JP2011527436A - スパッタ耐性材料を含む極紫外線放射反射要素 - Google Patents

スパッタ耐性材料を含む極紫外線放射反射要素 Download PDF

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Publication number
JP2011527436A
JP2011527436A JP2011517284A JP2011517284A JP2011527436A JP 2011527436 A JP2011527436 A JP 2011527436A JP 2011517284 A JP2011517284 A JP 2011517284A JP 2011517284 A JP2011517284 A JP 2011517284A JP 2011527436 A JP2011527436 A JP 2011527436A
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JP
Japan
Prior art keywords
extreme ultraviolet
ultraviolet radiation
layer
element according
reflecting element
Prior art date
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Pending
Application number
JP2011517284A
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English (en)
Japanese (ja)
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JP2011527436A5 (https=
Inventor
クリストフ メッツマケル
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Koninklijke Philips NV
Koninklijke Philips Electronics NV
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Publication date
Application filed by Koninklijke Philips NV, Koninklijke Philips Electronics NV filed Critical Koninklijke Philips NV
Publication of JP2011527436A publication Critical patent/JP2011527436A/ja
Publication of JP2011527436A5 publication Critical patent/JP2011527436A5/ja
Pending legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/28—Interference filters
    • G02B5/283—Interference filters designed for the ultraviolet
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G21K1/062—Devices having a multilayer structure
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/061—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements characterised by a multilayer structure
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/067—Construction details

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Theoretical Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Optical Elements Other Than Lenses (AREA)
JP2011517284A 2008-07-07 2009-07-01 スパッタ耐性材料を含む極紫外線放射反射要素 Pending JP2011527436A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP08104648 2008-07-07
EP08104648.4 2008-07-07
PCT/IB2009/052855 WO2010004482A1 (en) 2008-07-07 2009-07-01 Extreme uv radiation reflecting element comprising a sputter-resistant material

Publications (2)

Publication Number Publication Date
JP2011527436A true JP2011527436A (ja) 2011-10-27
JP2011527436A5 JP2011527436A5 (https=) 2016-03-10

Family

ID=41151943

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011517284A Pending JP2011527436A (ja) 2008-07-07 2009-07-01 スパッタ耐性材料を含む極紫外線放射反射要素

Country Status (5)

Country Link
US (1) US8693090B2 (https=)
EP (1) EP2297746A1 (https=)
JP (1) JP2011527436A (https=)
CN (1) CN102138185B (https=)
WO (1) WO2010004482A1 (https=)

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KR101846336B1 (ko) 2010-06-25 2018-04-06 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치 및 방법
WO2012041697A1 (en) * 2010-09-27 2012-04-05 Carl Zeiss Smt Gmbh Mirror, projection objective comprising such a mirror, and projection exposure apparatus for microlithography comprising such a projection objective
CN102621815B (zh) * 2011-01-26 2016-12-21 Asml荷兰有限公司 用于光刻设备的反射光学部件及器件制造方法
DE102012207125A1 (de) 2012-04-27 2013-03-28 Carl Zeiss Smt Gmbh Optisches Element und optisches System für die EUV-Lithographie sowie Verfahren zum Optimieren eines Schutzlagensystems für ein optisches Element
US9696467B2 (en) * 2014-01-31 2017-07-04 Corning Incorporated UV and DUV expanded cold mirrors
GB2551079A (en) * 2015-03-19 2017-12-06 Halliburton Energy Services Inc Mesh reinforcement for metal-matrix composite tools
US10128016B2 (en) * 2016-01-12 2018-11-13 Asml Netherlands B.V. EUV element having barrier to hydrogen transport
CN109370271B (zh) * 2018-10-29 2021-05-25 山东建筑大学 一种新型的耐辐照空间固体润滑剂涂层及制备方法
EP3779525B1 (en) * 2019-08-13 2024-01-03 Istituto Nazionale di Astrofisica Method for applying a carbon-based reflective overcoating on a grazing incidence optical unit
CN116165734B (zh) * 2023-03-01 2025-12-02 苏州江泓电子科技有限公司 一种反射镜及其制备方法和应用

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JPH02238400A (ja) * 1989-03-13 1990-09-20 Nippon Telegr & Teleph Corp <Ntt> 多層膜
JP2007109971A (ja) * 2005-10-14 2007-04-26 Hoya Corp 多層反射膜付き基板、その製造方法、反射型マスクブランクおよび反射型マスク
JP2008109060A (ja) * 2005-11-10 2008-05-08 Asahi Glass Co Ltd Ｅｕｖリソグラフィ用反射型マスクブランクの多層反射膜を成膜する方法、ならびにｅｕｖリソグラフィ用反射型マスクブランクの製造方法
US20080149854A1 (en) * 2006-12-22 2008-06-26 Asml Netherlands B.V. Illumination system, lithographic apparatus, mirror, method of removing contamination from a mirror and device manufacturing method
JP4466566B2 (ja) * 2003-10-15 2010-05-26 株式会社ニコン 多層膜反射鏡、多層膜反射鏡の製造方法、及び露光装置

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US5433988A (en) * 1986-10-01 1995-07-18 Canon Kabushiki Kaisha Multi-layer reflection mirror for soft X-ray to vacuum ultraviolet ray
TWI267704B (en) * 1999-07-02 2006-12-01 Asml Netherlands Bv Capping layer for EUV optical elements
US6664554B2 (en) 2001-01-03 2003-12-16 Euv Llc Self-cleaning optic for extreme ultraviolet lithography
EP1402542B1 (en) 2001-07-03 2007-09-26 EUV Limited Liability Corporation Passivating overcoat bilayer
US20030008148A1 (en) * 2001-07-03 2003-01-09 Sasa Bajt Optimized capping layers for EUV multilayers
US7234064B2 (en) * 2002-08-16 2007-06-19 Hx Technologies, Inc. Methods and systems for managing patient authorizations relating to digital medical data
US7420653B2 (en) * 2003-10-02 2008-09-02 Asml Netherlands B.V. Lithographic projection apparatus, mirror, method of supplying a protective cap layer, device manufacturing method and device manufactured accordingly
US7193228B2 (en) * 2004-03-10 2007-03-20 Cymer, Inc. EUV light source optical elements
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JP2006153528A (ja) 2004-11-26 2006-06-15 Canon Inc 軟ｘ線多層膜反射鏡、軟ｘ線多層膜反射鏡による投影光学系を備えた露光装置
DE102004062289B4 (de) * 2004-12-23 2007-07-19 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Thermisch stabiler Multilayer-Spiegel für den EUV-Spektralbereich
JP2006332153A (ja) * 2005-05-24 2006-12-07 Hoya Corp 反射型マスクブランク及び反射型マスク並びに半導体装置の製造方法
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Patent Citations (5)

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Publication number Priority date Publication date Assignee Title
JPH02238400A (ja) * 1989-03-13 1990-09-20 Nippon Telegr & Teleph Corp <Ntt> 多層膜
JP4466566B2 (ja) * 2003-10-15 2010-05-26 株式会社ニコン 多層膜反射鏡、多層膜反射鏡の製造方法、及び露光装置
JP2007109971A (ja) * 2005-10-14 2007-04-26 Hoya Corp 多層反射膜付き基板、その製造方法、反射型マスクブランクおよび反射型マスク
JP2008109060A (ja) * 2005-11-10 2008-05-08 Asahi Glass Co Ltd Ｅｕｖリソグラフィ用反射型マスクブランクの多層反射膜を成膜する方法、ならびにｅｕｖリソグラフィ用反射型マスクブランクの製造方法
US20080149854A1 (en) * 2006-12-22 2008-06-26 Asml Netherlands B.V. Illumination system, lithographic apparatus, mirror, method of removing contamination from a mirror and device manufacturing method

Also Published As

Publication number Publication date
US20110096428A1 (en) 2011-04-28
US8693090B2 (en) 2014-04-08
CN102138185B (zh) 2015-09-09
EP2297746A1 (en) 2011-03-23
WO2010004482A1 (en) 2010-01-14
CN102138185A (zh) 2011-07-27

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