CN101990470B - 大面积辊子对辊子的刻印平版印刷 - Google Patents

大面积辊子对辊子的刻印平版印刷 Download PDF

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Publication number
CN101990470B
CN101990470B CN200980112481.2A CN200980112481A CN101990470B CN 101990470 B CN101990470 B CN 101990470B CN 200980112481 A CN200980112481 A CN 200980112481A CN 101990470 B CN101990470 B CN 101990470B
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CN
China
Prior art keywords
membrane
template
polymerizable material
droplets
layer
Prior art date
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Active
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CN200980112481.2A
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English (en)
Chinese (zh)
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CN101990470A (zh
Inventor
S·V·斯里尼瓦桑
S·辛格豪尔
B-J·乔伊
I·M·麦克麦基
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Nanotechnologies Inc
University of Texas System
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University of Texas System
Molecular Imprints Inc
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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B29C59/04—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing using rollers or endless belts
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C43/00—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
    • B29C43/32—Component parts, details or accessories; Auxiliary operations
    • B29C43/44—Compression means for making articles of indefinite length
    • B29C43/46—Rollers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures

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  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
CN200980112481.2A 2008-04-01 2009-04-01 大面积辊子对辊子的刻印平版印刷 Active CN101990470B (zh)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US4126408P 2008-04-01 2008-04-01
US61/041,264 2008-04-01
US12/415,563 2009-03-31
US12/415,563 US8187515B2 (en) 2008-04-01 2009-03-31 Large area roll-to-roll imprint lithography
PCT/US2009/002032 WO2009123721A2 (en) 2008-04-01 2009-04-01 Large area roll-to-roll imprint lithography

Publications (2)

Publication Number Publication Date
CN101990470A CN101990470A (zh) 2011-03-23
CN101990470B true CN101990470B (zh) 2016-05-04

Family

ID=41115897

Family Applications (1)

Application Number Title Priority Date Filing Date
CN200980112481.2A Active CN101990470B (zh) 2008-04-01 2009-04-01 大面积辊子对辊子的刻印平版印刷

Country Status (8)

Country Link
US (1) US8187515B2 (https=)
EP (1) EP2262592A4 (https=)
JP (1) JP5613658B2 (https=)
KR (1) KR101767966B1 (https=)
CN (1) CN101990470B (https=)
MY (1) MY152467A (https=)
TW (1) TWI391233B (https=)
WO (1) WO2009123721A2 (https=)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080160129A1 (en) * 2006-05-11 2008-07-03 Molecular Imprints, Inc. Template Having a Varying Thickness to Facilitate Expelling a Gas Positioned Between a Substrate and the Template
DE602005022874D1 (de) * 2004-06-03 2010-09-23 Molecular Imprints Inc Fluidausgabe und tropfenausgabe nach bedarf für die herstellung im nanobereich
KR20100090046A (ko) * 2009-02-05 2010-08-13 엘지디스플레이 주식회사 박막 태양전지 및 그 제조방법
JP5411557B2 (ja) * 2009-04-03 2014-02-12 株式会社日立ハイテクノロジーズ 微細構造転写装置
KR20110066793A (ko) * 2009-12-11 2011-06-17 엘지디스플레이 주식회사 패터닝 장치
US8691134B2 (en) * 2010-01-28 2014-04-08 Molecular Imprints, Inc. Roll-to-roll imprint lithography and purging system
JP5828626B2 (ja) * 2010-10-04 2015-12-09 キヤノン株式会社 インプリント方法
JP2013064836A (ja) * 2011-09-16 2013-04-11 Olympus Corp 微細構造形成用型および光学素子の製造方法
US9616614B2 (en) * 2012-02-22 2017-04-11 Canon Nanotechnologies, Inc. Large area imprint lithography
JP6412317B2 (ja) 2013-04-24 2018-10-24 キヤノン株式会社 インプリント方法、インプリント装置および物品の製造方法
US9718096B2 (en) 2013-08-19 2017-08-01 Board Of Regents, The University Of Texas System Programmable deposition of thin films of a user-defined profile with nanometer scale accuracy
KR102292465B1 (ko) * 2013-08-19 2021-08-20 보드 오브 레젼츠, 더 유니버시티 오브 텍사스 시스템 나노미터 스케일 정확도를 갖는 사용자 정의 프로파일의 프로그램 가능한 박막 적층 방법
JP6399839B2 (ja) * 2014-07-15 2018-10-03 キヤノン株式会社 インプリント装置、および物品の製造方法
ES2701477T3 (es) * 2014-11-05 2019-02-22 Bobst Mex Sa Procedimientos de realización de una herramienta de estampado hembra, herramientas de estampado, módulo y procedimiento de estampado y máquina de estampado equipada con dichas herramientas
CA3001848C (en) * 2015-10-15 2023-09-19 Board Of Regents, The University Of Texas System Versatile process for precision nanoscale manufacturing
SG10201709153VA (en) * 2016-12-12 2018-07-30 Canon Kk Fluid droplet methodology and apparatus for imprint lithography
US11131923B2 (en) * 2018-10-10 2021-09-28 Canon Kabushiki Kaisha System and method of assessing surface quality by optically analyzing dispensed drops
EP3969244A4 (en) * 2019-05-13 2023-09-13 Board of Regents, The University of Texas System ROLL-TO-ROLL PROCESS FOR NANOIMPRINT LITHOGRAPHY TOOLS
US11562924B2 (en) * 2020-01-31 2023-01-24 Canon Kabushiki Kaisha Planarization apparatus, planarization process, and method of manufacturing an article
US11908711B2 (en) 2020-09-30 2024-02-20 Canon Kabushiki Kaisha Planarization process, planarization system and method of manufacturing an article

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101019066A (zh) * 2004-06-03 2007-08-15 分子制模股份有限公司 用于纳米规模制造的流体分配和按需液滴分配
CN101022894A (zh) * 2004-09-23 2007-08-22 分子制模股份有限公司 减小氧气抑制液体固化的聚合技术以及用于该技术的组合物
WO2007136832A2 (en) * 2006-05-18 2007-11-29 Molecular Imprints, Inc. Method for expelling gas positioned between a substrate and a mold

Family Cites Families (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0408283B1 (en) * 1989-07-12 1995-09-27 Canon Kabushiki Kaisha Apparatus for producing substrate sheet for optical recording mediums and process for producing substrate sheet for optical recording mediums making use of it, apparatus for producing optical recording medium and process for producing optical recording medium making use of it.
US6334960B1 (en) * 1999-03-11 2002-01-01 Board Of Regents, The University Of Texas System Step and flash imprint lithography
SG142150A1 (en) * 2000-07-16 2008-05-28 Univ Texas High-resolution overlay alignment systems for imprint lithography
KR100827741B1 (ko) * 2000-07-17 2008-05-07 보드 오브 리전츠, 더 유니버시티 오브 텍사스 시스템 임프린트 리소그래피 공정을 위한 자동 유체 분배 방법 및시스템
CN100365507C (zh) * 2000-10-12 2008-01-30 德克萨斯州大学系统董事会 用于室温下低压微刻痕和毫微刻痕光刻的模板
US6926929B2 (en) * 2002-07-09 2005-08-09 Molecular Imprints, Inc. System and method for dispensing liquids
US7442336B2 (en) * 2003-08-21 2008-10-28 Molecular Imprints, Inc. Capillary imprinting technique
US7077992B2 (en) * 2002-07-11 2006-07-18 Molecular Imprints, Inc. Step and repeat imprint lithography processes
US6932934B2 (en) * 2002-07-11 2005-08-23 Molecular Imprints, Inc. Formation of discontinuous films during an imprint lithography process
US6900881B2 (en) * 2002-07-11 2005-05-31 Molecular Imprints, Inc. Step and repeat imprint lithography systems
US6908861B2 (en) * 2002-07-11 2005-06-21 Molecular Imprints, Inc. Method for imprint lithography using an electric field
US7071088B2 (en) * 2002-08-23 2006-07-04 Molecular Imprints, Inc. Method for fabricating bulbous-shaped vias
US6929762B2 (en) * 2002-11-13 2005-08-16 Molecular Imprints, Inc. Method of reducing pattern distortions during imprint lithography processes
US7641840B2 (en) * 2002-11-13 2010-01-05 Molecular Imprints, Inc. Method for expelling gas positioned between a substrate and a mold
US6871558B2 (en) * 2002-12-12 2005-03-29 Molecular Imprints, Inc. Method for determining characteristics of substrate employing fluid geometries
US7365103B2 (en) * 2002-12-12 2008-04-29 Board Of Regents, The University Of Texas System Compositions for dark-field polymerization and method of using the same for imprint lithography processes
US20050160934A1 (en) * 2004-01-23 2005-07-28 Molecular Imprints, Inc. Materials and methods for imprint lithography
US7090716B2 (en) * 2003-10-02 2006-08-15 Molecular Imprints, Inc. Single phase fluid imprint lithography method
US8211214B2 (en) * 2003-10-02 2012-07-03 Molecular Imprints, Inc. Single phase fluid imprint lithography method
US20050106321A1 (en) * 2003-11-14 2005-05-19 Molecular Imprints, Inc. Dispense geometery to achieve high-speed filling and throughput
KR100585951B1 (ko) * 2004-02-18 2006-06-01 한국기계연구원 조합/분리형 독립구동이 가능한 복수 개의 모듈을 갖는 임프린팅 장치
US8076386B2 (en) * 2004-02-23 2011-12-13 Molecular Imprints, Inc. Materials for imprint lithography
US20050189676A1 (en) * 2004-02-27 2005-09-01 Molecular Imprints, Inc. Full-wafer or large area imprinting with multiple separated sub-fields for high throughput lithography
US20050276919A1 (en) * 2004-06-01 2005-12-15 Molecular Imprints, Inc. Method for dispensing a fluid on a substrate
KR20070086766A (ko) * 2004-12-01 2007-08-27 몰레큘러 임프린츠 인코퍼레이티드 임프린트 리소그래피 공정용 열관리를 위한 노출 방법
KR20070111544A (ko) * 2005-03-09 2007-11-21 쓰리엠 이노베이티브 프로퍼티즈 컴파니 미세 복제품 제조 장치 및 방법
CN101573659A (zh) * 2005-12-08 2009-11-04 分子制模股份有限公司 排除位于基板和模具之间的气体的方法
JP4778788B2 (ja) * 2005-12-28 2011-09-21 東芝機械株式会社 微細パターンシート作成装置および微細パターンシート作成方法
KR100804734B1 (ko) * 2007-02-22 2008-02-19 연세대학교 산학협력단 자외선 롤 나노임프린팅을 이용한 연속 리소그라피 장치 및 방법

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101019066A (zh) * 2004-06-03 2007-08-15 分子制模股份有限公司 用于纳米规模制造的流体分配和按需液滴分配
CN101022894A (zh) * 2004-09-23 2007-08-22 分子制模股份有限公司 减小氧气抑制液体固化的聚合技术以及用于该技术的组合物
WO2007136832A2 (en) * 2006-05-18 2007-11-29 Molecular Imprints, Inc. Method for expelling gas positioned between a substrate and a mold

Also Published As

Publication number Publication date
WO2009123721A3 (en) 2009-12-30
EP2262592A4 (en) 2012-07-11
JP2011520641A (ja) 2011-07-21
US8187515B2 (en) 2012-05-29
KR20110004380A (ko) 2011-01-13
EP2262592A2 (en) 2010-12-22
CN101990470A (zh) 2011-03-23
MY152467A (en) 2014-10-15
TW200950958A (en) 2009-12-16
US20090243153A1 (en) 2009-10-01
TWI391233B (zh) 2013-04-01
JP5613658B2 (ja) 2014-10-29
KR101767966B1 (ko) 2017-08-14
WO2009123721A2 (en) 2009-10-08

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