JP2011524646A - 太陽電池セル用電極の製造方法 - Google Patents

太陽電池セル用電極の製造方法 Download PDF

Info

Publication number
JP2011524646A
JP2011524646A JP2011513989A JP2011513989A JP2011524646A JP 2011524646 A JP2011524646 A JP 2011524646A JP 2011513989 A JP2011513989 A JP 2011513989A JP 2011513989 A JP2011513989 A JP 2011513989A JP 2011524646 A JP2011524646 A JP 2011524646A
Authority
JP
Japan
Prior art keywords
dispersion
electrode
solar cell
laser
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2011513989A
Other languages
English (en)
Japanese (ja)
Other versions
JP2011524646A5 (https=
Inventor
ロホトマン，レネ
ヴァーグナー，ノルベルト
カクツン，ユルゲン
プフィスター，ユルゲン
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF SE
Original Assignee
BASF SE
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by BASF SE filed Critical BASF SE
Publication of JP2011524646A publication Critical patent/JP2011524646A/ja
Publication of JP2011524646A5 publication Critical patent/JP2011524646A5/ja
Pending legal-status Critical Current

Links

Images

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00—Manufacture or treatment of devices covered by this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00—Constructional details of devices covered by this subclass
    • H10F77/20—Electrodes
    • H10F77/206—Electrodes for devices having potential barriers
    • H10F77/211—Electrodes for devices having potential barriers for photovoltaic cells
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F10/00—Individual photovoltaic cells, e.g. solar cells
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00—Constructional details of devices covered by this subclass
    • H10F77/20—Electrodes
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy

Landscapes

  • Conductive Materials (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Photovoltaic Devices (AREA)
  • Inert Electrodes (AREA)
  • Catalysts (AREA)
  • Hybrid Cells (AREA)
JP2011513989A 2008-06-18 2009-06-09 太陽電池セル用電極の製造方法 Pending JP2011524646A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP08158506 2008-06-18
EP08158506.9 2008-06-18
PCT/EP2009/057103 WO2009153192A2 (de) 2008-06-18 2009-06-09 Verfahren zur herstellung von elektroden für solarzellen

Publications (2)

Publication Number Publication Date
JP2011524646A true JP2011524646A (ja) 2011-09-01
JP2011524646A5 JP2011524646A5 (https=) 2016-02-25

Family

ID=41434490

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011513989A Pending JP2011524646A (ja) 2008-06-18 2009-06-09 太陽電池セル用電極の製造方法

Country Status (11)

Country Link
US (1) US8247320B2 (https=)
EP (1) EP2304814A2 (https=)
JP (1) JP2011524646A (https=)
KR (1) KR20110030539A (https=)
CN (1) CN102067323A (https=)
CA (1) CA2728055C (https=)
IL (1) IL209780A (https=)
MY (1) MY155485A (https=)
RU (1) RU2505889C2 (https=)
TW (1) TWI580059B (https=)
WO (1) WO2009153192A2 (https=)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013165056A (ja) * 2011-11-04 2013-08-22 Heraeus Precious Metals North America Conshohocken Llc 電気伝導性ペースト用有機媒体
KR20200122385A (ko) * 2019-01-28 2020-10-27 와커 헤미 아게 레이저 전사 인쇄에 의하여 적어도 하나의 실리콘층을 적용하는 방법

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9396833B2 (en) 2009-09-04 2016-07-19 Basf Se Composition for printing electrodes
MX2012009464A (es) * 2010-02-17 2012-09-12 Basf Se Proceso para producir uniones conductoras de electricidad entre celdas solares.
US20120231574A1 (en) * 2011-03-12 2012-09-13 Jiaxiong Wang Continuous Electroplating Apparatus with Assembled Modular Sections for Fabrications of Thin Film Solar Cells
CN103597547B (zh) * 2011-03-29 2016-12-21 太阳化学公司 含有蜡触变胶的可高纵横比丝网印刷的厚膜糊剂组合物
US9834693B2 (en) * 2011-04-22 2017-12-05 Northwestern University Methods for preparation of concentrated graphene ink compositions and related composite materials
US9902866B2 (en) * 2011-04-22 2018-02-27 Northwestern University Methods for preparation of concentrated graphene ink compositions and related composite materials
DE102011075025A1 (de) * 2011-04-29 2012-10-31 Schmid Technology Gmbh Verfahren und Vorrichtung zum Aufbringen von Drucksubstanz
KR101275636B1 (ko) 2011-08-30 2013-06-17 전자부품연구원 도핑 폴리머층을 포함하는 그래핀 기반 적층체
DE102012003866B4 (de) * 2012-02-23 2013-07-25 Universität Stuttgart Verfahren zum Kontaktieren eines Halbleitersubstrates, insbesondere zum Kontaktieren von Solarzellen, sowie Solarzellen
CN103366859B (zh) * 2012-03-29 2016-08-03 比亚迪股份有限公司 一种太阳能电池用导电浆料及其制备方法
CN103264226A (zh) * 2013-05-23 2013-08-28 广东工业大学 一种基于激光空化的碳纳米管植入方法
CN103779431B (zh) * 2013-12-19 2016-03-09 湖南红太阳光电科技有限公司 一种制备晶硅电池金属电极的方法
WO2016003987A1 (en) * 2014-07-02 2016-01-07 E. I. Du Pont De Nemours And Company Fabrication method of solar cell electrode using a conductive paste that comprises an organic elastomer
TW201618319A (zh) * 2014-11-07 2016-05-16 Taiwan Carbon Nano Technology Corp 用於太陽能電池製程之導電助劑及使用該導電助劑的導電漿料
EP3210793B1 (de) * 2016-02-26 2018-04-18 LPKF Laser & Electronics AG Verfahren zum übertragen einer drucksubstanz auf ein substrat mittels einer laserstrahlung
CN106653148A (zh) * 2016-12-16 2017-05-10 杭州杭硕新材料科技有限公司 一种晶硅太阳能电池背面电极银浆及其制备方法
DE102017110040B4 (de) * 2017-05-10 2020-08-27 LPKF SolarQuipment GmbH Druckvorrichtung und Druckverfahren zur Übertragung einer Drucksubstanz von einem endlos umlaufenden Drucksubstanzträger auf ein Substrat
KR102220531B1 (ko) 2018-04-23 2021-02-24 삼성에스디아이 주식회사 전극 형성용 조성물 및 이로부터 제조된 전극과 태양전지
KR102238769B1 (ko) * 2018-04-23 2021-04-09 삼성에스디아이 주식회사 전극 형성용 조성물 및 이로부터 제조된 전극과 태양전지
DE102018111132A1 (de) * 2018-05-09 2019-11-14 Lpkf Laser & Electronics Aktiengesellschaft Verwendung einer Komponente in einer Zusammensetzung, Zusammensetzung für den Lasertransferdruck sowie Lasertransferdruckverfahren
CN111009590A (zh) * 2019-10-14 2020-04-14 中建材浚鑫科技有限公司 一种hjt太阳电池及其制备方法
CN111009588A (zh) * 2019-10-14 2020-04-14 中建材浚鑫科技有限公司 一种perc电池及其制备方法
WO2022231460A1 (ru) * 2021-04-28 2022-11-03 Илья Валентинович СМИРНОВ Материал с покрытием, нанесенным лазером
KR20240052090A (ko) 2021-10-13 2024-04-22 와커 헤미 아게 탄소 나노튜브 및 카본 블랙을 포함하는 전기 전도성 실리콘 조성물
EP4364536B1 (de) 2021-10-13 2025-01-29 Wacker Chemie AG Elektrisch leitfähige elastomere drucktinte für kontaktlose druckverfahren
WO2023237192A1 (de) 2022-06-08 2023-12-14 Wacker Chemie Ag Elektrisch leitfähige elastomere drucktinte für kontaktlose druckverfahren
CN115148837A (zh) * 2022-06-29 2022-10-04 浙江晶科能源有限公司 一种太阳能电池及其制备方法和光伏组件
CN115083659B (zh) * 2022-07-20 2024-10-25 常州聚和新材料股份有限公司 用于激光转印的导电浆料、其制备方法及应用

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003528751A (ja) * 2000-03-30 2003-09-30 オウレンタム イノベーションズ テクノロジエン ゲーエムベーハー 印刷方法およびその印刷機械
US7014885B1 (en) * 1999-07-19 2006-03-21 The United States Of America As Represented By The Secretary Of The Navy Direct-write laser transfer and processing
WO2007134300A2 (en) * 2006-05-12 2007-11-22 Photon Dynamics, Inc. Deposition repair apparatus and methods
WO2007144322A1 (de) * 2006-06-14 2007-12-21 Basf Se Verfahren zur herstellung von elektrisch leitfähigen oberflächen auf einem träger

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4375007A (en) 1980-11-26 1983-02-22 E. I. Du Pont De Nemours & Co. Silicon solar cells with aluminum-magnesium alloy low resistance contacts
DE3702643A1 (de) 1986-02-10 1987-08-13 Toshiba Kawasaki Kk Tintenstrahlschreiber sowie schreibkopf und schreibkopfkassette dafuer
GB9803972D0 (en) 1998-02-25 1998-04-22 Noble Peter J W A deposition method and apparatus therefor
GB2336161B (en) * 1998-04-06 2003-03-26 John Michael Lowe Method of providing conductive tracks on a printed circuit and apparatus for use in carrying out the method
US6177151B1 (en) 1999-01-27 2001-01-23 The United States Of America As Represented By The Secretary Of The Navy Matrix assisted pulsed laser evaporation direct write
DE10051850A1 (de) 2000-03-30 2001-10-11 Aurentum Innovationstechnologi Druckverfahren und Druckmaschine hierfür
TW200521171A (en) * 2003-12-26 2005-07-01 Toshiba Kk Resin particles and resin layer containing metal micro particles, its forming method and circuit base board
KR101146811B1 (ko) * 2004-03-04 2012-05-22 에보니크 데구사 게엠베하 착색제로 착색된 레이져-용접가능한 투명, 반투명, 또는 불투명 플라스틱 재료
RU2303831C2 (ru) * 2004-06-21 2007-07-27 Открытое Акционерное Общество "Завод электронных материалов и приборов "Аналог" Паста алюминиевая для кремниевых солнечных элементов
US20070169806A1 (en) 2006-01-20 2007-07-26 Palo Alto Research Center Incorporated Solar cell production using non-contact patterning and direct-write metallization
JP2007194580A (ja) 2005-12-21 2007-08-02 E I Du Pont De Nemours & Co 太陽電池電極用ペースト
WO2008001430A1 (fr) 2006-06-27 2008-01-03 Mitsubishi Electric Corporation machine de sérigraphie et cellule de batterie solaire
DE102006033887B4 (de) 2006-07-21 2015-04-09 Leonhard Kurz Gmbh & Co. Kg Verfahren zur Herstellung eines Mehrschichtkörpers mit leitfähiger Polymerschicht
GB0615651D0 (en) 2006-08-07 2006-09-13 Sun Chemical Bv A process for manufacturing solar cells
CA2674702A1 (en) 2007-01-05 2008-07-10 Basf Se Method for producing electrically conductive surfaces

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7014885B1 (en) * 1999-07-19 2006-03-21 The United States Of America As Represented By The Secretary Of The Navy Direct-write laser transfer and processing
JP2003528751A (ja) * 2000-03-30 2003-09-30 オウレンタム イノベーションズ テクノロジエン ゲーエムベーハー 印刷方法およびその印刷機械
WO2007134300A2 (en) * 2006-05-12 2007-11-22 Photon Dynamics, Inc. Deposition repair apparatus and methods
WO2007144322A1 (de) * 2006-06-14 2007-12-21 Basf Se Verfahren zur herstellung von elektrisch leitfähigen oberflächen auf einem träger

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013165056A (ja) * 2011-11-04 2013-08-22 Heraeus Precious Metals North America Conshohocken Llc 電気伝導性ペースト用有機媒体
US10170645B2 (en) 2011-11-04 2019-01-01 Heraeus Precious Metals North America Conshohocken Llc Organic vehicle for electroconductive paste
KR20200122385A (ko) * 2019-01-28 2020-10-27 와커 헤미 아게 레이저 전사 인쇄에 의하여 적어도 하나의 실리콘층을 적용하는 방법
JP2021517066A (ja) * 2019-01-28 2021-07-15 ワッカー ケミー アクチエンゲゼルシャフトＷａｃｋｅｒ Ｃｈｅｍｉｅ ＡＧ レーザー転写印刷による少なくとも１つのシリコーン層の塗布方法
JP7019834B2 (ja) 2019-01-28 2022-02-15 ワッカー ケミー アクチエンゲゼルシャフト レーザー転写印刷による少なくとも１つのシリコーン層の塗布方法
KR102443560B1 (ko) 2019-01-28 2022-09-14 와커 헤미 아게 레이저 전사 인쇄에 의하여 적어도 하나의 실리콘층을 적용하는 방법

Also Published As

Publication number Publication date
EP2304814A2 (de) 2011-04-06
RU2505889C2 (ru) 2014-01-27
CA2728055A1 (en) 2009-12-23
WO2009153192A2 (de) 2009-12-23
CN102067323A (zh) 2011-05-18
IL209780A0 (en) 2011-02-28
KR20110030539A (ko) 2011-03-23
MY155485A (en) 2015-10-30
US20110151614A1 (en) 2011-06-23
TW201005960A (en) 2010-02-01
IL209780A (en) 2015-11-30
RU2011101492A (ru) 2012-07-27
WO2009153192A3 (de) 2010-11-25
CA2728055C (en) 2017-04-04
TWI580059B (zh) 2017-04-21
US8247320B2 (en) 2012-08-21

Similar Documents

Publication Publication Date Title
JP2011524646A (ja) 太陽電池セル用電極の製造方法
JP5898097B2 (ja) 太陽電池間の導電性接着剤の調製方法
KR100613160B1 (ko) 성막 방법, 배선 패턴의 형성 방법 및 반도체 장치의 제조 방법
CN108257854B (zh) 一种图形化掩模的制造方法
US7105264B2 (en) Method for forming patterned conductive film, electrooptical device, and electronic appliance
JP2000515083A (ja) 高解像度発光アレイの作成方法およびそれに対応する物品
TWI285800B (en) Method for forming photoresist pattern, method for forming wiring pattern, method for making semiconductor devices, electro-optical device and electronic apparatus
CN112517922B (zh) 一种高重频超快激光高效直写制造金属微结构的方法
CN101410947A (zh) 一种修补聚合物掩模的方法
KR101399419B1 (ko) 태양전지의 전면전극 형성방법
WO2010081533A2 (de) Verfahren und vorrichtung zur simultanen mikrostrukturierung und passivierung
JP2010103482A (ja) 光起電モジュールの製造方法
CN116100972B (zh) 一种基于激光转印的全彩荧光薄膜图案化方法
CN114883516B (zh) 一种基于激光烧蚀的荧光薄膜图案化方法及其应用
Moorhouse et al. Laser patterning of smart nanomaterials for reel-to-reel production of organic photovoltaic (OPV) devices
JP2013132703A (ja) マイクロ構造体の製造方法
Munoz-Martin et al. Laser printing and curing/sintering of silver paste lines for solar cell metallization
Rublack et al. Increasing solar-cell efficiency by femtosecond laser microstructuring
Crozier Development of a novel series interconnect for thin-film photovoltaics
JP2013135070A (ja) パターン形成方法および金属パターン

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20120608

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20130806

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20130807

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20131105

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20131112

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20131204

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20131211

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20131227

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20140110

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20140203

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20140408

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20151009

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20151112

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20151214

A524 Written submission of copy of amendment under article 19 pct

Free format text: JAPANESE INTERMEDIATE CODE: A524

Effective date: 20160108