JP2011515582A5 - - Google Patents

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Publication number
JP2011515582A5
JP2011515582A5 JP2011500841A JP2011500841A JP2011515582A5 JP 2011515582 A5 JP2011515582 A5 JP 2011515582A5 JP 2011500841 A JP2011500841 A JP 2011500841A JP 2011500841 A JP2011500841 A JP 2011500841A JP 2011515582 A5 JP2011515582 A5 JP 2011515582A5
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Japan
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microwave
substrate
etching system
deposition
source
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JP2011500841A
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Japanese (ja)
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JP2011515582A (ja
JP5698652B2 (ja
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Priority claimed from US12/050,373 external-priority patent/US20090238998A1/en
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Publication of JP5698652B2 publication Critical patent/JP5698652B2/ja
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JP2011500841A 2008-03-18 2009-02-26 同軸マイクロ波支援堆積及びエッチングシステム Expired - Fee Related JP5698652B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US12/050,373 US20090238998A1 (en) 2008-03-18 2008-03-18 Coaxial microwave assisted deposition and etch systems
US12/050,373 2008-03-18
PCT/US2009/035325 WO2009117229A2 (en) 2008-03-18 2009-02-26 Coaxial microwave assisted deposition and etch systems

Publications (3)

Publication Number Publication Date
JP2011515582A JP2011515582A (ja) 2011-05-19
JP2011515582A5 true JP2011515582A5 (enExample) 2013-06-13
JP5698652B2 JP5698652B2 (ja) 2015-04-08

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JP2011500841A Expired - Fee Related JP5698652B2 (ja) 2008-03-18 2009-02-26 同軸マイクロ波支援堆積及びエッチングシステム

Country Status (6)

Country Link
US (1) US20090238998A1 (enExample)
JP (1) JP5698652B2 (enExample)
KR (1) KR101617860B1 (enExample)
CN (1) CN101978095B (enExample)
TW (1) TWI485279B (enExample)
WO (1) WO2009117229A2 (enExample)

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