JP2012003254A5 - - Google Patents
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- Publication number
- JP2012003254A5 JP2012003254A5 JP2011110265A JP2011110265A JP2012003254A5 JP 2012003254 A5 JP2012003254 A5 JP 2012003254A5 JP 2011110265 A JP2011110265 A JP 2011110265A JP 2011110265 A JP2011110265 A JP 2011110265A JP 2012003254 A5 JP2012003254 A5 JP 2012003254A5
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- light
- pulsed laser
- evaluation
- transfer mask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000010409 thin film Substances 0.000 claims 29
- 238000011156 evaluation Methods 0.000 claims 13
- 238000004519 manufacturing process Methods 0.000 claims 9
- 238000000034 method Methods 0.000 claims 8
- 239000004065 semiconductor Substances 0.000 claims 4
- 239000000758 substrate Substances 0.000 claims 4
- 239000010408 film Substances 0.000 claims 3
- 230000001678 irradiating effect Effects 0.000 claims 3
- 229910052710 silicon Inorganic materials 0.000 claims 3
- 239000010703 silicon Substances 0.000 claims 3
- 229910052723 transition metal Inorganic materials 0.000 claims 3
- 150000003624 transition metals Chemical class 0.000 claims 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims 2
- 239000000463 material Substances 0.000 claims 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 1
- 150000001875 compounds Chemical class 0.000 claims 1
- 239000000356 contaminant Substances 0.000 claims 1
- 229910052757 nitrogen Inorganic materials 0.000 claims 1
- 230000010355 oscillation Effects 0.000 claims 1
- 239000001301 oxygen Substances 0.000 claims 1
- 229910052760 oxygen Inorganic materials 0.000 claims 1
- 238000000059 patterning Methods 0.000 claims 1
- 239000000126 substance Substances 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011110265A JP5917019B2 (ja) | 2010-05-19 | 2011-05-17 | 薄膜の評価方法、及びマスクブランクの製造方法 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010115833 | 2010-05-19 | ||
| JP2010115833 | 2010-05-19 | ||
| JP2011110265A JP5917019B2 (ja) | 2010-05-19 | 2011-05-17 | 薄膜の評価方法、及びマスクブランクの製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2012003254A JP2012003254A (ja) | 2012-01-05 |
| JP2012003254A5 true JP2012003254A5 (enExample) | 2014-06-19 |
| JP5917019B2 JP5917019B2 (ja) | 2016-05-11 |
Family
ID=44972751
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011110265A Active JP5917019B2 (ja) | 2010-05-19 | 2011-05-17 | 薄膜の評価方法、及びマスクブランクの製造方法 |
Country Status (2)
| Country | Link |
|---|---|
| US (2) | US8450030B2 (enExample) |
| JP (1) | JP5917019B2 (enExample) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9224643B2 (en) * | 2011-09-19 | 2015-12-29 | Taiwan Semiconductor Manufacturing Company, Ltd. | Structure and method for tunable interconnect scheme |
| US8974988B2 (en) | 2012-04-20 | 2015-03-10 | Taiwan Semiconductor Manufacturing Company, Ltd. | Mask and method for forming the same |
| WO2014112457A1 (ja) * | 2013-01-15 | 2014-07-24 | Hoya株式会社 | マスクブランク、位相シフトマスクおよびこれらの製造方法 |
| JP6366577B2 (ja) * | 2013-04-26 | 2018-08-01 | 昭和電工株式会社 | 導電パターンの製造方法及び導電パターン形成基板 |
| DE102016203442A1 (de) | 2016-03-02 | 2017-09-07 | Carl Zeiss Smt Gmbh | Projektionsbelichtungsanlage und Verfahren zum Vermessen eines Projektionsobjektives |
| WO2019069397A1 (ja) * | 2017-10-04 | 2019-04-11 | ギガフォトン株式会社 | レーザ加工方法及びレーザ加工システム |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07271014A (ja) * | 1994-03-28 | 1995-10-20 | Toppan Printing Co Ltd | フォトマスクブランク及びその製造方法、並びにこのフォトマスクブランクを使用して製造したフォトマスク |
| JP3472528B2 (ja) * | 1999-06-11 | 2003-12-02 | Ｈｏｙａ株式会社 | 位相シフトマスク及び位相シフトマスクブランク |
| JP2002156742A (ja) | 2000-11-20 | 2002-05-31 | Shin Etsu Chem Co Ltd | 位相シフトマスクブランク、位相シフトマスク及びこれらの製造方法 |
| JP4466805B2 (ja) | 2001-03-01 | 2010-05-26 | 信越化学工業株式会社 | 位相シフトマスクブランク及び位相シフトマスク |
| JP4741986B2 (ja) * | 2006-06-30 | 2011-08-10 | 株式会社日立ハイテクノロジーズ | 光学式検査方法および光学式検査装置 |
| EP2177487B1 (en) * | 2007-08-16 | 2011-12-28 | Asahi Glass Company, Limited | Method of removing contaminant from surface of glass substrate |
-
2011
- 2011-05-17 JP JP2011110265A patent/JP5917019B2/ja active Active
- 2011-05-17 US US13/109,655 patent/US8450030B2/en not_active Expired - Fee Related
-
2013
- 2013-04-26 US US13/871,582 patent/US8609307B2/en active Active
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