JP2011514393A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2011514393A5 JP2011514393A5 JP2010544653A JP2010544653A JP2011514393A5 JP 2011514393 A5 JP2011514393 A5 JP 2011514393A5 JP 2010544653 A JP2010544653 A JP 2010544653A JP 2010544653 A JP2010544653 A JP 2010544653A JP 2011514393 A5 JP2011514393 A5 JP 2011514393A5
- Authority
- JP
- Japan
- Prior art keywords
- alkyl
- substituted
- phenyl
- unsubstituted
- alkoxy
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims 21
- 239000000203 mixture Substances 0.000 claims 16
- 229910052736 halogen Inorganic materials 0.000 claims 14
- 150000002367 halogens Chemical class 0.000 claims 14
- 229910052739 hydrogen Inorganic materials 0.000 claims 12
- 239000001257 hydrogen Substances 0.000 claims 11
- 150000001875 compounds Chemical class 0.000 claims 10
- 150000002431 hydrogen Chemical class 0.000 claims 6
- 229910052760 oxygen Inorganic materials 0.000 claims 6
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 5
- 125000000217 alkyl group Chemical group 0.000 claims 5
- 229910052717 sulfur Inorganic materials 0.000 claims 5
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 claims 4
- 229910052757 nitrogen Inorganic materials 0.000 claims 4
- 125000004642 (C1-C12) alkoxy group Chemical group 0.000 claims 3
- 125000003545 alkoxy group Chemical group 0.000 claims 3
- 125000003118 aryl group Chemical group 0.000 claims 3
- 125000003236 benzoyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C(*)=O 0.000 claims 3
- 238000004132 cross linking Methods 0.000 claims 3
- 125000002541 furyl group Chemical group 0.000 claims 3
- 238000000034 method Methods 0.000 claims 3
- 125000001624 naphthyl group Chemical group 0.000 claims 3
- -1 o-xylylene, 2-butenylene Chemical group 0.000 claims 3
- 150000002978 peroxides Chemical class 0.000 claims 3
- 239000000853 adhesive Substances 0.000 claims 2
- 230000001070 adhesive effect Effects 0.000 claims 2
- 150000001409 amidines Chemical class 0.000 claims 2
- 150000001412 amines Chemical class 0.000 claims 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims 2
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 claims 2
- 239000003479 dental cement Substances 0.000 claims 2
- 125000001072 heteroaryl group Chemical group 0.000 claims 2
- 239000000976 ink Substances 0.000 claims 2
- 239000012778 molding material Substances 0.000 claims 2
- 230000003287 optical effect Effects 0.000 claims 2
- 239000003973 paint Substances 0.000 claims 2
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 claims 2
- 238000007789 sealing Methods 0.000 claims 2
- 239000003566 sealing material Substances 0.000 claims 2
- 125000001544 thienyl group Chemical group 0.000 claims 2
- 125000002853 C1-C4 hydroxyalkyl group Chemical group 0.000 claims 1
- 238000003848 UV Light-Curing Methods 0.000 claims 1
- 239000000654 additive Substances 0.000 claims 1
- 125000002947 alkylene group Chemical group 0.000 claims 1
- 125000001118 alkylidene group Chemical group 0.000 claims 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 claims 1
- 229910052799 carbon Inorganic materials 0.000 claims 1
- 239000003054 catalyst Substances 0.000 claims 1
- 238000001723 curing Methods 0.000 claims 1
- 125000001188 haloalkyl group Chemical group 0.000 claims 1
- 238000010438 heat treatment Methods 0.000 claims 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 1
- 239000003999 initiator Substances 0.000 claims 1
- 230000001678 irradiating effect Effects 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 125000004433 nitrogen atom Chemical group N* 0.000 claims 1
- 239000003504 photosensitizing agent Substances 0.000 claims 1
- 239000002243 precursor Substances 0.000 claims 1
- SNOOUWRIMMFWNE-UHFFFAOYSA-M sodium;6-[(3,4,5-trimethoxybenzoyl)amino]hexanoate Chemical compound [Na+].COC1=CC(C(=O)NCCCCCC([O-])=O)=CC(OC)=C1OC SNOOUWRIMMFWNE-UHFFFAOYSA-M 0.000 claims 1
- 239000000758 substrate Substances 0.000 claims 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims 1
- 229920002554 vinyl polymer Polymers 0.000 claims 1
- 0 CC(*)N(*)C(C)(C)N(*)C(C)(*)* Chemical compound CC(*)N(*)C(C)(C)N(*)C(C)(*)* 0.000 description 5
- HYQWHUCTTYCIAU-UHFFFAOYSA-N C(c1ccccc1)N1C(CCC2)N2CCC1 Chemical compound C(c1ccccc1)N1C(CCC2)N2CCC1 HYQWHUCTTYCIAU-UHFFFAOYSA-N 0.000 description 2
- XQZZCPHZZAZOPA-UHFFFAOYSA-N CCC(Cc1ccccc1)C(c(cc1)cc(OC)c1OC)=C(C)C Chemical compound CCC(Cc1ccccc1)C(c(cc1)cc(OC)c1OC)=C(C)C XQZZCPHZZAZOPA-UHFFFAOYSA-N 0.000 description 1
- LTXRZOZLUURSKO-UHFFFAOYSA-N COC(c1ccc(CN2C(CCC3)N3CCC2)cc1)=O Chemical compound COC(c1ccc(CN2C(CCC3)N3CCC2)cc1)=O LTXRZOZLUURSKO-UHFFFAOYSA-N 0.000 description 1
- LTXRZOZLUURSKO-HNNXBMFYSA-N COC(c1ccc(CN2[C@@H](CCC3)N3CCC2)cc1)=O Chemical compound COC(c1ccc(CN2[C@@H](CCC3)N3CCC2)cc1)=O LTXRZOZLUURSKO-HNNXBMFYSA-N 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP08150721 | 2008-01-28 | ||
| EP08150721.2 | 2008-01-28 | ||
| PCT/EP2009/050066 WO2009095282A2 (en) | 2008-01-28 | 2009-01-06 | Photolatent amidine bases for redox curing of radically curable formulations |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2011514393A JP2011514393A (ja) | 2011-05-06 |
| JP2011514393A5 true JP2011514393A5 (OSRAM) | 2013-03-14 |
| JP5697992B2 JP5697992B2 (ja) | 2015-04-08 |
Family
ID=39522044
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010544653A Expired - Fee Related JP5697992B2 (ja) | 2008-01-28 | 2009-01-06 | ラジカル硬化性配合物のレドックス硬化のための光潜在性アミジン塩基 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20110190412A1 (OSRAM) |
| EP (1) | EP2238178B1 (OSRAM) |
| JP (1) | JP5697992B2 (OSRAM) |
| CN (1) | CN101925616A (OSRAM) |
| WO (1) | WO2009095282A2 (OSRAM) |
Families Citing this family (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5809780B2 (ja) * | 2010-04-02 | 2015-11-11 | Ｄｉｃグラフィックス株式会社 | 紫外線硬化性コーティングニス |
| CN103797082B (zh) * | 2011-09-14 | 2016-07-06 | 电化株式会社 | 组合物及使用了该组合物的部件的临时固定方法 |
| ES2611966T3 (es) | 2012-08-09 | 2017-05-11 | Basf Se | Formulaciones endurecibles por radiación con alta adhesión |
| JP5725515B2 (ja) * | 2012-11-15 | 2015-05-27 | 学校法人東京理科大学 | 光塩基発生剤及び当該光塩基発生剤を含有する感光性樹脂組成物 |
| US9650526B2 (en) * | 2014-09-09 | 2017-05-16 | 3D Systems, Inc. | Method of printing a three-dimensional article |
| EP3204434A1 (en) * | 2014-10-06 | 2017-08-16 | Dow Global Technologies Llc | Using organic photoredox catalysts to achieve metal free photoregulated controlled radical polymerization |
| FR3030526B1 (fr) * | 2014-12-18 | 2018-06-15 | Arkema France | Polymerisation radicalaire d'alcoxyamines a basse temperature |
| US20180127538A1 (en) | 2015-04-29 | 2018-05-10 | 3M Innovative Properties Company | Composition including a polythiol and a polyepoxide and methods relating to the composition |
| EP3535333A1 (en) | 2016-11-03 | 2019-09-11 | 3M Innovative Properties Company | Composition including a polythiol, a polyepoxide, a photolatent base, and an amine and methods relating to the composition |
| CA3042860A1 (en) | 2016-11-03 | 2018-05-11 | 3M Innovative Properties Company | Polythiol sealant compositions |
| EP3535621A1 (en) | 2016-11-03 | 2019-09-11 | 3M Innovative Properties Company | Compositions including a photolatent amine, camphorquinone, and a coumarin and related methods |
| JP6873417B2 (ja) * | 2016-11-10 | 2021-05-19 | 学校法人東京理科大学 | 光反応性組成物 |
| JP7109438B2 (ja) * | 2016-12-05 | 2022-07-29 | アーケマ・インコーポレイテッド | 重合開始剤ブレンド物、およびそのような重合開始剤ブレンド物を含む３ｄプリンティングに有用な光硬化性組成物 |
| WO2018160691A1 (en) * | 2017-02-28 | 2018-09-07 | Basf Se | Curable sealant composition |
| WO2018160667A1 (en) * | 2017-02-28 | 2018-09-07 | Basf Se | Curable sealant composition |
| GB2567242B (en) * | 2017-10-09 | 2021-08-11 | Henkel IP & Holding GmbH | Anaerobically curable compositions comprising 1, 2, 3, 4-tetrahydro benzo(h)quinolin-3-ol or derivatives thereof |
| US20210371667A1 (en) | 2018-09-27 | 2021-12-02 | 3M Innovative Properties Company | Composition including amino-functional silanes and method of applying a sealant to a substrate |
| CN111040644A (zh) * | 2018-10-15 | 2020-04-21 | 烟台德邦科技有限公司 | 一种可光催化聚合的丙烯酸酯结构胶 |
| JP7304900B2 (ja) * | 2019-01-21 | 2023-07-07 | 三井化学株式会社 | 光重合開始剤、光硬化性組成物、硬化物、及び、歯科材料 |
| WO2020202076A1 (en) | 2019-04-04 | 2020-10-08 | 3M Innovative Properties Company | Method of irradiating a composition through a substrate |
| WO2023167201A1 (ja) * | 2022-03-02 | 2023-09-07 | 株式会社カネカ | 活性エネルギー線硬化性組成物、及び硬化物の製造方法 |
| CN120858151A (zh) * | 2023-03-30 | 2025-10-28 | 日东新兴有限公司 | 涂布用固化性组合物及其固化物 |
| TWI885621B (zh) * | 2023-11-30 | 2025-06-01 | 國家中山科學研究院 | 乙烯基酯樹脂之固化方法 |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3018266A (en) * | 1960-07-29 | 1962-01-23 | American Cyanamid Co | Polymerizable elastomer-vinyl aromatic compound composition containing a catalyst promoter system and method of polymerizing same |
| DE3612442A1 (de) * | 1986-04-12 | 1987-10-22 | Bayer Ag | Verfahren zur herstellung von uv-gehaerteten deckend pigmentierten beschichtungen |
| JPH1149835A (ja) * | 1997-08-05 | 1999-02-23 | Showa Highpolymer Co Ltd | コンクリート構築物用プライマー組成物及びその硬化方法 |
| TW436491B (en) * | 1997-08-22 | 2001-05-28 | Ciba Sc Holding Ag | Compositions for use in base-catalysed reactions, a process for curing said compostions and a process for photochemically generating bases in base catalysed polymeriaztion reactions |
| EP0898202B1 (en) * | 1997-08-22 | 2000-07-19 | Ciba SC Holding AG | Photogeneration of amines from alpha-aminoacetophenones |
| RU2265035C2 (ru) * | 2000-05-26 | 2005-11-27 | Акцо Нобель Н.В. | Фотоактивируемая композиция покрытия |
| RU2332419C2 (ru) * | 2001-10-17 | 2008-08-27 | Циба Спешиалти Кемикэлз Холдинг Инк. | Фотоактивируемые азотистые основания, фотополимеризующиеся композиции и применение |
| US6664357B1 (en) * | 2003-01-21 | 2003-12-16 | National Starch And Chemical Investment Holding Corporation | Method for the preparation of a stable anaerobic/UV/visible light curable adhesive |
| JP2008506826A (ja) * | 2004-07-21 | 2008-03-06 | チバ スペシャルティ ケミカルズ ホールディング インコーポレーテッド | 光活性化方法及び逆転した２段階工程による触媒の使用 |
| DE102005010327A1 (de) * | 2005-03-03 | 2006-09-07 | Basf Ag | Ratikalisch härtbare Beschichtungsmassen |
| JP4967276B2 (ja) * | 2005-08-09 | 2012-07-04 | 日立化成工業株式会社 | 回路接続材料並びに回路端子の接続構造体及び接続方法 |
| CN101522745B (zh) * | 2006-09-29 | 2013-06-19 | 西巴控股有限公司 | 以封闭异氰酸酯为基础的体系的光潜碱 |
-
2009
- 2009-01-06 WO PCT/EP2009/050066 patent/WO2009095282A2/en not_active Ceased
- 2009-01-06 JP JP2010544653A patent/JP5697992B2/ja not_active Expired - Fee Related
- 2009-01-06 US US12/812,795 patent/US20110190412A1/en not_active Abandoned
- 2009-01-06 EP EP09706026.3A patent/EP2238178B1/en not_active Not-in-force
- 2009-01-06 CN CN2009801032825A patent/CN101925616A/zh active Pending
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2011514393A5 (OSRAM) | ||
| WO2009095282A4 (en) | Photolatent amidine bases for redox curing of radically curable formulations | |
| US10961342B2 (en) | Resin formulation and uses thereof | |
| TWI238841B (en) | Photopolymerization compositions including maleimides and method thereof | |
| US10023500B2 (en) | Light-curable ceramic slurries with hybrid binders | |
| CN101124520B (zh) | 单光子和多光子可聚合的陶瓷前体聚合组合物 | |
| CN109689624A (zh) | 过氧化肉桂酸酯衍生物、含有该化合物的聚合性组合物 | |
| JP2006515833A5 (OSRAM) | ||
| RU2012114678A (ru) | Фотолатентные титан-хелатные катализаторы | |
| JP2008518988A5 (OSRAM) | ||
| JPWO2018025943A1 (ja) | 光硬化性組成物、義歯床及び有床義歯 | |
| JPH10291969A5 (OSRAM) | ||
| JP2011527027A5 (OSRAM) | ||
| WO2000071544A1 (en) | Chromene compounds | |
| DE602008000023D1 (de) | Lithographiedruckplattenvorläufer und Verfahren zur Herstellung einer Lithographiedruckplatte | |
| JP2008523987A5 (OSRAM) | ||
| ATE467666T1 (de) | Tintenzusammensetzung, tintenstrahldruckverfahren,bedrucktes material, verfahren zur herstellung einer lithographischen druckplatte, lithographische druckplatte | |
| CN106604912A (zh) | 肟磺酸酯衍生物 | |
| JPS61500974A (ja) | ２つの硬化タイプのプレポリマ−を含む光硬化性組成物 | |
| JP2008287213A5 (OSRAM) | ||
| ATE349715T1 (de) | Kunststofflinse und verfahren zu ihrer herstellung | |
| TW201638218A (zh) | 活性能量線硬化性組成物及其用途 | |
| JPWO2016031831A1 (ja) | 重合性単量体、重合性単量体の製造方法、硬化性組成物および樹脂部材 | |
| JP6625989B2 (ja) | 重合性単量体、重合性単量体の製造方法、硬化性組成物および樹脂部材 | |
| EP1652844A3 (en) | Fluorinated monomer having cyclic structure, manufacturing method, polymer, photoresist composition and patterning process |