JP2012002661A - 外観検査装置 - Google Patents
外観検査装置 Download PDFInfo
- Publication number
- JP2012002661A JP2012002661A JP2010137714A JP2010137714A JP2012002661A JP 2012002661 A JP2012002661 A JP 2012002661A JP 2010137714 A JP2010137714 A JP 2010137714A JP 2010137714 A JP2010137714 A JP 2010137714A JP 2012002661 A JP2012002661 A JP 2012002661A
- Authority
- JP
- Japan
- Prior art keywords
- appearance inspection
- inspection apparatus
- appearance
- inspection
- light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/956—Inspecting patterns on the surface of objects
- G01N21/95684—Patterns showing highly reflecting parts, e.g. metallic elements
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/956—Inspecting patterns on the surface of objects
- G01N2021/95638—Inspecting patterns on the surface of objects for PCB's
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/94—Investigating contamination, e.g. dust
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010137714A JP2012002661A (ja) | 2010-06-16 | 2010-06-16 | 外観検査装置 |
PCT/JP2011/063579 WO2011158826A1 (fr) | 2010-06-16 | 2011-06-14 | Dispositif de contrôle de l'aspect |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010137714A JP2012002661A (ja) | 2010-06-16 | 2010-06-16 | 外観検査装置 |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2012002661A true JP2012002661A (ja) | 2012-01-05 |
Family
ID=45348225
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010137714A Pending JP2012002661A (ja) | 2010-06-16 | 2010-06-16 | 外観検査装置 |
Country Status (2)
Country | Link |
---|---|
JP (1) | JP2012002661A (fr) |
WO (1) | WO2011158826A1 (fr) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2019239501A1 (fr) * | 2018-06-12 | 2019-12-19 | 株式会社エフケー光学研究所 | Dispositif d''examen de corps étranger et procédé d'examen de corps étranger |
Citations (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08304044A (ja) * | 1995-02-07 | 1996-11-22 | Shigeki Kobayashi | 撮像対象領域位置決め撮像装置、検査装置、形状計測装置、及び製品製造方法 |
JPH08327554A (ja) * | 1995-03-31 | 1996-12-13 | Lintec Corp | 照明装置 |
JPH1082622A (ja) * | 1996-09-05 | 1998-03-31 | Dainippon Printing Co Ltd | 基板の検査装置 |
JP2000030041A (ja) * | 1998-07-14 | 2000-01-28 | Olympus Optical Co Ltd | 画像入力装置 |
JP2002310934A (ja) * | 2001-04-18 | 2002-10-23 | Saki Corp:Kk | 外観検査装置 |
JP2004226319A (ja) * | 2003-01-24 | 2004-08-12 | Saki Corp:Kk | 外観検査装置および画像取得方法 |
JP2005188968A (ja) * | 2003-12-24 | 2005-07-14 | Dainippon Printing Co Ltd | 目視検査台 |
JP2006184019A (ja) * | 2004-12-24 | 2006-07-13 | Saki Corp:Kk | 外観検査装置 |
JP2007232445A (ja) * | 2006-02-28 | 2007-09-13 | Web Tec Kk | ラインセンサ検査装置 |
JP3145180U (ja) * | 2008-05-16 | 2008-10-02 | 晶彩科技股▲ふん▼有限公司 | 光学検査モジュール |
JP2010175305A (ja) * | 2009-01-27 | 2010-08-12 | Saki Corp:Kk | 被検査体の検査装置 |
-
2010
- 2010-06-16 JP JP2010137714A patent/JP2012002661A/ja active Pending
-
2011
- 2011-06-14 WO PCT/JP2011/063579 patent/WO2011158826A1/fr active Application Filing
Patent Citations (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08304044A (ja) * | 1995-02-07 | 1996-11-22 | Shigeki Kobayashi | 撮像対象領域位置決め撮像装置、検査装置、形状計測装置、及び製品製造方法 |
JPH08327554A (ja) * | 1995-03-31 | 1996-12-13 | Lintec Corp | 照明装置 |
JPH1082622A (ja) * | 1996-09-05 | 1998-03-31 | Dainippon Printing Co Ltd | 基板の検査装置 |
JP2000030041A (ja) * | 1998-07-14 | 2000-01-28 | Olympus Optical Co Ltd | 画像入力装置 |
JP2002310934A (ja) * | 2001-04-18 | 2002-10-23 | Saki Corp:Kk | 外観検査装置 |
JP2004226319A (ja) * | 2003-01-24 | 2004-08-12 | Saki Corp:Kk | 外観検査装置および画像取得方法 |
JP2005188968A (ja) * | 2003-12-24 | 2005-07-14 | Dainippon Printing Co Ltd | 目視検査台 |
JP2006184019A (ja) * | 2004-12-24 | 2006-07-13 | Saki Corp:Kk | 外観検査装置 |
JP2007232445A (ja) * | 2006-02-28 | 2007-09-13 | Web Tec Kk | ラインセンサ検査装置 |
JP3145180U (ja) * | 2008-05-16 | 2008-10-02 | 晶彩科技股▲ふん▼有限公司 | 光学検査モジュール |
JP2010175305A (ja) * | 2009-01-27 | 2010-08-12 | Saki Corp:Kk | 被検査体の検査装置 |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2019239501A1 (fr) * | 2018-06-12 | 2019-12-19 | 株式会社エフケー光学研究所 | Dispositif d''examen de corps étranger et procédé d'examen de corps étranger |
CN112236671A (zh) * | 2018-06-12 | 2021-01-15 | Fk光学研究所股份有限公司 | 异物检查装置及异物检查方法 |
TWI721447B (zh) * | 2018-06-12 | 2021-03-11 | 日商Fk光學研究所股份有限公司 | 異物檢查裝置及異物檢查方法 |
JPWO2019239501A1 (ja) * | 2018-06-12 | 2021-03-18 | 株式会社 エフケー光学研究所 | 異物検査装置及び異物検査方法 |
Also Published As
Publication number | Publication date |
---|---|
WO2011158826A1 (fr) | 2011-12-22 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20120117 |