JP2011518422A - 裏面コンタクト太陽電池用の高光吸収層を有する反射防止膜 - Google Patents
裏面コンタクト太陽電池用の高光吸収層を有する反射防止膜 Download PDFInfo
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- 239000006117 anti-reflective coating Substances 0.000 title 1
- 229910052581 Si3N4 Inorganic materials 0.000 claims abstract description 91
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims abstract description 91
- 238000002161 passivation Methods 0.000 claims abstract description 36
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 32
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 25
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 25
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Abstract
【選択図】 図3
Description
ここでλは光の波長を表しており、400nm以下であり、kは消衰係数である。高kシリコン窒化物は、太陽電池が曝されるUV放射(400nm以下の波長)の少なくとも10%をフィルタにより除去できるよう構成されると好適である。式1は、高kシリコン窒化物のみならず、一般的な高光吸収層の厚みを決定するのにも利用可能である。
Claims (25)
- 裏面コンタクト太陽電池を製造する方法であって、
前記裏面コンタクト太陽電池の正面側のシリコン基板の表面にテクスチャ加工を施してテクスチャ加工された正面側の表面を生成する工程と、
前記テクスチャ加工された正面側の表面の上に、二酸化シリコンを含むパッシベーションレベルを形成する工程と、
前記パッシベーションレベルの上に高kシリコン窒化物層を形成する工程と、
前記高kシリコン窒化物層の上に低kシリコン窒化物層を形成する工程とを備え、
前記裏面コンタクト太陽電池は前記正面とは反対の裏面上に、複数の拡散領域と、前記複数の拡散領域に電気的に連結された複数の金属コンタクトとを含み、前記正面は通常動作において太陽側を向き、太陽放射を収集し、
前記高kシリコン窒化物層は、前記正面から前記シリコン基板へ入射するUV放射の少なくとも10%を遮光する方法。 - 前記高kシリコン窒化物層は、400nm以下の波長の光に対して少なくとも0.03の消衰係数を有し、前記低kシリコン窒化物層は、400nm以上の波長の光に対して多くとも0.03の消衰係数を有する請求項1に記載の方法。
- 前記シリコン基板は、N型シリコン基板を含む請求項1に記載の方法。
- 前記パッシベーションレベルは、熱成長した二酸化シリコンを含む請求項1に記載の方法。
- 前記高kシリコン窒化物は、1nmから100nmの範囲の厚みを有する請求項1に記載の方法。
- 裏面コンタクト太陽電池であって、
前記裏面コンタクト太陽電池の正面側のシリコン基板上のテクスチャ加工された表面と、
前記テクスチャ加工された表面上に形成されたパッシベーションレベルと、
前記パッシベーションレベル上に形成された高光吸収層と、
前記高光吸収層上に形成された低光吸収層とを備え、
前記正面は通常動作において太陽側を向き、太陽放射を収集し、
前記高光吸収層は、前記正面から前記シリコン基板へ入射するUV放射の少なくとも10%を遮光する裏面コンタクト太陽電池。 - 前記高光吸収層は、400nm以下の波長の光に対して少なくとも0.03の消衰係数を有し、前記低光吸収層は、400nm以上の波長の光に対して多くとも0.03の消衰係数を有する請求項6に記載の裏面コンタクト太陽電池。
- 前記高光吸収層は、高kシリコン窒化物を有する請求項6に記載の裏面コンタクト太陽電池。
- 前記低光吸収層は低kシリコン窒化物を有し、前記高光吸収層は高kシリコン窒化物を有する請求項6に記載の裏面コンタクト太陽電池。
- 前記パッシベーションレベルは、二酸化シリコンを有する請求項6に記載の裏面コンタクト太陽電池。
- 前記シリコン基板は、N型シリコンを含む請求項6に記載の裏面コンタクト太陽電池。
- 前記高光吸収層は、400nm以下の波長の光に対して少なくとも0.03の消衰係数を有する高kシリコン窒化物を有する請求項6に記載の裏面コンタクト太陽電池。
- 前記高光吸収層は、1nmから100nmの範囲の厚みに形成された高kシリコン窒化物を有する請求項6に記載の裏面コンタクト太陽電池。
- 裏面コンタクト太陽電池を製造する方法であって、
前記裏面コンタクト太陽電池の太陽電池基板の正面側の表面にテクスチャ加工を施してテクスチャ加工された正面側の表面を生成する工程と、
前記テクスチャ加工された正面側の表面の上に、パッシベーションレベルを形成する工程と、
前記パッシベーションレベルの上に高光吸収層を形成する工程と、
前記高光吸収層の上に低光吸収層を形成する工程とを備え、
前記正面は通常動作において太陽側を向き、太陽放射を収集し、
前記高光吸収層は、前記正面から前記基板へ入射するUV放射の少なくとも10%を遮光する方法。 - 前記パッシベーションレベルは、熱成長した二酸化シリコンを含む請求項14に記載の方法。
- 前記低光吸収層は、400nm以下の波長の光に対して多くとも0.03の消衰係数を有する低kシリコン窒化物を有する請求項14に記載の方法。
- 前記高光吸収層は、400nm以下の波長の光に対して少なくとも0.03の消衰係数を有する高kシリコン窒化物を有する請求項14に記載の方法。
- 前記基板はN型シリコンを含む請求項14に記載の方法。
- 前記基板はN型シリコンを含み、前記パッシベーションレベルは前記N型シリコンの表面上に熱成長した二酸化シリコンを含む請求項14に記載の方法。
- 前記高光吸収層は、1nmから100nmの範囲の厚みに形成された高kシリコン窒化物を有する請求項14に記載の方法。
- 裏面コンタクト太陽電池であって、
裏面コンタクト太陽電池の基板の正面に形成されたパッシベーションレベルと、
前記パッシベーションレベル上に形成され、前記正面から前記基板へと入射するUV放射を遮光する高光吸収層と、
前記高光吸収層上に形成されて、前記高光吸収層と前記パッシベーションレベルとともに多層反射防止構造を形成する低光吸収層とを備える裏面コンタクト太陽電池。 - 前記高光吸収層は、400nm以下の波長の光に対して少なくとも0.03の消衰係数を有する請求項21に記載の裏面コンタクト太陽電池。
- 前記高光吸収層は、高kシリコン窒化物を有する請求項21に記載の裏面コンタクト太陽電池。
- 前記パッシベーションレベルは、前記基板のテクスチャ加工された表面上に形成される請求項21に記載の裏面コンタクト太陽電池。
- 前記パッシベーションレベルは二酸化シリコンを有する請求項21に記載の裏面コンタクト太陽電池。
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US775807P | 2007-12-14 | 2007-12-14 | |
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US12/325,878 US8198528B2 (en) | 2007-12-14 | 2008-12-01 | Anti-reflective coating with high optical absorption layer for backside contact solar cells |
US12/325,878 | 2008-12-01 | ||
PCT/US2008/085241 WO2009079199A1 (en) | 2007-12-14 | 2008-12-02 | Anti-reflective coating with high optical absorption layer for backside contact solar cells |
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WO2016063608A1 (ja) * | 2014-10-21 | 2016-04-28 | シャープ株式会社 | ヘテロバックコンタクト型太陽電池とその製造方法 |
JP2020129666A (ja) * | 2014-05-30 | 2020-08-27 | サンパワー コーポレイション | 太陽電池内の相対的ドーパント濃度レベル |
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US8198528B2 (en) * | 2007-12-14 | 2012-06-12 | Sunpower Corporation | Anti-reflective coating with high optical absorption layer for backside contact solar cells |
TW201030998A (en) | 2008-10-23 | 2010-08-16 | Alta Devices Inc | Photovoltaic device |
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WO2009079199A1 (en) | 2009-06-25 |
US8198528B2 (en) | 2012-06-12 |
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EP2220688A1 (en) | 2010-08-25 |
US20090151784A1 (en) | 2009-06-18 |
US8748736B2 (en) | 2014-06-10 |
CN101897032B (zh) | 2016-02-10 |
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CN101897032A (zh) | 2010-11-24 |
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CN105679843A (zh) | 2016-06-15 |
US20120255606A1 (en) | 2012-10-11 |
CN105679843B (zh) | 2018-05-22 |
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