JP2011520641A5 - - Google Patents

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Publication number
JP2011520641A5
JP2011520641A5 JP2011502956A JP2011502956A JP2011520641A5 JP 2011520641 A5 JP2011520641 A5 JP 2011520641A5 JP 2011502956 A JP2011502956 A JP 2011502956A JP 2011502956 A JP2011502956 A JP 2011502956A JP 2011520641 A5 JP2011520641 A5 JP 2011520641A5
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JP
Japan
Prior art keywords
imprint lithography
droplets
lithography template
membrane sheet
polymerizable material
Prior art date
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Application number
JP2011502956A
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English (en)
Japanese (ja)
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JP5613658B2 (ja
JP2011520641A (ja
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Publication date
Priority claimed from US12/415,563 external-priority patent/US8187515B2/en
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Publication of JP2011520641A publication Critical patent/JP2011520641A/ja
Publication of JP2011520641A5 publication Critical patent/JP2011520641A5/ja
Application granted granted Critical
Publication of JP5613658B2 publication Critical patent/JP5613658B2/ja
Active legal-status Critical Current
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JP2011502956A 2008-04-01 2009-04-01 大面積ロールツーロール・インプリント・リソグラフィ Active JP5613658B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US4126408P 2008-04-01 2008-04-01
US61/041,264 2008-04-01
US12/415,563 2009-03-31
US12/415,563 US8187515B2 (en) 2008-04-01 2009-03-31 Large area roll-to-roll imprint lithography
PCT/US2009/002032 WO2009123721A2 (en) 2008-04-01 2009-04-01 Large area roll-to-roll imprint lithography

Publications (3)

Publication Number Publication Date
JP2011520641A JP2011520641A (ja) 2011-07-21
JP2011520641A5 true JP2011520641A5 (https=) 2012-05-17
JP5613658B2 JP5613658B2 (ja) 2014-10-29

Family

ID=41115897

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011502956A Active JP5613658B2 (ja) 2008-04-01 2009-04-01 大面積ロールツーロール・インプリント・リソグラフィ

Country Status (8)

Country Link
US (1) US8187515B2 (https=)
EP (1) EP2262592A4 (https=)
JP (1) JP5613658B2 (https=)
KR (1) KR101767966B1 (https=)
CN (1) CN101990470B (https=)
MY (1) MY152467A (https=)
TW (1) TWI391233B (https=)
WO (1) WO2009123721A2 (https=)

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US20080160129A1 (en) * 2006-05-11 2008-07-03 Molecular Imprints, Inc. Template Having a Varying Thickness to Facilitate Expelling a Gas Positioned Between a Substrate and the Template
EP1768846B1 (en) * 2004-06-03 2010-08-11 Molecular Imprints, Inc. Fluid dispensing and drop-on-demand dispensing for nano-scale manufacturing
KR20100090046A (ko) * 2009-02-05 2010-08-13 엘지디스플레이 주식회사 박막 태양전지 및 그 제조방법
JP5411557B2 (ja) * 2009-04-03 2014-02-12 株式会社日立ハイテクノロジーズ 微細構造転写装置
KR20110066793A (ko) * 2009-12-11 2011-06-17 엘지디스플레이 주식회사 패터닝 장치
US8691134B2 (en) 2010-01-28 2014-04-08 Molecular Imprints, Inc. Roll-to-roll imprint lithography and purging system
JP5828626B2 (ja) * 2010-10-04 2015-12-09 キヤノン株式会社 インプリント方法
JP2013064836A (ja) * 2011-09-16 2013-04-11 Olympus Corp 微細構造形成用型および光学素子の製造方法
US9616614B2 (en) * 2012-02-22 2017-04-11 Canon Nanotechnologies, Inc. Large area imprint lithography
JP6412317B2 (ja) 2013-04-24 2018-10-24 キヤノン株式会社 インプリント方法、インプリント装置および物品の製造方法
US9718096B2 (en) 2013-08-19 2017-08-01 Board Of Regents, The University Of Texas System Programmable deposition of thin films of a user-defined profile with nanometer scale accuracy
KR102292465B1 (ko) * 2013-08-19 2021-08-20 보드 오브 레젼츠, 더 유니버시티 오브 텍사스 시스템 나노미터 스케일 정확도를 갖는 사용자 정의 프로파일의 프로그램 가능한 박막 적층 방법
JP6399839B2 (ja) * 2014-07-15 2018-10-03 キヤノン株式会社 インプリント装置、および物品の製造方法
PL3218179T3 (pl) * 2014-11-05 2019-02-28 Bobst Mex Sa Sposoby wykonania żeńskiego narzędzia do wytłaczania, narzędzia do wytłaczania, moduł i sposób wytłaczania oraz maszyna do wytłaczania wyposażona w takie narzędzia
CN121551242A (zh) * 2015-10-15 2026-02-24 德克萨斯大学系统董事会 用于精密纳米尺度制造的通用过程
SG10201709153VA (en) * 2016-12-12 2018-07-30 Canon Kk Fluid droplet methodology and apparatus for imprint lithography
US11131923B2 (en) * 2018-10-10 2021-09-28 Canon Kabushiki Kaisha System and method of assessing surface quality by optically analyzing dispensed drops
US12578637B2 (en) * 2019-05-13 2026-03-17 Board Of Regents, The University Of Texas System Roll-to-roll nanoimprint lithography tools and processes
US11562924B2 (en) * 2020-01-31 2023-01-24 Canon Kabushiki Kaisha Planarization apparatus, planarization process, and method of manufacturing an article
US11908711B2 (en) 2020-09-30 2024-02-20 Canon Kabushiki Kaisha Planarization process, planarization system and method of manufacturing an article

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US20060062922A1 (en) * 2004-09-23 2006-03-23 Molecular Imprints, Inc. Polymerization technique to attenuate oxygen inhibition of solidification of liquids and composition therefor
JP5198071B2 (ja) 2004-12-01 2013-05-15 モレキュラー・インプリンツ・インコーポレーテッド インプリントリソグラフィ・プロセスにおける熱管理のための露光方法
WO2006098934A1 (en) * 2005-03-09 2006-09-21 3M Innovative Properties Company Apparatus and method for making microreplicated article
CN101573659A (zh) * 2005-12-08 2009-11-04 分子制模股份有限公司 排除位于基板和模具之间的气体的方法
JP4778788B2 (ja) * 2005-12-28 2011-09-21 東芝機械株式会社 微細パターンシート作成装置および微細パターンシート作成方法
WO2007136832A2 (en) * 2006-05-18 2007-11-29 Molecular Imprints, Inc. Method for expelling gas positioned between a substrate and a mold
KR100804734B1 (ko) * 2007-02-22 2008-02-19 연세대학교 산학협력단 자외선 롤 나노임프린팅을 이용한 연속 리소그라피 장치 및 방법

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