 재료
JP6124624B2 (ja) * 2013-03-06 2017-05-10 キヤノン株式会社 光学素子およびそれを有する光学系
JP2014228614A (ja) * 2013-05-21 2014-12-08 豊田通商株式会社 光透過性組成物及びそれを用いた光機能部材並びに光透過性組成物の製造方法
JP6124711B2 (ja) * 2013-07-03 2017-05-10 キヤノン株式会社 反射防止膜及びそれを有する光学素子並びに光学系
CN103756395A (zh) * 2014-01-22 2014-04-30 上海赛肯森材料科技有限公司 用于减反射涂料组合物的纳米杂化粒子及其制备方法和用途
JP6274924B2 (ja) * 2014-03-14 2018-02-07 キヤノン株式会社 反射防止膜、光学部材及び光学部材の製造方法
KR20170015459A (ko) * 2014-06-10 2017-02-08 후지필름 가부시키가이샤 광학 기능층 형성용 조성물, 이를 이용한 고체 촬상 소자 및 카메라 모듈, 또한 광학 기능층의 패턴 형성 방법, 고체 촬상 소자 및 카메라 모듈의 제조 방법
JP6532228B2 (ja) * 2014-12-10 2019-06-19 キヤノン株式会社 光学部材及び光学部材の製造方法
CN105113247B (zh) * 2015-08-26 2017-07-07 浙江理工大学 一种乳胶粒减反射的涂层液及其制备方法和应用
JP6723705B2 (ja) * 2015-08-31 2020-07-15 キヤノン株式会社 光学部材および撮像機器
JP6758901B2 (ja) 2016-05-02 2020-09-23 キヤノン株式会社 反射防止膜、並びにそれを用いた光学用部材および光学機器
CN110632686B (zh) * 2016-07-14 2021-10-29 株式会社Lg化学 防反射膜
CN107652718B (zh) * 2017-09-27 2020-03-31 广东星星光电科技有限公司 一种减反射镀膜液及其制备方法
JP7118615B2 (ja) 2017-10-12 2022-08-16 キヤノン株式会社 光学素子、光学系および撮像装置
CN109188571B (zh) * 2018-08-14 2019-12-03 西北工业大学 一种中空闭孔SiO2减反射膜及其制备方法
KR102551221B1 (ko) * 2018-09-03 2023-07-04 삼성디스플레이 주식회사 광학 부재 및 이를 포함하는 표시 장치
WO2021171912A1 (ja) 2020-02-28 2021-09-02 日本板硝子株式会社 低屈折率膜、積層体、光学素子、防風材、及び表示装置
CN112175479B (zh) * 2020-09-28 2021-07-09 厦门大学 一种激光回归反射无人汽车涂层的制备方法
JP6972271B1 (ja) * 2020-10-09 2021-11-24 キヤノン株式会社 透光部材およびシールド
FR3155533A1 (fr) * 2023-11-17 2025-05-23 Polyrise Composition de vernis anti-reflet, procédé de formation d’un vernis anti-reflet, substrat transparent recouvert d’un vernis anti-reflet et véhicule automobile comprenant un tel substrat

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US6210858B1 (en) 1997-04-04 2001-04-03 Fuji Photo Film Co., Ltd. Anti-reflection film and display device using the same
JP4046921B2 (ja) 2000-02-24 2008-02-13 触媒化成工業株式会社 シリカ系微粒子、該微粒子分散液の製造方法、および被膜付基材
JP4457557B2 (ja) 2000-08-30 2010-04-28 株式会社ニコン 光学薄膜の形成方法及び光学薄膜を備えた光学素子
JP3899011B2 (ja) * 2001-10-25 2007-03-28 松下電工株式会社 面発光体
KR100671990B1 (ko) * 2001-10-25 2007-01-24 마츠시다 덴코 가부시키가이샤 복합박막 보유기판, 투명도전성막 보유기판 및 면발광체
JP2006502578A (ja) * 2002-10-11 2006-01-19 コーニンクレッカ　フィリップス　エレクトロニクス　エヌ　ヴィ 相変化材料を備えた電子装置
JP2005134609A (ja) 2003-10-30 2005-05-26 Konica Minolta Opto Inc 反射防止フィルム及び反射防止フィルムの製造方法並びに偏光板及び表示装置
WO2006013911A1 (en) * 2004-08-04 2006-02-09 Fujifilm Corporation Method for manufacturing an optical film, apparatus for manufacturing the same, optical film, polarizing plate and image display device
JP5047488B2 (ja) 2004-11-05 2012-10-10 ペンタックスリコーイメージング株式会社 シリカエアロゲル膜の製造方法
US20070103786A1 (en) * 2005-11-07 2007-05-10 Fujifilm Corporation Optical film, anti-reflection film, polarizing plate and image display device
US20070116902A1 (en) * 2005-11-18 2007-05-24 Fujifilm Corporation Optical film, anti-reflection film, polarizing plate and image display device
WO2008042169A1 (en) * 2006-09-29 2008-04-10 E. I. Du Pont De Nemours And Company Diffuse reflector comprising nonwoven sheet
JP5157143B2 (ja) 2006-12-01 2013-03-06 旭硝子株式会社 反射防止膜付き基体
JP2009073170A (ja) 2007-08-31 2009-04-09 Kaneka Corp 中空粒子からなる被膜を有する被膜付基材
US20100196655A1 (en) * 2007-06-29 2010-08-05 Toray Advanced Film Co., Ltd. Display-use filter
JP5241199B2 (ja) 2007-10-29 2013-07-17 日揮触媒化成株式会社 繊維状中空シリカ微粒子の製造方法および反射防止被膜付基材
MY192479A (en) * 2008-10-17 2022-08-23 Showa Denko Materials Co Ltd Film having low refractive index film and method for producing the same, anti-reflection film and method for producing the same, coating liquid set for low refractive index film, substrate having microparticle-laminated thin film and method for producing the same, and optical member
JP2010122603A (ja) * 2008-11-21 2010-06-03 Dainippon Printing Co Ltd 低屈折率層形成用組成物、光学積層体及び画像表示装置
JP5251701B2 (ja) 2009-04-23 2013-07-31 カシオ計算機株式会社 サーバ装置、サーバベース・コンピューティング・システム、およびサーバ制御プログラム

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