TWI391233B - 大面積輥對輥壓印微影術 - Google Patents
大面積輥對輥壓印微影術 Download PDFInfo
- Publication number
- TWI391233B TWI391233B TW098110869A TW98110869A TWI391233B TW I391233 B TWI391233 B TW I391233B TW 098110869 A TW098110869 A TW 098110869A TW 98110869 A TW98110869 A TW 98110869A TW I391233 B TWI391233 B TW I391233B
- Authority
- TW
- Taiwan
- Prior art keywords
- polymerizable material
- fine droplets
- film
- template
- lithography template
- Prior art date
Links
- 238000001459 lithography Methods 0.000 title claims description 66
- 239000000463 material Substances 0.000 claims description 98
- 238000000034 method Methods 0.000 claims description 44
- 239000012528 membrane Substances 0.000 claims description 43
- 238000000059 patterning Methods 0.000 claims description 21
- 238000004049 embossing Methods 0.000 claims description 10
- 230000000295 complement effect Effects 0.000 claims description 4
- 230000001681 protective effect Effects 0.000 claims description 3
- 238000010276 construction Methods 0.000 claims description 2
- 238000005452 bending Methods 0.000 claims 1
- 238000009960 carding Methods 0.000 claims 1
- 239000010408 film Substances 0.000 description 29
- 238000013461 design Methods 0.000 description 9
- 239000000758 substrate Substances 0.000 description 8
- 239000012530 fluid Substances 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 4
- 239000004744 fabric Substances 0.000 description 3
- 239000000835 fiber Substances 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- 101100457838 Caenorhabditis elegans mod-1 gene Proteins 0.000 description 1
- 229920000271 Kevlar® Polymers 0.000 description 1
- 101150110972 ME1 gene Proteins 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000005388 borosilicate glass Substances 0.000 description 1
- CETPSERCERDGAM-UHFFFAOYSA-N ceric oxide Chemical compound O=[Ce]=O CETPSERCERDGAM-UHFFFAOYSA-N 0.000 description 1
- 229910000422 cerium(IV) oxide Inorganic materials 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000011152 fibreglass Substances 0.000 description 1
- 229920002313 fluoropolymer Polymers 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 239000004761 kevlar Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 239000004038 photonic crystal Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
- 238000004886 process control Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 230000003014 reinforcing effect Effects 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000000427 thin-film deposition Methods 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
- B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
- B29C59/04—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing using rollers or endless belts
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C43/00—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
- B29C43/32—Component parts, details or accessories; Auxiliary operations
- B29C43/44—Compression means for making articles of indefinite length
- B29C43/46—Rollers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Mechanical Engineering (AREA)
- Theoretical Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Mathematical Physics (AREA)
- Shaping Of Tube Ends By Bending Or Straightening (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US4126408P | 2008-04-01 | 2008-04-01 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200950958A TW200950958A (en) | 2009-12-16 |
| TWI391233B true TWI391233B (zh) | 2013-04-01 |
Family
ID=41115897
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW098110869A TWI391233B (zh) | 2008-04-01 | 2009-04-01 | 大面積輥對輥壓印微影術 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US8187515B2 (https=) |
| EP (1) | EP2262592A4 (https=) |
| JP (1) | JP5613658B2 (https=) |
| KR (1) | KR101767966B1 (https=) |
| CN (1) | CN101990470B (https=) |
| MY (1) | MY152467A (https=) |
| TW (1) | TWI391233B (https=) |
| WO (1) | WO2009123721A2 (https=) |
Families Citing this family (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20080160129A1 (en) * | 2006-05-11 | 2008-07-03 | Molecular Imprints, Inc. | Template Having a Varying Thickness to Facilitate Expelling a Gas Positioned Between a Substrate and the Template |
| EP1768846B1 (en) * | 2004-06-03 | 2010-08-11 | Molecular Imprints, Inc. | Fluid dispensing and drop-on-demand dispensing for nano-scale manufacturing |
| KR20100090046A (ko) * | 2009-02-05 | 2010-08-13 | 엘지디스플레이 주식회사 | 박막 태양전지 및 그 제조방법 |
| JP5411557B2 (ja) * | 2009-04-03 | 2014-02-12 | 株式会社日立ハイテクノロジーズ | 微細構造転写装置 |
| KR20110066793A (ko) * | 2009-12-11 | 2011-06-17 | 엘지디스플레이 주식회사 | 패터닝 장치 |
| US8691134B2 (en) | 2010-01-28 | 2014-04-08 | Molecular Imprints, Inc. | Roll-to-roll imprint lithography and purging system |
| JP5828626B2 (ja) * | 2010-10-04 | 2015-12-09 | キヤノン株式会社 | インプリント方法 |
| JP2013064836A (ja) * | 2011-09-16 | 2013-04-11 | Olympus Corp | 微細構造形成用型および光学素子の製造方法 |
| US9616614B2 (en) * | 2012-02-22 | 2017-04-11 | Canon Nanotechnologies, Inc. | Large area imprint lithography |
| JP6412317B2 (ja) | 2013-04-24 | 2018-10-24 | キヤノン株式会社 | インプリント方法、インプリント装置および物品の製造方法 |
| US9718096B2 (en) | 2013-08-19 | 2017-08-01 | Board Of Regents, The University Of Texas System | Programmable deposition of thin films of a user-defined profile with nanometer scale accuracy |
| KR102292465B1 (ko) * | 2013-08-19 | 2021-08-20 | 보드 오브 레젼츠, 더 유니버시티 오브 텍사스 시스템 | 나노미터 스케일 정확도를 갖는 사용자 정의 프로파일의 프로그램 가능한 박막 적층 방법 |
| JP6399839B2 (ja) * | 2014-07-15 | 2018-10-03 | キヤノン株式会社 | インプリント装置、および物品の製造方法 |
| PL3218179T3 (pl) * | 2014-11-05 | 2019-02-28 | Bobst Mex Sa | Sposoby wykonania żeńskiego narzędzia do wytłaczania, narzędzia do wytłaczania, moduł i sposób wytłaczania oraz maszyna do wytłaczania wyposażona w takie narzędzia |
| CN121551242A (zh) * | 2015-10-15 | 2026-02-24 | 德克萨斯大学系统董事会 | 用于精密纳米尺度制造的通用过程 |
| SG10201709153VA (en) * | 2016-12-12 | 2018-07-30 | Canon Kk | Fluid droplet methodology and apparatus for imprint lithography |
| US11131923B2 (en) * | 2018-10-10 | 2021-09-28 | Canon Kabushiki Kaisha | System and method of assessing surface quality by optically analyzing dispensed drops |
| US12578637B2 (en) * | 2019-05-13 | 2026-03-17 | Board Of Regents, The University Of Texas System | Roll-to-roll nanoimprint lithography tools and processes |
| US11562924B2 (en) * | 2020-01-31 | 2023-01-24 | Canon Kabushiki Kaisha | Planarization apparatus, planarization process, and method of manufacturing an article |
| US11908711B2 (en) | 2020-09-30 | 2024-02-20 | Canon Kabushiki Kaisha | Planarization process, planarization system and method of manufacturing an article |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5480596A (en) * | 1989-07-12 | 1996-01-02 | Canon Kabushiki Kaisha | Optical recording medium substrate sheet producing apparatus having roll stamper with elastomer layer of predetermined hardness |
| US20060062922A1 (en) * | 2004-09-23 | 2006-03-23 | Molecular Imprints, Inc. | Polymerization technique to attenuate oxygen inhibition of solidification of liquids and composition therefor |
| US20070228589A1 (en) * | 2002-11-13 | 2007-10-04 | Molecular Imprints, Inc. | Method for expelling gas positioned between a substrate and a mold |
Family Cites Families (29)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6334960B1 (en) | 1999-03-11 | 2002-01-01 | Board Of Regents, The University Of Texas System | Step and flash imprint lithography |
| EP1303792B1 (en) | 2000-07-16 | 2012-10-03 | Board Of Regents, The University Of Texas System | High-resolution overlay alignement methods and systems for imprint lithography |
| AU2001277907A1 (en) | 2000-07-17 | 2002-01-30 | Board Of Regents, The University Of Texas System | Method and system of automatic fluid dispensing for imprint lithography processes |
| KR101031528B1 (ko) | 2000-10-12 | 2011-04-27 | 더 보드 오브 리전츠 오브 더 유니버시티 오브 텍사스 시스템 | 실온 저압 마이크로- 및 나노- 임프린트 리소그래피용템플릿 |
| US6926929B2 (en) | 2002-07-09 | 2005-08-09 | Molecular Imprints, Inc. | System and method for dispensing liquids |
| US6908861B2 (en) | 2002-07-11 | 2005-06-21 | Molecular Imprints, Inc. | Method for imprint lithography using an electric field |
| US7442336B2 (en) | 2003-08-21 | 2008-10-28 | Molecular Imprints, Inc. | Capillary imprinting technique |
| US6900881B2 (en) | 2002-07-11 | 2005-05-31 | Molecular Imprints, Inc. | Step and repeat imprint lithography systems |
| US6932934B2 (en) | 2002-07-11 | 2005-08-23 | Molecular Imprints, Inc. | Formation of discontinuous films during an imprint lithography process |
| US7077992B2 (en) | 2002-07-11 | 2006-07-18 | Molecular Imprints, Inc. | Step and repeat imprint lithography processes |
| US7071088B2 (en) | 2002-08-23 | 2006-07-04 | Molecular Imprints, Inc. | Method for fabricating bulbous-shaped vias |
| US6929762B2 (en) | 2002-11-13 | 2005-08-16 | Molecular Imprints, Inc. | Method of reducing pattern distortions during imprint lithography processes |
| US6871558B2 (en) | 2002-12-12 | 2005-03-29 | Molecular Imprints, Inc. | Method for determining characteristics of substrate employing fluid geometries |
| US7365103B2 (en) | 2002-12-12 | 2008-04-29 | Board Of Regents, The University Of Texas System | Compositions for dark-field polymerization and method of using the same for imprint lithography processes |
| US20050160934A1 (en) | 2004-01-23 | 2005-07-28 | Molecular Imprints, Inc. | Materials and methods for imprint lithography |
| US7090716B2 (en) | 2003-10-02 | 2006-08-15 | Molecular Imprints, Inc. | Single phase fluid imprint lithography method |
| US8211214B2 (en) | 2003-10-02 | 2012-07-03 | Molecular Imprints, Inc. | Single phase fluid imprint lithography method |
| US20050106321A1 (en) * | 2003-11-14 | 2005-05-19 | Molecular Imprints, Inc. | Dispense geometery to achieve high-speed filling and throughput |
| KR100585951B1 (ko) * | 2004-02-18 | 2006-06-01 | 한국기계연구원 | 조합/분리형 독립구동이 가능한 복수 개의 모듈을 갖는 임프린팅 장치 |
| US8076386B2 (en) | 2004-02-23 | 2011-12-13 | Molecular Imprints, Inc. | Materials for imprint lithography |
| US20050189676A1 (en) | 2004-02-27 | 2005-09-01 | Molecular Imprints, Inc. | Full-wafer or large area imprinting with multiple separated sub-fields for high throughput lithography |
| US20050276919A1 (en) * | 2004-06-01 | 2005-12-15 | Molecular Imprints, Inc. | Method for dispensing a fluid on a substrate |
| EP1768846B1 (en) * | 2004-06-03 | 2010-08-11 | Molecular Imprints, Inc. | Fluid dispensing and drop-on-demand dispensing for nano-scale manufacturing |
| JP5198071B2 (ja) | 2004-12-01 | 2013-05-15 | モレキュラー・インプリンツ・インコーポレーテッド | インプリントリソグラフィ・プロセスにおける熱管理のための露光方法 |
| WO2006098934A1 (en) * | 2005-03-09 | 2006-09-21 | 3M Innovative Properties Company | Apparatus and method for making microreplicated article |
| CN101573659A (zh) * | 2005-12-08 | 2009-11-04 | 分子制模股份有限公司 | 排除位于基板和模具之间的气体的方法 |
| JP4778788B2 (ja) * | 2005-12-28 | 2011-09-21 | 東芝機械株式会社 | 微細パターンシート作成装置および微細パターンシート作成方法 |
| WO2007136832A2 (en) * | 2006-05-18 | 2007-11-29 | Molecular Imprints, Inc. | Method for expelling gas positioned between a substrate and a mold |
| KR100804734B1 (ko) * | 2007-02-22 | 2008-02-19 | 연세대학교 산학협력단 | 자외선 롤 나노임프린팅을 이용한 연속 리소그라피 장치 및 방법 |
-
2009
- 2009-03-31 US US12/415,563 patent/US8187515B2/en active Active
- 2009-04-01 EP EP09726571A patent/EP2262592A4/en not_active Withdrawn
- 2009-04-01 TW TW098110869A patent/TWI391233B/zh active
- 2009-04-01 MY MYPI20104027 patent/MY152467A/en unknown
- 2009-04-01 JP JP2011502956A patent/JP5613658B2/ja active Active
- 2009-04-01 CN CN200980112481.2A patent/CN101990470B/zh active Active
- 2009-04-01 KR KR1020107022385A patent/KR101767966B1/ko active Active
- 2009-04-01 WO PCT/US2009/002032 patent/WO2009123721A2/en not_active Ceased
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5480596A (en) * | 1989-07-12 | 1996-01-02 | Canon Kabushiki Kaisha | Optical recording medium substrate sheet producing apparatus having roll stamper with elastomer layer of predetermined hardness |
| US20070228589A1 (en) * | 2002-11-13 | 2007-10-04 | Molecular Imprints, Inc. | Method for expelling gas positioned between a substrate and a mold |
| US20060062922A1 (en) * | 2004-09-23 | 2006-03-23 | Molecular Imprints, Inc. | Polymerization technique to attenuate oxygen inhibition of solidification of liquids and composition therefor |
Also Published As
| Publication number | Publication date |
|---|---|
| JP5613658B2 (ja) | 2014-10-29 |
| WO2009123721A3 (en) | 2009-12-30 |
| MY152467A (en) | 2014-10-15 |
| JP2011520641A (ja) | 2011-07-21 |
| KR20110004380A (ko) | 2011-01-13 |
| CN101990470A (zh) | 2011-03-23 |
| US8187515B2 (en) | 2012-05-29 |
| CN101990470B (zh) | 2016-05-04 |
| EP2262592A2 (en) | 2010-12-22 |
| KR101767966B1 (ko) | 2017-08-14 |
| WO2009123721A2 (en) | 2009-10-08 |
| US20090243153A1 (en) | 2009-10-01 |
| TW200950958A (en) | 2009-12-16 |
| EP2262592A4 (en) | 2012-07-11 |
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