JP2012059878A - 記憶素子、メモリ装置 - Google Patents
記憶素子、メモリ装置 Download PDFInfo
- Publication number
- JP2012059878A JP2012059878A JP2010200983A JP2010200983A JP2012059878A JP 2012059878 A JP2012059878 A JP 2012059878A JP 2010200983 A JP2010200983 A JP 2010200983A JP 2010200983 A JP2010200983 A JP 2010200983A JP 2012059878 A JP2012059878 A JP 2012059878A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- magnetization
- storage layer
- film
- storage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/02—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
- G11C11/16—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/02—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
- G11C11/16—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect
- G11C11/161—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect details concerning the memory cell structure, e.g. the layers of the ferromagnetic memory cell
Landscapes
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Hall/Mr Elements (AREA)
- Mram Or Spin Memory Techniques (AREA)
- Thin Magnetic Films (AREA)
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010200983A JP2012059878A (ja) | 2010-09-08 | 2010-09-08 | 記憶素子、メモリ装置 |
| US13/216,474 US8455967B2 (en) | 2010-09-08 | 2011-08-24 | Memory element and memory device |
| CN201110255449.9A CN102403025B (zh) | 2010-09-08 | 2011-08-31 | 存储元件和存储装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010200983A JP2012059878A (ja) | 2010-09-08 | 2010-09-08 | 記憶素子、メモリ装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2012059878A true JP2012059878A (ja) | 2012-03-22 |
| JP2012059878A5 JP2012059878A5 (enExample) | 2013-10-10 |
Family
ID=45770089
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010200983A Pending JP2012059878A (ja) | 2010-09-08 | 2010-09-08 | 記憶素子、メモリ装置 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US8455967B2 (enExample) |
| JP (1) | JP2012059878A (enExample) |
| CN (1) | CN102403025B (enExample) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPWO2017010549A1 (ja) * | 2015-07-16 | 2018-05-31 | 国立大学法人東北大学 | 磁気抵抗効果素子および磁気メモリ |
| JPWO2018134929A1 (ja) * | 2017-01-18 | 2019-11-07 | 国立大学法人東北大学 | 磁気抵抗効果素子、磁気メモリ及び磁気抵抗効果素子の製造方法 |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5786341B2 (ja) * | 2010-09-06 | 2015-09-30 | ソニー株式会社 | 記憶素子、メモリ装置 |
| JP2012064623A (ja) * | 2010-09-14 | 2012-03-29 | Sony Corp | 記憶素子、メモリ装置 |
| JP2013070008A (ja) * | 2011-09-26 | 2013-04-18 | Toshiba Corp | 半導体装置およびその製造方法 |
| JP2013115413A (ja) | 2011-12-01 | 2013-06-10 | Sony Corp | 記憶素子、記憶装置 |
Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008098523A (ja) * | 2006-10-13 | 2008-04-24 | Toshiba Corp | 磁気抵抗効果素子および磁気メモリ |
| JP2008227388A (ja) * | 2007-03-15 | 2008-09-25 | Sony Corp | 記憶素子及びメモリ |
| US20090080124A1 (en) * | 2007-09-25 | 2009-03-26 | Kabushiki Kaisha Toshiba | Magnetoresistive element and magnetoresistive random access memory including the same |
| US20090080238A1 (en) * | 2007-09-25 | 2009-03-26 | Kabushiki Kaisha Toshiba | Magnetoresistive element and magnetoresistive random access memory including the same |
| JP2009081315A (ja) * | 2007-09-26 | 2009-04-16 | Toshiba Corp | 磁気抵抗素子及び磁気メモリ |
| JP2009094104A (ja) * | 2007-10-03 | 2009-04-30 | Toshiba Corp | 磁気抵抗素子 |
| JP2010010720A (ja) * | 2009-10-13 | 2010-01-14 | Toshiba Corp | 磁気抵抗効果素子およびそれを用いた磁気ランダムアクセスメモリ |
| JP2010093091A (ja) * | 2008-10-09 | 2010-04-22 | Hitachi Ltd | 磁気メモリ、磁気メモリアレイおよび磁気メモリアレイへの情報書込み方法 |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6130814A (en) | 1998-07-28 | 2000-10-10 | International Business Machines Corporation | Current-induced magnetic switching device and memory including the same |
| JP2003017782A (ja) | 2001-07-04 | 2003-01-17 | Rikogaku Shinkokai | キャリヤスピン注入磁化反転型磁気抵抗効果膜と該膜を用いた不揮発性メモリー素子及び該素子を用いたメモリー装置 |
| US7242045B2 (en) | 2004-02-19 | 2007-07-10 | Grandis, Inc. | Spin transfer magnetic element having low saturation magnetization free layers |
| US8120949B2 (en) * | 2006-04-27 | 2012-02-21 | Avalanche Technology, Inc. | Low-cost non-volatile flash-RAM memory |
| JP2007305882A (ja) * | 2006-05-12 | 2007-11-22 | Sony Corp | 記憶素子及びメモリ |
| JP2008160031A (ja) * | 2006-12-26 | 2008-07-10 | Sony Corp | 記憶素子及びメモリ |
| JP4380707B2 (ja) * | 2007-01-19 | 2009-12-09 | ソニー株式会社 | 記憶素子 |
| JP5598697B2 (ja) * | 2007-06-25 | 2014-10-01 | 日本電気株式会社 | 磁気抵抗効果素子、および磁気ランダムアクセスメモリ |
| JP5104090B2 (ja) * | 2007-07-19 | 2012-12-19 | ソニー株式会社 | 記憶素子及びメモリ |
-
2010
- 2010-09-08 JP JP2010200983A patent/JP2012059878A/ja active Pending
-
2011
- 2011-08-24 US US13/216,474 patent/US8455967B2/en active Active
- 2011-08-31 CN CN201110255449.9A patent/CN102403025B/zh not_active Expired - Fee Related
Patent Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008098523A (ja) * | 2006-10-13 | 2008-04-24 | Toshiba Corp | 磁気抵抗効果素子および磁気メモリ |
| JP2008227388A (ja) * | 2007-03-15 | 2008-09-25 | Sony Corp | 記憶素子及びメモリ |
| US20090080124A1 (en) * | 2007-09-25 | 2009-03-26 | Kabushiki Kaisha Toshiba | Magnetoresistive element and magnetoresistive random access memory including the same |
| US20090080238A1 (en) * | 2007-09-25 | 2009-03-26 | Kabushiki Kaisha Toshiba | Magnetoresistive element and magnetoresistive random access memory including the same |
| JP2009081216A (ja) * | 2007-09-25 | 2009-04-16 | Toshiba Corp | 磁気抵抗効果素子およびそれを用いた磁気ランダムアクセスメモリ |
| JP2009081215A (ja) * | 2007-09-25 | 2009-04-16 | Toshiba Corp | 磁気抵抗効果素子およびそれを用いた磁気ランダムアクセスメモリ |
| JP2009081315A (ja) * | 2007-09-26 | 2009-04-16 | Toshiba Corp | 磁気抵抗素子及び磁気メモリ |
| JP2009094104A (ja) * | 2007-10-03 | 2009-04-30 | Toshiba Corp | 磁気抵抗素子 |
| JP2010093091A (ja) * | 2008-10-09 | 2010-04-22 | Hitachi Ltd | 磁気メモリ、磁気メモリアレイおよび磁気メモリアレイへの情報書込み方法 |
| JP2010010720A (ja) * | 2009-10-13 | 2010-01-14 | Toshiba Corp | 磁気抵抗効果素子およびそれを用いた磁気ランダムアクセスメモリ |
Non-Patent Citations (1)
| Title |
|---|
| S.IKEDA(他9名): "A Perpendicular-anisotropy CoFeB-MgO magnetic tunnel junction", NATURE MATERIALS, vol. 9, JPN7014002720, 11 July 2010 (2010-07-11), GB, pages 721 - 724, ISSN: 0002898983 * |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPWO2017010549A1 (ja) * | 2015-07-16 | 2018-05-31 | 国立大学法人東北大学 | 磁気抵抗効果素子および磁気メモリ |
| JPWO2018134929A1 (ja) * | 2017-01-18 | 2019-11-07 | 国立大学法人東北大学 | 磁気抵抗効果素子、磁気メモリ及び磁気抵抗効果素子の製造方法 |
| US11081641B2 (en) | 2017-01-18 | 2021-08-03 | Tohoku University | Magnetoresistance effect element, magnetic memory, and method for manufacturing magnetoresistance effect element |
| JP7018652B2 (ja) | 2017-01-18 | 2022-02-14 | 国立大学法人東北大学 | 磁気抵抗効果素子、磁気メモリ及び磁気抵抗効果素子の製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| US8455967B2 (en) | 2013-06-04 |
| CN102403025A (zh) | 2012-04-04 |
| US20120056286A1 (en) | 2012-03-08 |
| CN102403025B (zh) | 2016-08-03 |
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